Ultrapure water production system

Abstract

The utility model belongs to the technical field of water treatment, and particularly relates to an ultrapure water production system which comprises a raw water tank, an ultrafiltration device, a primary reverse osmosis device, a secondary reverse osmosis device, an electric deionized water device and an ultrapure water tank which are connected in sequence, ultrapure water production system further comprising an ultrafiltration water tank located on a pipeline between an ultrafiltration device and a primary reverse osmosis device and / or a primary reverse osmosis water tank located on a pipeline between a primary reverse osmosis device and a secondary reverse osmosis device and / or a secondary reverse osmosis water tank located on a pipeline between a secondary reverse osmosis device and an electric deionized water device and a box. By additionally arranging the ultrafiltration water tank and / or the first-stage reverse osmosis water tank and / or the second-stage reverse osmosis water tank, water can be stored, adjusted and distributed through the ultrafiltration water tank and / or the first-stage reverse osmosis water tank and / or the second-stage reverse osmosis water tank, so that buffering is provided when the water consumption fluctuates, and the technical problems of large water quality fluctuation, unstable water quality and the like are solved.

Description

Technical Field

[0001] This utility model belongs to the field of water treatment technology, specifically relating to an ultrapure water production system. Background Technology

[0002] Ultrapure water, also known as UP water, refers to water with a resistivity of 18 MΩ*cm (25℃). Besides water molecules, ultrapure water contains virtually no impurities, bacteria, viruses, dioxins, or other organic matter, and lacks essential minerals and trace elements. In other words, it is water with almost all atoms except oxygen and hydrogen removed. Ultrapure water is widely used in electronics, power, electroplating, lighting appliances, laboratories, food, papermaking, daily chemicals, building materials, paint manufacturing, batteries, testing, biology, pharmaceuticals, petroleum, chemicals, steel, and glass industries. It can be used as process water, chemical reagent water, and cosmetic water. It can also be used in the production processes of monocrystalline silicon, semiconductor wafer cutting, semiconductor chips, semiconductor packaging, lead frame racks, integrated circuits, liquid crystal displays, conductive glass, picture tubes, circuit boards, optical communications, computer components, capacitors, and various other components, as well as for cleaning high-voltage transformers.

[0003] In related technologies, the ultrapure water preparation system includes the following equipment arranged in sequence: a raw water tank, an ultrafiltration unit, a first-stage reverse osmosis unit (i.e., a first-stage RO unit), a second-stage reverse osmosis unit (i.e., a second-stage RO unit), an electro-deionized water unit (i.e., an EDI unit), and an ultrapure water tank. During the ultrapure water production process, the equipment is controlled to start and stop based on the water level in the tank. However, this method of production requires frequent start-ups and shutdowns, resulting in significant fluctuations in water quality, particularly after treatment by the electro-deionized water unit, the first-stage reverse osmosis unit, and the first-stage reverse osmosis unit, leading to unstable ultrapure water quality. Utility Model Content

[0004] In view of this, the present invention provides an ultrapure water production system to solve the above-mentioned technical problems such as large fluctuations and instability in water quality.

[0005] To achieve the above solution, the technical solution of this utility model is as follows:

[0006] This utility model provides an ultrapure water production system, which includes a raw water tank, an ultrafiltration device, a primary reverse osmosis device, a secondary reverse osmosis device, an electro-deionized water device, and an ultrapure water tank connected in sequence. It also includes an ultrafiltration water tank located on the pipeline between the ultrafiltration device and the primary reverse osmosis device, and / or a primary reverse osmosis water tank located on the pipeline between the primary reverse osmosis device and the secondary reverse osmosis device, and / or a secondary reverse osmosis water tank located on the pipeline between the secondary reverse osmosis device and the electro-deionized water device.

[0007] The principle of the ultrapure water production system of this utility model is as follows: by adding an ultrafiltration water tank on the pipeline between the ultrafiltration device and the first-stage reverse osmosis device, and / or a first-stage reverse osmosis water tank on the pipeline between the first-stage reverse osmosis device and the second-stage reverse osmosis device, and / or a second-stage reverse osmosis water tank on the pipeline between the second-stage reverse osmosis device and the electro-deionized water device, the ultrafiltration water tank and / or the first-stage reverse osmosis water tank and / or the second-stage reverse osmosis water tank can store, regulate and distribute water volume, so as to provide a buffer when water volume fluctuates, thereby solving technical problems such as large fluctuations in water quality and unstable water quality.

[0008] Optionally, the ultrapure water production system further includes a self-cleaning filter located on the pipeline between the raw water tank and the ultrafiltration device.

[0009] Specifically, this invention improves water quality by adding a self-cleaning filter to the pipeline between the raw water tank and the ultrafiltration device, which removes suspended solids, particulate matter and other impurities from the water.

[0010] Optionally, the ultrapure water production system further includes a precision filter located on the pipeline between the ultrafiltration tank and the primary reverse osmosis unit.

[0011] Specifically, this utility model removes suspended solids, colloidal substances, and small particulate impurities from the water by adding a precision filter on the pipeline between the ultrafiltration water tank and the first-stage reverse osmosis device. This prevents the pipeline from being blocked by these impurities and avoids corrosion to the subsequent first-stage and second-stage reverse osmosis devices, thus protecting the membrane filter elements in the subsequent first-stage and second-stage reverse osmosis devices.

[0012] Optionally, the ultrapure water production system further includes a first booster pump located on the pipeline between the ultrafiltration tank and the precision filter, the first booster pump being configured to adjust the outlet pressure and flow rate according to the liquid level height of the primary reverse osmosis tank.

[0013] Specifically, this invention adds a first booster pump to the pipeline between the ultrafiltration water tank and the precision filter. The first booster pump can adjust the outlet water pressure and flow rate according to the liquid level of the first-stage reverse osmosis water tank, thereby maintaining the stability of the liquid level of the first-stage reverse osmosis water tank and avoiding the technical problems of large fluctuations in water quality and unstable outlet water caused by frequent start-up and shutdown in the prior art.

[0014] Optionally, the ultrapure water production system further includes a primary high-pressure pump located on the pipeline between the precision filter and the primary reverse osmosis unit, the primary high-pressure pump being configured to adjust the outlet pressure and flow rate according to the liquid level height of the primary reverse osmosis water tank.

[0015] Specifically, this invention adds a first-stage high-pressure pump to the pipeline between the precision filter and the first-stage reverse osmosis device. The first-stage high-pressure pump can adjust the outlet pressure and flow rate according to the liquid level of the first-stage reverse osmosis water tank, thereby maintaining the stability of the liquid level of the first-stage reverse osmosis water tank and avoiding the technical problems of large fluctuations in water quality and unstable outlet water caused by frequent start-up and shutdown in the prior art.

[0016] Optionally, the ultrapure water production system further includes a raw water pump located on a pipeline between the raw water tank and the ultrafiltration device, the raw water pump being configured to adjust the outlet pressure and flow rate according to the liquid level height of the ultrafiltration tank.

[0017] Specifically, this utility model adds a raw water pump to the pipeline between the raw water tank and the ultrafiltration device. The raw water pump can adjust the outlet water pressure and flow rate according to the liquid level of the ultrafiltration water tank, thereby maintaining the stability of the liquid level of the ultrafiltration water tank and avoiding the technical problems of large fluctuations in water quality and unstable outlet water caused by frequent start-up and shutdown in the prior art.

[0018] Optionally, the ultrapure water production system further includes a second booster pump located on the pipeline between the ultrapure water tank and the electro-deionized water device, the second booster pump being configured to adjust the outlet pressure and flow rate according to the liquid level height of the ultrapure water tank.

[0019] Specifically, this invention adds a second booster pump to the pipeline between the ultrapure water tank and the electro-deionized water device. The second booster pump can adjust the outlet pressure and flow rate according to the liquid level of the ultrapure water tank, thereby maintaining the stability of the liquid level of the ultrapure water tank and avoiding the technical problems of large fluctuations in water quality and unstable outlet water caused by frequent start-up and shutdown in the prior art.

[0020] Optionally, the ultrapure water production system further includes a secondary high-pressure pump located on a pipeline between the primary reverse osmosis water tank and the secondary reverse osmosis unit, the secondary high-pressure pump being configured to adjust the outlet pressure and flow rate according to the liquid level height of the secondary reverse osmosis water tank.

[0021] Specifically, this invention adds a secondary high-pressure pump to the pipeline between the primary reverse osmosis water tank and the secondary reverse osmosis device. The secondary high-pressure pump can adjust the outlet pressure and flow rate according to the liquid level of the secondary reverse osmosis water tank, thereby maintaining the stability of the liquid level of the secondary reverse osmosis water tank and avoiding the technical problems of large fluctuations in water quality and unstable outlet water caused by frequent start-up and shutdown in the prior art.

[0022] Optionally, the raw water tank is provided with a water inlet, the water inlet is connected to a water inlet pipe, and the water inlet pipe is provided with a liquid level regulating valve.

[0023] Specifically, this utility model adds a liquid level regulating valve to the inlet pipe connected to the raw water tank. The valve opening can be adjusted according to the liquid level in the raw water tank to maintain a stable liquid level in the raw water tank, thus avoiding the technical problems of large fluctuations in water quality and unstable water output caused by frequent start-up and shutdown in the prior art.

[0024] Optionally, the ultrapure water tank is provided with a return water port, which is connected to the secondary reverse osmosis device.

[0025] Specifically, this invention connects the return port of the ultrapure water tank to the secondary reverse osmosis device, enabling the return of some ultrapure water to the secondary reverse osmosis device for further treatment when the user's demand for ultrapure water is not high, thereby maintaining the stability of the liquid level in the ultrapure water tank and the stability of the quality of the delivered ultrapure water.

[0026] Optionally, the ultrapure water production system further includes a third booster pump located on the pipeline between the return water inlet and the secondary reverse osmosis unit, the third booster pump being a variable frequency pump.

[0027] Specifically, this utility model adds a third booster pump to the pipeline between the return water inlet and the secondary reverse osmosis device, and sets the third booster pump to be a variable frequency pump, which can adjust the water flow rate and improve the flexibility of the production process.

[0028] Optionally, a flow regulating valve is provided on the pipeline between the return water inlet and the secondary reverse osmosis unit.

[0029] Specifically, this invention adds a flow regulating valve to the pipeline between the return water inlet of the ultrapure water tank and the secondary reverse osmosis device. This allows the flow regulating valve to adjust the amount of water returned to the secondary reverse osmosis device according to the user's demand for ultrapure water, thereby improving the flexibility of the production process.

[0030] Optionally, the ultrafiltration water tank and / or the primary reverse osmosis water tank and / or the secondary reverse osmosis water tank are equipped with level gauges, and the level gauges are continuous digital signal level gauges. Attached Figure Description

[0031] Figure 1 This is a schematic diagram of the ultrapure water production system in Example 1;

[0032] Figure 2 This is a schematic diagram of the ultrapure water production system in Example 2;

[0033] Figure 3This is a schematic diagram of the ultrapure water production system in Example 3;

[0034] Figure 4 This is a schematic diagram of the ultrapure water production system in Example 4.

[0035] Figure Labels

[0036] 1- Raw water tank;

[0037] 2-Ultrafiltration device;

[0038] 3- First-stage reverse osmosis unit;

[0039] 4- Secondary reverse osmosis unit;

[0040] 5-Electrodeionized water device;

[0041] 6-Ultrapure water tank;

[0042] 7-Ultrafiltration water tank;

[0043] 8 - Primary reverse osmosis water tank;

[0044] 9. Two-stage reverse osmosis water tank;

[0045] 10-Self-cleaning filter;

[0046] 11-Precision filter;

[0047] 12 - First booster pump;

[0048] 13. First-stage high-pressure pump;

[0049] 14 - Raw water pump;

[0050] 15 - Second booster pump;

[0051] 16-Level control valve;

[0052] 17 - Flow regulating valve;

[0053] 18 - Third booster pump;

[0054] 19-Secondary high-pressure pump. Detailed Implementation

[0055] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0056] In this utility model, unless otherwise explicitly specified and limited, the term "connection" and similar terms should be interpreted broadly. For example, "connection" can be a fixed connection, a detachable connection, or an integral part; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium; it can be the internal communication of two components or the interaction between two components, unless otherwise explicitly limited. Those skilled in the art can understand the specific meaning of the above terms in this utility model according to the specific circumstances.

[0057] Furthermore, in this utility model, descriptions involving "first," "second," "third," etc., are for descriptive purposes only and should not be construed as indicating or implying their relative importance or implicitly specifying the number of technical features indicated. Therefore, a feature defined with "first," "second," or "third" may explicitly or implicitly include at least one of those features. Additionally, the word "and / or" throughout the text means including three parallel solutions; taking "A and / or B" as an example, it includes solution A, solution B, or a solution that simultaneously satisfies A and B. Furthermore, the technical solutions of the various embodiments can be combined with each other, but this must be based on the ability of those skilled in the art to implement them. When the combination of technical solutions is contradictory or impossible to implement, it should be considered that such a combination of technical solutions does not exist and is not within the scope of protection claimed by this utility model.

[0058] This utility model provides an ultrapure water production system, which includes a raw water tank 1, an ultrafiltration device 2, a primary reverse osmosis device 3, a secondary reverse osmosis device 4, an electro-deionized water device 5, and an ultrapure water tank 6 connected in sequence. The raw water tank 1 is provided with an inlet, which is connected to an inlet pipe. The inlet pipe is provided with a level regulating valve 16. The ultrapure water production system also includes an ultrafiltration water tank 7 located on the pipeline between the ultrafiltration device 2 and the primary reverse osmosis device 3, and / or a primary reverse osmosis water tank 8 located on the pipeline between the primary reverse osmosis device 3 and the secondary reverse osmosis device 4, and / or a secondary reverse osmosis water tank 9 located on the pipeline between the secondary reverse osmosis device 4 and the electro-deionized water device 5. The ultrafiltration water tank 7 and / or the primary reverse osmosis water tank 8 and / or the secondary reverse osmosis water tank 9 are provided with level gauges, which are continuous digital signal level gauges.

[0059] In another embodiment, the ultrapure water production system also includes a self-cleaning filter 10 located on the pipeline between the raw water tank 1 and the ultrafiltration device 2.

[0060] In another embodiment, the ultrapure water production system also includes a precision filter 11 located on the pipeline between the ultrafiltration tank 7 and the first-stage reverse osmosis unit 3.

[0061] In another embodiment, the ultrapure water production system also includes a first booster pump 12 located on a pipeline between the ultrafiltration tank 7 and the precision filter 11, the first booster pump 12 being configured to adjust the outlet pressure and flow rate according to the liquid level height of the primary reverse osmosis tank 8.

[0062] In another embodiment, the ultrapure water production system also includes a first-stage high-pressure pump 13 located on the pipeline between the precision filter 11 and the first-stage reverse osmosis unit 6, the first-stage high-pressure pump 13 being configured to adjust the outlet pressure and flow rate according to the liquid level height of the first-stage reverse osmosis water tank 8.

[0063] In another embodiment, the ultrapure water production system also includes a raw water pump 14 located on a pipeline between the raw water tank 1 and the ultrafiltration device 2, the raw water pump 14 being configured to adjust the outlet pressure and flow rate according to the liquid level height of the ultrafiltration tank 7.

[0064] In another embodiment, the ultrapure water production system further includes a second booster pump 15 located on a pipeline between the secondary reverse osmosis water tank 9 and the electro-deionized water device 5, the second booster pump 15 being configured to adjust the outlet pressure and flow rate according to the liquid level height of the ultrapure water tank 6.

[0065] In another embodiment, the ultrapure water production system also includes a secondary high-pressure pump 19 located on a pipeline between the primary reverse osmosis tank 8 and the secondary reverse osmosis unit 4, the secondary high-pressure pump 19 being configured to adjust the outlet pressure and flow rate according to the liquid level height of the secondary reverse osmosis tank 9.

[0066] In another embodiment, the ultrapure water tank 6 is provided with a return water port, which is connected to the secondary reverse osmosis device 4, and a flow regulating valve 17 is provided at the return water port.

[0067] In another embodiment, the ultrapure water production system also includes a third booster pump 18 located on the pipeline between the return water inlet and the secondary reverse osmosis unit 4, the third booster pump 18 being a variable frequency pump.

[0068] The present invention will be described in detail below through specific examples and embodiments. It should also be understood that the following embodiments are only for specific illustration of the present invention and should not be construed as limiting the scope of protection of the present invention. Any non-essential improvements and adjustments made by those skilled in the art based on the above description of the present invention are within the scope of protection of the present invention. The specific process parameters, etc., in the following examples are merely examples within a suitable range; that is, those skilled in the art can make appropriate selections within the appropriate range based on the description herein, and are not intended to be limited to the specific values ​​in the examples below.

[0069] Example 1

[0070] Please see Figure 1 , Figure 1This is a schematic diagram of the ultrapure water production system of this embodiment 1. The ultrapure water production system includes a raw water tank 1, an ultrafiltration device 2, a first-stage reverse osmosis device 3, a second-stage reverse osmosis device 4, an electro-deionized water device 5, and an ultrapure water tank 6 connected in sequence.

[0071] Please continue reading. Figure 1 The raw water tank 1 is used as a storage place for raw water (i.e., the raw material for the preparation of ultrapure water). The raw water tank 1 is equipped with a water inlet, which is connected to a water inlet pipe 16. The water inlet pipe is equipped with a liquid level regulating valve 16. The liquid level regulating valve 16 is configured to adjust the valve opening according to the liquid level in the raw water tank to maintain the stability of the liquid level in the raw water tank and avoid the technical problems of large fluctuations in water quality and unstable water output caused by frequent start-up and shutdown in the prior art.

[0072] Specifically, in this embodiment, by adding a liquid level regulating valve 16 to the inlet pipe connected to the raw water tank 1, the opening of the valve can be adjusted according to the liquid level of the raw water tank 1 to maintain the stability of the liquid level in the raw water tank 1, thus avoiding the technical problems of large fluctuations in water quality and unstable water output caused by frequent start-up and shutdown in the prior art.

[0073] Please continue reading. Figure 1 The ultrafiltration device 2 is used as a place for ultrafiltration of raw water. It uses an ultrafiltration membrane to intercept and treat impurities such as bacteria, precipitates, suspended solids, and proteins in the raw water to initially purify the water quality.

[0074] Please continue reading. Figure 1 The first-stage reverse osmosis unit 3 is used as a place for preliminary reverse osmosis treatment of water after ultrafiltration. It utilizes the selective permeability of the semi-permeable membrane to remove microorganisms such as bacteria and viruses, as well as impurities such as organic matter and heavy metals from the water.

[0075] Please continue reading. Figure 1 The secondary reverse osmosis unit 4 is used as a place to further reverse osmosis treat the water after it has been treated by the primary reverse osmosis unit 3, so as to further remove bacteria, viruses and other microorganisms, as well as organic matter, heavy metals and other impurities from the water.

[0076] Please continue reading. Figure 1 The electro-deionization water device 5 is used as a place to electro-deionize water that has been treated by the two-stage reverse osmosis device 4. It applies a weak electric field to cause the anions and cations in the water to migrate to the anion membrane and cation membrane respectively and be adsorbed on the membrane, thereby purifying the water quality.

[0077] Please continue reading. Figure 1The ultrapure water production system also includes an ultrafiltration water tank 7 located on the pipeline between the ultrafiltration unit 2 and the first-stage reverse osmosis unit 3, and / or a first-stage reverse osmosis water tank 8 located on the pipeline between the first-stage reverse osmosis unit 3 and the second-stage reverse osmosis unit 4, and / or a second-stage reverse osmosis water tank 9 located on the pipeline between the second-stage reverse osmosis unit 4 and the electro-deionized water unit 5. The ultrafiltration water tank 7 serves as a storage, regulation, and distribution facility for water treated by the ultrafiltration unit 2; the first-stage reverse osmosis water tank 8 serves as a storage, regulation, and distribution facility for water treated by the first-stage reverse osmosis unit 3; and the second-stage reverse osmosis water tank 9 serves as a storage, regulation, and distribution facility for water treated by the second-stage reverse osmosis unit 4. The ultrafiltration water tank 7 and / or the first-stage reverse osmosis water tank 8 and / or the second-stage reverse osmosis water tank 9 are equipped with level gauges (not shown), which are continuous digital signal level gauges. Continuous digital signal level gauges are existing technology and will not be described further here.

[0078] The principle of the ultrapure water production system in this embodiment is as follows: by adding an ultrafiltration water tank 7 on the pipeline between the ultrafiltration device 2 and the first-stage reverse osmosis device 3 and / or a first-stage reverse osmosis water tank 8 on the pipeline between the first-stage reverse osmosis device 3 and the second-stage reverse osmosis device 4 and / or a second-stage reverse osmosis water tank 9 on the pipeline between the second-stage reverse osmosis device 4 and the electro-deionized water device 5, the ultrafiltration water tank 7 and / or the first-stage reverse osmosis water tank 8 and / or the second-stage reverse osmosis water tank 9 can store, regulate and distribute water volume, so as to provide a buffer when water volume fluctuates, thereby solving technical problems such as water quality instability caused by large fluctuations in water quality.

[0079] Example 2

[0080] Please see Figure 2 The difference between this embodiment and embodiment 1 is that the ultrapure water production system also includes a self-cleaning filter 10 on the pipeline between the raw water tank 1 and the ultrafiltration device 2 and / or a precision filter 11 on the pipeline between the ultrafiltration water tank 7 and the first-stage reverse osmosis device 3.

[0081] Specifically, this embodiment adds a self-cleaning filter 10 to the pipeline between the raw water tank 1 and the ultrafiltration device 2. This self-cleaning filter 10 removes suspended solids, particulate matter, and other impurities from the water, improving water quality. This embodiment also adds a precision filter 11 to the pipeline between the ultrafiltration water tank 7 and the first-stage reverse osmosis device 3. This precision filter 11 removes suspended solids, colloidal substances, and small particulate impurities from the water, preventing potential clogging of the pipeline and corrosion of the subsequent first-stage and second-stage reverse osmosis devices, thus protecting the membrane filtration elements in the subsequent first-stage and second-stage reverse osmosis devices.

[0082] Example 3

[0083] Please see Figure 3 The difference between this embodiment and Embodiment 2 is that the ultrapure water production system also includes a raw water pump 14 located on the pipeline between the raw water tank 1 and the ultrafiltration device 2, and / or a first booster pump 12 located on the pipeline between the ultrafiltration water tank 7 and the precision filter 11, and / or a first-stage high-pressure pump 13 located on the pipeline between the precision filter 11 and the first-stage reverse osmosis device 3, and / or a second-stage high-pressure pump 19 located on the pipeline between the first-stage reverse osmosis water tank 8 and the second-stage reverse osmosis device 4, and / or a pump 19 located on the pipeline between the second-stage reverse osmosis water tank 9 and the electro-deionized water device 5. The second booster pump 15 and the raw water pump 14 are configured to adjust the outlet pressure and flow rate according to the liquid level of the ultrafiltration water tank 7. The first booster pump 12 is configured to adjust the outlet pressure and flow rate according to the liquid level of the first-stage reverse osmosis water tank 8. The first-stage high-pressure pump 13 is configured to adjust the outlet pressure and flow rate according to the liquid level of the first-stage reverse osmosis water tank 8. The second booster pump 15 is configured to adjust the outlet pressure and flow rate according to the liquid level of the ultrapure water tank 6. The second-stage high-pressure pump 19 is configured to adjust the outlet pressure and flow rate according to the liquid level of the second-stage reverse osmosis water tank 9.

[0084] Specifically, this embodiment adds a raw water pump 14 to the pipeline between the raw water tank 1 and the ultrafiltration device 2. The raw water pump 14 can adjust the outlet water pressure and flow rate according to the liquid level of the ultrafiltration water tank 7, maintaining a stable liquid level and avoiding the large fluctuations in water quality and unstable outlet water caused by frequent start-ups and shutdowns in existing technologies. Similarly, this embodiment adds a first-stage high-pressure pump 13 to the pipeline between the precision filter 11 and the first-stage reverse osmosis device 3. The first-stage high-pressure pump 13 can adjust the outlet water pressure and flow rate according to the liquid level of the first-stage reverse osmosis water tank 8, maintaining a stable liquid level and avoiding the large fluctuations in water quality and unstable outlet water caused by frequent start-ups and shutdowns in existing technologies. This embodiment adds a first booster pump 12 to the pipeline between the ultrafiltration water tank 7 and the precision filter 11. The first booster pump 12 can adjust the outlet water pressure and flow rate according to the liquid level of the first-stage reverse osmosis water tank 8, maintaining a stable liquid level in the first-stage reverse osmosis water tank 8 and avoiding the technical problems of large water quality fluctuations and unstable outlet water caused by frequent start-up and shutdown in existing technologies. This embodiment also adds a second booster pump 15 to the pipeline between the second-stage reverse osmosis water tank 9 and the electro-deionized water device 5. The second booster pump 15 can adjust the outlet water pressure and flow rate according to the liquid level of the ultrapure water tank 6, maintaining a stable liquid level in the second-stage reverse osmosis water tank and avoiding the technical problems of large water quality fluctuations and unstable outlet water caused by frequent start-up and shutdown in existing technologies. This embodiment adds a secondary high-pressure pump 19 to the pipeline between the primary reverse osmosis water tank 8 and the secondary reverse osmosis device 4. The secondary high-pressure pump 19 can adjust the outlet pressure and flow rate according to the liquid level of the secondary reverse osmosis water tank 9, so as to maintain the stability of the liquid level of the secondary reverse osmosis water tank 9 and avoid the technical problems of large fluctuations in water quality and unstable outlet water caused by frequent start-up and shutdown in the prior art.

[0085] Example 4

[0086] Please see Figure 4 The difference between this embodiment and embodiment 3 is that the ultrapure water tank 6 is provided with a return water port, which is connected to the secondary reverse osmosis device 4. A third booster pump 18 and a flow regulating valve 17 are provided on the pipeline between the return water port and the secondary reverse osmosis device 4. The third booster pump 18 is a variable frequency pump.

[0087] Specifically, this embodiment connects the return port of the ultrapure water tank 6 to the secondary reverse osmosis unit 4. This allows for the return of some ultrapure water to the secondary reverse osmosis unit 4 for further treatment when the user's demand for ultrapure water is low, thus maintaining a stable liquid level in the ultrapure water tank 6 and a stable quality of the delivered ultrapure water. Furthermore, by adding a flow regulating valve 17 to the pipeline between the return port of the ultrapure water tank 6 and the secondary reverse osmosis unit 4, the amount of water returned to the secondary reverse osmosis unit 4 can be adjusted according to the user's demand for ultrapure water, improving flexibility in the production process.

[0088] The above embodiments are merely illustrative of the principles and effects of this utility model and are not intended to limit the scope of this utility model. Any person skilled in the art can modify or alter the above embodiments without departing from the spirit and scope of this utility model. Therefore, all equivalent modifications or alterations made by those skilled in the art without departing from the spirit and technical concept disclosed in this utility model should still be covered by the claims of this utility model.

Claims

1. An ultrapure water production system characterized by comprising: The ultrapure water production system comprises, in sequence, a raw water tank, an ultrafiltration device, a first reverse osmosis device, a second reverse osmosis device, an electrodeionization water device and an ultrapure water tank.

2. The ultrapure water production system according to claim 1, wherein The ultrapure water production system further comprises a self-cleaning filter located on the pipeline between the raw water tank and the ultrafiltration device.

3. The ultrapure water production system of claim 1, wherein, The ultrapure water production system further comprises a precision filter located on the pipeline between the ultrafiltration water tank and the first reverse osmosis device.

4. The ultrapure water production system as claimed in claim 3, wherein The ultrapure water production system further comprises a first booster pump located on the pipeline between the ultrafiltration water tank and the precision filter, which is configured to adjust the water pressure and flow rate according to the liquid level of the first reverse osmosis water tank. The ultrapure water production system further comprises a first high-pressure pump located on the pipeline between the precision filter and the first reverse osmosis device, which is configured to adjust the water pressure and flow rate according to the liquid level of the first reverse osmosis water tank.

5. The ultrapure water production system of claim 1, wherein, The ultrapure water production system further comprises a raw water pump located on the pipeline between the raw water tank and the ultrafiltration device, which is configured to adjust the water pressure and flow rate according to the liquid level of the ultrafiltration water tank. The ultrapure water production system further comprises a second booster pump located on the pipeline between the ultrapure water tank and the electrodeionization water device, which is configured to adjust the water pressure and flow rate according to the liquid level of the ultrapure water tank.

6. The ultrapure water production system of claim 1, wherein, The ultrapure water production system further comprises a second high-pressure pump located on the pipeline between the first reverse osmosis water tank and the second reverse osmosis device, which is configured to adjust the water pressure and flow rate according to the liquid level of the second reverse osmosis water tank.

7. The ultrapure water production system of claim 1, wherein, The raw water tank is provided with a water inlet, and the water inlet is connected with a water inlet pipe provided with a liquid level adjusting valve.

8. The ultrapure water production system of claim 1, wherein, The ultrapure water tank is provided with a backwater inlet connected with the second reverse osmosis device.

9. The ultrapure water production system as claimed in claim 8, wherein The ultrapure water production system further comprises a third booster pump located on the pipeline between the backwater inlet and the second reverse osmosis device, which is a variable frequency pump. The pipeline between the backwater inlet and the second reverse osmosis device is provided with a flow rate adjusting valve.

10. The ultrapure water production system of claim 1, wherein, The ultrafiltration water tank, the first reverse osmosis water tank and / or the second reverse osmosis water tank is provided with a liquid level meter, which is a continuous digital signal liquid level meter.

Images