Oxidation device for substrate

Abstract

The utility model relates to the technical field of substrate production, in particular to a substrate oxidation device which comprises a device frame and an oxidation tank mounted on the device frame, the oxidation tank is provided with an inlet end on the left side and an outlet end on the right side, a feeding roller of a substrate is mounted at the inlet end, a guide roller is further mounted on the device frame on the periphery of the oxidation tank, and the guide roller is mounted on the device frame on the periphery of the oxidation tank. The guide rollers are outer guide rollers, an annular lining belt is arranged on the outer guide rollers, the lining belt is made of rubber, the upper surface of the lining belt further extends into the oxidation tank, and the lining belt is attached to the lower side of an oxidation route in the oxidation tank and synchronously operates with the oxidation route. The face, attached to the oxidation route, of the lining belt is an attaching face. The method has the advantages of reducing the waste of the oxidation liquid, saving the cost and reducing the damage to the substrate. The utility model also provides an oxidation method of the substrate.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of substrate production, in particular to a substrate oxidation device and a substrate oxidation method. BACKGROUND

[0002] The photosensitive material plate comprises a substrate and a photosensitive chemical layer on the substrate.

[0003] The substrate is an aluminum substrate, and before the photosensitive chemical layer is coated on the substrate, the substrate further has an oxidation layer. The equipment used for forming the oxidation groove on the substrate is the substrate oxidation device.

[0004] The substrate oxidation device comprises a device frame and an oxidation groove installed on the device frame. In use, the oxidation groove is filled with an oxidation liquid, such as dilute sulfuric acid. The oxidation groove has a left-side entering end and a right-side exiting end. A substrate feeding roller is installed at the entering end, and a substrate receiving roller is installed at the exiting end. Guide rollers for the substrate are installed in the oxidation groove. The guide rollers are inner guide rollers. The substrate forms an oxidation route under the action of the feeding roller, the inner guide rollers and the receiving roller. The substrate runs along the oxidation route, and the oxidation groove can be formed on the surface of the substrate. Since only one side of the substrate (i.e., the side with the photosensitive chemical layer) needs to be oxidized to produce the photosensitive material plate, and there is no covering component on the side of the oxidation route in the prior art, the substrate produced by the device has an oxidation layer on both sides or the oxidation degree of both sides is the same. This causes waste of the oxidation liquid, unnecessary damage to the substrate and an increase in production cost. SUMMARY

[0005] The present application aims to solve the above problems and provides a substrate oxidation device and a substrate oxidation method that can reduce waste of the oxidation liquid, save cost and reduce damage to the substrate.

[0006] The technical scheme of the substrate oxidation device is as follows: a substrate oxidation device comprises a device frame and an oxidation groove installed on the device frame. The oxidation groove has a left-side entering end and a right-side exiting end. A substrate feeding roller is installed at the entering end, and a substrate receiving roller is installed at the exiting end. Guide rollers for the substrate are installed in the oxidation groove. The guide rollers are inner guide rollers. The substrate forms an oxidation route under the action of the feeding roller, the inner guide rollers and the receiving roller. The device is characterized in that: guide rollers are further installed on the device frame at the outer periphery of the oxidation groove. The guide rollers are outer guide rollers. An annular supporting belt is installed on the outer guide rollers. The supporting belt is made of rubber. The supporting belt extends into the oxidation groove. The supporting belt and the oxidation route run synchronously and are attached on the lower side of the oxidation route. The side of the supporting belt that is attached to the oxidation route is an attachment side.

[0007] Further, a bonding agent containing groove is installed on the device frame, the bonding agent containing groove is connected with the bonding agent nozzle, the bonding agent nozzle is towards the side where the supporting belt and the oxidation route are bonded, and is behind the bonding part of the oxidation route.

[0008] Further, a pair of rolling rollers are installed on the device frame, the rolling part is between the two rolling rollers, and the supporting belt and the oxidation route are bonded through the rolling part.

[0009] Further, a washing groove is installed on the device frame, and a diameter changing roller is in the washing groove, the diameter changing roller is a washing diameter changing roller, and the supporting belt passes through the washing diameter changing roller in the washing groove.

[0010] Further, the bonding surface has protrusions on both sides.

[0011] The technical scheme of the substrate oxidation method is achieved as follows: the substrate oxidation method is used to oxidize the substrate, the substrate is oxidized in the oxidation groove, the oxidation surface is formed on the substrate, and the bottom surface is opposite to the oxidation surface, and the characteristic is that a covering film is bonded on the bottom surface of the substrate during the oxidation process.

[0012] Further, the bonding agent is filled between the substrate and the covering film.

[0013] Further, the bonding agent is glycerol.

[0014] Further, the rolling rollers are used to roll the substrate and the covering film, so that the substrate and the covering film are combined more closely.

[0015] Further, after the oxidation surface of the substrate is oxidized, the covering film is removed, and the covering film is washed.

[0016] The substrate oxidation device and the substrate oxidation method have the advantages of reducing the waste of oxidation liquid, saving the cost, and reducing the damage to the substrate. BRIEF DESCRIPTION OF DRAWINGS

[0017] Figure 1 It is a structural schematic diagram of the substrate oxidation device.

[0018] Figure 2 It is Figure 1 A-A direction schematic diagram when used in the device.

[0019] Wherein: 1, device frame 11, feed roller 12, receiving roller 13, base plate 2, oxidation tank 31, inner guide roller 32, outer guide roller 4, oxidation route 5, backing belt 51 protrusion 6, adhesive container groove 61, adhesive nozzle 62, adhesive 7, rolling roller 71, rolling site 8, washing tank 81, washing reducing roller. DETAILED DESCRIPTION

[0020] In the description of the preferred embodiments of the present application, it should be noted that unless otherwise explicitly specified and limited, if the terms "arranged", "mounted", "connected" appear, they should be understood in a broad sense, for example, they can be fixedly connected, or detachably connected, or integrally connected; they can be mechanically connected, or directly connected, or indirectly connected through an intermediate, or connected inside two elements. For those skilled in the art, the specific meaning of the above terms in the present application can be understood according to the specific circumstances.

[0021] In order to facilitate understanding of the present application, the present application will be further described below in conjunction with the accompanying drawings.

[0022] As shown in Figure 1 , 2 An oxidation device for base plate, comprising a device frame 1 and an oxidation tank 2 mounted on the device frame, the oxidation tank has a left entering end and a right exiting end, a base plate feed roller 11 is mounted at the entering end, a base plate receiving roller 12 is mounted at the exiting end, and guide rollers for base plate are mounted in the oxidation tank, these guide rollers are inner guide rollers 31, and the base plate forms an oxidation route 4 under the action of the feed roller, the inner guide rollers and the receiving roller, characterized in that: guide rollers are further mounted on the device frame at the outer periphery of the oxidation tank, these guide rollers are outer guide rollers 32, and an annular backing belt 5 is mounted on the outer guide rollers, the backing belt is made of rubber, the upper surface of the backing belt further extends into the oxidation tank, the backing belt and the lower side of the oxidation route are in contact and run synchronously in the oxidation tank, and the side of the backing belt in contact with the oxidation route is the contact side.

[0023] With the above arrangement of the present application, when in use, the backing belt pad blocks the contact between the oxidation liquid and the bottom surface of the base plate 13, the backing belt is a covering film formed on the bottom surface of the base plate, which can prevent oxidation or reduce the degree of oxidation on the bottom surface of the base plate, thereby achieving the purpose of the present application.

[0024] The backing belt is in contact with the bottom surface of the base plate in the oxidation tank, the backing belt is separated from the base plate outside the oxidation tank, and the backing belt rotates in a cycle, which can be reused.

[0025] The rack is also provided with a conveying roller for conveying the substrate 13, the conveying roller is connected with a conveying motor, and the conveying roller acts on the substrate to ensure the running of the substrate on the device.

[0026] Further, the device rack is also provided with a bonding agent containing groove 6, the bonding agent containing groove is connected with a bonding agent nozzle 61, the bonding agent nozzle faces the side where the supporting belt and the oxidation line are bonded, and is behind the bonding part of the supporting belt and the oxidation line.

[0027] In use, the bonding agent containing groove contains a bonding agent 62, the bonding agent is a glue solution, and the bonding agent can prevent the oxidation solution from entering the lower surface of the substrate between the substrate and the supporting belt, preferably glycerol, and has the advantages of better preventing the oxidation solution from entering the lower surface of the substrate and not causing the oxidation solution to deteriorate.

[0028] The guide roller is also connected with a guide motor, the guide motor drives the guide roller to run, and the running of the guide roller ensures the running of the supporting belt.

[0029] Further, a pair of rolling rollers 7 are installed on the device rack, and the rolling part 71 is between the two rolling rollers, and the supporting belt and the oxidation line are bonded through the rolling part.

[0030] The above settings of the present application can make the supporting belt and the substrate more closely combined.

[0031] Further, a washing tank 8 is also installed on the device rack, and the washing tank also has a variable-diameter roller, which is a washing variable-diameter roller 81, and the supporting belt also passes through the washing variable-diameter roller to act in the washing tank.

[0032] The above settings of the present application can also realize washing of the supporting belt coming out of the oxidation tank.

[0033] Further, the bonding surface is provided with protrusions 51 on both sides.

[0034] The above settings of the present application can make the supporting belt and the substrate have a complete structure at the side part, and the oxidation solution is less likely to enter the lower surface of the substrate.

[0035] The technical scheme of the substrate oxidation method of the present application is as follows: the substrate oxidation method oxidizes the substrate, makes the substrate oxidize in the oxidation tank, forms an oxidation surface on the substrate, and the side opposite to the oxidation surface is a bottom surface, and the feature is that a covering film is bonded on the bottom surface of the substrate during oxidation, and the covering film is formed by the above-mentioned supporting belt.

[0036] Further, a bonding agent is filled between the substrate and the covering film. Further, a pair of rolling rollers 7 are installed on the device rack, and the rolling part 71 is between the two rolling rollers, and the supporting belt and the oxidation line are bonded through the rolling part.

[0037] Further, the adhesive is glycerin.

[0038] Further, the substrate and the cover film are rolled by a rolling roller, so that the substrate and the cover film are combined more closely.

[0039] Further, after the oxidized surface of the substrate is oxidized, the cover film is removed and the cover film is washed.

[0040] It should be noted that the beneficial effects of the above-mentioned embodiments of the substrate oxidizing device and the substrate oxidizing method are mutually explained and supplemented.

[0041] The present application also provides a use of glycerin as an adhesive. When the surface of a substrate is not oxidized in an oxidation tank, the surface is covered by a cover film, and the adhesive filled between the surface and the cover film is glycerin. That is, during the oxidation of the substrate in the oxidation tank, in order to oxidize one side of the substrate and not to oxidize the other side, the other side of the substrate is covered by a cover film, and glycerin is filled as an adhesive between the substrate and the cover film, so that the other side of the aluminum substrate is not oxidized.

[0042] The above-mentioned is only a specific embodiment of the present application, but the structural features of the present application are not limited thereto. Any changes or modifications made by those skilled in the art within the scope of the present application are covered by the patent scope of the present application.

Claims

1. An oxidation apparatus for a substrate, comprising a frame and an oxidation tank mounted on the frame, the oxidation tank having an inlet end on the left and an outlet end on the right, a substrate feed roller mounted at the inlet end, a substrate receiving roller mounted at the outlet end, and guide rollers for the substrate mounted inside the oxidation tank, these guide rollers being inner guide rollers, the substrate forming an oxidation path under the action of the feed roller, the inner guide roller, and the receiving roller, characterized in that: Guide rollers are also installed on the device frame around the oxidation tank. These guide rollers are outer guide rollers. There is also an annular support belt installed on the outer guide rollers. The support belt is made of rubber and extends into the oxidation tank. The support belt is attached to the oxidation path and runs synchronously inside the oxidation tank. The side of the support belt that is in contact with the oxidation path is the contact surface.

2. The substrate oxidation apparatus according to claim 1, characterized in that: An adhesive reservoir is also installed on the device frame. The adhesive reservoir is connected to an adhesive nozzle via a pipe. The adhesive nozzle faces the side where the backing tape and the oxidation path will be bonded, and is located behind the part that will be bonded to the oxidation path.

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