Workpiece loading device and vacuum processing chamber
By setting a mask to block the protrusions of the workpiece during the vacuum processing, the problem of uneven coating on the workpiece is solved, and the uniformity of the coating on the workpiece surface is improved, especially the coating thickness near the side edges is reduced.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-03-27
- Publication Date
- 2026-03-10
AI Technical Summary
In the prior art, it is difficult to achieve uniform coating on workpieces with protrusions such as side edges or corners during vacuum coating, especially the uneven coating thickness at the protruding parts.
By setting a mask during the vacuum processing to block the protruding areas of the workpiece, the distance between the protrusions and the coating source is kept consistent during the workpiece rotation. The design of the mask aligning with the extension direction of the protrusions achieves probabilistic blocking of the protrusions, thereby improving coating uniformity.
It improves the uniformity of the coating on the workpiece surface, especially by reducing the coating thickness near the side edges, while having little impact on the coating thickness at the center of the side, thus improving the overall coating uniformity.
Smart Images
Figure CN223983719U_ABST
Abstract
Description
Technical Field
[0001] This utility model belongs to the field of thin film preparation technology, and relates to a device for improving the uniformity of vacuum processing, and more particularly to a workpiece loading device and a vacuum processing chamber. Background Technology
[0002] Vacuum coating and other vacuum processing technologies are increasingly being applied in fields such as optical instruments, smartphones, tablets, and automotive components. Taking vacuum coating as an example, to achieve uniform film thickness on the workpiece surface, either a workpiece holder rotation method or a coating source rotation around a fixed workpiece holder can be used. In the workpiece holder rotation method, the workpiece holder typically rotates while coating occurs, ensuring that each area of the workpiece to be coated passes sequentially through the coating source's area of action, thus achieving uniform coating thickness along the rotation direction. However, in existing technologies, if the area of the workpiece to be coated has protrusions such as side edges or corners, the distance between the farthest point of the area to be coated and the coating source usually changes as these protrusions pass through the coating source's area of action during rotation. Sometimes, this also involves changes in the incident angle of the coating source relative to the workpiece surface. Furthermore, these protrusions may also obstruct the coating of other areas of the workpiece. Therefore, achieving good coating uniformity is often difficult for workpieces with protrusions such as side edges or corners.
[0003] Therefore, in order to improve the uniformity of vacuum processing such as vacuum coating of workpieces with protrusions such as side edges or corners, it is necessary to provide a workpiece loading device and a vacuum processing chamber. Utility Model Content
[0004] To address the shortcomings of existing technologies, the purpose of this invention is to provide a workpiece loading device and a vacuum processing chamber. By setting the position of the mask component, this invention probabilistically blocks the protruding areas of the workpiece during vacuum processing, thereby correcting the uniformity of vacuum processing and improving the uniformity of vacuum processing.
[0005] To achieve the objective of this utility model, the following technical solution is adopted:
[0006] In a first aspect, this utility model provides a workpiece loading device, the workpiece loading device comprising:
[0007] The fastener is used to fix the workpiece;
[0008] A mask element connected to the fixing element, the workpiece having at least one protrusion, the mask element being spaced apart from the protrusion and extending in the same direction as the protrusion; the mask element is used to partially block particles emitted by a vacuum processing source.
[0009] Specifically, in a vacuum processing apparatus, the fixture can be a fixed shaft or a rotating shaft for mounting the workpiece, or other types of fixtures. When a fixed shaft or a rotating shaft is used as a fixture, the fixture also includes other components such as a jig disposed on the fixed shaft or rotating shaft for positioning the workpiece.
[0010] When multiple protrusions of multiple workpieces share a single mask, the fixing component also includes connectors that connect the multiple workpieces, as well as connectors that connect the workpieces and the mask. Any component that enables the protrusions of the workpieces and the mask to rotate synchronously is considered a fixing component in this invention.
[0011] Specifically, a protrusion can be understood as an area where, during vacuum processing, the distance between the vacuum processing source and the workpiece decreases due to relative rotation between them. It can also be understood as an area that affects the processing effect on other areas of the workpiece. Furthermore, the protrusion is located between two adjacent surfaces to be processed.
[0012] The workpiece loading device provided by this utility model, by setting the position of the mask, probabilistically blocks the protruding area of the workpiece during vacuum processing, thereby correcting the uniformity of vacuum processing and improving the uniformity of vacuum processing.
[0013] Preferably, the fixing member is capable of rotation, and the mask is fixedly connected to the fixing member. When the fixing member rotates, the workpiece and the mask rotate synchronously around the rotation axis of the fixing member.
[0014] Preferably, the workpiece is in the shape of a polyhedron;
[0015] The polyhedron includes at least one bottom face and at least three side faces.
[0016] Preferably, the protrusion is a side edge of the polyhedron, and the extending direction of the protrusion is the extending direction of the side edge;
[0017] The mask is rod-shaped.
[0018] Preferably, the workpiece is in the shape of a cuboid;
[0019] In a plane perpendicular to the extending direction of the mask, the center of the mask is located on the extension line of the workpiece center and the side edge;
[0020] In the extending direction of the side edge, the central axis of the mask is parallel to the side edge.
[0021] Preferably, the polyhedron is a prism or a pyramid;
[0022] When the polyhedron is a prism, the mask is cylindrical in shape;
[0023] When the polyhedron is a pyramid, the mask is shaped like a frustum.
[0024] Secondly, this utility model provides a vacuum processing chamber, in which a revolution support is provided;
[0025] The workpiece loading device as described in the first aspect is disposed on the orbital support;
[0026] The vacuum processing sources are spaced apart around the circumference of the orbital support. When the distance between the fixing member and the vacuum processing source is closest, the mask member is located between the fixing member and the vacuum processing source.
[0027] Preferably, the fixing member is disposed on the periphery of the revolution bracket and is rotatably disposed on the revolution bracket.
[0028] Preferably, the vacuum processing source is a sputtering coating source.
[0029] Preferably, if the closest distance between the central axis of the mask and the sputtering point of the sputtering source is a, the distance between the central axis of the workpiece and the protrusion is b, the distance between the central axis of the mask and the corresponding protrusion is c, and the lateral dimension of the mask is x, then x satisfies: x=k×(LAB / N)×[a / (a+c)], where k is 0.1 to 0.3, LAB is the distance between two adjacent protrusions, and N is the number of sides of the workpiece.
[0030] More preferably, if the closest distance between the central axis of the mask and the sputtering point of the sputtering source is a, the distance between the central axis of the workpiece and the side edge is b, the distance between the central axis of the mask and its corresponding side edge is c, and the lateral dimension of the mask is x, then x satisfies: x=k×(LAB / N)×[a / (a+c)], where k is 0.1 to 0.3, LAB is the distance between two adjacent side edges, and N is the number of sides of the polyhedron.
[0031] The lateral dimension of the mask refers to the width of the mask perpendicular to the direction of the central axis and the extension line of the side edge of the polyhedron; the direction from the top surface to the bottom surface of the polyhedron is the thickness direction, and the lateral dimension of the mask in the thickness direction is constant, or varies with the changes of b and c in the thickness direction of the polyhedron.
[0032] During coating, the workpiece rotates and revolves. Since the distances from the sputtering source to the side surface and side edges are not equal at any given time (generally, the side edges are closer to the sputtering source), the coating thickness near the side edges is relatively thicker than in other areas. This invention achieves probability-based masking of the workpiece's side surface and side edges by setting the position and distance of the mask, with a relatively higher probability of masking the side edges. Therefore, it appropriately reduces the coating thickness near the side edges, while having little impact on the coating thickness at the center of the side surface, thereby improving the uniformity of the side surface coating.
[0033] Preferably, a > 80 mm.
[0034] Preferably, the number of vacuum processing sources is at least one.
[0035] Preferably, when the number of vacuum processing sources is at least two, the at least two vacuum processing sources are evenly arranged on one side of the orbital support.
[0036] Preferably, when the vacuum processing source is a sputtering coating source, the point on the target surface of the sputtering coating source with the highest sputtering rate is defined as the sputtering point.
[0037] Specifically, for magnetron sputtering coating sources, the sputtering point corresponds to the center of the region on the target surface where the magnetic field direction of the magnet is perpendicular to the electric field direction of the target.
[0038] Optionally, when the sputtering source is a cylindrical target, each cylindrical target has 2 sputtering points.
[0039] Preferably, when the number of sputtering points s is 1, a / c > 1 / 5, and more preferably a / c > 1 / 3.
[0040] Preferably, when the number of sputtering points s is 2, a / c > 1 / 10, and more preferably a / c > 1 / 7.
[0041] Preferably, when the number of sputtering points s is 3, a / c > 1 / 15, and more preferably a / c > 1 / 10.
[0042] Preferably, when the number of sputtering points s is 4, a / c > 1 / 20, and more preferably a / c > 1 / 15.
[0043] Preferably, the distance b between the central axis of the workpiece and the side edge, the distance c between the central axis of the mask and its corresponding side edge, and the number s of the sputtering points satisfy the condition that c > b / 2s.
[0044] The numerical range described in this utility model includes not only the point values listed above, but also any point values within the numerical range not listed above. Due to space limitations and for the sake of brevity, this utility model will not exhaustively list the specific point values included in the range.
[0045] Compared with the prior art, the present invention has the following beneficial effects:
[0046] (1) The workpiece loading device provided by this utility model, by setting the position of the mask, performs probability shielding of the protruding area of the workpiece during the vacuum treatment process, thereby correcting the uniformity of the vacuum treatment of the workpiece and improving the uniformity of the vacuum treatment.
[0047] (2) During the coating process, the workpiece rotates and revolves. Since the distances from the side surface and the side edge to the coating source are not equal at the same time (generally, the side edge is closer to the sputtering coating source), the coating thickness near the side edge is relatively thicker than other areas. This invention achieves probability-based masking of the workpiece's side surface and side edge by setting the position and distance of the mask, with a relatively higher probability of masking the side edge. Therefore, the coating thickness near the side edge is appropriately reduced, while the coating thickness at the center of the side surface is not significantly affected, thereby improving the uniformity of the side surface coating. Attached Figure Description
[0048] Figure 1 , Figure 2 This is a schematic diagram of the device structure for improving the uniformity of lateral coating in Example 1.
[0049] Wherein: 1, polyhedron; 11, side surface; 12, side edge; 2, mask; 3, sputtering point; 4, orbital support; 5, fixing component. Detailed Implementation
[0050] The technical solution of this utility model will be further described below through specific embodiments. Those skilled in the art should understand that the embodiments described are merely illustrative of this utility model and should not be considered as specific limitations thereof.
[0051] One embodiment of this utility model provides a workpiece loading device, the workpiece loading device comprising:
[0052] The fastener is used to fix the workpiece;
[0053] A mask element connected to the fixing element, the workpiece having at least one protrusion, the mask element being spaced apart from the protrusion and extending in the same direction as the protrusion; the mask element is used to partially block particles emitted by a vacuum processing source.
[0054] The workpiece loading device provided by this utility model, by setting the position of the mask, probabilistically blocks the protruding area of the workpiece during vacuum processing, thereby correcting the uniformity of vacuum processing and improving the uniformity of vacuum processing.
[0055] For example, in a vacuum processing apparatus, the fixture may be a fixed shaft or a rotating shaft for mounting the workpiece, or it may be other forms of fixture. When the fixed shaft or rotating shaft is used as the fixture, the fixture may also include other components such as a jig disposed on the fixed shaft or rotating shaft for positioning the workpiece.
[0056] When multiple protrusions of multiple workpieces share a single mask, the fixing component also includes connectors that connect the multiple workpieces, as well as connectors that connect the workpieces and the mask. Any component that enables the protrusions of the workpieces and the mask to rotate synchronously is considered a fixing component in this invention.
[0057] The protrusion in this utility model can be understood as a region where, during vacuum processing such as vacuum coating, the distance between the vacuum processing source and the workpiece decreases due to relative rotation. It can also be understood as a region that affects the processing effect on other areas to be processed on the workpiece. Furthermore, the protrusion is located between two adjacent surfaces to be coated.
[0058] In some embodiments, the workpiece is clamped and fixed by two upper and lower fixing rods through two upper and lower cover plates, and the mask is fixed to the cover plate (preferably the upper cover plate). When the workpiece is closest to the sputtering coating source, the mask is spaced between the edge between two adjacent surfaces to be coated and the sputtering coating source.
[0059] In some embodiments, multiple workpieces can also be fixed along a straight line or vertical direction by a fastener. In this case, the protrusions of multiple workpieces that are approximately on the same straight line can share a linear mask.
[0060] In some embodiments, the fixing member is capable of rotation, and the mask member is fixedly connected to the fixing member. When the fixing member rotates, the workpiece and the mask member rotate synchronously around the rotation axis of the fixing member.
[0061] In some embodiments, the workpiece is in the shape of a polyhedron;
[0062] The polyhedron includes at least one bottom surface and at least three side surfaces;
[0063] The protrusion is a side edge of the polyhedron, and the extension direction of the protrusion is the extension direction of the side edge;
[0064] The mask is rod-shaped.
[0065] The mask is configured to correspond with the side edge; or, when multiple protrusions of multiple workpieces share a mask, one mask can correspond to multiple protrusions.
[0066] In some embodiments, the workpiece is rectangular in shape;
[0067] In a plane perpendicular to the extending direction of the mask, the center of the mask is located on the extension line of the workpiece center and the side edge;
[0068] In the extending direction of the side edge, the central axis of the mask is parallel to the side edge.
[0069] In some embodiments, the polyhedron is a prism or a pyramid;
[0070] When the polyhedron is a prism, the mask is cylindrical in shape;
[0071] When the polyhedron is a pyramid, the mask is shaped like a frustum.
[0072] When the polyhedron is prism-shaped, its top and bottom faces have the same shape and size; along the thickness direction from its top to its bottom face, the distance from the central axis of the polyhedron to the side edges is equal, and the value of LAB (the distance between two adjacent side edges) remains unchanged. In this case, the shape of the mask makes the lateral dimensions equal at all points along the thickness direction of the polyhedron.
[0073] The mask can be rectangular or cylindrical. Considering the revolution and rotation of the polyhedron during the coating process, and to avoid changes in the masking area during the coating process, the shape of the mask is preferably cylindrical.
[0074] Therefore, in some embodiments, when the polyhedron is prism-shaped, the mask is cylindrical.
[0075] When the polyhedron is pyramidal in shape, its top and bottom faces have the same shape but different sizes. Along the thickness direction from the top to the bottom face, the distance from the central axis of the polyhedron to its side edges changes in a certain trend. For example, if the area of the top face is larger than the area of the bottom face, then along the thickness direction from the top to the bottom face, the distance from the central axis of the polyhedron to its side edges gradually decreases, and the LAB value also gradually decreases accordingly. Therefore, the shape of the mask element causes its lateral dimensions along the thickness direction of the polyhedron to change as the LAB value gradually decreases.
[0076] The mask can be wedge-shaped or frustum-shaped. Considering the revolution and rotation of the polyhedron during the coating process, and to avoid changes in the masking area during the coating process, the preferred shape of the mask is frustum-shaped.
[0077] Therefore, in some embodiments, when the polyhedron is pyramidal in shape, the mask is frustum-shaped.
[0078] One embodiment of this utility model provides a vacuum processing chamber, in which a revolution support is provided;
[0079] The workpiece loading device as described in any embodiment is disposed on the orbital support;
[0080] The vacuum processing sources are spaced apart around the circumference of the orbital support. When the distance between the fixing member and the vacuum processing source is closest, the mask member is located between the fixing member and the vacuum processing source.
[0081] In some embodiments, the fixing member is disposed on the periphery of the orbital support and is rotatably disposed on the orbital support.
[0082] In some embodiments, the vacuum processing source is a sputtering coating source.
[0083] In some embodiments, if the closest distance between the central axis of the mask and the sputtering point of the sputtering source is a, the distance between the central axis of the workpiece and the protrusion is b, the distance between the central axis of the mask and the corresponding protrusion is c, and the lateral dimension of the mask is x, then x satisfies: x=k×(LAB / N)×[a / (a+c)], where k is 0.1 to 0.3, LAB is the distance between two adjacent protrusions, and N is the number of sides of the workpiece.
[0084] One embodiment of this utility model provides a vacuum processing method, which is performed in the vacuum processing chamber described in any embodiment, and includes:
[0085] The sides of the workpiece are treated using a vacuum processing source;
[0086] During the processing, the workpiece rotates on its own axis and revolves around the sun.
[0087] In some embodiments, the vacuum processing method is a vacuum coating method, and the vacuum processing source is a sputtering coating source;
[0088] Let a be the closest distance between the central axis of the mask and the sputtering point of the sputtering source, b be the distance between the central axis of the workpiece and the side edge, c be the distance between the central axis of the mask and its corresponding side edge, and x be the lateral dimension of the mask. Then x satisfies: x=k×(LAB / N)×[a / (a+c)], where k is 0.1 to 0.3, LAB is the distance between two adjacent side edges, and N is the number of sides of the workpiece.
[0089] The lateral dimension of the mask refers to the width of the mask perpendicular to the direction of the central axis and the extension line of the side edge of the polyhedron; the direction from the top surface to the bottom surface of the polyhedron is the thickness direction, and the lateral dimension of the mask in the thickness direction is constant, or varies with the changes of b and c in the thickness direction of the polyhedron.
[0090] During coating, the workpiece rotates and revolves. Since the distances from the coating source to the side surface and side edges are not equal at any given time (generally, the side edges are closer to the sputtering coating source), the coating thickness near the side edges is relatively thicker than in other areas. This invention achieves probability-based masking of the workpiece's side surface and side edges by setting the position and distance of the mask, with a relatively higher probability of masking the side edges. Therefore, it appropriately reduces the coating thickness near the side edges, while having little impact on the coating thickness at the center of the side surface, thereby improving the uniformity of the side coating.
[0091] If the mask is too close to the workpiece, the probability of the mask occluding different points on the workpiece will be biased towards an exponential distribution. In other words, the mask will severely obscure the side edges, even forming shadow boundaries, resulting in uneven coating thickness. Therefore, this invention has specifically set the value of x. Furthermore, the coating source can be a sputtering source. When sputtering, it is necessary to avoid the mask interfering with sputtering stability. Specifically, this interference can be the interference with sputtering stability caused when the mask is placed within the plasma cloud surrounding the target. Therefore, a > 75 mm, preferably a > 80 mm.
[0092] In some embodiments, the number of sputtering coating sources is at least one, for example, it can be one, two, three, four, five, six or eight, but is not limited to the listed values, and other unlisted values within the range are also applicable.
[0093] When there is one sputtering source, when the mask moves to the closest distance to the sputtering source, the center of the mask is located on the line connecting the sputtering source and the central axis of the polyhedron; when there are at least two sputtering sources, when the mask moves to the closest distance to the sputtering source, the center of the mask is located on the line connecting the central axis of the polyhedron and the center points of the multiple sputtering sources.
[0094] In some embodiments, the revolution support is disposed on one side of the sputtering coating source, driving the workpiece to revolve and rotate.
[0095] This invention does not further limit the specific structure of the revolution support, as long as it can realize the function of driving the mask to revolve and rotate. Based on this, as long as the value of x is controlled to meet the requirements, the purpose of improving the uniformity of transverse coating can be achieved.
[0096] In some embodiments, when the number of sputtering coating sources is at least two, the at least two sputtering coating sources are evenly arranged on one side of the orbital support. This ensures that when the mask moves to its closest distance to the coating sources, the center of the mask is located on the line connecting the central axis of the polyhedron and the center points of the multiple sputtering coating sources.
[0097] In some embodiments, when the vacuum processing source is a sputtering coating source, the point on the target surface of the sputtering coating source with the highest sputtering rate is defined as the sputtering point.
[0098] Specifically, for magnetron sputtering coating sources, the sputtering point corresponds to the center of the region on the target surface where the magnetic field direction of the magnet is perpendicular to the electric field direction of the target.
[0099] Optionally, when the sputtering source is a cylindrical target, each cylindrical target has 2 sputtering points. Taking a twin sputtering target as an example, it is considered to have 4 sputtering points.
[0100] In some embodiments, when the number of sputtering points s is 1, a / c > 1 / 5, for example, it can be 1 / 5, 1 / 4, 1 / 3, 1 / 2 or 1 / 1, but is not limited to the listed values. Other unlisted values within the range are also applicable, and it is preferred that a / c > 1 / 3.
[0101] In some embodiments, when the number of sputtering points s is 2, a / c > 1 / 10, for example, it can be 1 / 10, 1 / 9, 1 / 8, 1 / 7, 1 / 6 or 1 / 5, but is not limited to the listed values. Other unlisted values within the range are also applicable, and preferably a / c > 1 / 7.
[0102] In some embodiments, when the number of sputtering points s is 3, a / c > 1 / 15, for example, it can be 1 / 15, 1 / 14, 1 / 13, 1 / 12, 1 / 11 or 1 / 10, but is not limited to the listed values. Other unlisted values within the range are also applicable, and it is preferred that a / c > 1 / 10.
[0103] In some embodiments, when the number of sputtering points s is 4, a / c > 1 / 20, for example, it can be 1 / 20, 1 / 19, 1 / 18, 1 / 17, 1 / 16 or 1 / 15, but is not limited to the listed values. Other unlisted values within the range are also applicable, and it is preferred that a / c > 1 / 15.
[0104] In some embodiments, the distance b between the workpiece's central axis and the side edge, the distance c between the mask's central axis and its corresponding side edge, and the number s of sputtering points satisfy the condition that c > b / 2s.
[0105] The closest distance between the central axis of the mask and the sputtering coating source refers to the closest distance between the mask and the sputtering coating source during the entire coating process, when the workpiece is rotating and revolving around the sun.
[0106] In the vacuum coating method provided by this utility model, the central axis of the mask is parallel to the rotation axis of the workpiece, and the lateral dimension x of the mask in the thickness direction corresponds to the LAB value in the thickness direction of the corresponding workpiece.
[0107] The testing and characterization methods in the following specific embodiments include: using the apparatus provided in the following embodiments and comparative examples to perform magnetron sputtering coating; after coating, performing reflectivity testing on a single side of both sides of the polyhedral mask: marking 8 points uniformly on a single side, measuring the reflectivity curve of these 8 points using a spectrophotometer, collecting the wavelength of the characteristic points of the curve (characterizing the film thickness), and comparing the characteristic point wavelengths of these 8 points to obtain the surface uniformity.
[0108] Example 1
[0109] This embodiment provides a vacuum processing method, which is used for coating processes such as... Figure 1 , Figure 2 The vacuum processing is carried out in the vacuum processing chamber shown. The vacuum processing method includes coating the side surface 11 of the polyhedron 1 with a twin sputtering target coating source, and the polyhedron 1 rotates and revolves during the coating process. Specifically, the twin sputtering target coating source includes four sputtering points 3, and the polyhedron 1 is a cube.
[0110] The vacuum processing chamber includes a twin sputtering target, a revolution support 4, and a workpiece loading device. The workpiece loading device includes a fixing member 5 for fixing the polyhedron 1 and a mask member 2. The workpiece loading device is disposed on the revolution support 4. The twin sputtering target is disposed circumferentially on the revolution support 4. When the fixing member 5 is closest to the twin sputtering target, the mask member 2 is located between the fixing member 5 and the twin sputtering target.
[0111] The polyhedron 1 is a hexahedral aluminum alloy prism with a length, width and height of 42mm×42mm×36mm. The revolution bracket 4 is set on one side of the coating source, driving the hexahedral aluminum alloy prism to revolve and rotate. The hexahedral aluminum alloy prism includes a top surface, a bottom surface and four side surfaces 11 to be coated, and has four side edges 12.
[0112] The mask 2 consists of four cylindrical mask 2, with one mask 2 corresponding to each side edge 12; the mask 2 is connected to the fixing member 5, and the mask 2 is spaced apart from the side edge 12 of the hexahedral aluminum alloy prism, and the extension direction of the mask 2 is consistent with that of the side edge 12.
[0113] Let a be the closest distance a from the central axis of the mask 2 to the sputtering point 3 of the sputtering source, b be the distance b from the central axis of the polyhedron 1 to the side edge 12, c be the distance c from the central axis of the mask 2 to its corresponding side edge 12, and x be the lateral dimension of the mask 2. All of a, b, c, and x are in mm. Therefore, x = 1.92, a = 150, c = 14, k = 0.2; and LAB = 42 mm, N = 4.
[0114] When using the vacuum processing method provided in this embodiment for coating, the coating uniformity is -9nm.
[0115] Comparative Example 1
[0116] This comparative example provides a vacuum processing method that is identical to Example 1 except that no mask is used.
[0117] When the vacuum processing method provided in this comparative example is used for coating, the coating uniformity is 53 nm.
[0118] In summary, the workpiece loading device provided by this invention, through the setting of the mask position, performs probabilistic masking of the protrusions and surrounding areas of the workpiece surface to be treated during vacuum processing, thereby correcting the uniformity of vacuum processing and improving the uniformity of vacuum processing. In the aforementioned specific embodiment of vacuum coating, the workpiece to be coated undergoes a combined revolution and rotation motion during coating. Since the distances of the side surface and the side edge from the coating source are not equal at the same time (generally, the side edge is closer to the sputtering coating source), the coating thickness near the side edge is relatively thicker than other areas. This invention, through the setting of the mask position and geometry, achieves probabilistic masking of the workpiece side surface and side edge, with a relatively higher masking probability for the side edge. Therefore, it appropriately reduces the coating rate and coating thickness near the side edge, while having little impact on the coating thickness at the center of the side surface, thereby improving the uniformity of the side surface coating.
[0119] The applicant declares that the above description is only a specific embodiment of the present utility model, but the protection scope of the present utility model is not limited thereto. Those skilled in the art should understand that any changes or substitutions that can be easily conceived by those skilled in the art within the technical scope disclosed in the present utility model fall within the protection and disclosure scope of the present utility model.
Claims
1. A workpiece loading device, characterized by, The workpiece loading device comprises: a fixing member for fixing a workpiece; a mask member connected to the fixing member, the workpiece having at least one protrusion, the mask member being spaced apart from the protrusion and extending in the same direction as the protrusion, the mask member being used for partially shielding particles emitted by a vacuum processing source.
2. The workpiece loading device of claim 1, wherein, The fixing member is capable of self-rotation, and the mask member is fixedly connected to the fixing member, so that the workpiece and the mask member rotate synchronously around the rotation axis of the fixing member when the fixing member rotates.
3. The workpiece loading device of claim 1 or 2, wherein, The workpiece has a polyhedral shape. The polyhedral shape comprises at least one bottom surface and at least three side surfaces.
4. The workpiece loading device of claim 3, wherein, The protrusion is a side edge of the polyhedral shape, and the protrusion extends in the same direction as the side edge. The mask member has a rod shape.
5. The workpiece loading device of claim 4, wherein, The workpiece has a cuboid shape. In a plane perpendicular to the extension direction of the mask member, the center of the mask member is located on the extension line of the line connecting the center of the workpiece and the side edge. In the extension direction of the side edge, the central axis of the mask member is parallel to the side edge.
6. The workpiece loading device of claim 4, wherein, The polyhedral shape is a prism or a pyramid. When the polyhedral shape is a prism, the mask member has a cylindrical shape. When the polyhedral shape is a pyramid, the mask member has a circular truncated cone shape.
7. A vacuum processing chamber, characterized in that, The vacuum processing chamber is provided with a revolving support. The workpiece loading device according to any one of claims 1-6 is arranged on the revolving support. The vacuum processing source is spaced apart from the revolving support in the circumferential direction, and the mask member is located between the fixing member and the vacuum processing source when the fixing member is closest to the vacuum processing source.
8. The vacuum processing chamber of claim 7, wherein, The fixing member is arranged on the circumferential side of the revolving support and is rotatably arranged on the revolving support.
9. The vacuum processing chamber of claim 7, wherein, The vacuum processing source is a sputtering source.
10. The vacuum processing chamber according to claim 9, wherein The closest distance between the central axis of the mask member and the sputtering point of the sputtering source is a, the distance between the central axis of the workpiece and the protrusion is b, the distance between the central axis of the mask member and the corresponding protrusion is c, and the transverse dimension of the mask member is x, and x satisfies x=k×(LAB / N)×[a / (a+c)], wherein k is 0.1-0.3, LAB is the distance between two adjacent protrusions, and N is the number of side surfaces of the workpiece.