Target material conveying device and RPD vacuum coating equipment

Abstract

The utility model discloses a target material conveying device and RPD vacuum coating equipment, and the target material conveying device comprises a target supply mechanism which is internally provided with a closed chamber and a first target inlet channel which is positioned below the closed chamber and is communicated with the closed chamber, and an inlet and an outlet of the first target inlet channel are both of a chamfer structure; the target supply mechanism is used for feeding a target material into a hearth of the RPD vacuum coating equipment; the first target ejecting mechanism is used for pushing the target material at the feeding opening to the target supplying mechanism along the first target feeding channel in a matched mode; a supporting block is arranged at the bottom of the closed chamber corresponding to the first target inlet channel in a matched manner, and the supporting block is located on the side, facing the opposite rotation direction of the target, of the first target inlet channel; and the supporting block is used for lifting the target material to a preset height. According to the utility model, the bottom surface of the target material to be blanked is ensured to be higher than the jacking end of the first target jacking mechanism through the supporting block, so that the target material is prevented from being blocked during blanking, the coating efficiency and the coating effect of the whole machine are ensured, and the time and the labor cost are reduced.

Description

TECHNICAL FIELD

[0001] The utility model relates to a semiconductor device technical field especially relates to a target material conveying device and RPD vacuum coating equipment. BACKGROUND

[0002] With the continuous development of photovoltaic industry, the quality requirement of coated glass and coated silicon wafer is higher and higher, and the use of RPD vacuum coating equipment is more and more common. Among them, RPD vacuum coating needs to provide coating material by continuously consuming target material, so the target material conveying mechanism (TSS mechanism) needs to work for a long time to provide target material for the hearth of RPD vacuum coating equipment.

[0003] However, the existing target material conveying mechanism has poor stability when sending target material into the hearth of RPD vacuum coating equipment or returning target material to the feed port, and cannot quickly center the target material. Once the target material conveying mechanism is misoperated due to manual adjustment, some processes need to frequently replace different target materials, and after a long time, human error occurs, sensor detection mechanism error occurs, and other reasons cause the target material to be stuck in the cavity or the target material that needs to be discharged to be unloaded, which will cause the target material to be stuck in the target material conveying mechanism, and only the machine can be stopped or the target material conveying mechanism can be disassembled for maintenance. This not only seriously affects the coating efficiency and coating effect of the whole machine, but also greatly increases the time and labor cost. UTILITY MODEL CONTENT

[0004] The utility model provides a kind of target material conveying device and RPD vacuum coating equipment, for solving the problem of target material in prior art in target material conveying device when discharging, easy to jam, seriously affect the coating efficiency and coating effect of the whole machine, greatly increase time and labor cost.

[0005] The technical scheme of the utility model is a kind of target material conveying device, comprising:

[0006] target supply mechanism, the target supply mechanism is equipped with airtight chamber and first target inlet channel located below and communicated with the airtight chamber, the import and export of the first target inlet channel are all chamfered structure;The target supply mechanism is used to send target material into the hearth of RPD vacuum coating equipment;

[0007] first target mechanism, the first target mechanism is used to push the target material of feed port along the first target inlet channel to the target supply mechanism;

[0008] The bottom of the airtight chamber is provided with a support block corresponding to the first target inlet channel, and the support block is located on the side of the first target inlet channel opposite to the rotating direction of the target material;The support block is used to lift the target material to a predetermined height.

[0009] Further, the support block is provided with a matched arc-shaped notch on the side close to the first target inlet channel, and the cross-sectional shape of the arc-shaped notch is matched with the cross-sectional shape of the first target inlet channel.

[0010] Further, the top opening edge of the arc-shaped notch is provided as a chamfer structure.

[0011] Further, the height of the support block gradually increases along the rotation direction of the target material until a constant height value is reached and remains unchanged; the other side of the support block away from the first target inlet channel is flush with the bottom of the sealed chamber.

[0012] Further, the inlet and outlet of the first target inlet channel are both chamfered structures.

[0013] Further, the target supply mechanism further comprises a first base provided with the sealed chamber, and a target supply turntable is rotationally connected in the sealed chamber, and a plurality of target material sleeves for placing target materials are provided along the circumferential direction of the target supply turntable;

[0014] The bottom of the sealed chamber is matched with the lifting end of the first target lifting mechanism and is provided with a first through hole, and the bottom of the first base is matched with the lifting end of the first target lifting mechanism and is sequentially provided with a first guide flange and a guide pressing plate, and the first guide flange and the guide pressing plate are both matched with the lifting end of the first target lifting mechanism and are provided with a second through hole;

[0015] Among them, the first target inlet channel is composed of the first through hole, the second through hole and the corresponding target material sleeve.

[0016] Further, the first target inlet channel between the first guide flange and the guide pressing plate is provided with a first plug valve, and the first plug valve is used to isolate the outside air from entering the sealed chamber.

[0017] Further, the first target inlet channel is vertically arranged, the sizes of the bottom opening of the first through hole, the second through hole and the target material sleeve are all greater than the sizes of the top opening, and the bottom opening and the top opening of the first through hole, the second through hole and the target material sleeve are all provided as chamfered structures.

[0018] Further, the target supply mechanism is also provided with a second target inlet channel, and the inlet and outlet of the second target inlet channel are both chamfered structures, and the second target inlet channel is arranged in a staggered manner with the first target inlet channel.

[0019] The second target lifting mechanism is matched with the target material in the target supply turntable and is used to lift the target material into the second target inlet channel to push it to the hearth.

[0020] Further, the bottom of the closed chamber is provided with a third through hole corresponding to the lifting end of the second target mechanism;

[0021] The top of the first base is sequentially provided with a second guide flange and a bottom plate of the furnace corresponding to the lifting end of the second target mechanism, and the second guide flange and the bottom plate are both provided with a fourth through hole corresponding to the lifting end of the second target mechanism;

[0022] The third through hole, the fourth through hole and the target sleeve corresponding thereto constitute the second target inlet channel.

[0023] Further, the second target inlet channel between the second guide flange and the bottom plate of the furnace is provided with a second plug valve for isolating the gas in the target supply mechanism from flowing into the furnace.

[0024] Further, the second target inlet channel is vertically arranged, the third through hole, the fourth through hole and the bottom opening of the target sleeve constituting the second target inlet channel are all larger in size than the top opening thereof, and the third through hole, the fourth through hole and the bottom opening and the top opening of the target sleeve are all provided with chamfered structures.

[0025] The utility model also provides a kind of RPD vacuum coating equipment, and the RPD vacuum coating equipment includes above-mentioned target material conveying device.

[0026] Compared with prior art, the utility model at least has following beneficial effects:

[0027] 1, the utility model discloses a supporting block is lifted to predetermined height to the target material to be discharged, and the target material bottom surface to be discharged is higher than the lifting end of first target mechanism, so as to avoid the situation that target material is stuck when discharging, so as to guarantee the coating efficiency and coating effect of complete machine, reduce time and labor cost.

[0028] 2, the utility model can also correct the position of target material in first target inlet channel by the chamfered structure of the import and export of first target inlet channel, guarantee that target material is always in the vertical direction center position of first target inlet channel, avoid the situation that target material is stuck or chuck when feeding, so as to guarantee the coating efficiency and coating effect of complete machine, reduce time and labor cost. BRIEF DESCRIPTION OF DRAWINGS

[0029] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention pertains; the terminology used herein in the specification is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention; the terms "comprising" and "having," and any variations thereof, in the specification, claims, and accompanying drawings of this invention are intended to cover non-exclusive inclusion. The terms "first," "second," etc., in the specification, claims, or accompanying drawings of this invention are used to distinguish different objects and not to describe a particular order.

[0030] To more clearly illustrate the technical solutions in the embodiments of this utility model, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this utility model. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0031] Figure 1 This is a partial cross-sectional view of a target material conveying device proposed in this utility model;

[0032] Figure 2 This is a partial cross-sectional view of another target material conveying device proposed in this utility model;

[0033] Figure 3 This is an exploded view of the target material conveying device proposed in this utility model;

[0034] Figure 4 This is a partial cross-sectional view of the target supply mechanism proposed in this utility model;

[0035] Figure 5 This is a schematic diagram of the support block proposed in this utility model;

[0036] Figure 6 This is a schematic diagram of the target material conveying device proposed in this utility model;

[0037] Figure 7 for Figure 6 A cross-sectional view along the AA direction.

[0038] Figure label:

[0039] 10, target supply mechanism; 101, first target inlet channel; 102, first base; 103, closed chamber; 104, target supply turntable; 105, target material sleeve; 106, first through hole; 107, first guide flange; 108, guide pressing plate; 109, second through hole; 110, support block; 1101, arc-shaped notch; 111, first plug valve; 112, second target inlet channel; 113, third through hole; 114, second guide flange; 115, bottom plate; 116, fourth through hole; 117, second plug valve; 118, rotary motor; 119, cavity cover; 120, observation window; 121, sensor;

[0040] 20, first target lifting mechanism; 201, second base; 202, guide rail; 203, sliding block; 204, first lifting rod; 205, first lifting motor;

[0041] 30, second target lifting mechanism; 301, second lifting motor; 302, second lifting rod;

[0042] 40, target material. DETAILED DESCRIPTION

[0043] In order to make the technical problems, technical schemes and beneficial effects of the present application more clearly understood, the present application will be further described in detail below with reference to the drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present application and do not limit the present application. Therefore, the feature mentioned in the specification is used to explain one feature of one embodiment of the present application, but it does not mean that each embodiment of the present application must have the explained feature. In addition, it should be noted that the specification describes many features. Although some features can be combined together to show possible system designs, these features can also be used in other combinations that are not explicitly described. Therefore, unless otherwise stated, the described combination is not intended to be limiting.

[0044] The principles and structures of the present application will be described in detail below with reference to the drawings and embodiments.

[0045] In some embodiments, as shown in Figs. Figures 1-2 and 4, the present application provides a target material conveying device, comprising:

[0046] The target supply mechanism 10 is provided with a closed chamber 103 and a first target inlet channel 101 below the closed chamber 103 and communicating with the closed chamber 103; the target supply mechanism 10 is used to send the target material 40 into the furnace (not shown, the same throughout) of the RPD vacuum coating equipment;

[0047] The first target pushing mechanism 20 is used to push the target material 40 in the feeding port along the first target feeding channel 101 to the target supply mechanism 10.

[0048] The bottom of the sealed chamber 103 is provided with a support block 110 corresponding to the first target feeding channel 101, and the support block 110 is located on the side of the first target feeding channel 101 facing the opposite rotation direction of the target material 40. The support block 110 is used to lift the target material 40 to a predetermined height.

[0049] In this way, when the first target pushing mechanism 20 pushes the target material 40 along the first target feeding channel 101 upward into the sealed chamber 103, and then the target material 40 moves to the preset position of the target material 40 entering the furnace of the RPD vacuum coating equipment along the rotation direction of the target material 40 (the rotation direction in the embodiment is preferably clockwise, and the opposite rotation direction is counterclockwise, the same below), if some unexpected situation occurs during the process, resulting in the need to withdraw the target material in the sealed chamber 103 to the feeding port (equivalent to discharging, the same below), at this time, the target material 40 moves to the top opening of the first target feeding channel 101 along the rotation direction of the target material 40. However, due to some unexpected situations, it cannot be guaranteed that the lifting end of the first target pushing mechanism 20 is always lower than or flush with the bottom of the sealed chamber 103 during the discharging process of the target material. If the lifting end of the first target pushing mechanism 20 is higher than the bottom of the sealed chamber 103, when the target material 40 moves to the support block 110 in the sealed chamber 103 along the rotation direction, the lifting end of the first target pushing mechanism 20 will interfere with the discharging process of the target material 40, causing the target material 40 to be stuck, seriously affecting the coating efficiency and coating effect of the whole machine, and greatly increasing the time and labor cost.

[0050] Therefore, in order to solve the problem that the lifting end of the first target pushing mechanism 20 interferes with the discharging process of the target material 40, the support block 110 in the embodiment lifts the target material 40 passing through it to a predetermined height, so that the bottom surface of the target material 40 to be discharged is higher than the lifting end of the first target pushing mechanism 20, thereby avoiding the situation that the target material 40 is stuck during discharging, ensuring the coating efficiency and coating effect of the whole machine, and reducing the time and labor cost.

[0051] In some embodiments, in order to ensure that the target material 40 passing through the support block 110 can be more stably withdrawn to the first target feeding channel 101, as shown in Figures 4-5 The side of the support block 110 close to the first target feeding channel 101 is provided with a matching arc-shaped notch 1101, and the cross-sectional shape of the arc-shaped notch 1101 is matched with the cross-sectional shape of the first target feeding channel 101.

[0052] It can be understood that, as Figure 7As shown, the side of the support block 110 close to the first target inlet channel 101 corresponds to the side of the support block 110 facing the rotating direction of the target material 40. The arc-shaped notch 1101 is located above the inner bottom wall of the closed chamber 103.

[0053] Therefore, the embodiment can avoid the chucking phenomenon of the target supply disc 104 by lifting the target material 40 before the arc-shaped notch 1101 by a predetermined height through the support block 110, so that the bottom surface of the target material 40 is higher than the lifting end of the first target lifting mechanism 20. At this time, the first target lifting mechanism 20 can avoid the chucking phenomenon of the target material 40 during the process of moving the target material 40 in the arc-shaped notch 1101 back to the feeding port along the first target inlet channel 101, thereby ensuring the film coating efficiency and film coating effect of the whole machine and reducing the time and labor cost.

[0054] In some embodiments, the top opening edge of the arc-shaped notch 1101 is provided as a chamfer structure. In this way, the target material 40 can be in the center of the arc-shaped notch 1101 when passing through the arc-shaped notch 1101, thereby smoothly moving down to the first target inlet channel 101, avoiding the situation of being stuck or chucked when the target material 40 is unloaded.

[0055] It should be noted that the arc-shaped notch 1101 of the embodiment is semicircular. When the target material 40 is unloaded, the arc-shaped notch 1101 can correspond to part of the first target inlet channel 101. Of course, when the target material 40 is in the loading process, the arc-shaped notch 1101 does not belong to part of the first target inlet channel 101.

[0056] In some embodiments, in order to lift the target material 40 before the arc-shaped notch 1101 by a predetermined height, the bottom surface of the target material 40 to be unloaded is higher than the lifting end of the first target lifting mechanism 20, as shown in Figure 4 As shown, the height of the support block 110 gradually increases along the rotating direction of the target material 40 until it reaches a constant height value and remains unchanged. The other side of the support block 110 away from the first target inlet channel 101 is flush with the bottom of the closed chamber 103.

[0057] In some embodiments, the inlet and outlet of the first target inlet channel 101 are chamfered structures.

[0058] In this way, when the first target lifting mechanism 20 pushes the target material 40 upward or moves the target material 40 downward along the first target inlet channel 101, because the target material 40 cannot be guaranteed to be completely centered with the middle part of the first target inlet channel 101, and the target material 40 will also have a slight deviation during the upward pushing process, therefore, when the target material 40 is not placed in the centered position (such as Figure 1When the target material 40 is not placed in the central position and the first target pushing mechanism 20 pushes the target material 40 from the feeding port to the inside of the closed chamber 103 upward, the chamfer structure will convert part of the lifting force of the first target pushing mechanism 20 into a force to push the target material 40 to move to the central position of the first target channel 101, that is, the target material 40 will move to the central position of the first target channel 101 in the chamfer direction, so as to complete the position correction of the target material 40; similarly, when the target material 40 is not placed in the central position and the first target pushing mechanism 20 pushes the target material 40 from the closed chamber 103 to the feeding port downward, at this time the target material 40 in the closed chamber 103 will rotate in the rotating direction, at this time the target material 40 will move to the supporting block 110 and be located above the top opening of the first target channel 101, and then be lifted by the top of the first target pushing mechanism 20 to prevent the target material 40 from being stuck or clamped when the target material 40 is unloaded because the bottom surface of the target material 40 is lower than the lifting end of the first target pushing mechanism 20; and when the target material 40 contacts the outlet of the first target channel 101, the chamfer structure of the first target pushing mechanism 20 will convert part of the descending force of the first target pushing mechanism 20 into a force to push the target material 40 to move to the central position of the first target channel 101, that is, the target material 40 will move to the central position of the first target channel 101 in the chamfer direction (the central position at this time is equivalent to the vertical center position, the same below), so as to complete the position correction of the target material 40.

[0059] Therefore, the position of the target material 40 in the first target channel 101 can be corrected by the chamfer structure of the inlet and outlet of the first target channel 101, so that the target material 40 is always in the vertical center position of the first target channel 101, thereby avoiding the situation that the target material 40 is stuck or clamped when being loaded or unloaded, so as to ensure the film coating efficiency and effect of the whole machine and reduce the time and labor cost.

[0060] In some specific embodiments, as shown in Figures 2-3 As shown, the target feeding mechanism 10 further comprises a first base 102 provided with the closed chamber 103, and a target feeding turntable 104 is rotationally connected in the closed chamber 103, and a plurality of target material sleeves 105 for placing the target material 40 are provided in the circumferential direction of the target feeding turntable 104;

[0061] A first through hole 106 is matched and provided at the bottom of the closed chamber 103 corresponding to the lifting end of the first target pushing mechanism 20, and a first guide flange 107 and a guide pressing plate 108 are sequentially provided at the bottom of the first base 102 corresponding to the lifting end of the first target pushing mechanism 20, and the first guide flange 107 and the guide pressing plate 108 are both matched with a second through hole 109 corresponding to the lifting end of the first target pushing mechanism 20;

[0062] The first through hole 106, the second through hole 109 and the corresponding target material sleeve 105 constitute the first target inlet channel 101. The second through hole 109, the first through hole 106 and the target material sleeve 105 are sequentially arranged along the upward direction of the first target mechanism 20.

[0063] It can be understood that when the target supply disc 104 in the sealed chamber 103 fails, the top of the first base 102 is concave downward to form a containing cavity for placing the target supply disc 104. The opening of the containing cavity is provided with a cavity cover 119. When the cavity cover 119 is sealed and covers the top of the first base 102, the containing cavity forms the sealed chamber 103, and the cavity cover 119 is provided with a through hole for the target material 40 to pass through corresponding to the second target inlet channel 112. The side of the first base 102 is provided with at least one observation window 120 for a user to observe the running state of the target material 40 in the target supply disc 104. The outer side wall of the guide pressing plate 108 is further provided with at least one sensor 121 for detecting whether the target material 40 reaches the entrance of the first target inlet channel 101. The target material sleeve 105 penetrates the target supply disc 104, and the target material sleeve 105 is a hollow structure and is provided with openings at the top and the bottom to facilitate the target material 40 to enter and exit.

[0064] It should be noted that the first base 102 is further provided with a rotating motor 118 corresponding to the bottom of the sealed chamber 103. The rotating end of the rotating motor 118 penetrates the bottom of the sealed chamber 103 and is connected with the target supply disc 104 to realize the rotation of the target supply disc 104. The support block 110 is located at the bottom of the sealed chamber 103 and corresponds to the side of the first through hole 106 facing the reverse rotation direction of the target supply disc 104. In this way, when the target material 40 is fed, the support block 110 does not work and does not hinder the feeding of the target material 40. Only when the target material 40 is discharged, the support block 110 will play a role.

[0065] It should be noted that the support block 110 is located below the target material sleeve 105, and the side of the support block 110 corresponding to the first through hole 106 is provided with an arc-shaped gap 1101 through which the target material 40 can pass. The arc-shaped gap 1101 is located above the first through hole 106, and the arc-shaped gap 1101 is arranged along the edge of the first through hole 106.

[0066] As Figure 6As shown, the first top target mechanism 20 comprises: a second base 201, one side of the second base 201 is provided with a guide rail 202 vertically distributed thereon, a sliding block 203 is slidably connected to the guide rail 202, and a first top rod 204 is fixedly connected to the sliding block 203 (and the top end of the first top rod 204 corresponds to the jacking end of the first top target mechanism 20); the other side of the second base 201 is provided with a first lifting motor 205, and the lifting end of the first lifting motor 205 is fixedly connected to the sliding block 203, so that the first lifting motor 205 drives the sliding block 203 to slide up and down on the guide rail 202, and then the sliding block 203 drives the first top rod 204 to lift in the first target inlet channel 101.

[0067] It can be understood that when the target supply mechanism 10 starts to operate, the control unit of the RPD vacuum coating equipment starts the rotating motor 118, and then the rotating motor 118 drives the target supply turntable 104 to rotate in the closed chamber 103, and then the control unit starts the first lifting motor 205 to drive the first top rod 204 to descend below the feeding port, waits for the corresponding target material 40 to enter the designated position of the feeding port, and then the first lifting motor 205 drives the first top rod 204 to rise, and the top of the first top rod 204 pushes the target material 40 on the feeding port to push the corresponding target material 40 upward to the first target inlet channel 101 and into the target material sleeve 105 of the target supply turntable 104 along the first target inlet channel 101. At this time, when the target material 40 enters the target material sleeve 105 along the first target inlet channel 101, the control unit controls the target supply turntable 104 to stop rotating; and when the target material 40 completely enters the current target material sleeve 105, the top end of the first top rod 204 is just flush with the bottom of the closed chamber 103, preventing affecting the rotation of the target supply turntable 104, and the control unit controls the target supply turntable 104 to rotate, so that the next target material sleeve 105 is arranged corresponding to the first through hole 106, and then the first lifting motor 205 drives the new target material 40 to enter the corresponding target material sleeve 105 again through the first top rod 204, thereby forming a cycle.

[0068] Therefore, when the first lifting motor 205 drives the first push rod 204 to push the target material 40 upward or downward along the first target feeding channel 101, because the target material 40 cannot be guaranteed to be completely aligned with the center of the first target feeding channel 101, and the target material 40 will also have a slight offset during the upward pushing process, when the target material 40 is not placed in the centered position, and the first push rod 204 pushes the target material 40 upward from the feed port to the target supply mechanism 10, it will cause the target material 40 to contact the inlet of the first target feeding channel 101. At this time, the chamfered structure will convert part of the upward force of the first push rod 204 into a force that pushes the target material 40 to move towards the center position of the first target feeding channel 101. The force of the chamfer will cause the target 40 to move along the chamfer direction to the center of the first target inlet channel 101, thereby completing the position correction of the target 40. Similarly, when the target 40 is not placed in the center position, and the first lifting motor 205 drives the first push rod 204 to lower the target 40 from the target supply mechanism 10 to the feed port, the target 40 will come into contact with the outlet of the first target inlet channel 101. At this time, the chamfer structure will convert part of the force of the first push rod 204 descending into the force that pushes the target 40 to the center position of the first target inlet channel 101, that is, the target 40 will move along the chamfer direction to the center of the first target inlet channel 101, thereby completing the position correction of the target 40.

[0069] Therefore, the target material 40 can be corrected in the first target inlet channel 101 by the chamfered structure of the inlet and outlet of the first target inlet channel 101, so as to ensure that the target material 40 is always in the vertical center position of the first target inlet channel 101, thereby preventing the target material 40 from getting stuck in the first target inlet channel 101, thus ensuring the coating efficiency and coating effect of the whole machine, and reducing time and labor costs.

[0070] In some embodiments, such as Figure 2 As shown, the target feeding mechanism 10 is also provided with a second target feeding channel 112. The inlet and outlet of the second target feeding channel 112 are both chamfered. The second target feeding channel 112 is offset from the first target feeding channel 101.

[0071] A second target-topping mechanism 30 is provided below the second target-inlet channel 112. The second target-topping mechanism 30 is used to match and push the target material 40 in the target-supply turntable 104 into the second target-inlet channel 112 so as to push it into the furnace.

[0072] It should be noted that the second target-mounting mechanism 30 includes a second lifting motor 301 and a second top rod 302 located at the lifting end of the second lifting motor 301 (and the top of the second top rod 302 is equivalent to the lifting end of the second target-mounting mechanism 30), so that the second lifting motor 301 drives the second top rod 302 to move up and down within the second target-entry channel 112.

[0073] In some specific embodiments, as shown in FIG. 1, the first base 102 is provided with a first lifting hole 106 corresponding to the lifting end of the first lifting mechanism 20. Figure 2 The bottom of the closed chamber 103 is provided with a third through hole 113 corresponding to the lifting end of the second lifting mechanism 30.

[0074] The top of the first base 102 is provided with a second guide flange 114 and a bottom plate 115 of the furnace in turn corresponding to the lifting end of the second lifting mechanism 30, and the second guide flange 114 and the bottom plate 115 are both provided with a fourth through hole 116 corresponding to the lifting end of the second lifting mechanism 30.

[0075] The third through hole 113, the fourth through hole 116 and the target sleeve 105 corresponding thereto constitute the second target inlet channel 112, and the third through hole 113, the target sleeve 105 and the fourth through hole 116 are arranged in the ascending direction of the second lifting mechanism 30 in turn.

[0076] It can be understood that when the control unit starts the first lifting motor 205 to drive the first lifting rod 204 to make the target material 40 enter the target sleeve 105 along the first target inlet channel 101, the control unit will control the target supply turntable 104 to stop rotating, and at the same time, the control unit will control the second lifting motor 301 to start, so that the second lifting motor 301 drives the second lifting rod 302 to push the target material 40 in the target sleeve 105 above the third through hole 113 upward to the second target inlet channel 112, and then to the furnace of the RPD vacuum coating equipment. At this time, the lifting frequency of the first lifting mechanism 20 and the second lifting mechanism 30 is the same, so as to prevent the lifting end of the first lifting mechanism 20 and the lifting end of the second lifting mechanism 30 from affecting the rotation of the target supply turntable 104. Of course, when the first lifting motor 205 drives the new target material 40 to enter the next target sleeve 105 above the first through hole 106 again through the first lifting rod 204, the second lifting motor 301 drives the target material 40 in the next target sleeve 105 above the third through hole 113 upward to the second target inlet channel 112 through the second lifting rod 302, so as to form a cycle.

[0077] It should be noted that, when the second lifting motor 301 drives the second top rod 302 to push the target material 40 upward along the second target inlet channel 112 or to draw the target material 40 downward, because the target material 40 cannot be guaranteed to be completely centered with the middle part of the second target inlet channel 112, and the target material 40 will also have a slight deviation in the process of being pushed upward, thus when the target material 40 is not placed in the centered position and the second top rod 302 pushes the target material 40 upward from the target supply turntable 104 to the furnace, the target material 40 will contact the inlet of the second target inlet channel 112, at this time the chamfer structure will convert part of the upward force of the second top rod 302 into a force to push the target material 40 to move to the middle position of the second target inlet channel 112, that is, the target material 40 will move to the centered position with the second target inlet channel 112 in the direction of the chamfer, thereby completing the position correction of the target material 40. Similarly, when the target material 40 is not placed in the centered position and the second top rod 302 draws the target material 40 downward from the furnace to the target supply turntable 104, the target material 40 will contact the outlet of the second target inlet channel 112, at this time the chamfer structure will convert part of the downward force of the second top rod 302 into a force to push the target material 40 to move to the middle position of the second target inlet channel 112, that is, the target material 40 will move to the centered position with the second target inlet channel 112 in the direction of the chamfer, thereby completing the position correction of the target material 40.

[0078] Therefore, the target material 40 can correct the position of the target material 40 in the second target inlet channel 112 through the chamfer structure of the second target inlet channel 112, so that the target material 40 is always in the vertical center position of the second target inlet channel 112 in the process of entering the furnace or retreating to the target supply turntable 104, thereby preventing the target material 40 from being stuck in the second target inlet channel 112, ensuring the film coating efficiency and effect of the whole machine, and reducing the time and labor costs.

[0079] It can be understood that, when the first target pushing mechanism 20 pushes the target material 40 of the feeding port along the first target inlet channel 101 to the target material sleeve 105 of the target supply turntable 104, then the target supply turntable 104 rotates clockwise to below the second target inlet channel 112, and then the second target pushing mechanism 30 pushes the target material below the second target inlet channel 112 along the second target inlet channel 112 to the furnace, so as to ensure that there is no target material 40 in the target material sleeve 105 below the second target inlet channel 112, thereby ensuring that there is no target material 40 passing through the support block 110 when the target supply turntable 104 rotates clockwise; when the target material 40 in the target supply turntable 104 needs to be retreated to the feeding port due to some unexpected circumstances, the operation of the second target pushing mechanism 30 needs to be stopped at this time, so that the target material 40 can pass below the second target inlet channel 112 smoothly and then move to the support block 110.

[0080] In some embodiments, as Figure 1As shown, the first target inlet channel 101 is a vertically arranged cylindrical structure. The diameter of the bottom opening of the first through hole 106, the second through hole 109 and the target sleeve 105 that make up the first target inlet channel 101 is larger than the diameter of its top opening. The bottom opening and top opening of the first through hole 106, the second through hole 109 and the target sleeve 105 are all set as chamfered structures.

[0081] Because the target 40 experiences a greater positional offset during its entry into the target feeding turntable 104 from the feed inlet, and a smaller positional offset when it returns to the feed inlet from the turntable 104, the diameters of the bottom openings of the first through hole 106, the second through hole 109, and the target sleeve 105 are all larger than the diameters of their top openings. Furthermore, at this point, the top opening of the target sleeve 105 corresponds to the top opening of the first target feeding channel 101, and the bottom opening of the second through hole 109 corresponds to the bottom opening of the first target feeding channel 101.

[0082] Furthermore, the target material 40 can be corrected in the first target inlet channel 101 by the chamfered structure of the bottom opening and top opening of the first through hole 106, the second through hole 109, and the target material sleeve 105. This ensures that the target material 40 is always in the vertical center position of the first target inlet channel 101 during the process of entering the target supply turntable 104 or returning to the feed port, thereby preventing the target material 40 from getting stuck in the first target inlet channel 101, thus ensuring the overall coating efficiency and coating effect of the machine, and reducing time and labor costs.

[0083] In some embodiments, such as Figure 1 As shown, the second target inlet channel 112 is a vertically arranged cylindrical structure. The diameter of the bottom opening of the third through hole 113, the fourth through hole 116 and the target sleeve 105 that make up the second target inlet channel 112 is larger than the diameter of its top opening. The bottom opening and top opening of the third through hole 113, the fourth through hole 116 and the target sleeve 105 are all set as chamfered structures.

[0084] Because the target material 40 experiences a greater positional offset during its entry into the furnace from the target feeding turntable 104, and a smaller positional offset when it returns to the turntable 104 from the furnace, the diameters of the bottom openings of the third through hole 113, the fourth through hole 116, and the target sleeve 105 are all larger than the diameter of their top openings. Furthermore, at this point, the bottom opening of the target sleeve 105 corresponds to the bottom opening of the second target inlet channel 112, and the top opening of the fourth through hole 116 corresponds to the top opening of the second target inlet channel 112.

[0085] The target material 40 can be corrected in position in the second target feeding channel 112 by the third through hole 113, the fourth through hole 116, and the chamfer structure of the bottom opening and the top opening of the target sleeve 105, so that the target material 40 is always in the vertical center position of the second target feeding channel 112 during entering the furnace or retreating to the target supply disc 104, thereby preventing the target material 40 from being stuck in the second target feeding channel 112, ensuring the film coating efficiency and film coating effect of the whole machine, and reducing the time and labor cost.

[0086] In some embodiments, as shown in FIG. 1, a first target feeding channel 101 between the first guide flange 107 and the guide pressing plate 108 is provided with a first plug valve 111 for isolating external air from entering the sealed chamber 103. Figure 1

[0087] A second target feeding channel 112 between the second guide flange 114 and the bottom plate 115 of the furnace is provided with a second plug valve 117 for isolating the gas in the target supply mechanism 10 from flowing into the furnace.

[0088] It should be noted that the sealed chamber 103 is also connected with a vacuum pumping device (not shown, the same throughout the text). Because the target material 40 in the feeding port needs to be sent to the target supply disc 104 in the sealed chamber 103, external air will inevitably enter the sealed chamber 103, at which time the control unit needs to start the vacuum pumping device to ensure the air tightness in the sealed chamber 103.

[0089] In other embodiments, to prevent external air from entering the furnace of the RPD vacuum coating equipment, the control unit can first open the first plug valve 111, close the second plug valve 117, and first fill the target material 40 in the target supply disc 104 through the first target feeding mechanism 20; then the control unit closes the first plug valve 111 and the second plug valve 117, starts the vacuum pumping device to ensure the air tightness in the sealed chamber 103; then opens the second plug valve 117, closes the first plug valve 111 and the vacuum pumping device, and sends the target material 40 in the target supply disc 104 into the furnace through the second target feeding mechanism 30, then opens the first plug valve 111, closes the second plug valve 117, and the first target feeding mechanism 20 fills the target material 40 in the target supply disc 104 to form a cycle.

[0090] ​In other embodiments (not shown in the figures), the first top target mechanism 20 can also be additionally provided with adjustable fixing structures and detection mechanisms, which can be understood as fixing structures that can adjust the position or angle of the first top rod 204, and detection mechanisms that can detect whether the first top rod 204 is accurately aligned with the first target inlet channel 101, and if the first top rod 204 is not accurately aligned with the first target inlet channel 101, the fixing structures can be controlled to adjust the position or angle of the first top rod 204 to ensure that the first top rod 204 can be accurately aligned with the vertical center position of the first target inlet channel 101, thereby achieving the best centering effect. Similarly, the second top target mechanism 30 can also be additionally provided with adjustable fixing structures and detection mechanisms, so that the fixing structures can adjust the position or angle of the second top rod 302, and the detection mechanisms can detect whether the second top rod 302 is accurately aligned with the second target inlet channel 112, and if the second top rod 302 is not accurately aligned with the second target inlet channel 112, the fixing structures can be controlled to adjust the position or angle of the second top rod 302 to ensure that the second top rod 302 can be accurately aligned with the vertical center position of the second target inlet channel 112, thereby achieving the best centering effect, thereby improving the working efficiency and stability of the RPD vacuum coating equipment.

[0091] In other embodiments (not shown in the figures), the first top rod 204, the second top rod 302 and the target material 40 can also be provided with positioning structures, i.e. specific structures or markings are designed on the first top rod 204, the second top rod 302 and the target material 40 to help positioning and centering during assembly or use. These positioning structures can include notches, protrusions, holes or other geometric shapes that match each other to ensure that the first top rod 204 can accurately align the target material 40 with the vertical center position of the first target inlet channel 101, and the second top rod 302 can accurately align the target material 40 with the vertical center position of the second target inlet channel 112, thereby not only improving the installation efficiency of the RPD vacuum coating equipment, but also ensuring the stability and accuracy during operation.

[0092] In some embodiments, the utility model also provides a kind of RPD vacuum coating equipment, and the RPD vacuum coating equipment includes the above-mentioned target material conveying device.

[0093] Obviously, the above-described embodiments are only a part of the embodiments of the present application, rather than all the embodiments, and the preferred embodiments of the present application are given in the drawings, but do not limit the patent scope of the present application. The present application can be realized in many different forms, and conversely, the purpose of providing these embodiments is to make the disclosure of the present application more thorough and comprehensive. Although the present application has been described in detail with reference to the foregoing embodiments, those skilled in the art can still modify the technical solutions recorded in the foregoing specific embodiments, or equivalently replace some of the technical features. Any equivalent structure made by using the content of the present application specification and drawings, directly or indirectly used in other related technical fields, is also within the patent protection scope of the present application.

Claims

1. A target material conveying device, characterized in that, include: The target supply mechanism (10) is provided with a sealed chamber (103) and a first target inlet channel (101) located below and communicating with the sealed chamber (103); the target supply mechanism (10) is used to feed the target material (40) into the furnace of the RPD vacuum coating equipment. The first top target mechanism (20) is used to match and push the target material (40) at the feed port along the first target feeding channel (101) to the target supply mechanism (10); The bottom of the sealed chamber (103) is provided with a support block (110) corresponding to the first target inlet channel (101), and the support block (110) is located on the side of the first target inlet channel (101) facing the target material (40) in the opposite rotation direction; the support block (110) is used to lift the target material (40) to a predetermined height.

2. The target material conveying device according to claim 1, characterized in that, The support block (110) has a matching arc-shaped notch (1101) on the side near the first target inlet channel (101), and the cross-sectional shape of the arc-shaped notch (1101) is adapted to the cross-sectional shape of the first target inlet channel (101).

3. The target material conveying device according to claim 2, characterized in that, The top opening edge of the arc-shaped notch (1101) is set with a chamfered structure.

4. The target material conveying device according to claim 1, characterized in that, The height of the support block (110) gradually increases along the rotation direction of the target material (40) until it reaches a constant height value and remains unchanged; the other side of the support block (110) away from the first target inlet channel (101) is flush with the bottom of the sealed chamber (103).

5. The target material conveying device according to claim 1, characterized in that, The inlet and outlet of the first target channel (101) are both chamfered.

6. The target material conveying device according to claim 1, characterized in that, The target supply mechanism (10) further includes: a first base (102) having the sealed chamber (103), a target supply turntable (104) being rotatably connected inside the sealed chamber (103), and a plurality of target sleeves (105) for placing target materials (40) being provided through the turntable (104) along its circumference. The bottom of the sealed chamber (103) is provided with a first through hole (106) corresponding to the lifting end of the first target mechanism (20). The bottom of the first base (102) is provided with a first guide flange (107) and a guide pressure plate (108) in sequence corresponding to the lifting end of the first target mechanism (20). The first guide flange (107) and the guide pressure plate (108) are both provided with a second through hole (109) corresponding to the lifting end of the first target mechanism (20). The first through hole (106), the second through hole (109), and the corresponding target sleeve (105) constitute the first target inlet channel (101).

7. The target material conveying device according to claim 6, characterized in that, The first target inlet channel (101) located between the first guide flange (107) and the guide pressure plate (108) is provided with a first slide gate valve (111), which is used to prevent outside air from entering the sealed chamber (103).

8. The target material conveying device according to claim 6 or 7, characterized in that, The first target inlet channel (101) is vertically arranged. The bottom openings of the first through hole (106), the second through hole (109) and the target sleeve (105) that make up the first target inlet channel (101) are all larger than their top openings. The bottom openings and top openings of the first through hole (106), the second through hole (109) and the target sleeve (105) are all set as chamfered structures.

9. The target material conveying device according to claim 6, characterized in that, The target feeding mechanism (10) is also provided with a second target inlet channel (112), the inlet and outlet of the second target inlet channel (112) are both chamfered, and the second target inlet channel (112) is offset from the first target inlet channel (101); A second target-topping mechanism (30) is provided below the second target-inlet channel (112). The second target-topping mechanism (30) is used to match and push the target material (40) in the target-supply turntable (104) into the second target-inlet channel (112) to push it into the furnace.

10. The target material conveying device according to claim 9, characterized in that, The bottom of the sealed chamber (103) is provided with a third through hole (113) corresponding to the lifting end of the second top target mechanism (30); The top of the first base (102) and the bottom plate (115) of the furnace are provided in sequence, corresponding to the lifting end of the second top target mechanism (30). The second guide flange (114) and the bottom plate (115) are provided with a fourth through hole (116) corresponding to the lifting end of the second top target mechanism (30). The third through hole (113), the fourth through hole (116), and the corresponding target sleeve (105) constitute the second target inlet channel (112).

11. The target material conveying device according to claim 10, characterized in that, The second target inlet channel (112) located between the second guide flange (114) and the bottom plate (115) of the furnace is provided with a second gate valve (117), which is used to prevent the gas in the target supply mechanism (10) from flowing into the furnace.

12. The target material conveying device according to claim 10 or 11, characterized in that, The second target inlet channel (112) is vertically arranged. The bottom openings of the third through hole (113), the fourth through hole (116) and the target sleeve (105) that make up the second target inlet channel (112) are all larger than their top openings. The bottom and top openings of the third through hole (113), the fourth through hole (116) and the target sleeve (105) are all set with chamfered structures.

13. An RPD vacuum coating equipment, characterized in that, The RPD vacuum coating equipment includes the target material conveying device as described in any one of claims 1-12.

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