Anti-oxidation device and system for seed crystal
By setting up gas channels and gas shields in the chuck, and using inert gas to protect the seed crystal, the problem of seed crystal oxidation is solved, and the safety and stability of single crystal silicon pulling is improved.
Patent Information
- Application Number
- CN202520346776.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-02-28
- Publication Date
- 2026-03-06
- Estimated Expiration
- 2035-02-28
AI Technical Summary
During the Czochralski process of growing single-crystal silicon, the seed crystal is easily oxidized by volatiles at high temperatures, especially in the area above the liquid surface, which leads to a decrease in seed crystal strength and even the risk of breakage, dropping, and explosion. Existing inert gas protection is not effective.
A gas channel is provided on the clamping arm of the chuck, running through both ends, and equipped with a gas guide cover. Inert gas is used to effectively protect the area between the seed crystal and the liquid surface through the gas channel, ensuring that the inert gas can flow to the top of the chuck and reduce the contact between volatiles and the seed crystal.
It effectively reduces the probability of seed crystal oxidation, improves the protective effect of inert gas, avoids obstruction of vision, and enhances the safety and stability of the crystal pulling process.
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Figure CN223974254U_ABST
Abstract
Description
Technical Field
[0001] This application belongs to the field of single crystal pulling technology, and in particular relates to an anti-oxidation device and system for seed crystals. Background Technology
[0002] The Czochralski method for growing monocrystalline silicon is currently the most widely used technology for producing monocrystalline silicon. Its development is trending towards larger hot zones, larger charge sizes, and larger dimensions. Ensuring the safety of pulling large-size, heavy crystal ingots has become a critical issue that urgently needs to be addressed. Currently, in the Czochralski method, the weight of the crystal ingot relies solely on the tungsten wire rope and the φ4-5mm portion of the seed crystal. During the crystal pulling process, the combined effects of high temperatures and volatile gases cause the seed crystal to undergo iridescent oxidation, reducing its strength. As the ingot length increases, especially towards the end section, the rate of breakage, breakage, and explosion becomes even higher.
[0003] Currently, to prevent the seed crystals from oxidizing during in-furnace development, inert gases such as argon are mainly used for protection. However, since the existing graphite chuck structure is larger at the top and smaller at the bottom, the area between the graphite chuck structure and the liquid surface is an inert gas blind zone. The inert gas cannot effectively protect the seed crystals in this area. Therefore, when volatiles are generated above the liquid surface due to high temperature, the volatiles can still come into contact with the seed crystals in the inert gas blind zone, thus causing the seed crystals to oxidize during in-furnace development. Utility Model Content
[0004] This application provides an anti-oxidation device and system for seed crystals, which reduces the contact between volatiles and seed crystals, thereby reducing the probability of oxidation of the seed crystals.
[0005] In a first aspect, this application provides an anti-oxidation device for seed crystals, comprising: a chuck for holding the seed crystal, the chuck having a gas channel extending through both ends therethrough, the gas channel having an inlet end and an outlet end; and a gas hood, coaxially disposed with the chuck and connected to the chuck at the inlet end of the gas channel and for supplying gas to the inlet end of the gas channel.
[0006] In a second aspect, this application provides an anti-oxidation system for seed crystals, comprising a weight, a seed crystal disposed at the bottom of the weight, a connecting rope disposed at the top of the weight and connected to the weight, and at least one of the aforementioned anti-oxidation devices for seed crystals. The anti-oxidation device for seed crystals has one end of its clamping end encircled and connected to the weight, and the other end encircled and clamps the seed crystal.
[0007] In summary, the anti-oxidation device and system for seed crystals provided in this application have at least the following beneficial effects:
[0008] In this application, starting from the source of the reaction, a gas guiding channel is provided on the clamping arm of the chuck, extending through both ends. This channel guides inert gas from outside the chuck to the area between the chuck and the liquid surface, effectively protecting the seed crystal in this region. This reduces the impact of volatiles on the seed crystal and lowers the probability of oxidation. Furthermore, a gas guide shroud is provided on the gas inlet side of the gas guiding channel, and the shroud is used to guide the gas flow, ensuring that the inert gas can flow from outside the chuck to above it. This allows the inert gas to smoothly flow in from the gas inlet of the gas guiding channel and out through the gas outlet to the area between the seed crystal and the liquid surface, without obstructing the seed crystal's field of view. Therefore, based on the setting of the gas guide shroud, on the one hand, the gas flow rate entering the gas guide channel is increased, thereby enhancing the protective effect of the inert gas on the seed crystal in the area between the seed crystal and the liquid surface, thereby further reducing the impact of volatiles on the seed crystal and reducing the probability of the seed crystal being oxidized; on the other hand, it also avoids the problem of the gas guide shroud blocking the seed crystal viewing area. Attached Figure Description
[0009] To more clearly illustrate the technical solutions in the specific embodiments of this application or the prior art, the accompanying drawings used in the description of the specific embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are some embodiments of this application; those skilled in the art can obtain other drawings based on these drawings without any creative effort.
[0010] Figure 1 This is a schematic diagram of the structure of the anti-oxidation system for seed crystals provided in the embodiments of this application;
[0011] Figure 2 This is a schematic diagram of the gas flow direction in the seed crystal anti-oxidation system provided in the embodiments of this application;
[0012] Figure 3 This is a three-dimensional structural schematic diagram of the anti-oxidation device for seed crystals provided in the embodiments of this application;
[0013] Figure 4 This is a schematic diagram of the structure of a chuck provided in an embodiment of this application;
[0014] Figure 5 For along Figure 4 A schematic diagram of the internal structure after being divided by the AA line;
[0015] Figure 6 This is a schematic diagram of another type of chuck provided in an embodiment of this application;
[0016] Figure 7 This is a schematic diagram of the structure of the air guide shroud provided in the embodiments of this application;
[0017] Figure 8 For along Figure 7 A schematic diagram of the internal structure after being divided by the BB line;
[0018] Figure 9 for Figure 1 An enlarged view of the circled area.
[0019] The attached figures are labeled as follows:
[0020] 100. Anti-oxidation device for seed crystals;
[0021] 10. Clamp; 11. First connecting part; 12. First extension part; 20. Air guide cover; 21. Second connecting part; 22. Second extension part; 23. Supporting part; S. Air guide channel; S1. Air inlet end; S2. Air outlet end;
[0022] 200. Heavy hammer;
[0023] 300, Seed Crystal;
[0024] 400. Connecting rope;
[0025] 500, cold screen. Detailed Implementation
[0026] To make the above and other features and advantages of this application clearer, the present invention will be further described below with reference to the accompanying drawings. It should be understood that the specific embodiments given herein are for the purpose of explanation to those skilled in the art and are exemplary only, not restrictive.
[0027] Furthermore, features specified with "first" or "second" for descriptive purposes only should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Features specified with "first" or "second" may explicitly or implicitly include at least one of the specified features. The description of "multiple" generally means at least two, such as two, three, etc., unless otherwise explicitly specified.
[0028] Figure 1 This is a schematic diagram of the anti-oxidation system for seed crystals provided in an embodiment of this application. Figure 2 This is a schematic diagram of the gas flow direction in the seed crystal anti-oxidation system provided in the embodiments of this application. Figure 3 This is a three-dimensional structural diagram of the anti-oxidation device for seed crystals provided in an embodiment of this application.
[0029] Please see Figure 1 The seed crystal anti-oxidation system in this application embodiment includes a seed crystal anti-oxidation device 100, a weight 200, a seed crystal 300, and a connecting rope 400.
[0030] Along the axial direction of the hammer 200, the seed crystal 300 is set at the bottom of the hammer 200 by the seed crystal anti-oxidation device 100, and the connecting rope 400 is set at the top of the hammer 200 and connected to the hammer 200.
[0031] One end of the seed crystal anti-oxidation device 100 is ringed around and connected to the weight 200, and the other end is ringed around and clamps the seed crystal 300, so as to suspend the seed crystal 300 below the weight 200.
[0032] Please see Figures 1 to 3 The seed crystal anti-oxidation device 100 specifically includes a chuck 10 and a gas guide hood 20.
[0033] The chuck 10 has a clamping arm for holding the seed crystal 300, which is surrounded by a mounting cavity. The seed crystal 300 passes through this mounting cavity. Under its own weight, the seed crystal 300 presses against the inner wall of the mounting cavity (i.e., the clamping arm). The clamping arm of the chuck 10 then clamps the seed crystal 300 under this pressure, thus fixing it securely on the chuck 10. Furthermore, during the crystal pulling process, as the force on the seed crystal 300 increases, the friction between the chuck 10 and the seed crystal 300 also increases, resulting in a greater clamping force and thus ensuring stable clamping during the crystal pulling process.
[0034] Along the axial direction of the chuck 10, the clamping arm of the chuck 10 is provided with a gas guiding channel S extending through both ends of the chuck. The gas guiding channel S has an inlet end S1 and an outlet end S2, that is, the gas guiding channel S extends from one end of the clamping arm to the other end along the extension direction of the clamping arm, and forms an inlet end S1 for gas entry and an outlet end S2 for gas exit. Specifically, during the crystal pulling process, the gas flowing into and out of the gas guiding channel S is an inert gas, such as argon.
[0035] The air guide cover 20 is coaxially arranged with the clamp 10 and is connected to the clamp 10 at the air inlet end S1 of the air guide channel S and is used to supply air to the air inlet end S1 of the air guide channel S.
[0036] Understandably, in the axial direction of the chuck 10, the chuck 10 has a seed crystal mounting part and a counterweight connecting part. When installing and replacing the seed crystal 300, the seed crystal 300 can be placed in the seed crystal mounting part of the chuck 10 first, and then the air guide cover 20 can be coaxially connected to the chuck 10 on the air inlet end S1 side of the air guide channel S. Then, the whole consisting of the three can be sleeved on the counterweight 200, and the counterweight connecting part of the chuck 10 can be connected to the counterweight 200 (such as a threaded connection).
[0037] To address the frequent issue of seed crystal oxidation and iridescence, current technologies primarily rely on human observation and assessment to mitigate the risks associated with it. Once oxidation and iridescence occur, manual intervention is crucial for rapid detection and prevention of subsequent accidents such as rod breakage and explosions. However, with industry development, labor-saving and efficiency-enhancing have become strategic goals for many monocrystalline silicon companies. The limitations of labor-saving measures and personnel technical capabilities make accurate assessment of seed crystal oxidation even more challenging. Furthermore, while detection methods for seed crystal oxidation, such as cameras, are being developed, their accuracy remains unsatisfactory due to factors like high furnace temperatures, color differences, and positional relationships.
[0038] In this application, the existing approach of detection, judgment, and rapid processing is completely abandoned. Instead, it starts from the source of the reaction and sets a gas channel S through both ends of the clamping arm of the chuck 10. The gas channel S guides the inert gas outside the chuck 10 to the area between the chuck 10 and the liquid surface. This allows the inert gas to effectively protect the seed crystal 300 in this area. In other words, the inert gas can effectively isolate the seed crystal 300 from the volatiles generated above the liquid surface due to high temperature in this area, thereby reducing the impact of volatiles on the seed crystal 300 and reducing the probability of the seed crystal 300 being oxidized.
[0039] Furthermore, a gas guide shroud 20 is installed on the gas inlet end S1 side of the gas guide channel S of the chuck 10, and the gas guide shroud 20 is used for flow guidance to ensure that the inert gas can be guided from the outside of the chuck 10 to the top of the chuck 10. This allows the inert gas to flow smoothly from the gas inlet end S1 of the gas guide channel S and flow out through the gas outlet end S2 to the area between the seed crystal 300 and the liquid surface, without obstructing the seed crystal's field of view. Therefore, based on the setting of the gas guide shroud 20, on the one hand, the gas flow rate entering the gas guide channel S is increased, thereby enhancing the protective effect of the inert gas on the seed crystal 300 in the area between the seed crystal 300 and the liquid surface, thereby further reducing the impact of volatiles on the seed crystal 300 and reducing the probability of the seed crystal 300 being oxidized; on the other hand, it also avoids the problem of the gas guide shroud 20 blocking the seed crystal's field of view.
[0040] Figure 4 This is a schematic diagram of the structure of a chuck provided in an embodiment of this application. Figure 5 For along Figure 4 A schematic diagram of the internal structure after being divided by the AA line. Figure 6 This is a schematic diagram of another clamp structure provided in an embodiment of this application.
[0041] Please see Figures 4 to 6The air guide channel S on the chuck 10 extends obliquely from the air inlet end S1 toward the central axis of the chuck 10, that is, the extending direction of the air guide channel S intersects the central axis of the chuck 10 and the air guide channel S gradually extends closer to the central axis of the chuck 10. Furthermore, the acute angle between the extending direction of the air guide channel S and the axial direction of the chuck 10 is 5° to 20°. For example, the acute angle between the extending direction of the air guide channel S and the axial direction of the chuck 10 can be 5°, 7°, 8°, 10°, 12°, 15°, 16°, 18°, 19°, 20°, etc.
[0042] In this embodiment, the gas guide channel S on the chuck 10 is inclinedly extended from the gas inlet end S1 toward the central axis of the chuck 10, so that the inert gas can enter from the gas inlet end S1 of the gas guide channel S and flow obliquely along the gas guide channel S toward the seed crystal 300, so as to gradually approach the seed crystal 300, thereby ensuring that the inert gas can be directly blown onto the surface of the seed crystal 300. This allows the inert gas to effectively protect the seed crystal 300 in the area between the seed crystal 300 and the liquid surface, thereby reducing the impact of volatiles on the seed crystal 300 and reducing the probability of the seed crystal 300 being oxidized. Furthermore, by setting the acute angle between the extension direction of the gas guide channel S and the axis of the chuck 10 within the upper range, the inert gas can be blown just to a position 30mm-50mm away from the liquid surface of the seed crystal 300. This allows the inert gas to form a protective zone at this position, effectively isolating the seed crystal 300 from the volatiles generated above the liquid surface due to high temperature. This reduces the impact of volatiles on the seed crystal 300 and lowers the probability of the seed crystal 300 being oxidized.
[0043] Preferably, the acute angle between the extending direction of the air guide channel S and the axial direction of the chuck 10 is 8° to 14°. For example, the acute angle between the extending direction of the air guide channel S and the axial direction of the chuck 10 can be 8°, 8.5°, 9°, 9.5°, 10°, 10.5°, 11°, 11.5°, 12°, 12.5°, 13°, 13.5°, 14°, etc.
[0044] Setting the acute angle between the extension direction of the gas guide channel S and the axis of the chuck 10 within the upper range optimizes the distance between the position of the inert gas blowing onto the surface of the seed crystal 300 and the liquid surface. This avoids the problems of the inert gas blowing onto the surface of the seed crystal 300 being too close to the liquid surface, which would affect the growth of the crystal rod, and the inert gas being too far from the liquid surface, which would result in poor protection of the seed crystal 300.
[0045] In some embodiments, such as Figure 4 and Figure 5As shown, there are multiple air channels S, which are spaced apart circumferentially along the clamping arm of the chuck 10. Each air channel S is a through-hole structure, such as a round hole or an irregularly shaped hole. Preferably, the multiple air channels S are equally spaced along the circumferential direction of the clamping arm. The diameter of the air channel S can be 4mm to 12mm, for example, 4mm, 5mm, 6mm, 7mm, 8mm, 9mm, 10mm, or 11mm.
[0046] In this embodiment, based on the cooperation of multiple gas guiding channels S, when the inert gas flows out from the multiple gas guiding channels S, multiple continuous inert gas protection zones can be formed on the outer periphery of the part of the seed crystal 300 that extends out of the chuck 10. The multiple continuous inert gas protection zones effectively isolate the seed crystal 300 from the volatiles generated above the liquid surface due to high temperature in various circumferential directions, thereby reducing the impact of volatiles on the seed crystal 300 and reducing the probability of the seed crystal 300 being oxidized.
[0047] In some embodiments, such as Figure 6 As shown, there is one air guide channel S, which is a hollow annular cavity structure extending circumferentially along the clamping arm of the chuck 10.
[0048] In this embodiment, the gas guiding channel S is formed as a hollow annular cavity structure. When the inert gas flows out from the gas guiding channel S, an annular inert gas protection zone can be formed on the outer periphery of the part of the seed crystal 300 that extends out of the chuck 10. This effectively isolates the seed crystal 300 from the volatiles generated above the liquid surface due to high temperature in every circumferential direction, thereby reducing the impact of volatiles on the seed crystal 300 and reducing the probability of the seed crystal 300 being oxidized.
[0049] In some embodiments, please refer to Figure 5 The chuck 10 has a hollow ring structure and is coaxially arranged with the counterweight 200 and the seed crystal 300. Specifically, the chuck 10 includes a first connecting portion 11 and a first extension portion 12 arranged along its axial direction.
[0050] The first connecting portion 11 is connected to the air guide cover 20, and the first extension portion 12 is located at the end of the first connecting portion 11 away from the air guide cover 20. The air guide channel S passes through the first connecting portion 11 and the first extension portion 12, and the outer diameter of the first extension portion 12 decreases sequentially from the first connecting portion 11 towards the direction away from the air guide cover 20, i.e., the first extension portion 12 is formed into a tapered structure that is larger at the top and smaller at the bottom. The chuck 10 can be threadedly connected to the counterweight 200 by providing internal threads on the inner wall of the first connecting portion 11 and / or the inner wall of the first extension portion 12.
[0051] In this embodiment, since the gas channel S is provided to pass through the first connecting part 11 and the first extension part 12, the outer diameter of the first extension part 12 is set to decrease sequentially from the first connecting part 11 toward the direction away from the gas hood 20. On the one hand, this can reduce the obstruction of the inert gas by the chuck 10 itself, thereby reducing the inert gas blind zone between the chuck 10 and the liquid surface, and making the blowing in the gas channel S of the chuck 10 more concentrated. This helps to reduce the impact of volatiles on the seed crystal 300 and reduce the probability of the seed crystal 300 being oxidized. On the other hand, it also alleviates the problem of the chuck 10 blocking the crystal-guiding field of view.
[0052] Specifically, the first connecting part 11 can be a columnar structure, or it can be a conical structure with the outer diameter of the first connecting part 11 being larger than the outer diameter of the first extension part 12. This application does not make any specific limitations.
[0053] Figure 7 This is a schematic diagram of the structure of the air guide shroud provided in the embodiments of this application. Figure 8 For along Figure 7 A schematic diagram of the internal structure after being divided by the BB line. Figure 9 for Figure 1 An enlarged view of the circled area.
[0054] Please see Figure 7 and Figure 8 The air guide cover 20 has a hollow ring structure and includes a second connecting part 21 and a second extension part 22 arranged along its axial direction. The second connecting part 21 is connected to the clamp 10. The second extension part 22 is located at the end of the second connecting part 21 away from the clamp 10, and the inner diameter of the second extension part 22 is larger than the inner diameter of the second connecting part 21.
[0055] In this embodiment, the inner diameter of the second extension 22, which is far from the air inlet end S1, is set to be greater than the inner diameter of the second connecting part 21, which is close to the air inlet end S1. Thus, the air guide cover 20 is formed as a hollow cavity structure with a larger upper part and a smaller lower part. Inert gas can be introduced into the air guide channel S through the larger opening at the top of the air guide cover 20. This not only increases the gas flow rate introduced into the air guide channel S, but also improves the gas introduction efficiency.
[0056] In order to further improve the flow of gas in the gas guide channel S, the inner diameter of the second extension 22 is arranged to increase sequentially from the second connecting part 21 toward the direction away from the clamp 10, that is, the second extension 22 is formed into a conical structure with a larger upper part and a smaller lower part.
[0057] In some embodiments, please refer to Figure 8 and Figure 9 The air guide cover 20 also includes a support portion 23, which protrudes from the inside of the second connecting portion 21 and is supported on the clamp 10.
[0058] In this embodiment, the air guide cover 20 is guided and installed onto the clamp 10 by the second connecting part 21 until the bearing part 23 inside the second connecting part 21 is supported on the clamp 10. Thus, the air guide cover 20 and the clamp 10 are stably installed based on the weight of the air guide cover 20. This installation method is simple and efficient, and simplifies the structure of the air guide cover 20.
[0059] In some embodiments, continue reading Figure 2 The seed crystal anti-oxidation system also includes a cold shield 500, which is arranged around the outside of the seed crystal anti-oxidation device 100 and spaced apart from it. The inner diameter of the gas guide shroud 20 is larger than the outer diameter of the corresponding counterweight 200 and smaller than one-third of the inner diameter of the corresponding cold shield 500.
[0060] During normal crystal pulling, when the inert gas flow enters the interior of the cold screen 500 along the furnace cover of the single crystal furnace, the inert gas flow in the central part of the cold screen 500 is introduced into the interior of the gas guide hood 20 and enters the gas guide channel S of the chuck 10 along with the gas guide hood 20. With the guidance of the gas guide channel S, and combined with the high flow rate power provided by the back-end vacuum pump system, the inert gas flow can directly purge the seed crystal 300, so that the area between the seed crystal 300 and the liquid surface can also be covered by inert gas, thereby reducing the impact of volatiles on the seed crystal 300 and reducing the probability of the seed crystal 300 being oxidized. Furthermore, by setting the inner diameter of the air guide shroud 20 to be larger than the outer diameter of the counterweight 200 at its corresponding position and smaller than 1 / 3 of the inner diameter of the cold screen 500 at its corresponding position, the air guide shroud 20 can effectively guide the inert gas flow inside the cold screen 500 into the air guide channel S of the chuck 10 and ensure the relative balance of the air flow inside and outside the air guide shroud 20, thereby improving the guiding effect of the air guide shroud 20 on the inert gas flow.
[0061] Although embodiments of this application have been shown and described above, it is understood that the above embodiments are exemplary and should not be construed as limiting this application. Those skilled in the art can make changes, modifications, substitutions and variations to the above embodiments within the scope of this application.
Claims
1. An anti-oxidation device for a seed crystal, characterized by comprising: The device comprises: a chuck (10) for clamping a seed crystal, the chuck (10) being provided with a gas guide channel (S) extending through both ends thereof, and the gas guide channel (S) having an air inlet end (S1) and an air outlet end (S2); and a gas guide cover (20) coaxially arranged with the chuck (10) and connected with the chuck (10) at the air inlet end (S1) of the gas guide channel (S) and used for supplying air to the air inlet end (S1) of the gas guide channel (S).
2. The seed crystal oxidation prevention device according to claim 1, wherein The gas guide channel (S) extends obliquely from the air inlet end (S1) towards the central axis of the chuck (10), and the acute angle between the extension direction of the gas guide channel (S) and the axial direction of the chuck (10) is 5°-20°.
3. The seed crystal oxidation prevention device according to claim 2, wherein The acute angle between the extension direction of the gas guide channel (S) and the axial direction of the chuck (10) is 8°-14°.
4. The seed crystal oxidation prevention device according to claim 1, characterized in that: The number of the gas guide channels (S) is multiple, and the multiple gas guide channels (S) are arranged in a circumferential direction of the chuck (10); or The number of the gas guide channels (S) is one, and the gas guide channel (S) is a hollow annular cavity structure extending in a circumferential direction of a clamping arm of the chuck (10).
5. The seed crystal oxidation prevention apparatus according to claim 1, wherein The gas guide cover (20) is a hollow annular structure and comprises a second connecting portion (21) and a second extension portion (22) arranged in an axial direction thereof, the second connecting portion (21) is connected with the chuck (10), the second extension portion (22) is located at one end of the second connecting portion (21) away from the chuck (10), and an inner diameter of the second extension portion (22) is greater than an inner diameter of the second connecting portion (21).
6. The seed crystal oxidation prevention apparatus according to claim 5, wherein The inner diameter of the second extension portion (22) is sequentially increased from the second connecting portion (21) towards a direction away from the chuck (10).
7. The seed crystal oxidation prevention apparatus according to claim 5, wherein The gas guide cover (20) further comprises a bearing portion (23) protrudingly formed on an inner side of the second connecting portion (21) and bearing on the chuck (10).
8. The seed crystal oxidation prevention device according to claim 1, characterized in that: The chuck (10) is a hollow annular structure and comprises a first connecting portion (11) and a first extension portion (12) arranged in an axial direction thereof, the first connecting portion (11) is connected with the gas guide cover (20), and the first extension portion (12) is located at one end of the first connecting portion (11) away from the gas guide cover (20); The gas guide channel (S) extends through the first connecting portion (11) and the first extension portion (12), and an outer diameter of the first extension portion (12) is sequentially decreased from the first connecting portion (11) towards a direction away from the gas guide cover (20).
9. An anti-oxidation system for seed crystal, comprising a weight (200), a seed crystal (300) arranged at the bottom of the weight (200), and a connecting rope (400) arranged at the top of the weight (200) and connected with the weight (200), characterized in that, Further comprising at least one seed crystal oxidation prevention device (100) according to any one of claims 1-8; wherein one end of the chuck (10) of the seed crystal oxidation prevention device (100) is annularly arranged on the weight (200) and connected with the weight (200), and the other end is annularly arranged on the seed crystal (300) and clamps the seed crystal (300).
10. The seed crystal oxidation prevention system of claim 9, wherein the seed crystal oxidation prevention system further comprises a cold shield (500) disposed around and spaced apart from the seed crystal oxidation prevention device (100). The seed crystal oxidation prevention system further comprises a cold shield (500) disposed around and spaced apart from the seed crystal oxidation prevention device (100). The inner diameter of the gas guide cover (20) is greater than the outer diameter of the weight (200) at the corresponding position and less than 1 / 3 of the inner diameter of the cold shield (500) at the corresponding position.