Reaction cavity gas exhaust system and filtering device thereof

Abstract

The utility model relates to a reaction chamber gas exhaust system and a filter device thereof, the exhaust system comprises a reaction chamber and a dry pump which are connected through an exhaust pipeline, and a pressure control valve is arranged on the exhaust pipeline; a filter device is arranged between the pressure control valve and the dry pump in the middle of the exhaust pipeline; the filter device is a filter screen or a pump filter device. The pump filtering device is of a cylindrical structure, the top of the pump filtering device is closed, the bottom of the pump filtering device is communicated, and filtering holes are formed in the side wall. The outer wall of the bottom is integrally connected with a sealing connection part consistent with the inner wall of the exhaust pipeline, and the sealing connection part is fixedly installed on the inner wall of the exhaust pipeline. The dry pump can solve the problem that in the prior art, the pump is damaged due to overload of the dry pump due to the fact that by-products or PM generated by film expansion or articles fall off, the stability and the reliability of the film expansion technology are greatly improved, the service life of the dry pump is prolonged, a film layer with higher quality is provided for manufacturing of semiconductor devices, and the yield and the controllability of the whole manufacturing process are improved.

Description

TECHNICAL FIELD

[0001] The utility model relates to the technical field of semiconductor manufacturing equipment, specifically relates to a reaction cavity gas exhaust system and filter device thereof. BACKGROUND

[0002] In the semiconductor manufacturing process, furnace tube membrane expansion technology is widely used in manufacturing various devices, such as transistors, solar cells, etc. In the membrane expansion process, it needs to meet the low pressure or vacuum condition, and needs to use the auxiliary equipment dry pump to extract the reaction chamber pressure, so that it reaches the vacuum or the required pressure of reaction, such as shown in the figure. Figure 1 And Figure 2

[0003] However, in the existing membrane expansion process, there are some challenges. One of them is that by-products will fall during the membrane expansion process, or there is a risk of falling tools during regular maintenance of the machine. The falling by-products or tools will enter the dry pump from the dry pump inlet to the dry pump inside, causing direct damage to the dry pump internal components and causing dry pump overload, resulting in pump damage; this can cause product quality yield loss, production abnormalities and equipment failure. SUMMARY

[0004] In view of the technical problem of pump damage caused by dry pump overload due to by-product or PM falling during the membrane expansion process in the prior art, the technical scheme provides a reaction cavity gas exhaust system and filter device thereof. Before the gas enters the dry pump, a physical barrier is provided, which can effectively intercept larger particle impurities (such as tools, screws, small particles, etc.) from the reaction chamber. After the impurities are intercepted, they cannot enter the dry pump inside, avoiding the problem of pump body jamming; thereby ensuring the service life of the dry pump and the reliability of the process, improving the service life of the dry pump, reducing product abnormalities and scrap rate, improving production efficiency and process controllability, and ensuring the service life of the dry pump; the above problems can be effectively solved.

[0005] The utility model discloses the following technical scheme realizes:

[0006] A filter device of a reaction cavity gas exhaust system, the filter device is a cylindrical structure, the top is closed, the bottom is provided with an opening communicated with the exhaust pipe, and a plurality of filter holes are arranged on the side wall; the outer wall of the bottom is integrally connected with a sealing joint part consistent with the shape of the inner wall of the exhaust pipe, and the sealing joint part is fixedly installed on the inner wall of the exhaust pipe.

[0007] Further, the top closed part is welded and fixed with the cylindrical structure, or is integrally formed, or is fixedly connected through threads; when the top closed part is welded and fixed with the cylindrical structure or is fixedly connected through threads, the joint or connection needs to be sealed.

[0008] ​Further, the filter holes are arranged in multiple rows and multiple columns and distributed in the middle and upper part of the cylindrical structure filter device.

[0009] Further, the filter holes are arranged in multiple rows and multiple columns and distributed in the middle and upper part of the cylindrical structure filter device.

[0010] Further, the filter holes are arranged in multiple rows and multiple columns and distributed in the middle and upper part of the cylindrical structure filter device.

[0011] Further, the filter holes are arranged in multiple rows and multiple columns and distributed in the middle and upper part of the cylindrical structure filter device.

[0012] Further, the filter holes are arranged in multiple rows and multiple columns and distributed in the middle and upper part of the cylindrical structure filter device.

[0013] Further, the filter holes are arranged in multiple rows and multiple columns and distributed in the middle and upper part of the cylindrical structure filter device.

[0014] A reaction cavity gas discharge system, comprising: a reaction chamber, the reaction chamber is connected with a dry pump through an exhaust pipe, a pressure control valve is arranged on the exhaust pipe; the filter device is arranged on the exhaust pipe between the pressure control valve and the dry pump. Advantages

[0015] Compared with the prior art, the reaction cavity gas discharge system and the filter device thereof have the following advantages:

[0016] In the technical solution, the filter device is arranged as a protective barrier before the gas enters the dry pump, and provides a physical barrier before the gas enters the dry pump, so that the larger particle impurities (such as tools, screws, and small particles) from the reaction chamber can be effectively intercepted; the impurities are intercepted before the inlet of the dry pump, so that the direct damage of the impurities to the internal components of the dry pump is avoided. After the impurities are intercepted, the impurities cannot enter the internal part of the dry pump, so that the problem of pump body jamming is avoided. The failure frequency of the dry pump is reduced, and the equipment maintenance cost is greatly reduced. At the same time, the problem of main machine stop caused by dry pump failure can be effectively avoided, the continuous operation of the equipment is ensured, and the production efficiency is improved. The non-scheduled downtime is reduced, the stable process condition is ensured, and the product yield is improved.

[0017] The sealing design at the top of the filter device prevents tools or other large foreign particles from falling from the top. The multiple filter holes uniformly distributed on the side wall have a pore size design that can effectively block larger particles while ensuring smooth gas flow. By placing the filter holes in the middle and upper part of the side wall, when foreign matter falls into the exhaust pipe, the foreign matter will fall to the upper side of the sealing adapter at the bottom, not blocking the filter holes and not affecting the flow of gas.

[0018] The filter device in the technical solution has a simple structure, strong compatibility, and high adaptability. The filter device is small in size and simple in structure, and is installed in the exhaust pipe between the pressure control valve and the dry pump without changing the original equipment layout. It is also easy to clean and maintain: the filter device is easy to disassemble, can quickly clean the particulate matter, and reduces the equipment downtime.

[0019] The technical solution can solve the problem of dry pump overload caused by the falling of by-products or PM generated by the film expansion process in the prior art, greatly improve the stability and reliability of the film expansion process, prolong the service life of the dry pump, provide higher quality film layers for the manufacture of semiconductor devices, and improve the yield and controllability of the entire process. BRIEF DESCRIPTION OF DRAWINGS

[0020] Figure 1 The figure is the architecture diagram of the existing gas exhaust system of the reaction chamber in the background art.

[0021] Figure 2 The figure is the gas flow direction diagram in the existing exhaust pipe in the background art.

[0022] Figure 3 The figure is the overall structure schematic diagram of embodiment 1.

[0023] Figure 4 The figure is the gas flow direction diagram in the exhaust pipe after the filter device is used in embodiment 1.

[0024] Figure 5 The figure is the overall structure schematic diagram of embodiment 2.

[0025] Figure 6 The figure is the three-dimensional diagram of embodiment 2.

[0026] Figure 7 The figure is the gas simulation flow direction diagram of embodiment 2.

[0027] The marks in the figure are: 1-reaction chamber, 2-exhaust pipe, 3-pressure control valve, 4-filter device, 41-top closed part, 42-sealing adapter, 43-filter hole, 44-flange interface, 5-dry pump. DETAILED DESCRIPTION

[0028] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. The described embodiments are only some embodiments of the present utility model, and not all embodiments. Various modifications and improvements to the technical solutions of the present utility model made by those skilled in the art without departing from the design concept of the present utility model should fall within the protection scope of the present utility model. Example 1

[0029] like Figures 3-4 As shown, a reaction chamber gas emission system includes: a reaction chamber 1, which is connected to a dry pump 5 via an exhaust pipe 2. A pressure control valve 3 is installed on the exhaust pipe 2. A filter device 4 is installed on the exhaust pipe 2 between the pressure control valve 3 and the dry pump 5 (in this embodiment, the filter device is installed at the connection between the exhaust pipe 2 and the dry pump 5).

[0030] The filter device 4 can be a conventional filter screen or other filter device with filter holes. Multiple filter holes are evenly distributed on the filter screen or filter device, and the diameter of the filter holes is less than or equal to the outer diameter of the by-product.

[0031] Alternatively, the filter device 4 may also be a cylindrical pipe filter device as described in Example 2. Example 2

[0032] A filtration device for a reaction chamber gas exhaust system is applied to the reaction chamber gas exhaust system described in Example 1, as well as the exhaust pipe or other vertically arranged pipes described in Example 1; used to filter gases or liquids flowing in the same direction.

[0033] The filter device 4 has a cylindrical structure, which can be either round or polygonal. In this invention, the cylindrical structure is 6 inches (approximately 153 mm) in diameter and 370 mm in height. The main body is made of a high-temperature resistant and corrosion-resistant metal material (such as SS316 stainless steel) to withstand the high-temperature and highly corrosive gases in the reaction chamber process environment. The surface of the filter device is polished and coated with a high-temperature resistant and corrosion-resistant coating to reduce particle adhesion and facilitate cleaning and maintenance.

[0034] The top of the columnar structure is closed to prevent foreign objects from entering from the top. The top closed part 41 is welded to the columnar structure, integrally formed, or connected by threads. When the top closed part 41 is welded to the columnar structure or connected by threads, the joint or connection point must be sealed and a sealing test must be performed. In this embodiment, it is integrally formed, resulting in better overall performance.

[0035] The bottom of the cylindrical structure is provided with an opening communicated with the exhaust pipe 2, and the outer wall of the bottom is integrally connected with a sealing adapter 42 consistent with the shape of the inner wall of the exhaust pipe 2, which is fixedly installed on the inner wall of the exhaust pipe 2. The sealing adapter 42 is connected to the exhaust pipe 2 between the pressure control valve 3 and the dry pump 5 through a flange interface 44 or a threaded interface, and a sealing washer is arranged between the interface of the sealing adapter 44 and the exhaust pipe 2.

[0036] A plurality of filter holes 43 are arranged on the side wall of the cylindrical structure; the filter holes 43 are arranged in multiple rows and columns and distributed in the middle and upper part of the cylindrical structure filter device. In this embodiment, the diameter of the filter holes 43 is 20 mm, and 60 filter holes are uniformly distributed in the middle and upper part of the cylindrical structure filter device. The gas can pass smoothly, and the foreign matter can be filtered. The filter holes 43 are processed by CNC machining and laser drilling process to ensure the accuracy and uniformity of the hole diameter.

[0037] When the filter device of the cylindrical structure is installed, the top is directed to the reaction chamber, and the bottom is directed to the dry pump; during installation, sealing treatment is required between the sealing adapter and the inner wall of the exhaust pipe.

[0038] S1. Disassemble the existing pipeline: disconnect the pipeline between the pressure control valve and the dry pump.

[0039] S2. Install the filter device: insert the filter device into the connecting pipeline to ensure that the device is tightly matched with the interfaces of the pressure control valve and the dry pump.

[0040] S3. Fix and seal: fix by screw or flange fastener, and seal with sealing washer.

[0041] S4. Detection and debugging: after installation, perform air tightness test to ensure that there is no gas leakage and verify the gas flow performance of the filter device.

[0042] 1. Matters needing attention during operation

[0043] Ensure that there is no obvious resistance when the gas passes through the filter device to avoid affecting the process efficiency.

[0044] Periodically monitor the running state of the dry pump to ensure its stable operation without foreign matter interference.

[0045] 2. Maintenance process

[0046] Regular cleaning: after shutdown, disassemble the filter device, and use compressed air to remove particles or deposits on the inner side wall of the device. Use cleaning liquid (such as isopropyl alcohol or special solvent) to thoroughly clean the surface of the device to prevent particles from blocking the holes.

[0047] Abnormality handling: If the pump operates abnormally, check if there is foreign matter accumulation in the device. If necessary, replace the new filter device to ensure gas flow performance.

[0048] 3. Spare parts management:

[0049] Establish a spare parts inventory for the filter device to ensure quick replacement in case of failure or maintenance, reducing downtime.

[0050] 4. Safety and reliability testing:

[0051] (1) Initial verification

[0052] Filtering effect test:

[0053] Simulate dropping screws, particles and other foreign matter to verify whether the device can completely intercept foreign matter and ensure the safety of the dry pump.

[0054] Gas flow test:

[0055] Test the effect of the device on gas flow rate and exhaust pressure to ensure that it does not interfere with the original process performance.

[0056] (2) Long-term verification

[0057] Run in actual production environment for a certain period of time, observe the durability and particle filtering effect of the filter device. Record the running state and failure rate of the dry pump, and evaluate the impact of the device on the service life of the equipment.

[0058] 5. Risk prevention measures:

[0059] (1) Pressure overload risk

[0060] Ensure that the pore size distribution and number of the filter device do not cause excessive back pressure on the exhaust system. The pore size design can be adjusted through simulation analysis or actual test.

[0061] (2) Particle accumulation risk

[0062] Regularly check if the filter device is blocked due to particle accumulation to avoid affecting gas exhaust efficiency.

[0063] (3) Sealing problem

[0064] Use high-quality sealing gaskets or sealing materials at the device interface, and regularly check the sealing condition to avoid affecting equipment operation due to gas leakage.

[0065] 6. Application promotion and optimization improvement:

[0066] (1) Promotion plan

[0067] Promote the technology in the same type of reaction chamber equipment, optimize the design of the filter device under different process conditions (such as changing the pore size, material or structure).

[0068] (2) Performance optimization

[0069] Adjust the opening density and pore size according to the characteristics of different by-products (particle size, quantity) to improve the filtering efficiency. Use high-temperature-resistant and corrosion-resistant coating to further improve the service life of the device.

[0070] Implementation effect

[0071] Through the above specific implementation scheme, the filter device can achieve the following effects in the actual production environment:

[0072] The foreign matter interception rate reaches 100%, effectively protecting the dry pump operation; the dry pump failure rate decreases by more than 90%, the equipment operation life is extended by 30%; the unplanned downtime is significantly reduced, the main machine production efficiency is improved by more than 20%; the maintenance cost is reduced by 50%, and the equipment operation is more reliable.

Claims

1. A filtration device for a reaction chamber gas exhaust system, characterized in that: The filter device (4) is a cylindrical structure with a closed top and an opening at the bottom that communicates with the exhaust pipe (2). Multiple filter holes (43) are provided on the side wall. The outer wall of the bottom is integrally connected with a sealing connection part (42) that is consistent with the shape of the inner wall of the exhaust pipe (2). The sealing connection part is fixedly installed on the inner wall of the exhaust pipe.

2. The filtration device for a reaction chamber gas emission system according to claim 1, characterized in that: The top closed part (41) of the column structure is welded to the column structure, or integrally formed, or fixed by thread; when the top closed part (41) is welded to the column structure or fixed by thread, the joint or connection needs to be sealed.

3. The filtration device for a reaction chamber gas emission system according to claim 1, characterized in that: The filter holes (43) are arranged in multiple rows and columns, distributed in the upper middle part of the columnar structure filter device.

4. A filtration device for a reaction chamber gas exhaust system according to claim 1 or 3, characterized in that: The diameter of the filter pores is less than or equal to the outer diameter of the by-product.

5. The filtration device for a reaction chamber gas emission system according to claim 4, characterized in that: The diameter of the filter hole (43) is 20 mm, and multiple filter holes (43) are evenly distributed in the upper middle part of the columnar structure filter device (4).

6. The filtration device for a reaction chamber gas emission system according to claim 1, characterized in that: The main body of the filter device (4) is made of high temperature and corrosion resistant metal material, and the surface is polished and coated with a high temperature and corrosion resistant coating.

7. A filtration device for a reaction chamber gas exhaust system according to any one of claims 1 to 3 or 5 to 6, characterized in that: When the columnar filter device (4) is installed, the top faces the reaction chamber and the bottom faces the dry pump; during installation, the sealing connection (42) and the inner wall of the exhaust pipe need to be sealed.

8. The filtration device for a reaction chamber gas emission system according to claim 6, characterized in that: The sealing connection (42) is connected to the exhaust pipe (2) between the pressure control valve (3) and the dry pump (5) through a flange interface (44) or a threaded interface. A sealing gasket is provided between the interface of the sealing connection (42) and the inner wall of the exhaust pipe (2).

9. A reaction chamber gas exhaust system, comprising: The reaction chamber (1) is connected to the dry pump (5) through the exhaust pipe (2), and the exhaust pipe (2) is provided with a pressure control valve (3); characterized in that: the exhaust pipe (2) is provided with a filter device (4) as described in any one of claims 1-8 between the pressure control valve (3) and the dry pump (5).

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