Gas treatment device and hydrogen fluoride preparation system

Abstract

The utility model discloses a gas treatment device. The gas treatment device comprises a liquid supply assembly, a gas supply assembly, a Venturi tube, an absorption tower, a gas distributor, a spraying assembly and a separator, the Venturi tube is connected with the liquid supply assembly and the gas supply assembly; the Venturi tube is communicated with an input port of the absorption tower; the gas distributor is arranged in the absorption tower and is positioned above the input port; the spraying assembly is arranged in the absorption tower and located above the gas distributor, and the liquid supply assembly is connected with the spraying assembly; and the separator is connected with the absorption tower. Gas containing silicon tetrafluoride is preliminarily mixed with the absorption liquid in the Venturi tube, the silicon tetrafluoride is preliminarily absorbed by the absorption liquid and then enters the absorption tower, and under the action of the gas distributor and the spraying assembly, the silicon tetrafluoride is absorbed by the absorption liquid again. The liquid absorbing the silicon tetrafluoride drops to the bottom of the absorption tower and is received by the separator for solid-liquid separation, so that the fluosilicic acid solution with the concentration meeting the requirement is obtained. The utility model further discloses a hydrogen fluoride preparation system.

Description

Technical Field

[0001] This application belongs to the technical field of gas processing equipment, specifically relating to a gas processing device and a hydrogen fluoride preparation system. Background Technology

[0002] During the preparation of hydrogen fluoride, some fluorine escapes as silicon tetrafluoride gas. Treating silicon tetrafluoride gas as waste gas would result in low hydrogen fluoride conversion rates and increase the cost of waste gas treatment equipment. Therefore, there is an urgent need for equipment capable of absorbing and reusing silicon tetrafluoride gas. Utility Model Content

[0003] Based on this, this application provides a gas processing device and a hydrogen fluoride preparation system capable of absorbing and reusing silicon tetrafluoride gas.

[0004] The technical solution proposed in this application is as follows:

[0005] A gas processing apparatus, comprising:

[0006] Liquid supply assembly and gas supply assembly;

[0007] A venturi tube, connected to the liquid supply assembly and the gas supply assembly, is used to mix liquid and gas;

[0008] An absorption tower is provided with an inlet, and the venturi tube is connected to the inlet to allow a mixture of liquid and gas to be introduced into the absorption tower.

[0009] A gas distributor is installed inside the absorption tower and located above the inlet;

[0010] A spray assembly is installed inside the absorption tower and located above the gas distributor; the liquid supply assembly is connected to the spray assembly.

[0011] A separator, connected to the absorption tower, is used to receive the liquid at the bottom of the absorption tower and to perform solid-liquid separation on the liquid.

[0012] Using the aforementioned gas treatment device, the gas containing silicon tetrafluoride is first initially mixed with the absorbent in a venturi tube. The absorbent initially absorbs the silicon tetrafluoride. The gas then enters the absorption tower, where, under the action of a gas distributor and spray assembly, the absorbent further absorbs the silicon tetrafluoride. The liquid absorbing the silicon tetrafluoride drips to the bottom of the absorption tower, where a separator collects the liquid and performs solid-liquid separation, separating the silicon dioxide solid from the liquid to obtain a fluorosilicic acid solution with the required concentration. Thus, this gas treatment device enables the absorption and reuse of silicon tetrafluoride in gas.

[0013] Furthermore, the gas processing device also includes a raw liquid tank, which is connected to the separator and is used to receive the liquid after solid-liquid separation.

[0014] Furthermore, the gas treatment device also includes a storage tank and a reflux pump. The storage tank is connected to the separator, and the raw liquid tank and the storage tank can be alternately connected to the separator. The storage tank and the spray assembly are connected via the reflux pump.

[0015] Furthermore, the spray assembly includes a first spray layer and a second spray layer, which are arranged vertically at intervals within the absorption tower. The reflux pump is connected to the first spray layer, and the liquid supply assembly is connected to the second spray layer.

[0016] Furthermore, the spray assembly includes at least two second spray layers, which are arranged vertically at intervals within the absorption tower.

[0017] Furthermore, the gas treatment device also includes a circulation pump, and the absorption tower and the second spray layer are connected via the circulation pump.

[0018] Furthermore, the gas processing device also includes a cooler for cooling the liquid pumped to the second spray layer by the circulating pump.

[0019] Furthermore, the gas treatment device also includes a cleaning structure disposed inside the absorption tower and located at the top of the absorption tower. The liquid supply assembly is connected to the cleaning structure, and the cleaning structure is capable of spraying liquid onto the inner wall of the absorption tower, the spraying assembly, and the gas distributor.

[0020] Furthermore, the gas treatment device also includes a stirring structure, which is disposed inside the absorption tower and located at the bottom of the absorption tower. The stirring structure is used to stir the liquid at the bottom of the absorption tower.

[0021] A hydrogen fluoride preparation system includes a gas processing device as described above. Attached Figure Description

[0022] The accompanying drawings are provided to further understand this application and form part of the specification. They are used together with the embodiments of this application to explain this application and do not constitute a limitation thereof.

[0023] Figure 1 This is a schematic diagram of the gas processing device provided in this application.

[0024] Label Explanation:

[0025] 11. Liquid supply assembly; 12. Gas supply assembly; 13. Venturi tube; 14. Absorption tower; 15. Gas distributor; 16. Spray assembly; 17. Separator; 18. Stirring structure; 19. Cleaning structure; 20. Production pump; 21. Raw material tank; 22. Storage tank; 23. Return pump; 24. First spray layer; 25. Second spray layer; 26. Circulation pump; 27. Cooler; 28. Temperature detector; 29. ​​Liquid level detector. Detailed Implementation

[0026] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the scope of protection of this application.

[0027] In the description of this application, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are used only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the equipment or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this application.

[0028] On one hand, this application provides a gas processing device for absorbing and reusing silicon tetrafluoride gas generated during the preparation of hydrogen fluoride. For example... Figure 1 As shown, the gas processing device includes a liquid supply assembly 11, a gas supply assembly 12, a venturi tube 13, an absorption tower 14, a gas distributor 15, a spray assembly 16, and a separator 17.

[0029] Both the liquid supply assembly 11 and the gas supply assembly 12 are connected to the Venturi tube 13. The liquid supply assembly 11 provides the absorbent, which can be a 30% fluorosilicic acid solution. The gas supply assembly 12 provides the gas, which can be a gas containing silicon tetrafluoride. The Venturi tube 13 is capable of mixing the liquid and the gas, i.e., initially mixing the liquid and the gas. During the mixing process, the absorbent can initially absorb the silicon tetrafluoride.

[0030] The absorption tower 14 has an inlet, and a venturi tube 13 is connected to the inlet to allow a mixture of liquid and gas to be introduced into the absorption tower 14. The gas entering the absorption tower 14 flows upward, and the liquid entering the absorption tower 14 flows downward to the bottom of the absorption tower 14. The gas distributor 15 and the spray assembly 16 are both located inside the absorption tower 14, with the gas distributor 15 positioned above the inlet to uniformly distribute the gas entering the absorption tower 14 and improve the uniformity of gas distribution. The spray assembly 16 is positioned above the gas distributor 15, and the liquid supply assembly 11 is connected to the spray assembly 16 to spray the absorbent liquid through the spray assembly 16. After the gas is uniformly distributed, the contact between the gas and the absorbent liquid is more uniform, thereby improving the absorption efficiency of the absorbent liquid.

[0031] Separator 17 is connected to absorption tower 14 and is used to receive the liquid at the bottom of absorption tower 14 and perform solid-liquid separation to obtain solid and liquid products. In this embodiment, the solid is silicon dioxide, and the liquid product is a fluorosilicic acid solution with a concentration of 50% or other concentrations greater than 30%.

[0032] Using the aforementioned gas treatment device, the gas containing silicon tetrafluoride is first initially mixed with the absorbent in the Venturi tube 13, where the absorbent initially absorbs the silicon tetrafluoride. It then enters the absorption tower 14, where, under the action of the gas distributor 15 and the spray assembly 16, the absorbent further absorbs the silicon tetrafluoride. The liquid absorbing the silicon tetrafluoride drips to the bottom of the absorption tower 14, where the separator 17 receives the liquid and performs solid-liquid separation, separating the silicon dioxide solid from the liquid to obtain a fluorosilicic acid solution with the required concentration. Thus, this gas treatment device enables the absorption and reuse of silicon tetrafluoride in the gas.

[0033] It should be explained that the gas supply component 12 mentioned above may include a gas storage tank, which can store the gas containing silicon tetrafluoride generated during the hydrogen fluoride preparation process, and then deliver the gas to the venturi tube 13 through a delivery structure, such as a delivery pump.

[0034] Furthermore, the Venturi tube includes a contraction section, a throat, and a diffusion section. The liquid supply assembly 11 is connected to the contraction section to introduce the absorbent liquid into the Venturi tube at a high velocity. The absorbent liquid is accelerated in the contraction section, and its velocity reaches its maximum at the throat, creating a negative pressure zone. The gas supply assembly 12 is connected to the throat to draw in gas through negative pressure and perform preliminary mixing with the absorbent liquid. The mixture is then introduced into the absorption tower 14.

[0035] In one embodiment, the gas treatment device further includes a stirring structure 18, which is disposed inside the absorption tower 14 and located at the bottom of the absorption tower 14. The stirring structure 18 is used to stir the liquid at the bottom of the absorption tower 14 to prevent the accumulation of silica precipitate in the liquid, so that the solids in the liquid remain in a suspended state, making it convenient to transport them together with the liquid to the separator 17 for separation processing.

[0036] In one embodiment, the gas treatment device further includes a cleaning structure 19, which is disposed inside the absorption tower 14 and located at the top of the absorption tower 14. The liquid supply assembly 11 is connected to the cleaning structure 19, and the cleaning structure 19 can spray liquid onto the inner wall of the absorption tower 14, the spray assembly 16 and the gas distributor 15 to clean the inner wall of the absorption tower 14, the spray assembly 16 and the gas distributor 15.

[0037] It should be explained that, as mentioned above, the absorbent liquid produces silicon dioxide solid after absorbing silicon tetrafluoride. To prevent silicon dioxide solid from adhering to the inner wall of the absorption tower 14, the spray assembly 16, and the gas distributor 15, a cleaning structure 19 is provided to spray the absorbent liquid downwards to clean it. In addition, after the gas passes through the spray assembly 16, most of the silicon tetrafluoride is absorbed, and the small amount of residual silicon tetrafluoride will not form a large amount of silicon dioxide solid in the cleaning structure 19 and the exhaust pipe, thus preventing blockage.

[0038] In one embodiment, the gas processing apparatus further includes a pump 20 disposed between the absorption tower 14 and the separator 17, for pumping liquid from the bottom of the absorption tower 14 into the separator 17.

[0039] In one embodiment, the gas processing device further includes a raw liquid tank 21, which is connected to the separator 17 to receive the liquid after solid-liquid separation. In this embodiment, the liquid after solid-liquid separation is a fluorosilicic acid solution with a concentration of 50%.

[0040] Furthermore, the gas processing device also includes a storage tank 22 and a reflux pump 23. The storage tank 22 is connected to the separator 17, and the raw liquid tank 21 and the storage tank 22 can be alternately connected to the separator 17. The storage tank 22 can receive the liquid separated by the separator 17. The storage tank 22 and the spray assembly 16 are connected via the reflux pump 23 to circulate the liquid in the storage tank 22 to the spray assembly 16, thereby realizing the recycling of the liquid. It is understood that the alternate connection between the raw liquid tank 21 and the storage tank 22 and the separator 17 can be achieved through a three-way valve.

[0041] It should be explained that during the normal operation of the gas treatment device, the raw liquid tank 21 is connected to the separator 17. After solid-liquid separation in the separator 17, the liquid at the bottom of the absorption tower 14 is directly fed into the raw liquid tank 21 for storage. After absorption is completed, the solid in the separator 17 needs to be cleaned to remove residual acidic substances from the solid surface. At this time, the separator 17 and the storage tank 22 can be connected, and the cleaned liquid can be fed into the storage tank 22. Preferably, the cleaning liquid is water.

[0042] In one embodiment, the spray assembly 16 includes a first spray layer 24 and a second spray layer 25, which are arranged vertically at intervals within the absorption tower 14. A reflux pump 23 is connected to the first spray layer 24 to reuse the liquid and reduce consumption; a liquid supply assembly 11 is connected to the second spray layer 25 to spray the absorbent liquid through the second spray layer 25.

[0043] Furthermore, the spray assembly 16 includes at least two second spray layers 25, which are arranged at intervals along the vertical direction to improve the density and uniformity of the absorbent spray, thereby enhancing the absorption effect on silicon tetrafluoride. Specifically... Figure 1 In the illustrated embodiment, the first spray layer 24 is located above the second spray layer 25.

[0044] It should be explained that, compared to the amount of absorbent provided by the liquid supply assembly 11, the amount of water used for cleaning the solids in the separator 17 is less, so the first spray layer 24 is preferably one layer; at the same time, the liquid in the storage tank 22 is also a fluorosilicic acid solution, but the concentration is usually lower than that of the absorbent input by the liquid supply assembly 11.

[0045] In one embodiment, the gas treatment device further includes a circulation pump 26, through which the absorption tower 14 and the second spray layer 25 are connected, so as to circulate the liquid at the bottom of the absorption tower 14 to the second spray layer 25, thereby realizing the recycling of the liquid and reducing the consumption of absorbent liquid. It should be noted that, in order to improve the reliability of the gas treatment device, the circulation pump 26, as well as the above-mentioned extraction pump 20 and return pump 23, can all be equipped with standby pumps.

[0046] Furthermore, the gas processing device also includes a cooler 27, which is used to cool the liquid pumped by the circulating pump 26 to the second spray layer 25 so that the temperature of the liquid sprayed by the second spray layer 25 meets the requirements and avoids the temperature inside the absorption tower 14 from being too high.

[0047] Furthermore, the absorption tower 14 is also equipped with a liquid replenishment port, located below the gas distributor 15; the liquid supply assembly 11 is also connected to the absorption tower 14 and communicates with the liquid replenishment port to replenish the absorbent when the liquid level at the bottom of the absorption tower 14 is low. It should be explained that, in the initial stage, the absorbent sprayed from the second spray layer 25 is supplied through the liquid supply assembly 11; after the liquid level at the bottom of the absorption tower 14 reaches a high level, the circulation pump 26 and the cooler 27 are started, and the liquid sprayed from the second spray layer 25 is supplied through the circulation pump 26; when the liquid level at the bottom of the absorption tower 14 drops to a low level, the liquid supply assembly 11 replenishes the absorbent into the absorption tower 14 through the liquid replenishment port.

[0048] Specifically Figure 1 In the embodiment shown, a temperature detector 28 and a liquid level detector 29 can be installed on the absorption tower 14. The cooler 27 works in conjunction with the temperature detector 28 to ensure that the temperature inside the absorption tower 14 meets the requirements. The liquid level detector 29 works in conjunction with the liquid supply assembly 11 and the circulation pump 26 to achieve the above-mentioned working process.

[0049] To facilitate understanding of the technical solution of this application, this document combines... Figure 1 The working process of the gas processing device in the above embodiments will be described as follows:

[0050] In the initial application, the liquid supply assembly 11 feeds absorbent into the Venturi tube 13 and the second spray layer 25, while the gas supply assembly 12 feeds gas containing silicon tetrafluoride into the Venturi tube 13. The absorbent and gas are initially mixed in the Venturi tube 13 and then fed into the absorption tower 14. The gas flows upward in the absorption tower 14, passing sequentially through the gas distributor 15, the second spray layer 25, the first spray layer 24, and the cleaning structure 19, before being discharged from the exhaust port at the top. The gas distributor 15 ensures uniform gas distribution, improving the absorption effect of the absorbent on silicon tetrafluoride. After the liquid level at the bottom of the absorption tower 14 reaches a certain height, the stirring structure 18 is activated to agitate the liquid. After the liquid level at the bottom of the absorption tower 14 reaches a high level, the circulation pump 26 and the cooler 27 are activated. The circulation pump 26 pumps the liquid at the bottom of the absorption tower 14 to the second spray layer 25, while the liquid supply assembly 11 stops supplying liquid to the second spray layer 25.

[0051] After a certain amount of gas is processed, the liquid supply component 11 and the gas supply component 12 stop supplying liquid and gas, and start the extraction pump 20 to input the liquid at the bottom of the absorption tower 14 into the separator 17 for solid-liquid separation. At the same time, the liquid remaining at the bottom of the absorption tower 14 can be discharged by opening a drain port at the bottom of the absorption tower 14.

[0052] The liquid separated in separator 17 is stored in raw liquid tank 21. After separation, water is introduced into separator 17 to clean the solids, and the cleaned liquid is introduced into storage tank 22. When processing the next batch of gas, reflux pump 23 can pump the liquid in storage tank 22 to the first spray layer 24 for spraying, and other processes are as described above, and will not be repeated here.

[0053] Additionally, it should be noted that, as Figure 1 As shown, valves can be installed on the pipeline to control the flow of the pipeline, thereby achieving the connection and isolation between various components.

[0054] On the other hand, this application also provides a hydrogen fluoride preparation system, which includes the gas processing device in the above embodiments.

[0055] In summary, the gas processing apparatus and hydrogen fluoride preparation system provided in this application have at least the following advantages:

[0056] 1. The absorbent and gas are initially mixed through the Venturi tube 13, and then mixed and absorbed again in the absorption tower 14, which improves the absorption efficiency while absorbing silicon tetrafluoride in the gas.

[0057] 2. The absorbed liquid enters the separator 17 for solid-liquid separation. The separated liquid is stored in the original liquid tank 21 to realize the reuse of silicon tetrafluoride.

[0058] 3. The water used to clean the solids in the separator 17 is fed into the storage tank 22 and then pumped to the first spray layer 24 by the return pump 23 for reuse, which improves the resource utilization rate.

[0059] 4. Silicon tetrafluoride absorption will produce silicon dioxide solid. By setting up the cleaning structure 19, silicon dioxide can be prevented from adhering to the inner wall of the absorption tower 14, the spray assembly 16 and the gas distributor 15.

[0060] 5. Cooling the liquid delivered to the second spray layer 25 by the circulating pump 26 through the cooler 27 can ensure that the temperature inside the absorption tower 14 meets the requirements and avoids excessive temperature.

[0061] Although embodiments of this application have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and variations can be made to these embodiments without departing from the principles and spirit of this application, the scope of which is defined by the appended claims and their equivalents.

Claims

1. A gas processing device, characterized in that, include: Liquid supply assembly and gas supply assembly; A venturi tube, connected to the liquid supply assembly and the gas supply assembly, is used to mix liquid and gas; An absorption tower is provided with an inlet, and the venturi tube is connected to the inlet to allow a mixture of liquid and gas to be introduced into the absorption tower. A gas distributor is installed inside the absorption tower and located above the inlet; A spray assembly is installed inside the absorption tower and located above the gas distributor; the liquid supply assembly is connected to the spray assembly. A separator, connected to the absorption tower, is used to receive the liquid at the bottom of the absorption tower and to perform solid-liquid separation on the liquid.

2. The gas processing device according to claim 1, characterized in that, It also includes a raw liquid tank, which is connected to the separator and is used to receive the liquid after solid-liquid separation.

3. The gas processing apparatus according to claim 2, characterized in that, It also includes a storage tank and a reflux pump. The storage tank is connected to the separator, and the raw liquid tank and the storage tank can be alternately connected to the separator. The storage tank and the spray assembly are connected via the reflux pump.

4. The gas processing apparatus according to claim 3, characterized in that, The spray assembly includes a first spray layer and a second spray layer, which are arranged vertically at intervals within the absorption tower. The reflux pump is connected to the first spray layer, and the liquid supply assembly is connected to the second spray layer.

5. The gas processing apparatus according to claim 4, characterized in that, The spray assembly includes at least two layers of the second spray layer, which are arranged vertically at intervals within the absorption tower.

6. The gas processing apparatus according to claim 4, characterized in that, It also includes a circulating pump, through which the absorption tower and the second spray layer are connected.

7. The gas processing apparatus according to claim 6, characterized in that, It also includes a cooler for cooling the liquid pumped by the circulation pump to the second spray layer.

8. The gas processing apparatus according to claim 1, characterized in that, It also includes a cleaning structure, which is disposed inside the absorption tower and located at the top of the absorption tower. The liquid supply assembly is connected to the cleaning structure, and the cleaning structure is capable of spraying liquid onto the inner wall of the absorption tower, the spraying assembly, and the gas distributor.

9. The gas processing apparatus according to claim 1, characterized in that, It also includes a stirring structure, which is disposed inside the absorption tower and located at the bottom of the absorption tower. The stirring structure is used to stir the liquid at the bottom of the absorption tower.

10. A hydrogen fluoride preparation system, characterized in that, Includes the gas processing apparatus according to any one of claims 1-9.

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