Winding coating equipment

Abstract

The utility model provides winding coating equipment. The winding coating equipment comprises an unwinding chamber, wherein a base material unwinding device is arranged in the unwinding chamber; a base material winding device is arranged in the winding chamber; a coating drum and an evaporation device are arranged in the coating chamber; the base material winding device is used for conveying the base material released from the base material unwinding device to the base material winding device after winding through a film coating drum; the evaporation device comprises an evaporation boat for evaporating an evaporation material into evaporation gas to coat a base material wound around a coating drum, a low-temperature evaporation source, a liquid supplementing system and a lifting mechanism are adopted, it is guaranteed that the distance between the evaporation liquid level and the base material is consistent, and the evaporation stability and the film thickness uniformity are improved; the vacuum valve is adopted to control the flow-in rate of the evaporation material, so that raw material waste caused by vacuum breaking reaction during equipment failure or shutdown and cavity opening is avoided; shielding films are arranged on the two sides of the base material to prevent the edges of the base material from forming non-uniform film layers; winding paths are symmetrically arranged and can rotate forwards and backwards to thicken a film layer, so that the production efficiency is improved; an anti-adhesion plate is arranged to prevent the evaporation material from escaping, and the deposition amount of different positions is adjusted through an evaporation source cover plate.

Description

TECHNICAL FIELD

[0001] The utility model relates to photovoltaic cell coating equipment technical field, especially in kind of winding coating equipment. BACKGROUND

[0002] Vacuum winding coating is a kind of coating technology for the flexible substrate continuously moving in vacuum environment, and is widely used in packaging, optical film, display backboard, solar cell backboard and functional film technical field etc..To meet the higher performance coating requirements, such as higher transparency, lower defect rate and more stable production process etc., the industry continuously carries out technical innovation, such as improving evaporation source design to improve the evaporation deposition efficiency and evaporation uniformity of flexible substrate, developing new type flexible substrate to obtain better functional characteristics etc..

[0003] However, there are still some technical problems and challenges in the practical application of vacuum winding coating technology. For example, when the evaporation source is consumed, the evaporation source will cause the evaporation material liquid level to drop, thereby changing the distance between the evaporation material liquid level and the flexible substrate above, and further affecting the evaporation stability of the flexible substrate and the thickness uniformity of the film layer formed by the deposition of the flexible substrate surface, and reducing the evaporation effect of the evaporation source on the flexible substrate. At the same time, part of the vacuum winding coating equipment adopts the charging mode of stopping single liquid supplement and filling after the evaporation material in the evaporation source is consumed. This charging mode reduces the production efficiency of the equipment and cannot meet the needs of continuous production. In addition, when the vacuum winding coating equipment fails or stops opening, the evaporation material stored in the equipment for liquid supplement of the evaporation source will be oxidized and denatured due to the destruction of the internal vacuum environment, causing waste of evaporation material. UTILITY MODEL CONTENT

[0004] The utility model provides a kind of winding coating equipment and the photovoltaic coating equipment of application thereof, to solve the technical problems that the liquid level of the evaporation source of existing vacuum winding coating equipment is caused to drop due to evaporation process, thereby changing the distance between liquid level and substrate, and affecting coating effect.

[0005] To solve the above problems, the technical scheme adopted by the utility model is as follows:

[0006] The utility model provides a kind of winding coating equipment, comprising:

[0007] The unwinding chamber is provided with a substrate unwinding device therein.

[0008] The winding chamber is provided with a substrate winding device therein.

[0009] The coating chamber is provided with a coating drum and an evaporation device located below the coating drum therein.

[0010] A substrate winding device for winding a target substrate released from a substrate unwinding device around a plating drum and conveying the target substrate to a substrate winding device for winding the target substrate.

[0011] The evaporation device comprises:

[0012] An evaporation boat for evaporating a deposition material into a deposition gas to perform a plating operation on a target substrate around the plating drum above the evaporation boat.

[0013] A lifting mechanism for driving the evaporation boat to perform a lifting motion to adjust a distance between a liquid surface of the deposition material in the evaporation boat and a surface of the target substrate around the plating drum.

[0014] Further, the evaporation device further comprises:

[0015] A liquid storage tank for storing the deposition material.

[0016] A liquid supplement conduit connected between the liquid storage tank and the evaporation boat for guiding the deposition material from the liquid storage tank into the evaporation boat.

[0017] A vacuum valve provided on the liquid supplement conduit for regulating a flow rate of the deposition material passing through the liquid supplement conduit into the evaporation boat.

[0018] Further, the winding plating device further comprises:

[0019] A mask unwinding device provided in the plating chamber and located at one side of the plating drum.

[0020] A mask winding device provided in the plating chamber and located at the other side of the plating drum opposite to the mask unwinding device.

[0021] A mask winding device for winding a shielding film released from the mask unwinding device around the target substrate between the evaporation boat and the corresponding target substrate sides at the lower side of the plating drum and conveying the shielding film to the mask winding device for winding the shielding film.

[0022] Further, the winding plating device further comprises:

[0023] A shadow board provided at a gap between the evaporation boat and the plating drum and arranged around the evaporation boat.

[0024] Further, the winding plating device further comprises:

[0025] An evaporation source cover plate movably mounted on the inner side of the shadow board in a direction parallel to the axial direction of the plating drum for adjusting a size of a deposition passage between the inner side of the shadow board and the evaporation boat and the plating drum for conveying the deposition gas.

[0026] Further, the evaporation device further comprises:

[0027] An outer peripheral heater mounted on the outer side of the liquid storage tank.

[0028] A pressure stabilizing valve is arranged on the liquid storage tank.

[0029] Further, the evaporation device further comprises:

[0030] A lifting base is installed on the lifting mechanism and used for carrying the evaporation boat.

[0031] A boat heater is arranged in the lifting base and used for heating the evaporation boat.

[0032] Further, the winding and coating equipment further comprises:

[0033] At least one post-processing chamber is arranged on a path through which the winding device transports the target substrate between the coating chamber and the winding chamber, and is used for post-processing the target substrate after coating.

[0034] Preferably, the post-processing chamber comprises:

[0035] A first processing chamber, a second processing chamber and a third processing chamber are arranged in sequence on the path through which the winding device transports the target substrate between the coating chamber and the winding chamber.

[0036] A substrate cooling device is arranged in the first processing chamber and used for cooling the target substrate after coating.

[0037] A substrate heat treatment device is arranged in the second processing chamber and used for heat treating the target substrate.

[0038] A gas treatment device is arranged in the third processing chamber and used for gas treating the target substrate.

[0039] Preferably, the housing of the winding and coating equipment is in the shape of a cuboid, the winding chamber, the unwinding chamber and the coating chamber are arranged in the lower layer of the housing, the first processing chamber, the second processing chamber and the third processing chamber are arranged in the upper layer of the housing, and the unwinding chamber, the coating chamber, the first processing chamber, the second processing chamber, the third processing chamber and the winding chamber are arranged in sequence in the clockwise direction.

[0040] Preferably, the winding device comprises:

[0041] A first winding mechanism is arranged in the unwinding chamber and used for connecting the target substrate released from the substrate unwinding device.

[0042] A second winding mechanism is arranged in the unwinding chamber and comprises: a second guide assembly used for guiding the target substrate from the first winding mechanism to the coating drum; and a third guide assembly used for connecting the target substrate wound around the coating drum.

[0043] A third winding mechanism is arranged in the first processing chamber and used for connecting the target substrate wound around the second winding mechanism.

[0044] A fourth winding mechanism is arranged in the second processing chamber and used for connecting the target substrate wound around the third winding mechanism.

[0045] The fifth winding mechanism is arranged in the third processing chamber and is used for connecting the target base material wound by the fourth winding mechanism;

[0046] The sixth winding mechanism is arranged in the winding chamber and is used for guiding the target base material from the fifth winding mechanism to the base material winding device.

[0047] Preferably, the first winding mechanism, the second guide assembly, the third guide assembly, the third winding mechanism, the fourth winding mechanism, the fifth winding mechanism and the sixth winding mechanism all comprise a plurality of tension rollers for guiding and tensioning the target base material.

[0048] Preferably, in the third winding mechanism, the fourth winding mechanism and the fifth winding mechanism, the included angle between the line connecting the entry point of the target base material to the tension roller and the axis of the tension roller and the line connecting the exit point of the target base material from the tension roller and the axis of the tension roller is less than 45 degrees.

[0049] Further, the winding and coating equipment further comprises:

[0050] The ion cleaning device is arranged in the unwinding chamber and is used for providing an ion source to perform a cleaning operation on the target base material.

[0051] The cooling device is arranged in the coating drum.

[0052] Compared with the prior art, the winding and coating equipment has the following beneficial effects:

[0053] The evaporation device of the winding and coating equipment adopts a low-temperature evaporation source + a liquid supplementing system + a lifting mechanism, so that the distance between the evaporation liquid surface in the evaporation boat and the target base material is maintained substantially uniform, the evaporation stability, the film thickness uniformity and the evaporation efficiency are improved, the inflow rate of the evaporation boat by the evaporation material is controlled by the vacuum valve, the waste of raw materials caused by the reaction of the evaporation material due to the broken space when the equipment fails or stops and opens the cavity is avoided, the evaporation shielding film is wound on both sides of the target base material to shield the edges of the target base material, so that the uneven film layer is prevented from being formed on the edges of the target base material, the winding path adopts a symmetrical layout, the film layer is thickened by forward and reverse rotation, and the production efficiency is improved, the anti-sticking plate is arranged to prevent the evaporation material from escaping and polluting the surrounding cavity and the environment, the deposition amount of the target base material at different positions is adjusted by the evaporation source cover plate, the remaining evaporation material is blocked from continuing to deposit after the evaporation is completed, and the uneven film thickness is caused, the winding path is designed after the target base material is coated, so that the included angles in the processing chamber are all less than 45 degrees, and the problems such as defects and hidden cracks are reduced, three post-processing chambers are adopted, the crystal structure is improved, the film forming compactness and the oxidation resistance are improved. BRIEF DESCRIPTION OF DRAWINGS

[0054] In order to more clearly illustrate the technical scheme provided by the utility model, the utility model will be described in detail below in combination with embodiments and drawings. It should be understood that the embodiments described in the following specific embodiments and the drawings of the specification are only some embodiments of the utility model, and those skilled in the art can change these drawings under the concept of the utility model.

[0055] Figure 1 The structural schematic diagram of the embodiment of the winding coating equipment provided by the utility model is provided.

[0056] Figure 2 The structural schematic diagram of the evaporation device of the embodiment of the winding coating equipment provided by the utility model is provided.

[0057] In the drawings, the main marks are as follows:

[0058] 1, unwinding chamber, 11, base material unwinding device, 111, base material unwinding roller, 12, first winding mechanism, 121, first flattening assembly, 1211, first positioning roller, 1212, first movable swing arm, 1213, first movable roller, 122, first guide assembly, 1221, first guide roller, 2, coating chamber, 21, coating drum, 22, evaporation device, 221, evaporation boat, 222, lifting mechanism, 223, liquid storage tank, 224, liquid supplementing conduit, 225, vacuum valve, 226, peripheral heater, 227, pressure stabilizing valve, 228, lifting base, 229, boat body heater, 23, mask unwinding device, 231, mask unwinding roller, 24, mask winding device, 241, mask winding roller, 25, mask winding device, 251, fourth guide assembly, 2511, fourth guide roller, 252, fifth guide assembly, 2521, fifth guide roller, 26, anti-sticking plate, 27, evaporation source cover plate, 28, second winding mechanism, 281, second guide assembly, 2811, second guide roller, 2812, first flattening roller, 282, third guide assembly, 2821, third guide roller, 2822, second flattening roller, 3, first processing chamber, 31, third winding mechanism, 311, sixth guide assembly, 3111, sixth guide roller, 4, second processing chamber, 41, fourth winding mechanism, 411, seventh guide assembly, 4111, seventh guide roller, 5, third processing chamber, 51, fifth winding mechanism, 511, eighth guide assembly, 5111, eighth guide roller, 6, winding chamber, 61, base material winding device, 611, base material winding roller, 62, sixth winding mechanism, 621, ninth guide assembly, 6211, ninth guide roller, 622, second flattening assembly, 6221, second positioning roller, 6222, second movable swing arm, 6223, second movable roller, 7, target base material, 8, shielding film, 9, ion cleaning device. DETAILED DESCRIPTION

[0059] In order to make the technical problems, technical solutions and beneficial effects of the utility model clearer, the utility model will be further described in detail below in combination with the accompanying drawings, embodiments and examples. Figure 1 、 2 The utility model provides a winding coating equipment, comprising:

[0060] Please refer to Figure 1 、 2 The winding coating equipment comprises:

[0061] The winding coating equipment comprises:

[0062] The evaporation device 22 comprises:

[0063] The evaporation boat 221 is used for containing evaporation materials (not shown in the figure) and heating and evaporating the evaporation materials into evaporation gas, and the evaporation gas moves upward until contacting the target substrate 7 winding around the coating drum 21 above the evaporation boat 221, so as to perform a coating operation on the side of the target substrate 7 winding around the coating drum 21 above the evaporation boat 221 facing downward to the evaporation boat 221 below, and make the side deposit a coating layer;

[0064] The lifting mechanism 222 is used for driving the evaporation boat 221 to move up and down below the coating drum 21, so as to adjust the distance between the liquid surface of the evaporation materials in the molten state in the evaporation boat 221 and the surface of the target substrate 7 winding around the coating drum 21, so that the winding coating equipment can be applicable to different types of target substrates 7 required by different types of evaporation materials, and the versatility, adaptability, use rate of the winding coating equipment are improved, and the production cost of the vacuum coating operation is reduced.

[0065] In the embodiment, the evaporation materials include but are not limited to gold, silver, copper, zinc, lithium, nickel, chromium, aluminum, titanium, nickel-chromium alloy, copper-tungsten alloy, diamond-like carbon, C 60 , lithium fluoride, magnesium fluoride and the like. The target substrate 7 includes but is not limited to aluminum foil, copper foil, PE, PP, PET, PI, PC and multilayer composite materials and the like.

[0066] In the embodiment, the evaporation boat 221 is a crucible type evaporation boat 221 made of metal material.

[0067] Please refer to Figure 1 、 2 In the embodiment, the evaporation device 22 further comprises:

[0068] a liquid storage tank 223 for storing the evaporation material, a liquid supplement conduit 224 connecting the liquid storage tank 223 and the evaporation boat 221 for guiding the evaporation material from the liquid storage tank 223 into the evaporation boat 221, and a vacuum valve 225 provided on the liquid supplement conduit 224 for adjusting and controlling the flow of the evaporation material through the liquid supplement conduit 224 into the evaporation boat 221, so as to maintain the distance between the liquid surface (evaporation surface) of the evaporation material in the molten state in the evaporation boat 221 and the surface of the target substrate 7 passing through the coating drum 21 within a desired range. Meanwhile, when the vacuum coating equipment fails or is stopped and opened, the vacuum valve 225 can be closed in time to isolate the liquid supplement conduit 224, so as to separate the internal space of the liquid storage tank 223 from the damaged vacuum environment of the vacuum coating equipment, thereby keeping the internal space of the liquid storage tank 223 in a vacuum state, avoiding the oxidation reaction and denaturation of the evaporation material stored in the equipment due to the damage of the vacuum environment in the vacuum coating equipment, and causing waste of the evaporation material.

[0069] Please refer to Figure 1 、 2 , as a preferred embodiment of the present embodiment, the evaporation device 22 further comprises:

[0070] a peripheral heater 226 installed on the outside of the liquid storage tank 223 for heating the tank body of the liquid storage tank 223, so as to maintain the temperature of the evaporation material stored in the liquid storage tank 223 within a certain range, and a pressure stabilizing valve 227 provided on the liquid storage tank 223 for maintaining the pressure of the internal space of the liquid storage tank 223 constant.

[0071] Please refer to Figure 1 、 2 , as a more preferred embodiment of the present embodiment, the evaporation device 22 further comprises a first gas flow meter (not shown in the figure) provided on the liquid storage tank 223 corresponding to the position of the pressure stabilizing valve 227 for real-time detection of the pressure value of the internal space of the liquid storage tank 223 to maintain the pressure constant in cooperation with the pressure stabilizing valve 227.

[0072] The liquid supplementing tank 223, the peripheral heater 226, the pressure stabilizing valve 227, the first gas flow meter, the liquid supplementing conduit 224 and the vacuum valve 225 form a liquid supplementing system of the evaporation device 22, so that the winding coating equipment provided by the utility model can adjust the real-time flow of the evaporation material supplementing into the evaporation boat 221 through the liquid supplementing system, and the lifting mechanism 222 drives the evaporation boat 221 to move up and down below the coating drum 21 to adjust the distance between the liquid surface of the evaporation material in the molten state in the evaporation boat 221 and the surface of the target substrate 7 winding through the coating drum 21, so that the distance between the liquid surface (evaporation surface) of the evaporation material in the molten state in the evaporation boat 221 and the surface of the target substrate 7 winding through the coating drum 21 above is maintained near the distance value required by the coating process of the target substrate 7, and the distance value only changes slightly and approaches to be unchanged. Therefore, the winding coating equipment provided by the utility model has the evaporation stability of the flexible target substrate 7 and the thickness uniformity of the coating layer deposited on the surface of the target substrate 7, and guarantees the evaporation effect and efficiency of the evaporation device 22 (evaporation source) on the flexible target substrate 7.

[0073] Please refer to Figure 1 、 2 , as the preferred embodiment of the present embodiment, the evaporation device 22 further comprises:

[0074] The lifting base 228 is installed on the lifting mechanism 222 and is used for installing and carrying the evaporation boat 221; the boat body heater 229 is arranged in the lifting base 228 and is used for heating the evaporation boat 221, so that the evaporation material contained in the evaporation boat 221 is in a molten state and evaporates and boils, so that the evaporation material is evaporated into evaporation gas for performing the coating operation on the target substrate 7 winding through the coating drum 21 above.

[0075] As a more preferred embodiment of the present embodiment, the lifting mechanism 222 can adopt a linear driving mechanism such as a synchronous pulley, a gear rack, a screw nut, a cylinder push rod and the like.

[0076] As a more preferred embodiment of the present embodiment, the boat body heater 229 adopts a low-temperature heater such as a heating resistance wire, so that the evaporation device 22 is used as a low-temperature evaporation source, thereby maintaining the liquid surface of the evaporation material in the evaporation boat 221 in a molten state to decrease at a lower rate, and further maintaining the distance between the liquid surface of the evaporation material in the evaporation boat 221 and the surface of the target substrate 7 winding through the coating drum 21 above to change at a smaller rate, so that the above-mentioned liquid supplementing system and the lifting mechanism 222 can timely cooperate to adjust the distance between the liquid surface in the evaporation boat 221 and the surface of the target substrate 7 winding through the coating drum 21 to maintain near the required distance value.

[0077] In other embodiments of the present embodiment, the boat body heater 229 can also adopt an induction heater, an electron beam heater, a strip-shaped linear heater and the like to heat the evaporation boat 221 (evaporation source).

[0078] As a preferred embodiment of the present application, the evaporation boat 221 has a thin thickness, and correspondingly, the evaporation cavity inside the evaporation boat 221 for containing the evaporation material and as the evaporation space region also has a shallow depth. When the evaporation material liquid in the evaporation boat 221 is supplemented by the above-mentioned liquid supplementing system, the excessive liquid will overflow from the top end of the evaporation cavity on the evaporation boat 221, so that the liquid level of the evaporation material in the evaporation boat 221 is maintained at a limited height. That is, the evaporation material liquid level fluctuation range of the coiled plating film equipment is the depth of the evaporation space region of the evaporation boat 221, so as to keep the distance between the liquid level and the surface of the target substrate 7 substantially unchanged during the evaporation process, thereby maintaining the evaporation rate stable.

[0079] As a preferred embodiment of the present application, the coiled plating film equipment further comprises: Figure 1

[0080] The mask unwinding device 23 is arranged in the plating film chamber 2 and located at one side of the plating film drum 21, the mask winding device 24 is arranged in the plating film chamber 2 and located at the other side of the plating film drum 21 opposite to the mask unwinding device 23, and the mask winding device 25 is used to wind the shielding film 8 released from the mask unwinding device 23 through the two side ends of the target substrate 7 in the width direction and between the evaporation boat 221 below the plating film drum 21, and then deliver the shielding film 8 to the mask winding device 24 for storage. That is, the above-mentioned mask unwinding device 23, mask winding device 24 and mask winding device 25 constitute the mask unwinding and winding system of the coiled plating film equipment in the plating film chamber 2.

[0081] As a preferred embodiment of the present application, the mask winding device 25 is used to wind the shielding film 8 released from the mask unwinding device 23 through the two side ends of the target substrate 7 in the width direction and between the evaporation boat 221 below the plating film drum 21, and then deliver the shielding film 8 to the mask winding device 24 for storage. Figure 1

[0082] Because the evaporation amount of the evaporation boat 221 on both sides of the two side ends corresponding to the width direction of the target substrate 7 is less than the evaporation amount of the evaporation boat 221 in the middle part, the conventional coiled plating film equipment is prone to cause the difference in evaporation amount between the two side ends corresponding to the evaporation boat 221 on both sides and the middle part corresponding to the evaporation boat 221 in the middle part of the target substrate 7 during the evaporation process, which leads to the thickness of the plating film layer formed on the surface of the target substrate 7 being smaller at the two side edges in the width direction of the target substrate 7 and larger in the middle part of the target substrate 7, resulting in the uneven thickness of the plating film layer.

[0083] ​​To avoid the above problems, the winding coating equipment provided by the utility model, through the mask winding and unwinding system, a pair of shielding films 8 are wound between the two side ends of the target substrate 7 corresponding to the width direction below the coating drum 21 and the evaporation boat 221, and the spacing of the winding path of the pair of shielding films 8 matches the width of the target substrate 7, so that the evaporation boat 221 performs the coating operation on the target substrate 7 wound above the coating drum 21, at the same time, the pair of shielding films 8 continuously wind and shield between the two side edges of the target substrate 7 in the width direction and the evaporation boat 221 (evaporation source) below, avoiding the situation that the coating layer formed by the evaporation of the surface of the target substrate 7 in the coating process has a thickness less than that of the middle part of the target substrate 7 at the two side edges in the width direction of the target substrate 7, so as to ensure the thickness uniformity of the coating layer and the coating effect.

[0084] As a preferred embodiment of the present embodiment, the winding coating equipment further comprises:

[0085] A film thickness detection device (not shown in the figure) is arranged in the coating chamber 2 and is used for detecting the thickness of the coating layer deposited on the surface of the target substrate 7 in real time while the evaporation boat 221 performs the coating operation on the target substrate 7 wound above the coating drum 21.

[0086] As a more preferred embodiment of the present embodiment, the film thickness detection device can adopt a crystal oscillator, an ellipsometer, an X-ray film thickness measuring instrument, an eddy current sensor, a CCD camera and the like.

[0087] Please refer to Figure 1 、 2 , as a preferred embodiment of the present embodiment, the winding coating equipment further comprises:

[0088] A shielding plate 26 is arranged at the gap between the evaporation boat 221 and the coating drum 21 and surrounds the evaporation boat 221, and is used for preventing the evaporation gas from escaping from the gap between the evaporation boat 221 and the coating drum 21 to pollute the surrounding chambers and the environment.

[0089] Please refer to Figure 1 、 2 , as a preferred embodiment of the present embodiment, the winding coating equipment further comprises:

[0090] An evaporation source cover plate 27 is movably arranged on the inner side of the shielding plate 26 in the direction parallel to the axis of the coating drum 21, and is used for adjusting the size of the evaporation channel for conveying the evaporation gas between the inner side of the shielding plate 26 and the evaporation boat 221 and the coating drum 21, so as to control the deposition amount of the evaporation material at different positions on the surface of the target substrate 7, and after the evaporation process is completed, the evaporation source cover plate 27 moves to completely shield between the evaporation boat 221 and the coating drum 21, so as to block the remaining evaporation gas from continuing to deposit on the surface of the coating layer, causing the film thickness of the coating layer to be uneven.

[0091] As a more preferred embodiment of the present application, a linear driving mechanism such as a synchronous belt wheel, a gear rack, a screw nut, a cylinder push rod, etc. is used to drive the evaporation source cover plate 27 to reciprocate linearly along the axial direction of the coating drum 21.

[0092] As a preferred embodiment of the present application, the winding coating equipment further comprises:

[0093] A cooling device (not shown in the figure) is arranged in the coating drum 21 to cool the target substrate 7 wound around the coating drum 21, so as to avoid the target substrate 7 from being damaged by the high-temperature evaporation gas and affecting the evaporation effect.

[0094] As a more preferred embodiment of the present application, a refrigerant flow channel is arranged in the coating drum 21, and the refrigerant and the heat medium are connected to the system pipeline of an external cold and hot water machine to respectively cool and reheat the target substrate 7, so as to keep the temperature of the target substrate 7 at -35℃ to 30℃.

[0095] Referring to Figure 1 In the present application, the winding coating equipment further comprises:

[0096] At least one post-processing chamber is arranged on the path of the target substrate 7 transported by the substrate winding device between the coating chamber 2 and the winding chamber 6, and is used to post-process the target substrate 7 after coating.

[0097] Referring to Figure 1 As a preferred embodiment of the present application, the post-processing chamber comprises: a first processing chamber 3, a second processing chamber 4, and a third processing chamber 5, which are arranged in sequence on the path of the target substrate 7 transported by the substrate winding device between the coating chamber 2 and the winding chamber 6; wherein the substrate cooling device (not shown in the figure) is arranged in the first processing chamber 3 to cool the target substrate 7 after coating; the substrate heat treatment device (not shown in the figure) is arranged in the second processing chamber 4 to heat treat the target substrate 7; and the gas treatment device (not shown in the figure) is arranged in the third processing chamber 5 to gas treat the target substrate 7. The substrate cooling device, the substrate heat treatment device, and the gas treatment device constitute a post-processing system of the winding coating equipment.

[0098] After the target substrate 7 released from the substrate unwinding device 11 is wound around the coating drum 21 and the evaporation is completed, the target substrate 7 after evaporation is guided into the first processing chamber 3, the second processing chamber 4, and the third processing chamber 5 in sequence, so that the target substrate 7 is cooled, heat treated, and gas treated in the first processing chamber 3, the second processing chamber 4, and the third processing chamber 5 in sequence, and finally the target substrate 7 after all post-processing is transported to the substrate winding device 61 for storage.

[0099] The post-processing system of the winding coating equipment comprises three post-processing chambers arranged in sequence on the path of the target substrate 7 transported by the substrate winding device between the coating chamber 2 and the winding chamber 6. After the target substrate 7 completes the evaporation process, the target substrate 7 is sequentially subjected to cooling, heat treatment and gas treatment in the three post-processing chambers. The first two cooling and heat treatment processes can control the temperature of the target substrate 7, thereby improving the crystal structure of the coating layer deposited on the surface of the target substrate 7, releasing the internal stress, and further improving the film forming density of the target substrate 7 to ensure the film forming quality. The last gas treatment process can realize the anti-oxidation and corrosion function of the outer surface of the coating layer.

[0100] As a preferred embodiment of the present embodiment, the gas treatment device can control the spraying of liquid such as H2O to the target substrate 7 and deliver gas to the surface of the coating layer of the target substrate 7. The gas that can be delivered includes but is not limited to CO2, N2, O2, H2, CF4, SiH4, NH3, He, Ar and the like.

[0101] As a more preferred embodiment of the present embodiment, the winding coating equipment further comprises:

[0102] The second gas flow meter (not shown in the figure), the third gas flow meter (not shown in the figure) and the fourth gas flow meter (not shown in the figure) are respectively arranged in the first processing chamber 3, the second processing chamber 4 and the third processing chamber 5, and are respectively used to detect the pressure value of the internal space of the first processing chamber 3, the second processing chamber 4 and the third processing chamber 5 in real time.

[0103] In other embodiments of the present embodiment, the post-processing chamber can also include one, two or more processing chambers for performing various post-processing operations on the target substrate 7 according to actual production needs.

[0104] Please refer to Figure 1 As a preferred embodiment of the present embodiment, the housing of the winding coating equipment is in the shape of a rectangular parallelepiped, the winding chamber 6, the unwinding chamber 1 and the coating chamber 2 are arranged in the lower layer of the rectangular parallelepiped-shaped cavity in the housing, the first processing chamber 3, the second processing chamber 4 and the third processing chamber 5 are arranged in the upper layer of the rectangular parallelepiped-shaped cavity in the housing, and the unwinding chamber 1, the coating chamber 2, the first processing chamber 3, the second processing chamber 4, the third processing chamber 5 and the winding chamber 6 are sequentially arranged in the clockwise direction and connected in sequence. That is, the winding chamber 6, the unwinding chamber 1 and the coating chamber 2 are sequentially arranged in the lower layer of the cavity in the housing from right to left, the first processing chamber 3, the second processing chamber 4 and the third processing chamber 5 are sequentially arranged in the upper layer of the cavity in the housing from left to right, and the first processing chamber 3 and the second processing chamber 4 are arranged above and below the coating chamber 2 respectively, and the third processing chamber 5 is arranged above and below the unwinding chamber 1 and the winding chamber 6 respectively.

[0105] Please refer to Figure 1As a more preferred embodiment of the present application, the chambers of the coater are sealed from each other, and the target substrate 7 is transferred between the chambers through a slot provided in the wall separating the adjacent chambers, so that a large process chamber in the housing of the coater is divided into a plurality of small chambers that are independent of each other, and each of the small chambers can be used to perform a different process step or maintain a different atmosphere.

[0106] Referring to Figure 1 In the present application, the substrate winding device comprises:

[0107] The first winding mechanism 12 is provided in the unwinding chamber 1 and is used to receive the target substrate 7 released from the substrate unwinding device 11. The second winding mechanism 28 is provided in the coating chamber 2 and comprises a second guide assembly 281 (equivalent to a feeding guide assembly) for guiding the target substrate 7 from the first winding mechanism 12 to the coating drum 21. The third guide assembly 282 (equivalent to a discharging guide assembly) is used to receive the target substrate 7 wound around the coating drum 21. The third winding mechanism 31 is provided in the first processing chamber 3 and is used to receive the target substrate 7 wound around the second winding mechanism 28. The fourth winding mechanism 41 is provided in the second processing chamber 4 and is used to receive the target substrate 7 wound around the third winding mechanism 31. The fifth winding mechanism 51 is provided in the third processing chamber 5 and is used to receive the target substrate 7 wound around the fourth winding mechanism 41. The sixth winding mechanism 62 is provided in the winding chamber 6 and is used to guide the target substrate 7 from the fifth winding mechanism 51 to the substrate winding device 61.

[0108] Referring to Figure 1 As a preferred embodiment of the present application, the substrate unwinding device 11 comprises:

[0109] The substrate unwinding roller 111 is rotatably mounted in the unwinding chamber 1, and the target substrate 7 to be coated is wound around the substrate unwinding roller 111.

[0110] The first winding mechanism 12 comprises:

[0111] The first flattening assembly 121 includes a first positioning roller 1211 rotatably mounted inside the unwinding chamber 1 and located above the substrate unwinding device 11; a first movable swing arm 1212 including a pair of first strip arms whose ends are connected to each other, and the included angle between the pair of first strip arms is greater than 90 degrees and less than 180 degrees, wherein the end of one first strip arm away from the other first strip arm is hinged to the first positioning roller 1211; and a pair of first movable rollers 1213, each rotatably mounted on one of the first strip arms away from the first positioning roller 1211. The end of the first strip arm of roller 1211 and the connection point of the pair of first strip arms; during the winding operation, the first positioning roller 1211, which is farthest from the substrate unwinding device 11, is fixed at a point and rotates. The pair of first movable rollers 1213 swing up and down around the first positioning roller 1211 with the first movable swing arm 1212 according to the required roll diameter of the target substrate 7, thereby changing the relative position of the pair of first movable rollers 1213 in the unwinding chamber 1, so as to flatten and tighten the target substrate 7 that has been wound around the pair of first movable rollers 1213 and the first positioning roller 1211.

[0112] The first winding mechanism 12 also includes:

[0113] The first guide assembly 122 includes a plurality of first guide rollers 1221 that are rotatably mounted in the unwinding chamber 1 and located above the first flattening assembly 121, and are staggered along the winding path of the target substrate 7 conveyed between the first flattening assembly 121 and the coating chamber 2.

[0114] Please see Figure 1 As a preferred embodiment of this invention, the first guide assembly 122 includes three first guide rollers 1221 arranged in an alternating manner, with each first guide roller 1221 cooperating with each other to provide tension to tighten the target substrate 7 that passes through the three first guide rollers 1221.

[0115] Please see Figure 1 In a preferred embodiment of this invention, the second guide component 281 of the second winding mechanism 28 includes:

[0116] A plurality of second guide rollers 2811 are rotatably mounted in the coating chamber 2 and located above the coating drum 21 on the side (right side) near the unwinding chamber 1, and are staggered along the winding path of the target substrate 7 conveyed between the first guide assembly 122 and the coating drum 21; a first drive unit (not shown) is used to drive the first flattening roller 2812 to move vertically and / or horizontally between adjacent second guide rollers 2811; a first position sensor (not shown) is used to detect whether the position of the target substrate 7 after being guided by each of the second guide rollers 2811 of the second guide assembly 281 has shifted when it is wound into the coating drum 21.

[0117] The third guide assembly 282 of the second winding mechanism 28 includes:

[0118] A plurality of third guide rollers 2821 are rotatably mounted in the coating chamber 2 above the coating drum 21 on the side (left side) away from the unwinding chamber 1 and are spaced apart along the winding path of the target substrate 7 between the coating drum 21 and the first treatment chamber 3; a second driving unit (not shown in the figure) is used to drive the second flattening rollers to move vertically and / or horizontally between adjacent third guide rollers 2821; and a second position sensor (not shown in the figure) is used to detect whether the position of the target substrate 7 after being guided by each third guide roller 2821 of the third guide assembly 282 and then winding off the coating drum 21 deviates.

[0119] When the first position sensor detects that the position of the target substrate 7 entering the coating drum 21 deviates, the first driving unit is driven to adjust the position of the first flattening rollers 2812 between adjacent second guide rollers 2811, and at the same time, the second driving unit is driven to adjust the position of the second flattening rollers between adjacent third guide rollers 2821, until the first position sensor and the second position sensor both detect that the positions of the target substrate 7 entering and exiting the coating drum 21 meet the preset position range, thereby correcting the positions of the target substrate 7 entering and exiting the coating drum 21 and achieving the deviation correction function of the second winding mechanism 28 for the winding path of the target substrate 7 around the coating drum 21.

[0120] Please refer to Figure 1 As a more preferred embodiment of the present embodiment, the second guide assembly 281 and the third guide assembly 282 each include two second guide rollers 2811 and two third guide rollers 2821 that are spaced apart, and each second guide roller 2811 and each third guide roller 2821 cooperate to provide tension to tighten the target substrate 7 around the two second guide rollers 2811 and the two third guide rollers 2821.

[0121] As a more preferred embodiment of the present embodiment, the first driving unit and the second driving unit can adopt a synchronous pulley, a gear and rack, a lead screw and nut, a cylinder push rod, etc.

[0122] Please refer to Figure 1 As a preferred embodiment of the present embodiment, the coating drum 21 is rotatably mounted in the coating chamber 2 and is used to guide the target substrate 7 around the coating drum 21 to enter and exit the space region above the evaporation device 22 (evaporation source) and below the coating drum 21 for performing evaporation on the target substrate 7.

[0123] Please refer to Figure 1 As a preferred embodiment of the present embodiment, the mask unwinding device 23 includes:

[0124] A pair of mask unwinding rollers 231 are rotatably installed in the coating chamber 2 and located at one side (left or right) of the coating drum 21, and a pair of shielding films 8 to be subjected to the shielding operation are respectively wound and released on the pair of mask unwinding rollers 231.

[0125] The mask winding device 24 comprises:

[0126] A pair of mask winding rollers 241 are rotatably installed in the coating chamber 2 and located at the other side of the coating drum 21 opposite to the pair of mask unwinding rollers 231, and a pair of shielding films 8 after the shielding operation are respectively wound and stored on the pair of mask unwinding rollers 231.

[0127] The mask winding device 24 comprises:

[0128] The fourth guide assembly 251 comprises a plurality of fourth guide rollers 2511 rotatably installed above the coating drum 21 close to the unwinding chamber 1 (right side) in the coating chamber 2 and staggered and spaced along the winding path of the pair of shielding films 8 between the pair of mask unwinding rollers 231 and the coating drum 21, and the fifth guide assembly 252 comprises a plurality of fifth guide rollers 2521 rotatably installed above the coating drum 21 away from the unwinding chamber 1 (left side) in the coating chamber 2 and staggered and spaced along the winding path of the pair of shielding films 8 between the coating drum 21 and the pair of mask winding rollers 241.

[0129] Please refer to Figure 1 As a more preferred embodiment of the present embodiment, the fourth guide assembly 251 and the fifth guide assembly 252 respectively comprise two fourth guide rollers 2511 and two fifth guide rollers 2521 staggered and spaced, and each fourth guide roller 2511 and each fifth guide roller 2521 cooperate to provide tension to tighten the pair of shielding films 8 wound through the two fourth guide rollers 2511 and the two fifth guide rollers 2521.

[0130] Please refer to Figure 1 As a preferred embodiment of the present embodiment, the third winding mechanism 31 comprises a sixth guide assembly 311 comprising a plurality of sixth guide rollers 3111 rotatably installed in the first treatment chamber 3 and staggered and spaced along the winding path of the target substrate 7 between the coating chamber 2 (the third guide assembly 282) and the second treatment chamber 4.

[0131] Please refer to Figure 1 As a preferred embodiment of the present embodiment, the fourth winding mechanism 41 comprises a seventh guide assembly 411 comprising a plurality of seventh guide rollers 4111 rotatably installed in the second treatment chamber 4 and staggered and spaced along the winding path of the target substrate 7 between the first treatment chamber 3 (the sixth guide assembly 311) and the third treatment chamber 5.

[0132] Referring to Figure 1 As a preferred embodiment of the present application, the fifth winding mechanism 51 comprises an eighth guide assembly 511, which comprises a plurality of eighth guide rollers 5111 rotatably mounted in the third processing chamber 5 and staggeredly arranged along the winding path of the target substrate 7 transported between the second processing chamber 4 (the seventh guide assembly 411) and the winding chamber 6.

[0133] Referring to Figure 1 As a more preferred embodiment of the present application, the sixth guide assembly 311, the seventh guide assembly 411 and the eighth guide assembly 511 respectively comprise four sixth guide rollers 3111, four seventh guide rollers 4111 and four eighth guide rollers 5111 arranged at intervals, and each of the sixth guide rollers 3111, the seventh guide rollers 4111 and the eighth guide rollers 5111 cooperates to provide a tensioned winding of the target substrate 7 through the four sixth guide rollers 3111, the four seventh guide rollers 4111 and the four eighth guide rollers 5111.

[0134] Referring to Figure 1 As a preferred embodiment of the present application, the substrate winding device 61 comprises:

[0135] A substrate winding roller 611 rotatably mounted in the winding chamber 6, and the coated target substrate 7 is wound and stored on the substrate winding roller 611.

[0136] The sixth winding mechanism 62 comprises:

[0137] A ninth guide assembly 621 comprising a plurality of ninth guide rollers 6211 rotatably mounted in the winding chamber 6 and arranged at intervals above the substrate winding device 61 along the winding path of the target substrate 7 transported between the third processing chamber 5 (the eighth guide assembly 511) and the winding chamber 6.

[0138] The sixth winding mechanism 62 further comprises:

[0139] The second flattening assembly 622 comprises a second positioning roller 6221 rotatably mounted in the winding chamber 6 and located above the winding assembly and below the ninth guide assembly 621; a second movable swing arm 6222 comprising a pair of second strip-shaped arms connected at their ends, and the included angle of the pair of second strip-shaped arms is greater than 90 degrees and less than 180 degrees, wherein one end of one of the second strip-shaped arms is hingedly connected to the second positioning roller 6221; a pair of second movable rollers 6223 rotatably mounted at the other end of the second strip-shaped arm hingedly connected to the second positioning roller 6221 and at the connection of the pair of second strip-shaped arms; during the winding operation, the second positioning roller 6221 farthest from the winding assembly is fixed at a point of rotation, and the pair of second movable rollers 6223 swing up and down around the second positioning roller 6221 according to the required winding diameter of the target substrate 7, so as to change the relative position of the pair of second movable rollers 6223 in the winding chamber 6, so as to flatten and tighten the target substrate 7 wound around the pair of second movable rollers 6223 and the second positioning roller 6221.

[0140] Referring to Figure 1 In the present embodiment, the first winding mechanism 12, the second winding mechanism 28, the third winding mechanism 31, the fourth winding mechanism 41, the fifth winding mechanism 51, the sixth winding mechanism 62 and the mask winding device 25 all comprise a plurality of tension rollers (i.e. the first to ninth guide rollers 6211) for guiding and tensioning the target substrate 7 or the shielding film 8.

[0141] Referring to Figure 1 As a preferred embodiment of the present embodiment, in the third winding mechanism 31, the fourth winding mechanism 41 and the fifth winding mechanism 51, the included angle (wrap angle) between the line connecting the entry point of the target substrate 7 contacting the tension roller (i.e. the sixth guide roller 3111, the seventh guide roller 4111 and the eighth guide roller 5111) and the axis of the tension roller and the line connecting the exit point of the target substrate 7 leaving the tension roller is less than 45 degrees, so that the target substrate 7 after the deposition of the film layer is optimized in the winding path and the wrap angle when passing through each post-processing chamber (i.e. the first processing chamber 3, the second processing chamber 4 and the third processing chamber 5), thereby reducing the problems of defects and hidden cracks of the film layer on the surface of the target substrate 7.

[0142] Referring to Figure 1 As a preferred embodiment of the present embodiment, the film coating equipment further comprises:

[0143] The ion cleaning device 9 is arranged in the unwinding chamber 1 and is used to provide an ion source to perform cleaning operation on the target substrate 7, so as to reduce the impurities contacting and polluting the surface of the target substrate 7 and affecting the quality and production stability of the deposited film layer.

[0144] As other embodiments of the present embodiment, a glow discharge device (not shown in the figure) can be provided in the unwinding chamber 1 instead of the ion cleaning device 9 to clean the target substrate 7.

[0145] Please see ​ , 2 The working principle and steps of the winding and coating equipment are as follows:

[0146] S1, unwinding link: the target substrate 7 is released from the substrate unwinding roller 111 of the substrate unwinding device 11 in the unwinding chamber 1 and is sent out, is flattened through a pair of first movable rollers 1213 and first positioning rollers 1211 of the first flattening assembly 121 of the first winding mechanism 12 and a first movable swing arm 1212, and then passes through each first guide roller 1221 of the first guide assembly 122 from the unwinding chamber 1 into the coating chamber 2; the target substrate 7 enters the coating chamber 2 and first passes through the ion cleaning device 9 in the unwinding chamber 1 to receive ion source cleaning.

[0147] S2, feeding link: after entering the coating chamber 2, each second guide roller 2811 of the second guide assembly 281 of the second winding mechanism 28 guides the target substrate 7 to be wound from the first winding mechanism 12 to the coating drum 21, the first position sensor detects whether the position of the target substrate 7 wound into the coating drum 21 is deviated after being guided by each second guide roller 2811 of the second guide assembly 281, when the first position sensor detects that the position of the target substrate 7 entering the coating drum 21 is deviated, the first driving unit drives to adjust the position of the first flattening roller 2812 between adjacent second guide rollers 2811, and the second driving unit of the third guide assembly 282 drives to adjust the position of the second flattening roller between adjacent third guide rollers 2821, until the first position sensor and the second position sensor both detect that the positions of the target substrate 7 entering and leaving the coating drum 21 meet the preset position range;

[0148] S3, evaporation link: the evaporation boat 221 heats the evaporation material contained therein to evaporate into evaporation gas, which moves upward until it contacts the target substrate 7 around the coating drum 21 above the evaporation boat 221, to perform a coating operation on the side of the target substrate 7 around the coating drum 21 above the evaporation boat 221 facing downward to the evaporation boat 221 below, so that the side is deposited to form a coating layer; at the same time, the liquid storage tank 223, the peripheral heater 226, the pressure stabilizing valve 227, the first gas flow meter, the liquid supplementing conduit 224 and the vacuum valve 225 constitute a liquid supplementing system of the evaporation device 22 to adjust the real-time flow of evaporation material supplementing the evaporation boat 221, cooperating with the lifting mechanism 222 to drive the evaporation boat 221 to move up and down below the coating drum 21, to adjust the distance between the liquid surface of the evaporation material in a molten state in the evaporation boat 221 and the surface of the target substrate 7 around the coating drum 21, and to maintain it around the distance value required by the coating process of the target substrate 7, so that the winding coating equipment is suitable for different types of target substrates 7 required by different types of evaporation materials;

[0149] During the evaporation operation, the fourth guide rollers 2511 of the fourth guide assembly 251 of the mask winding device 25 wind a pair of shielding films 8 released from the pair of mask unwinding rollers 231 of the mask unwinding device 23 around the target substrate 7 between the two sides of the target substrate 7 and the evaporation boat 221 below the coating drum 21, and the pair of shielding films 8 continuously wind around and shield between the two side edges of the target substrate 7 in the width direction and the evaporation boat 221 below, so as to avoid the thickness of the coating layer formed on the surface of the target substrate 7 during the evaporation process being less than that of the middle part of the target substrate 7 at the two side edges in the width direction of the target substrate 7; after the shielding operation is completed, the fifth guide rollers 2521 of the fifth guide assembly 252 of the mask winding device 25 separate the pair of shielding films 8 from the target substrate 7 and the evaporation boat 221 below the coating drum 21, and transport them to the pair of mask winding rollers 241 of the mask winding device 24 for storage; at the same time, the cooling device in the coating drum 21 cools the target substrate 7 around the coating drum 21, to avoid the target substrate 7 being damaged by high-temperature evaporation gas and affecting the evaporation effect;

[0150] Further, the film thickness detection device also detects the thickness of the deposited film layer formed on the surface of the target substrate 7 in real time during the evaporation process, and prevents the evaporation gas from escaping from the gap between the evaporation boat 221 and the film deposition drum 21 to pollute the surrounding chambers and the environment by means of the anti-adsorption plate 26 arranged around the evaporation boat 221 at the gap between the evaporation boat 221 and the film deposition drum 21. The size of the evaporation channel for conveying the evaporation gas between the inside of the anti-adsorption plate 26 and the evaporation boat 221 and the film deposition drum 21 is adjusted by the evaporation source cover plate 27 movably mounted inside the anti-adsorption plate 26 in the direction parallel to the axial direction of the film deposition drum 21, so as to control the deposition amount of the evaporation material at different positions on the surface of the target substrate 7, and after the evaporation process is completed, the evaporation source cover plate 27 is moved to completely block between the evaporation boat 221 and the film deposition drum 21 to block the remaining evaporation gas from continuing to deposit on the surface of the film deposition layer;

[0151] S4, discharging link: after the target substrate 7 is wound around the film deposition drum 21 and the evaporation is completed, the third guide rollers 2821 of the third guide assembly 282 of the second winding mechanism 28 guide the target substrate 7 to be wound from the film deposition drum 21 to the first treatment chamber 3 (the third winding mechanism 31), and the position range of the target substrate 7 out of the film deposition drum 21 is rectified and controlled in the above-mentioned manner in S3;

[0152] S5, post-processing link: after the target substrate 7 is separated from the film deposition chamber 2, the corresponding sixth guide rollers 3111, seventh guide rollers 4111 and eighth guide rollers 5111 of the sixth guide assembly 311 of the third winding mechanism 31, the seventh guide assembly 411 of the fourth winding mechanism 41 and the eighth guide assembly 511 of the fifth winding mechanism 51 guide the target substrate 7 after the evaporation into the first treatment chamber 3, the second treatment chamber 4 and the third treatment chamber 5 in turn, so that the target substrate 7 receives cooling, heat treatment and gas treatment in the first treatment chamber 3, the second treatment chamber 4 and the third treatment chamber 5 in turn by the substrate cooling device, the substrate heat treatment device and the gas treatment device, and then the target substrate 7 after the post-processing is wound to the winding chamber 6 (the sixth winding mechanism 62) by the eighth guide rollers 5111;

[0153] S6, winding link: after the target substrate 7 is separated from the third treatment chamber 5, the ninth guide rollers 6211 of the ninth guide assembly 621 of the sixth winding mechanism 62 guide the target substrate 7 after the post-processing to a pair of second movable rollers 6223 and second positioning rollers 6221 of the second flattening assembly 622, which are flattened by the cooperation of the second movable swing arms 6222, and then the target substrate 7 after the evaporation and the post-processing is wound and stored by the substrate winding rollers 611 of the substrate winding device 61.

[0154] In the embodiment, since the winding path of the winding coating equipment is symmetrically arranged, forward and reverse rotation can be realized, that is, the substrate winding device can be operated in the reverse direction of the forward rotation winding direction described above, that is, the clockwise rotation from the unwinding chamber 1 through the coating chamber 2, the first treatment chamber 3, the second treatment chamber 4, the third treatment chamber 5 and the winding chamber 6 in sequence, and the anticlockwise rotation from the winding chamber 6 through the third treatment chamber 5, the second treatment chamber 4, the first treatment chamber 3, the coating chamber 2 and the unwinding chamber 1 in sequence, so as to realize the thickening of the film layer deposited on the target substrate surface, and simplify the production steps and improve the production efficiency.

[0155] The above is only a preferred embodiment of the present application, and is not intended to limit the present application. Those skilled in the art should understand that any modification, equivalent replacement and improvement made within the spirit and principle of the present application shall be included in the protection scope of the present application.

Claims

1. A roll-to-roll coating apparatus, characterized in that, include: Unwinding chamber (1), in which a substrate unwinding device (11) is installed; The winding chamber (6) is equipped with a substrate winding device (61); A coating chamber (2) is provided therein, with a coating drum (21) and an evaporation device (22) located below the coating drum (21); The substrate winding device is used to transport the target substrate (7) released from the substrate unwinding device (11) through the coating drum (21) to the substrate winding device (61) for storage. The evaporation device (22) includes: Evaporation boat (221) is used to evaporate the vapor deposition material into vapor deposition gas to perform a coating operation on the target substrate (7) above the evaporation boat (221) and around the coating drum (21); The lifting mechanism (222) is used to drive the evaporation boat (221) to move up and down, so as to adjust the distance between the liquid surface of the vaporized material in the evaporation boat (221) and the surface of the target substrate (7) that passes around the coating drum (21).

2. The roll-to-roll coating equipment as described in claim 1, characterized in that, The evaporation device (22) further includes: Storage tank (223) for storing the vapor-deposited material; A replenishment conduit (224) is connected between the liquid storage tank (223) and the evaporation boat (221) for introducing the vapor deposition material from the liquid storage tank (223) into the evaporation boat (221); A vacuum valve (225) is provided on the replenishment conduit (224) to regulate the flow rate of the vapor deposition material into the evaporation boat (221) through the replenishment conduit (224).

3. The roll-to-roll coating equipment as described in claim 1, characterized in that, Also includes: A mask unwinding device (23) is provided inside the coating chamber (2) and located on one side of the coating drum (21); A mask winding device (24) is located inside the coating chamber (2) and on the other side of the coating drum (21) opposite to the mask unwinding device (23); The mask winding device (25) is used to transport the masking film (8) released from the mask unwinding device (23) around the two sides of the target substrate (7) below the coating drum (21) and between the evaporation boat (221) to the mask winding device (24) for storage.

4. The roll-to-roll coating equipment as described in claim 1, characterized in that, Also includes: An anti-stick plate (26) is provided in the gap between the evaporation boat (221) and the coating drum (21), and is arranged around the evaporation boat (221).

5. The roll-to-roll coating equipment as described in claim 4, characterized in that, Also includes: The evaporation source cover plate (27) is movably installed inside the anti-stick plate (26) in a direction parallel to the axial direction of the coating drum (21) to adjust the size of the evaporation channel located inside the anti-stick plate (26) and between the evaporation boat (221) and the coating drum (21) for conveying the evaporation gas.

6. The roll-to-roll coating equipment as described in claim 2, characterized in that, The evaporation device (22) further includes: An external heater (226) is installed on the outside of the liquid storage tank (223); A pressure regulating valve (227) is installed on the liquid storage tank (223).

7. The roll-to-roll coating apparatus according to any one of claims 1-6, characterized in that, The evaporation device (22) further includes: A lifting base (228) is installed on the lifting mechanism (222) and is used to support the evaporation boat (221); A boat heater (229) is located inside the lifting base (228) and is used to heat the evaporation boat (221).

8. The roll-to-roll coating apparatus according to any one of claims 1-6, characterized in that, Also includes: At least one post-processing chamber is disposed on the path of the substrate winding device conveying the target substrate (7) between the coating chamber (2) and the winding chamber (6) for post-processing the coated target substrate.

9. The roll-to-roll coating equipment as described in claim 8, characterized in that, The processing chamber includes: The first processing chamber (3), the second processing chamber (4), and the third processing chamber (5) are arranged sequentially on the path of the substrate winding device for conveying the target substrate (7) between the coating chamber (2) and the winding chamber (6); The first processing chamber (3) is equipped with a substrate cooling device for cooling the target substrate (7) after coating; The second processing chamber (4) is equipped with a substrate heat treatment device for heat treating the target substrate (7); The third processing chamber (5) is equipped with a gas processing device for gas processing of the target substrate (7).

10. The roll-to-roll coating apparatus as described in claim 9, characterized in that, The housing of the roll coating equipment is rectangular. The winding chamber (6), the unwinding chamber (1), and the coating chamber (2) are located in the lower layer of the housing. The first processing chamber (3), the second processing chamber (4), and the third processing chamber (5) are located in the upper layer of the housing. The unwinding chamber (1), the coating chamber (2), the first processing chamber (3), the second processing chamber (4), the third processing chamber (5), and the winding chamber (6) are arranged adjacent to each other in a clockwise direction.

11. The roll-to-roll coating apparatus as described in claim 10, characterized in that, The substrate winding device includes: A first winding mechanism (12) is provided in the unwinding chamber (1) for connecting the target substrate (7) released from the substrate unwinding device (11); The second winding mechanism (28), located in the unwinding chamber (1), includes: a second guide assembly (281) for guiding the target substrate (7) from the first winding mechanism (12) to the coating drum (21); and a third guide assembly (282) for connecting the target substrate (7) wound around the coating drum (21). The third winding mechanism (31) is located in the first processing chamber (3) and is used to connect the target substrate (7) that has been wound through the second winding mechanism (28); The fourth winding mechanism (41) is located in the second processing chamber (4) and is used to connect the target substrate (7) that has been wound through the third winding mechanism (31); The fifth winding mechanism (51) is located in the third processing chamber (5) and is used to connect the target substrate (7) that has been wound through the fourth winding mechanism (41); The sixth winding mechanism (62) is located in the winding chamber (6) and is used to guide the target substrate (7) from the fifth winding mechanism (51) to the substrate winding device (61) for storage.

12. The roll-to-roll coating apparatus as described in claim 11, characterized in that, The first winding mechanism (12), the second guide assembly (281), the third guide assembly (282), the third winding mechanism (31), the fourth winding mechanism (41), the fifth winding mechanism (51), and the sixth winding mechanism (62) each include a plurality of tension rollers for guiding and tightening the target substrate (7).

13. The roll-to-roll coating apparatus as described in claim 12, characterized in that, In the third winding mechanism (31), the fourth winding mechanism (41) and the fifth winding mechanism (51), the angle between the line connecting the entry point of the target substrate (7) initially contacting the tension roller and the axis of the tension roller and the line connecting the exit point of the target substrate (7) finally leaving the tension roller and the axis of the tension roller is less than 45 degrees.

14. The roll-to-roll coating apparatus according to any one of claims 1-6, characterized in that, Also includes: An ion cleaning device (9) is located in the unwinding chamber (1) and is used to provide an ion source to perform cleaning operations on the target substrate (7); A cooling device is located inside the coating drum (21).

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