Interlocking device for associating light source illumination intensity with exposure operation
By introducing an interlocking device that links the light intensity of the light source with the exposure operation in the lithography machine, using a dielectric film reflector and a G2 reflector to separate the light source, and controlling the exposure action through a light intensity detection sensor and a signal converter, the problem of no exposure caused by abnormal light source in the lithography machine is solved, and timely linkage control between light intensity and exposure action is achieved.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-03-07
- Publication Date
- 2026-03-10
AI Technical Summary
The lack of light intensity monitoring in lithography machines leads to unexposed products in cases of machine malfunction, which cannot be detected and addressed in a timely manner.
Design an interlocking device that links the light intensity of the light source with the exposure operation. Utilize a dielectric film reflector and a G2 reflector to separate the long and short wavelength light sources, and convert the light intensity signal into an exposure control signal through a light intensity detection sensor and a signal converter. Equipped with an audible and visual alarm, it promptly alerts the operators.
It achieves the correlation control between light intensity and exposure action, ensuring that the lithography machine stops exposure in time when the light source is abnormal, avoiding product abnormalities, and is simple and convenient to operate.
Smart Images
Figure CN223986278U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to an interlocking device that links the light intensity of a light source with the exposure operation, belonging to the field of chip manufacturing technology such as integrated circuits or discrete devices. Background Technology
[0002] Photolithography machines are the main production equipment in semiconductor manufacturing. They work by using an ultraviolet light source and an optical system to transfer a pattern from a photomask onto a silicon wafer. Photolithography machines typically use a mercury lamp to emit ultraviolet light for pattern exposure. The intensity of the ultraviolet light directly affects the quality of the lithographic pattern.
[0003] Currently, lithography machines lack monitoring capabilities for ultraviolet light intensity. During production, if the mercury lamp in the lithography machine malfunctions by going out or weakening due to aging, the lack of a light detection device means operators cannot detect the abnormal light source in time, leading to unexposed products. Summary of the Invention
[0004] The technical problem to be solved by this utility model is to provide an interlocking device that links the light intensity of a light source with the exposure operation, which can detect the light intensity of the light source and convert the light intensity signal into an on / off signal for the exposure operation, so that the light intensity is linked with the exposure operation.
[0005] The technical solution adopted by this utility model to solve the above problems is as follows: an interlocking device that links the light intensity of a light source with the exposure operation, including a dielectric film reflector, which is obliquely disposed below a mercury lamp, and a G2 reflector disposed on the outer side of the dielectric film reflector; a light intensity detection sensor is disposed below the dielectric film reflector, and the light intensity detection sensor is connected to the exposure controller via a signal converter; the light source emitted by the mercury lamp includes a long-wavelength light source and a short-wavelength light source, the long-wavelength light source is reflected by the dielectric film reflector to the G2 reflector, and then collected by a barrel lens to form a uniform beam, the uniform beam passes through a mask, and transmits the pattern on the mask onto the wafer; the short-wavelength light source is transmitted through the dielectric film reflector to the light intensity detection sensor, the light intensity detection sensor detects the light intensity of the transmitted light, and the detection data is converted into an on / off signal for the exposure controller via a signal converter, thereby controlling the exposure operation of the lithography machine.
[0006] It is also equipped with an audible and visual alarm, which is connected to the light intensity detection sensor.
[0007] The dielectric film reflector includes a first lens, on which a dielectric film layer is provided.
[0008] The G2 reflector includes a second lens, on which a total reflection coating is provided.
[0009] Compared with the prior art, the advantages of this utility model are as follows: a simple structure and convenient operation of an interlocking device that links the light intensity of a light source with the exposure operation. The long-wavelength light source is reflected by a dielectric film reflector onto a G2 reflector for exposure, and the short-wavelength light source is transmitted through the dielectric film reflector, so that the light intensity detection sensor detects the light intensity of the transmitted light and converts the light intensity value into an on / off signal for the exposure operation, thus linking the light intensity with the exposure operation; the sound and light alarm works, and the operator can promptly detect abnormalities and report and handle them. Attached Figure Description
[0010] Figure 1 This is a schematic diagram of an interlocking device that links the light intensity of a light source with the exposure operation, according to an embodiment of the present invention.
[0011] Figure 2 A flowchart illustrating an interlocking device that links light intensity to exposure operation according to an embodiment of this utility model;
[0012] The diagram shows: 1. Mercury lamp, 2. Dielectric film reflector, 3. Light intensity sensor, 4. G2 reflector, 5. Barrel lens, 6. Signal converter, 7. Exposure controller, and 8. Audible and visual alarm. Detailed Implementation
[0013] The present invention will be further described in detail below with reference to the accompanying drawings and embodiments.
[0014] like Figure 1 , 2 As shown, this embodiment includes an interlocking device that links the light intensity of a light source with the exposure operation. The device includes a dielectric film reflector 2, which is tilted below a mercury lamp 1. A G2 reflector 4 is located outside the dielectric film reflector 2. The light source emitted by the mercury lamp 1 includes both long-wavelength and short-wavelength light sources. The long-wavelength light source is reflected by the dielectric film reflector 2 to the G2 reflector 4 and then collected by a barrel lens 5 to form a uniform beam. The beam passes through a photomask, projecting the pattern on the photomask onto the wafer. A light intensity detection sensor 3 is located below the dielectric film reflector 2. The light intensity detection sensor 3 is connected to the exposure controller 7 via a signal converter 6. The short-wavelength light source is transmitted through the dielectric film reflector 2 to the light intensity detection sensor 3. The light intensity detection sensor 3 detects the light intensity of the transmitted light, and the detection data is converted into an on / off signal for the exposure controller 7 via the signal converter 6. When the light intensity detection sensor 3 detects that the light intensity of the transmitted light is lower than the set requirement, the exposure controller 7 controls the lithography machine to stop the exposure operation.
[0015] It is also equipped with an audible and visual alarm 8, which is connected to the light intensity detection sensor 3. When the light intensity detection sensor 3 detects that the intensity of the transmitted light is lower than the set requirement, the audible and visual alarm 8 sounds an alarm, thereby reminding the operator to promptly detect the abnormality and report it for handling.
[0016] The aforementioned dielectric film reflector includes a first lens, on which a dielectric film layer is disposed. The dielectric film layer is required to have a reflectivity of ≥99% for light with a wavelength of ≥340nm and a transmittance of ≥99% for light with a wavelength of <340nm.
[0017] The aforementioned G2 reflector includes a second lens, which is coated with a total reflection film.
[0018] The above-mentioned light intensity detection sensor is a stainless steel illuminance sensor with an operating temperature of 20-150℃, a detection wavelength range of 80-730nm, a power supply of DC 5-24V, an output terminal of switch output or 0-5V output, and an illuminance detection range of 0-60000LUX.
[0019] When the mercury lamp illuminance meets the requirements, the lithography machine operates normally; when the mercury lamp illuminance is weak or the lamp is turned off, the light intensity detection sensor detects that the intensity of the transmitted light is lower than the set requirement, the exposure controller controls the lithography machine to stop the exposure operation, and the audible and visual alarm is activated, so that the operator can promptly detect the abnormality and report it for handling.
[0020] This application features a simple structure and convenient operation. A long-wavelength light source is reflected by a dielectric film mirror onto a G2 mirror for exposure. A short-wavelength light source is transmitted through the dielectric film mirror, allowing a photoelectric sensor to detect the intensity of the transmitted light. This intensity signal is then converted into an on / off signal for the exposure action, thus linking the light intensity to the exposure process. An audible and visual alarm activates, enabling operators to promptly detect and address any anomalies.
[0021] In addition to the above embodiments, this utility model also includes other implementation methods. All technical solutions formed by equivalent transformation or equivalent substitution should fall within the protection scope of the claims of this utility model.
Claims
1. A light source light intensity and exposure run associated interlocking device, characterized in that: The application relates to a mercury lamp with a dielectric film mirror, a G2 mirror and a light intensity detection sensor.
2. A light source light intensity and exposure run related interlock device according to claim 1, characterized in that: The light source emitted by the mercury lamp comprises a long-wave band light source and a short-wave band light source, the long-wave band light source is reflected by the dielectric film mirror to the G2 mirror, and then is collected by a barrel lens to form a uniform light beam, the uniform light beam penetrates the mask, and the pattern on the mask is transmitted to the wafer; the short-wave band light source is transmitted to the light intensity detection sensor through the dielectric film mirror, the light intensity detection sensor detects the light intensity of the transmitted light, and the detection data is converted into an on-off signal of the exposure controller through a signal converter, thereby controlling the exposure action of the photoetch machine.
3. A light source light intensity and exposure run related interlock device according to claim 1, characterized in that: An audible and visual alarm is further arranged and is connected with the light intensity detection sensor.
4. A light source light intensity and exposure run related interlock according to claim 1, wherein: the light source light intensity is a function of the light source light intensity and exposure run related interlock. The dielectric film mirror comprises a first lens, and a dielectric film layer is arranged on the first lens. The G2 mirror comprises a second lens, and a total reflection film layer is arranged on the second lens.