Winding and plating removing device

Abstract

The utility model relates to the technical field of solar cell equipment, and discloses a deplating device, which is applied to a solar cell with a deplating layer on the surface, and comprises an etching structure, a deplating structure and a deplating structure, the etching structure comprises a plurality of etching grooves, and the etching grooves are used for placing etching liquid for etching the deplating layer; the surface of the bearing platform is used for bearing the winding plating layer, an open groove is formed in the surface of the bearing platform and used for making contact with a part of the winding plating layer, a containing cavity is formed in the bearing platform, and the containing cavity communicates with the open groove; the etching groove is used for being arranged in the containing cavity and in butt joint with the open groove, the solar cell is provided with a winding plating layer, and under the state that etching liquid exists in the etching groove, the etching liquid is used for making contact with the winding plating layer located at the open groove to conduct etching. By the adoption of the winding plating removing device, the local winding plating removing effect can be achieved, the accuracy of local etching is improved, defects are reduced, and the electrical performance and long-term stability of the solar cell are improved.

Description

Technical Field

[0001] This utility model relates to the field of solar cell equipment technology, and in particular to a decoating device. Background Technology

[0002] In the process of removing the coating from solar cells, chemical etching can usually only remove the coating from the entire surface, making it difficult to achieve the effect of removing the coating locally. Although laser etching can achieve the effect of removing the coating locally, this method is not only prone to damaging other parts of the solar cell, but also leads to higher heat energy in local areas of the solar cell, changes in the crystal structure of the solar cell, and the addition of additional defects, thereby affecting the electrical performance and long-term stability of the solar cell. Utility Model Content

[0003] This utility model discloses a de-coating device. Using this de-coating device can not only achieve the effect of local de-coating, but also help improve the accuracy of local etching, reduce the generation of defects, and improve the electrical performance and long-term stability of solar cells.

[0004] This application provides a decoating device for solar cells with a coating layer on their surface. The decoating device includes:

[0005] An etching structure, the etching structure including a plurality of etching grooves, the etching grooves being used to hold etching solution for etching the surrounding coating;

[0006] A support platform, the surface of which is used to support the coating layer, the surface of which is provided with a groove for contacting a portion of the coating layer, and the interior of which has a receiving cavity connected to the groove;

[0007] The etching tank is disposed in the accommodating cavity and is connected to the slot. When the solar cell has the surrounding coating and the etching tank contains the etching liquid, the etching liquid is used to contact the surrounding coating located at the slot for etching.

[0008] Furthermore, the etching groove is either fixedly connected or movably connected to the accommodating cavity.

[0009] Furthermore, when the etching groove is movably connected relative to the accommodating cavity;

[0010] Wherein, the accommodating cavity is a through cavity, which is connected to the slot, so that the bearing platform is arranged in a through manner along its own thickness direction; or, the accommodating cavity is a groove, which is connected to the slot, so that the bearing platform forms an inwardly recessed accommodating groove along its own thickness direction.

[0011] Furthermore, the etching structure also includes a lifting assembly, which is connected to the etching groove and is used to drive the etching groove to move up and down relative to the support platform.

[0012] Furthermore, the etching groove includes:

[0013] Main structural element;

[0014] A groove, located at the edge of the main structure along its length, and the groove is connected to the slot;

[0015] A guide ramp is located below the groove opening and is used to guide excess etching fluid to flow downwards.

[0016] Furthermore, the etching groove includes a first groove structure and a second groove structure that are interconnected;

[0017] The first groove structure has a triangular cross-section perpendicular to the length of the etching groove, and one corner of the triangular structure is recessed into the interior of the triangular structure to form the groove opening. The guide slope is located on the hypotenuse of the triangular structure.

[0018] Further, the depth of the first groove structure is 5μm to 15μm, and the width of the first groove structure along the length direction perpendicular to the etching groove is 10μm to 15μm; and / or,

[0019] Along the length of the etched groove, the second groove structure has a length of 185mm to 230mm and a height of 5mm to 15mm; along the length perpendicular to the etched groove, the width of the second groove structure is 0.5mm to 1.5mm; and / or,

[0020] Along the length direction perpendicular to the etched groove, the width of the accommodating cavity is 1mm to 5mm.

[0021] Furthermore, the etching structure also includes a draining groove, which is disposed below the etching groove along a length direction perpendicular to the etching groove, and the length of the draining groove corresponds to the length of the support platform.

[0022] Furthermore, any of the etching grooves includes a first groove structure and a second groove structure that are interconnected. Corresponding to the position of the leakage groove, the second groove structure is recessed towards the first groove structure to form an arched structure.

[0023] Furthermore, the support platform also includes fixing members, which are disposed on both sides of the support platform along a length direction perpendicular to the etched groove. The fixing members are used to fix the position of the solar cell on the support platform; and / or,

[0024] The etching removal device further includes multiple cleaning components for cleaning the etching solution on the solar cell; and / or,

[0025] The de-coating device further includes a straightening structure, which comprises:

[0026] A position detection device, used to detect the position of the solar cell on the correction platform;

[0027] A correction platform, electrically connected to the position detection element, is used to correct the position of the solar cell so that the corrected position of the solar cell matches the processing position of the support platform; and / or,

[0028] The decoating device further includes a suction cup structure and a correction structure. The suction cup structure is used to transfer the solar cell from the correction structure to the support platform.

[0029] Furthermore, when the decoating device includes multiple cleaning components, the cleaning components are pipe structures with multiple through holes on the pipe wall so that the cleaning liquid inside the pipe structure can flow to the solar cell through the through holes.

[0030] Furthermore, the de-coating device also includes a plurality of contact rollers spaced apart along a direction perpendicular to the length of the etching groove, and the cleaning component is located below the contact rollers, with any one of the cleaning components disposed between adjacent contact rollers.

[0031] Furthermore, when the decoating device includes a correction platform, the surface of the correction platform is provided with a plurality of fixing components, which are used to fix the position of the solar cell on the correction platform.

[0032] Furthermore, the fixing component is a vacuum suction hole, which is distributed on the surface of the correction platform, and the diameter of any one of the vacuum suction holes is 0.5mm to 1.5mm.

[0033] Compared with the prior art, this application has at least the following beneficial effects:

[0034] This application provides a decoating device, comprising a support platform and an etching structure. The support platform has a groove on its surface for contacting a portion of the decoating layer. The groove is connected to a cavity within the support platform. Since an etching tank is placed within the cavity and is connected to the groove, when the etching tank contains an etching solution capable of etching the decoating layer, the etching solution will contact a portion of the decoating layer for etching, thereby achieving the effect of locally removing the decoating layer from the solar cell. Using this decoating device improves the precision of local etching, avoids changes in the crystal structure of the solar cell, and helps improve the electrical performance and long-term stability of the solar cell. Attached Figure Description

[0035] To more clearly illustrate the technical solutions in the embodiments of this utility model, the drawings used in the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this utility model. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0036] Figure 1 This is a schematic diagram of the structure of a de-coating device provided in an embodiment of this application;

[0037] Figure 2 This is a schematic diagram of the structure of a carrier platform provided in an embodiment of this application;

[0038] Figure 3 This is a cross-sectional schematic diagram of the first type of support platform and etching groove provided in the embodiments of this application;

[0039] Figure 4 This is a cross-sectional schematic diagram of the second type of support platform and etching groove provided in the embodiments of this application;

[0040] Figure 5 This is a cross-sectional schematic diagram of the third type of support platform and etching groove provided in the embodiments of this application;

[0041] Figure 6 This is a schematic diagram of the etching mechanism provided in the embodiments of this application;

[0042] Figure 7 This is a schematic diagram of the etching groove provided in an embodiment of this application;

[0043] Figure 8 This is a cross-sectional schematic diagram of the etching groove provided in an embodiment of this application;

[0044] Figure 9 This is a schematic diagram of a second groove structure provided in an embodiment of this application;

[0045] Figure 10 This is a schematic diagram of another second groove structure provided in an embodiment of this application;

[0046] Figure 11 This is a schematic diagram of the structure of the cleaning component provided in the embodiments of this application.

[0047] Icons: 1. Etching structure; 11. Etching groove; 11a. First groove structure; 11b. Second groove structure; 111. Main structure; 112. Groove opening; 113. Guide slope; 12. Lifting assembly; 13. Leakage groove; 2. Bearing platform; 21. Groove; 22. Receiving cavity; 23. Receiving groove; 24. Fixing component; 3. Cleaning component; 31. Pipe wall; 32. Through hole; 4. Correction structure; 41. Position detection component; 42. Correction platform; 421. Fixing assembly; 5. Suction cup structure; 51. Lateral track; 6. Connecting roller; 7. Conveyor belt. Detailed Implementation

[0048] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0049] In this invention, the terms "upper," "lower," "left," "right," "front," "rear," "top," "bottom," "inner," "outer," "middle," "vertical," "horizontal," "lateral," and "longitudinal" indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. These terms are primarily for the purpose of better describing this invention and its embodiments, and are not intended to limit the indicated device, element, or component to having a specific orientation, or to be constructed and operated in a specific orientation.

[0050] Furthermore, in addition to indicating direction or positional relationship, some of the aforementioned terms may also have other meanings. For example, the term "above" may also be used in some cases to indicate a certain dependency or connection relationship. Those skilled in the art can understand the specific meaning of these terms in this utility model according to the specific circumstances.

[0051] Furthermore, the terms "first," "second," etc., are primarily used to distinguish different devices, elements, or components (which may be the same or different in specific type and construction), and are not intended to indicate or imply the relative importance or quantity of the indicated devices, elements, or components. Unless otherwise stated, "a plurality of" means two or more.

[0052] The technical solution provided by this utility model will be further described below with reference to the embodiments and accompanying drawings.

[0053] In the process of removing the coating from solar cells, chemical etching can be used to remove the coating from the entire surface of the solar cell. During this process, the side of the solar cell containing the coating is immersed in an etching solution for etching, while the other side is protected with a water film to prevent the etching solution from etching that side. However, this method can only remove the entire coating and is difficult to achieve the effect of partial removal.

[0054] Laser etching is used to etch the coating around solar cells in specific areas. While this method can achieve localized removal of the coating, the size of the laser spot during the etching process causes some of the laser light to act on other areas, damaging those areas and increasing defects in the solar cell. Furthermore, the high energy generated during laser etching leads to high heat in certain areas of the solar cell, causing changes in the crystal structure of those areas and creating additional defects, thus affecting the electrical performance and long-term stability of the solar cell.

[0055] Based on the above problems, this application provides a de-coating device. Using this de-coating device can not only achieve the effect of local de-coating, but also help improve the accuracy of local etching, reduce the generation of defects, and improve the electrical performance and long-term stability of solar cells.

[0056] This application provides a device for removing the coating layer, applicable to solar cells with a coating layer on their surface, such as... Figures 1 to 5 As shown, the de-coating apparatus includes:

[0057] The etching structure 1 includes a plurality of etching tanks 11, which are used to hold etching solution for etching the coating layer.

[0058] The support platform 2 has a surface for supporting the coating layer. The surface of the support platform 2 is provided with a groove 21 for contacting a portion of the coating layer. The interior of the support platform 2 has a receiving cavity 22, which is connected to the groove 21.

[0059] The etching tank 11 is used to be disposed in the accommodating cavity 22 and connected to the slot 21. When the solar cell has a coating layer and the etching tank 11 contains etching liquid, the etching liquid is used to contact the coating layer located at the slot 21 for etching.

[0060] The decoating removal apparatus provided in this application includes an etching structure 1 and a support platform 2. The support platform 2 has a groove 21 on its surface and a receiving cavity 22 inside, which is connected to the groove 21. The groove 21 is used to contact a portion of the decoating layer. When an etching tank 11 is placed in the receiving cavity 22, since the etching tank 11 is in contact with the groove 21, when the etching tank 11 contains etching solution, the etching solution will contact the portion of the decoating layer to etch it, thereby achieving a localized etching effect. Using the decoating removal apparatus of this application not only achieves the effect of localized decoating removal but also results in high etching precision, avoiding changes in the crystal structure of the solar cell, thus helping to improve the electrical performance and long-term stability of the solar cell.

[0061] In this design, the surface of the support platform 2 is used to support the wrap-around coating, meaning that the side of the solar cell with the wrap-around coating faces the support platform 2. Taking the back side of the solar cell with the wrap-around coating as an example, when performing partial removal of the wrap-around coating, the back side of the solar cell is placed facing the support platform 2 so that the wrap-around coating is located on the surface of the support platform 2. Furthermore, the slot 21 is used to contact a portion of the wrap-around coating; that is, the slot 21 is set in a portion of the surface of the support platform 2, so that when the wrap-around coating is on the surface of the support platform 2, only a portion of the wrap-around coating contacts the slot 21. Thus, when the etching tank 11 containing the etching solution is in contact with the slot 21, the etching solution can only contact the wrap-around coating at the slot 21 and cannot contact the wrap-around coating at other locations on the surface of the support platform 2, thereby achieving localized etching of the wrap-around coating. For example, for a back-contact solar cell, the pattern of the groove 21 can match the pattern of the non-electrode region of the back-contact solar cell. This allows for the removal of part of the coating around the back-contact solar cell under etching, exposing the silicon substrate. Consequently, the electrode and non-electrode regions of the back-contact solar cell are arranged in an interdigitated pattern. This application does not limit the structural morphology of the groove 21, as long as it meets the structural requirements of the solar cell.

[0062] Furthermore, the etching groove 11 is either fixedly connected or movably connected to the accommodating cavity 22.

[0063] In the first alternative implementation, see back Figure 3 The etching tank 11 is fixedly installed in the accommodating cavity 22. This fixed connection makes the etching tank 11 and the supporting platform 2 an integral whole. Therefore, after the etching solution has etched the coating, the solar cell can be transferred by a suction cup or other structure, thereby realizing the separation of the solar cell from the etching solution.

[0064] The fixed connection methods include threaded nut mating connections and snap-fit ​​connections. 、Adhesive bonding and welding. In addition, in the second and third alternative embodiments, the etching groove 11 is movably connected within the receiving cavity 22, thus making the etching groove 11 independent of the receiving cavity 22, and the etching groove 11 can move within the receiving cavity 22.

[0065] Specifically, in the second alternative implementation, refer to the previous section. Figure 4 When the etching tank 11 is movably connected to the receiving cavity 22, wherein the receiving cavity 22 is a through cavity that communicates with the slot 21, the supporting platform 2 is arranged through the cavity along its thickness direction; this arrangement simplifies the structure of the de-plating device, makes it easier to remove the etching tank 11 from the receiving cavity 22, and reduces the difficulty of maintaining and replacing the etching tank 11. In the third optional embodiment, refer to the previous section. Figure 5 The accommodating cavity 22 is a groove, which is connected to the slot 21, so that the supporting platform 2 forms an inwardly recessed accommodating groove 23 along its own thickness direction. Through the above-mentioned movable connection, the etching groove 11 can move in the accommodating cavity 22, wherein the etching groove 11 can move up and down within the accommodating cavity 22.

[0066] Furthermore, such as Figure 6 As shown, the etching structure 1 also includes a lifting assembly 12, which is connected to the etching groove 11. The lifting assembly 12 is used to drive the etching groove 11 to move up and down relative to the support platform 2.

[0067] The lifting assembly 12 enables the etching tank 11 to move up and down, facilitating the timely detachment of the solar cell from the etching solution and preventing the etching solution from spreading on the solar cell surface. This helps ensure the accuracy and effectiveness of the etching process. Specifically, during localized etching, the etching tank 11 is in an upward state, allowing the etching solution to contact the solar cell for etching. After etching is completed, the etching tank 11 is in a downward state, separating the etching solution from the solar cell. This ensures a high degree of accuracy in localized etching and prevents the etching solution from spreading on the solar cell surface.

[0068] The lifting assembly 12 achieves lifting motion by using components such as lead screws, cylinders, ropes, and gear racks.

[0069] Furthermore, such as Figure 7 As shown, the etching groove 11 includes:

[0070] Main structure 111;

[0071] Groove 112, Groove 112 is located along the length of the main structure 111 (refer to...) Figure 7 At the edge of the X direction in the middle, the slot 112 is connected to the slot 21;

[0072] Guide slope 113 is located below groove 112 and is used to guide excess etching fluid to flow downward.

[0073] The etching groove 11 of this application includes a main structure 111, a groove opening 112, and a guide slope 113. Therefore, when the coating layer of the solar cell comes into contact with the etching solution, the etching solution will etch part of the coating layer. However, if there is a lot of etching solution, excess etching solution will overflow during the contact process. At this time, since the guide slope 113 is located below the groove opening 112, the overflowing etching solution will slide down along the guide slope 113, thereby preventing the etching solution from etching the other areas of the solar cell, ensuring the accuracy of etching, and reducing the formation of defects.

[0074] Furthermore, such as Figure 8 As shown, the etching groove 11 includes a first groove structure 11a and a second groove structure 11b connected to each other. The first groove structure 11a is located in a direction perpendicular to the length of the etching groove 11 (refer to...). Figure 7 The cross-section of the Y-direction is a triangular structure. One corner of the triangular structure is recessed into the interior of the triangular structure to form a groove 112. The guide slope 113 is located on the hypotenuse of the triangular structure.

[0075] In this design, one corner of the triangular structure is recessed inward to form a groove 112, which is connected to the slot 21. Therefore, when the groove 112 comes into contact with part of the coating, a localized etching effect is achieved. Furthermore, the hypotenuse of the triangular structure serves as a guide slope 113, located below the groove 112. During the contact between the etching solution and the solar cell, any overflowing etching solution will slide down the hypotenuse of the triangular structure, preventing the accumulation of etching solution, reducing etching of other areas of the solar cell, and improving the precision of the etching process.

[0076] In addition, refer to the return Figure 6 To prevent overflowing etching solution from dripping onto the ground or other structural components, the etching structure 1 of this application further includes a drain trough 13, which is located below the etching tank 11. The length of the drain trough 13, perpendicular to the length of the etching tank 11, corresponds to the length of the support platform 2. Therefore, during the contact between the solar cell and the etching solution, the overflowing etching solution will slide into the drain trough 13, achieving the collection of the etching solution. This helps to largely prevent the etching solution from etching the ground or other structural components, reducing environmental pollution and facilitating the recycling and treatment of the etching solution.

[0077] In one alternative implementation, such as Figure 9 As shown, corresponding to the position of the leakage tank 13, the second tank structure 11b in the etching tank 11 is a cubic structure. This structure is simple to process and improves the processing efficiency.

[0078] In another alternative implementation, such as Figure 10 As shown, corresponding to the position of the leakage tank 13, the second tank structure 11b is recessed towards the first tank structure 11a to form an arched structure. The setting of this arched structure helps to reduce the sliding distance of the etching liquid and improve the effect of collecting the etching liquid.

[0079] Further, see the return Figure 1 The support platform 2 also includes a fixing member 24. Along the length direction perpendicular to the etching groove 11, the fixing member 24 is disposed on both sides of the support platform 2. The fixing member 24 is used to fix the position of the solar cell on the support platform 2.

[0080] The fixture 24 is designed to prevent the solar cell from shifting during the etching process, thereby ensuring high stability in the contact between the etching solution and the surrounding coating, improving the accuracy of local etching, and preventing defects from occurring.

[0081] Furthermore, the decoating device also includes multiple cleaning components 3, which are used to clean the etching solution on the solar cells.

[0082] Optionally, such as Figure 11 As shown, the cleaning component 3 is a pipe structure. The pipe wall 31 of the pipe structure has multiple through holes 32 so that the cleaning fluid in the pipe structure can flow to the solar cell through the through holes 32.

[0083] By setting up the cleaning component 3, the residual etching solution on the surface of the solar cell can be effectively removed. This not only avoids over-etching by the etching solution, but also avoids the traces caused by the residual etching solution after drying, thus avoiding adverse effects on the yield of the solar cell.

[0084] Further, see the return Figure 1 The de-coating device also includes a plurality of contact rollers 6 spaced apart along the length direction perpendicular to the etching groove 11, and a cleaning component 3 located below the contact rollers 6, with any cleaning component 3 located between adjacent contact rollers 6.

[0085] Since the cleaning component 3 is located between the solar cells and the solar cells and is lower than the solar cells, there is a gap between the cleaning component 3 and the solar cells, which helps to spray water and improve the cleaning effect. Furthermore, since the cleaning component 3 is located between adjacent solar cells, this arrangement can avoid the solar cells being blocked by the solar cells, resulting in incomplete cleaning in some areas, which helps to improve the cleaning effect.

[0086] Furthermore, in order to ensure the transmission stability of the bonding rollers 6, the distance between adjacent bonding rollers 6 is less than the length of the solar cell in the transmission direction of the rollers. The distance between adjacent bonding rollers 6 is 2cm to 4cm. This setting not only helps to ensure the transmission stability of the solar cell, but also helps to clean the cleaning component 3, thereby ensuring that the etching solution is completely removed.

[0087] Further, see the return Figure 1 The decoating device also includes a correction structure 4, which includes: a position detection element 41, which is used to detect the position of the solar cell on the correction platform 42; and a correction platform 42, which is electrically connected to the position detection element 41 and is used to correct the position of the solar cell so that the position of the corrected solar cell matches the processing position of the carrying platform 2.

[0088] Specifically, when the position detection component 41 detects the position of the solar cell on the correction platform 42, the correction platform 42 can rotate according to the detected position information, so that the position of the rotated solar cell matches the processing position of the support platform 2. This setting allows the corrected solar cell to be accurately placed on the support platform 2, thereby ensuring the accuracy of etching.

[0089] To ensure the accuracy of the correction, the surface of the correction platform 42 is provided with multiple fixing components 421, which are used to fix the position of the solar cell on the correction platform 42. The setting of the fixing components 421 prevents the solar cell from shifting, so that the position of the corrected solar cell matches the processing position of the support platform 2 with a high degree, thereby improving the effectiveness of etching.

[0090] In an alternative embodiment, when the fixing component 421 is a clamping member, the clamping member is symmetrically arranged at the edge position of the correction platform 42.

[0091] In another optional embodiment, the fixing component 421 is a vacuum suction port, which is uniformly distributed on the surface of the correction platform 42, and the diameter of any vacuum suction port is 0.5mm to 1.5mm. When the fixing component 421 is a vacuum suction port, the negative pressure generated by the vacuum is used to adsorb the solar cell, thereby fixing the solar cell. Furthermore, by controlling the diameter of the vacuum suction port within the aforementioned range, the stability of the adsorption is ensured. Using a vacuum suction port as the fixing component 421 effectively ensures that the structure of the solar cell is not damaged.

[0092] Further, see the return Figure 1 The decoating device also includes a suction cup structure 5 and a correction structure 4. The suction cup structure 5 is used to transfer the solar cell from the correction structure 4 to the support platform 2.

[0093] The suction cup structure 5 includes a transverse track 51 and a suction cup. The transverse track 51 provides a path for transporting solar cells between different structures, facilitating their conversion between different structures and thus realizing automated processing of solar cells.

[0094] It is understood that the decoating device of this application also includes a conveyor belt 7, which transports the solar cell to a preset position. When the solar cell reaches the preset position, the suction cup will adsorb the solar cell and place it on the correction structure 4.

[0095] The working process of the de-coating device of this application is described below:

[0096] First, the solar cells are transported to a preset position via a conveyor belt. Upon arrival, a suction cup adheres to the solar cell, which is then transported along a transverse track to a correction structure. The solar cell is placed on the correction platform, where a position detection device obtains its position information. This information is then received by the correction platform, which corrects the solar cell's position to align with the processing position on the carrier platform. The corrected solar cell is then transported to the carrier platform via the suction cup structure. A lifting assembly then rises to align the etching tank with the slot, allowing the etching tank to contact the solar cell's coating. Etching fluid from the etching tank etches the coating, while a drain tank simultaneously collects any overflowing etching fluid, achieving localized removal of the coating. After etching, the lifting assembly descends, and the suction cup structure transports the etched solar cell to the bonding rollers. While the solar cell is being transported on the bonding rollers, a cleaning unit cleans the surface of the solar cell of the etching fluid.

[0097] The above provides a detailed description of a de-coating device disclosed in the embodiments of this application. Specific examples have been used to illustrate the principles and implementation methods of this application. The description of the above embodiments is only for the purpose of helping to understand a de-coating device. At the same time, for those skilled in the art, there will be changes in the specific implementation methods and application scope based on the ideas of this utility model. Therefore, the content of this specification should not be construed as a limitation of this utility model.

Claims

1. A de-winding plating device applied to a solar cell having a winding plating layer on a surface, characterized in that, The unwinding plating device comprises: An etching structure, which comprises a plurality of etching grooves for placing etching liquid for etching the plating layer; A bearing platform, a surface of which is used for bearing the plating layer, and the surface of the bearing platform is provided with a groove for contacting a part of the plating layer, and the bearing platform has a containing cavity inside, which is communicated with the groove; The etching groove is arranged in the containing cavity and is opposite to the groove, and in the state that the solar cell has the plating layer and the etching groove has the etching liquid, the etching liquid is used for etching the plating layer at the groove.

2. The de-winding plating apparatus according to claim 1, wherein The etching groove is arranged in fixed connection or movable connection relative to the containing cavity.

3. The de-winding plating apparatus according to claim 2, wherein When the etching groove is arranged in movable connection relative to the containing cavity; The containing cavity is a through cavity, which is communicated with the groove, so that the bearing platform is arranged in a through manner along the thickness direction of the bearing platform; or the containing cavity is a groove, which is communicated with the groove, so that the bearing platform forms a containing groove which is concave along the thickness direction of the bearing platform.

4. The de-winding plating apparatus according to claim 3, wherein The etching structure further comprises a lifting assembly, which is connected with the etching groove and is used for driving the lifting movement of the etching groove relative to the bearing platform.

5. The de-winding plating apparatus according to claim 3, wherein The etching groove comprises: A structure body; A slot, which is located at the edge of the structure body along the length direction of the structure body, and the slot is opposite to the groove; A guide slope, which is located below the slot and is used for guiding the downward flow of the excess etching liquid.

6. The de-winding plating apparatus according to claim 5, wherein The etching groove comprises a first groove structure and a second groove structure which are connected with each other; The first groove structure is in a triangular structure in the cross section perpendicular to the length direction of the etching groove, one angle of the triangular structure is recessed into the interior of the triangular structure to form the slot, and the guide slope is located at the oblique side of the triangular structure.

7. The de-winding plating apparatus according to claim 6, wherein The depth of the first groove structure is 5 μm~15 μm, and the width of the first groove structure is 10 μm~15 μm along the length direction perpendicular to the etching groove; and / or, The length of the second groove structure is 185 mm~230 mm, and the height is 5 mm~15 mm along the length direction of the etching groove, and the width of the second groove structure is 0.5 mm~1.5 mm along the length direction perpendicular to the etching groove; and / or, The width of the containing cavity is 1 mm~5 mm along the length direction perpendicular to the etching groove.

8. The de-winding plating apparatus according to claim 3, wherein The etching structure further comprises a liquid leakage groove, which is arranged below the etching groove and has a length corresponding to the length of the bearing platform along the length direction perpendicular to the etching groove.

9. The de-winding plating apparatus of claim 8, wherein, Any etching groove comprises a first groove structure and a second groove structure which are connected with each other, and the second groove structure is recessed in the direction of the first groove structure to form an arched structure corresponding to the position of the liquid leakage groove.

10. The de-winding plating apparatus of claim 1, wherein, The bearing platform further comprises a fixing member arranged on both sides of the bearing platform along a direction perpendicular to the length direction of the etching groove, and the fixing member is used for fixing the position of the solar cell on the bearing platform; and / or, The de-winding plating device further comprises a plurality of cleaning members used for cleaning the etching liquid on the solar cell; and / or, The de-winding plating device further comprises a correction structure, and the correction structure comprises: a position detection member used for detecting the position of the solar cell on the correction platform; a correction platform electrically connected with the position detection member, and the correction platform is used for correcting the position of the solar cell so that the position of the corrected solar cell matches the processing position of the bearing platform; and / or, The de-winding plating device further comprises a suction disc structure, and the de-winding plating device further comprises a correction structure, and the suction disc structure is used for transmitting the solar cell from the correction structure to the bearing platform.

11. The de-winding plating apparatus of claim 10, wherein, When the de-winding plating device comprises a plurality of cleaning members, the cleaning member is a pipe structure, and a plurality of through holes are arranged on the pipe wall of the pipe structure, so that the cleaning liquid in the pipe structure can flow onto the solar cell through the through holes.

12. The de-winding plating apparatus of claim 11, wherein, The de-winding plating device further comprises a plurality of tab rollers arranged at intervals along a direction perpendicular to the length direction of the etching groove, and the cleaning member is located below the tab roller, and any cleaning member is arranged between adjacent tab rollers.

13. The de-winding plating apparatus of claim 10, wherein, When the de-winding plating device comprises a correction platform, the surface of the correction platform is provided with a plurality of fixing assemblies, and the fixing assemblies are used for fixing the position of the solar cell on the correction platform.

14. The de-winding plating apparatus of claim 13, wherein, The fixing assembly is a vacuum suction hole, and the vacuum suction holes are distributed on the surface of the correction platform, and the aperture of any vacuum suction hole is 0.5 mm-1.5 mm.

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