Photovoltaic silicon wafer cleaning equipment

Abstract

The utility model provides photovoltaic silicon wafer cleaning equipment, which relates to the technical field of photovoltaic silicon wafer production and comprises a cleaning box, a base is arranged in the cleaning box, cleaning assemblies are arranged on two sides of the inner wall of the cleaning box and used for cleaning photovoltaic silicon wafers, each cleaning assembly comprises a fixing pipe, a spray head, a vertical plate and a cleaning block, and an adjusting assembly is arranged in the cleaning box. The adjusting assembly is used for adjusting the position of the base and comprises a servo motor, a lead screw, an adjusting block and a lead screw hole. According to the photovoltaic silicon wafer cleaning equipment, long photovoltaic silicon wafers can be conveniently cleaned through the cleaning assembly, so that the actual using effect of the device is enhanced, the cleaned photovoltaic silicon wafers can be moved to the positions between the multiple draught fans and the electric heating wires through the adjusting assembly, water stains on the photovoltaic silicon wafers are dried through the draught fans and the electric heating wires, and the cleaning efficiency of the photovoltaic silicon wafers is improved. Therefore, residual water spots on the outer side of the photovoltaic silicon wafer are prevented from dropping on the ground when the photovoltaic silicon wafer is detached.

Description

Technical Field

[0001] This utility model relates to the field of photovoltaic silicon wafer production technology, specifically a photovoltaic silicon wafer cleaning device. Background Technology

[0002] With the increasing global demand for clean energy, photovoltaic technology has developed rapidly. In recent years, significant technological advancements in photovoltaic silicon wafers, such as improved efficiency and reduced costs, have made solar energy a more economical choice. Photovoltaic silicon wafers are an indispensable part of solar photovoltaic technology. Existing photovoltaic silicon wafers have surface contaminants and impurities during the production process, so they need to be cleaned. However, existing cleaning equipment uses a fixed distance between the two cleaning rollers, which cannot be adjusted according to the actual thickness of the photovoltaic silicon wafer, thus affecting the cleaning efficiency.

[0003] To address the aforementioned issues, CN202322680788.2 discloses a "cleaning device for photovoltaic silicon wafers." This device uses a rotating lead screw, with the threaded engagement between the lead screw and a fixed block, to move a second cleaning roller within a groove, enabling the cleaning of photovoltaic silicon wafers of varying thicknesses. However, this device still has certain drawbacks in practical use. For example, when cleaning longer photovoltaic silicon wafers, the limited depth of the cleaning tank means only the lower half of the wafer can be cleaned. The wafer needs to be flipped over for complete cleaning, which affects the cleaning efficiency. Furthermore, the device requires cleaning multiple wafers sequentially. To ensure cleaning efficiency, the wafers are removed after cleaning, leaving water stains on their outer surface. This water drips onto the ground, making the surface slippery. Utility Model Content

[0004] The technical problem to be solved by this utility model is to provide a photovoltaic silicon wafer cleaning device, which facilitates the cleaning of long photovoltaic silicon wafers through the cleaning components and can dry water stains on the silicon wafers through the adjustment components, a fan and an electric heating wire.

[0005] The technical problem to be solved by this utility model is achieved by the following technical solution:

[0006] A photovoltaic silicon wafer cleaning device includes: a cleaning tank, a base disposed inside the cleaning tank, and cleaning components disposed on both sides of the inner wall of the cleaning tank for cleaning photovoltaic silicon wafers. The cleaning components include: a fixing tube, a nozzle, a vertical plate, and a cleaning block. An adjustment component is disposed inside the cleaning tank for adjusting the position of the base. The adjustment component includes: a servo motor, a lead screw, an adjustment block, and a lead screw hole.

[0007] Optionally, three fixed pipes are installed on both sides of the inner wall of the cleaning tank, and multiple nozzles are installed on one side of the outer end of the fixed pipes. Two vertical plates are set inside the cleaning tank, and cleaning blocks are installed on the inner side of both vertical plates. Two electric telescopic rods are installed on both sides of the inner wall of the cleaning tank, and one end of the electric telescopic rod is connected to the vertical plate. Diversion pipes are set on both sides of the outer end of the cleaning tank, and three connecting pipes are connected to the inner side of each of the two diversion pipes. One end of each of the six connecting pipes is connected to one of the six fixed pipes, and a water inlet pipe is connected to one side of the outer end of each of the two diversion pipes. The cleaning assembly consisting of the fixed pipes, nozzles, vertical plates, and cleaning blocks is used to clean photovoltaic silicon wafers.

[0008] Optionally, a servo motor is installed on one side of the outer end of the cleaning tank, and a lead screw is driven and connected to one side of the outer end of the servo motor. An adjusting block is provided on the outer side of the lead screw, and a lead screw hole is opened on one side of the outer end of the adjusting block to engage with the lead screw. Pulleys are installed on both sides of the bottom of the base, and vertical rods are connected to both sides of the top of the base. A top plate is installed on the top of the vertical rods, and the bottom of the adjusting block is connected to the top plate. Side plates are connected to both sides of the top of the base. A fitting block is installed on the inner side of one side plate, and two adjusting holes are opened on one side of the outer end of the other side plate. An adjusting rod is threadedly connected to the inside of the adjusting hole, and a movable block is connected to one end of the adjusting rod. The adjusting assembly composed of the servo motor, lead screw, adjusting block, and lead screw hole is used to adjust the position of the base.

[0009] Optionally, air inlet frames are installed on both sides of the inner wall of the cleaning box, heating wires are installed inside the air inlet frames, multiple fans are installed on one side of the outer end of the air inlet frames, and air inlets are opened on both sides of the outer end of the cleaning box. The fans and heating wires are used to dry the water stains on the outside of the photovoltaic silicon wafer.

[0010] The beneficial effects of this utility model are:

[0011] The advantage of this invention is that the cleaning component facilitates the cleaning of long photovoltaic silicon wafers, thereby enhancing the actual performance of the device.

[0012] Secondly, by adjusting the components, the cleaned photovoltaic silicon wafers can be moved between multiple fans and heating wires, and the fans and heating wires can dry the water stains on the silicon wafers, thereby preventing the water stains remaining on the outside of the photovoltaic silicon wafers from dripping onto the ground when they are disassembled. Attached Figure Description

[0013] Figure 1 This is a schematic diagram of the overall structure of this utility model.

[0014] Figure 2 This is a cross-sectional view of the overall structure of this utility model.

[0015] Figure 3This is a schematic diagram of the adjusting block structure of this utility model.

[0016] Figure 4 This is a schematic diagram of the base structure of this utility model.

[0017] Figure 5 This is a schematic diagram of the air inlet frame structure of this utility model.

[0018] Figure 6 This is a schematic diagram of the fixed tube structure of this utility model.

[0019] Figure 7 This is a side sectional view of the cleaning tank of this utility model.

[0020] Figure 8 For the present utility model Figure 2 Enlarged view of point A in the image.

[0021] Figures 1-8 In the middle: 1-Cleaning box; 101-Base; 2-Fixing pipe; 201-Nozzle; 202-Vertical plate; 203-Cleaning block; 3-Electric telescopic rod; 301-Diverter pipe; 302-Connecting pipe; 303-Water inlet pipe; 4-Servo motor; 401-Lead screw; 402-Adjusting block; 403-Lead screw hole; 5-Pulley; 501-Vertical rod; 502-Top plate; 6-Side plate; 601-Adhesive block; 602-Adjusting rod; 603-Moving block; 7-Air inlet frame; 701-Heating wire; 702-Fan; 703-Air inlet. Detailed Implementation

[0022] The technical solutions in the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. All other embodiments obtained by those skilled in the art based on the embodiments of this application without creative effort are within the scope of protection of this application.

[0023] The present application will now be described in detail with reference to the accompanying drawings and specific embodiments.

[0024] like Figures 1-8 As shown, a photovoltaic silicon wafer cleaning device includes: a cleaning tank 1, a base 101 inside the cleaning tank 1, and cleaning components on both sides of the inner wall of the cleaning tank 1 for cleaning photovoltaic silicon wafers. The cleaning components include: a fixed tube 2, a nozzle 201, a vertical plate 202, and a cleaning block 203. An adjustment component is provided inside the cleaning tank 1 for adjusting the position of the base 101. The adjustment component includes: a servo motor 4, a lead screw 401, an adjustment block 402, and a lead screw hole 403.

[0025] The cleaning tank 1 has three fixed pipes 2 installed on both sides of its inner wall. Multiple nozzles 201 are installed on one side of the outer end of the fixed pipes 2. The cleaning tank 1 has two vertical plates 202 inside. Cleaning blocks 203 are installed on the inner side of the two vertical plates 202. When cleaning the photovoltaic silicon wafer on the top of the base 101, water is sprayed to both sides of the photovoltaic silicon wafer through the nozzles 201. The photovoltaic silicon wafer is moved back and forth by moving the base 101, so that the cleaning blocks 203 rub back and forth on both sides of the photovoltaic silicon wafer, thereby cleaning both sides of the photovoltaic silicon wafer.

[0026] The cleaning tank 1 has two electric telescopic rods 3 installed on both sides of its inner wall. One end of each electric telescopic rod 3 is connected to a vertical plate 202. Two diversion pipes 301 are installed on both sides of the outer end of the cleaning tank 1. Three connecting pipes 302 are connected to the inner side of each of the two diversion pipes 301. One end of each of the six connecting pipes 302 is connected to one of the six fixed pipes 2. A water inlet pipe 303 is connected to one side of the outer end of each of the two diversion pipes 301. When the nozzle 201 is used, one end of the water inlet pipe 303 is connected to an external water source, and water is then transported to the inside of the diversion pipes 301 through the water inlet pipe 303. The water flow is then transported through the diversion pipe 301 to the connecting pipe 302, the fixed pipe 2, and the nozzle 201. Finally, the nozzle 201 sprays the water flow to both sides of the photovoltaic silicon wafer. The bottom of the cleaning box 1 is provided with multiple drain outlets, through which the water after cleaning the photovoltaic silicon wafer can be discharged from the inside of the cleaning box 1. A drain box can be placed at the bottom of the cleaning box 1 to guide the discharged water. The electric telescopic rod 3 is used to adjust the position of the vertical plate 202 and the cleaning block 203, so that the cleaning block 203 can clean photovoltaic silicon wafers of different thicknesses.

[0027] A servo motor 4 is installed on one side of the outer end of the cleaning tank 1. A lead screw 401 is driven and connected to one side of the outer end of the servo motor 4. An adjusting block 402 is provided on the outer side of the lead screw 401. A lead screw hole 403 is opened on one side of the outer end of the adjusting block 402, which is threadedly engaged with the lead screw 401. When the base 101 and the photovoltaic silicon wafer need to be moved, the lead screw 401 is driven to rotate by the servo motor 4. The adjusting block 402 moves laterally through the lead screw hole 403 as the lead screw 401 rotates. The top of the base 101 is connected to the adjusting block 402 through the vertical rod 501 and the top plate 502. Therefore, when the adjusting block 402 moves laterally, it can drive the base 101 and the photovoltaic silicon wafer to move synchronously.

[0028] The base 101 has pulleys 5 installed on both sides of its bottom, and vertical rods 501 connected to both sides of its top. A top plate 502 is installed on the top of the vertical rods 501. The bottom of the adjusting block 402 is connected to the top plate 502. Since the bottom of the pulleys 5 is in contact with one side of the inner wall of the cleaning tank 1, the base 101 can be moved inside the cleaning tank 1 by means of the pulleys 5.

[0029] The base 101 has side plates 6 connected to both sides of its top. One side plate 6 has a bonding block 601 installed on its inner side, and the other side plate 6 has two adjustment holes on its outer side. An adjustment rod 602 is threaded into the adjustment holes, and a movable block 603 is connected to one end of the adjustment rod 602. When using the device, the photovoltaic silicon wafer is placed on the top of the base 101, and one side of the photovoltaic silicon wafer is bonded to the bonding block 601. Then, the adjustment rod 602 is rotated in the adjustment hole, so that the adjustment rod 602 can drive the movable block 603 to move. A clamping block is installed on the inner side of the movable block 603 until one side of the clamping block is bonded to the outer frame of the photovoltaic silicon wafer, thereby vertically fixing the photovoltaic silicon wafer to the top of the base 101. Both the clamping block and the bonding block 601 are made of rubber material to prevent the outer frame of the photovoltaic silicon wafer from being damaged by clamping.

[0030] The cleaning chamber 1 has air inlet frames 7 installed on both sides of its inner wall. The air inlet frames 7 are equipped with heating wires 701. Multiple fans 702 are installed on one side of the outer end of the air inlet frames 7. Air inlets 703 are opened on both sides of the outer end of the cleaning chamber 1. After the photovoltaic silicon wafer is cleaned, the movable base 101 moves the photovoltaic silicon wafer to be adjusted between the two air inlet frames 7. Then, the fans 702 blow air onto the photovoltaic silicon wafer. When the fans 702 are in use, the air outside the cleaning chamber 1 will pass through the air inlets 703, the air inlet frames 7 and the heating wires 701. The air will be heated into hot air when it passes through the heating wires 701. The hot air will then be blown to the photovoltaic silicon wafer by the fans 702, thereby drying the water stains on both sides of the photovoltaic silicon wafer.

[0031] When using this device, the photovoltaic silicon wafer is placed on top of the base 101, and one side of the photovoltaic silicon wafer is attached to the bonding block 601. Then, the adjusting rod 602 is rotated through the threaded adjustment hole, so that the adjusting rod 602 can drive the movable block 603 to move. A clamping block is installed on the inner side of the movable block 603 until one side of the clamping block is attached to the outer frame of the photovoltaic silicon wafer, thereby vertically fixing the photovoltaic silicon wafer to the top of the base 101. Then, the servo motor 4 drives the lead screw 401 to rotate, and the adjusting block 402 moves laterally through the lead screw hole 403 as the lead screw 401 rotates. The top of the base 101 is connected to the adjusting block 402 through the vertical rod 501 and the top plate 502. Therefore, when the adjusting block 402 moves laterally, it can drive the base 101 and the photovoltaic silicon wafer to move synchronously until the photovoltaic silicon wafer is moved to the six fixed positions. Between pipes 2, water is sprayed onto both sides of the photovoltaic silicon wafer through nozzle 201. Then, the photovoltaic silicon wafer is moved back and forth by the movable base 101, so that the cleaning block 203 rubs back and forth on both sides of the photovoltaic silicon wafer to clean both sides of the photovoltaic silicon wafer. After the photovoltaic silicon wafer is cleaned, the movable base 101 moves the photovoltaic silicon wafer to be adjusted between the two air inlet frames 7. Then, the fan 702 blows air onto the photovoltaic silicon wafer. When the fan 702 is in use, the air outside the cleaning box 1 will pass through the air inlet 703, the air inlet frame 7 and the heating wire 701. When the air passes through the heating wire 701, it will be heated into hot air. The fan 702 blows the hot air to the photovoltaic silicon wafer to dry the water stains on both sides of the photovoltaic silicon wafer. Finally, the photovoltaic silicon wafer is moved to the far right and removed from the top of the base 101.

[0032] In the above embodiments, the descriptions of each embodiment have different focuses. For parts not described in detail in a certain embodiment, please refer to the relevant descriptions in other embodiments.

[0033] The photovoltaic silicon wafer cleaning equipment provided in the embodiments of this application has been described in detail above. Specific examples have been used to illustrate the principles and implementation methods of this application. The description of the above embodiments is only for the purpose of helping to understand the technical solutions and core ideas of this application. Those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some of the technical features. These modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of this application.

Claims

1. A photovoltaic silicon wafer cleaning apparatus, characterized by, include: Cleaning box (1); The cleaning tank (1) is equipped with a base (101). The cleaning box (1) has cleaning components on both sides of its inner wall for cleaning photovoltaic silicon wafers. The cleaning components include: a fixed tube (2), a nozzle (201), a vertical plate (202), and a cleaning block (203). The cleaning tank (1) is equipped with an adjustment component for adjusting the position of the base (101). The adjustment component includes a servo motor (4), a lead screw (401), an adjustment block (402), and a lead screw hole (403).

2. The photovoltaic silicon wafer cleaning apparatus of claim 1, wherein, Three fixed pipes (2) are installed on both sides of the inner wall of the cleaning tank (1). Multiple nozzles (201) are installed on one side of the outer end of the fixed pipes (2). Two vertical plates (202) are set inside the cleaning tank (1). Cleaning blocks (203) are installed on the inner side of the two vertical plates (202).

3. The photovoltaic silicon wafer cleaning apparatus of claim 2, wherein, Two electric telescopic rods (3) are installed on both sides of the inner wall of the cleaning tank (1). One end of the electric telescopic rod (3) is connected to the vertical plate (202). Two diversion pipes (301) are provided on both sides of the outer end of the cleaning tank (1). Three connecting pipes (302) are connected to the inner side of the two diversion pipes (301). One end of the six connecting pipes (302) is connected to the six fixed pipes (2) respectively. A water inlet pipe (303) is connected to one side of the outer end of the two diversion pipes (301).

4. The photovoltaic silicon wafer cleaning apparatus of claim 1, wherein, A servo motor (4) is installed on one side of the outer end of the cleaning tank (1). A lead screw (401) is driven and connected to one side of the outer end of the servo motor (4). An adjustment block (402) is provided on the outer side of the lead screw (401). A lead screw hole (403) is opened on one side of the outer end of the adjustment block (402) and is threadedly engaged with the lead screw (401).

5. The photovoltaic silicon wafer cleaning apparatus of claim 4, wherein, The base (101) is equipped with pulleys (5) on both sides of the bottom, and vertical rods (501) are connected to both sides of the top of the base (101). A top plate (502) is installed on the top of the vertical rods (501), and the bottom of the adjusting block (402) is connected to the top plate (502).

6. The photovoltaic silicon wafer cleaning apparatus of claim 1, wherein, The base (101) has side plates (6) connected to both sides of the top. One of the side plates (6) has a fitting block (601) installed on the inner side. The other side plate (6) has two adjustment holes on one side of the outer end. An adjustment rod (602) is threaded inside the adjustment hole. One end of the adjustment rod (602) is connected to a movable block (603).

7. The photovoltaic silicon wafer cleaning apparatus of claim 1, wherein, The cleaning box (1) has air inlet frames (7) installed on both sides of its inner wall. The air inlet frames (7) are equipped with heating wires (701). Multiple fans (702) are installed on one side of the outer end of the air inlet frames (7). Air inlets (703) are opened on both sides of the outer end of the cleaning box (1).

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