Substrate oxidation device
By designing bottom and top oxidation routes in the substrate oxidation apparatus and combining the use of pumps and rinsing pipes, the problem of pinholes on the oxide film was solved, resulting in higher quality oxide films and cleaner substrate surfaces.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-05-08
- Publication Date
- 2026-03-27
AI Technical Summary
In existing oxidation devices for photosensitive material substrates, pinholes are easily formed on the oxide film during the oxidation process, affecting the quality of the oxide layer.
The oxidation route of the substrate oxidation device is designed with one part located at the bottom of the oxidation tank and the other part located at the top and then turning back. Combined with the use of pumps and rinsing pipes, the cleanliness of the oxidation solution and the rinsing effect are ensured.
Reducing pinholes in the oxide film improves its quality, resulting in a cleaner substrate surface and fewer subsequent cleaning steps.
Smart Images
Figure CN224047508U_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The utility model relates to the technical field of the production equipment of photosensitive material plate, and particularly to a substrate oxidation device, especially a photosensitive material plate substrate oxidation device. BACKGROUND
[0002] The photosensitive material plate comprises a substrate and a layer of photosensitive liquid on the substrate. The substrate first forms an oxidation film on its surface, and then a layer of photosensitive liquid is coated on the oxidation film of the substrate to obtain the photosensitive material plate. The equipment used to form the oxidation film on the substrate is the oxidation device of the photosensitive material plate substrate.
[0003] The oxidation device of the photosensitive material plate substrate comprises an oxidation tank. The oxidation tank has an entering end on the left side and an exiting end on the right side. There are a variable-diameter roller and a conveying roller in the oxidation tank. The substrate enters the oxidation tank from the entering end, and the oxidation of the surface of the substrate is completed in the oxidation tank. The oxidized substrate exits from the exiting end. The substrate enters from the entering end, passes through the variable-diameter roller, and then exits from the exiting end to form an oxidation route. In the prior art, people always think that the oxidation liquid above the oxidation tank is clearer and contains fewer impurities. The oxidation route is arranged above the inside of the oxidation tank. The substrate obtained in this way has fewer impurities on the surface and does not need to be cleaned too much. However, the oxidation film of the substrate obtained in this way has more pinholes (i.e., pinhole-shaped non-oxidized parts), which affects the quality of the oxidation layer. SUMMARY
[0004] The purpose of the utility model is to provide a substrate oxidation device with fewer pinholes on the oxidation film and good oxidation film quality to solve the above problems.
[0005] The technical solution of the utility model is as follows: a substrate oxidation device comprises an oxidation tank. The oxidation tank has an entering end on the left side and an exiting end on the right side. There are a variable-diameter roller and a conveying roller in the oxidation tank. The substrate enters the oxidation liquid in the oxidation tank from the entering end, and the oxidation of the surface of the substrate is completed in the oxidation tank. The oxidized substrate exits from the exiting end. The substrate enters from the entering end, passes through the variable-diameter roller, and then exits from the exiting end to form an oxidation route. The feature is that one section of the oxidation route is arranged at a position close to the bottom in the oxidation tank. This section of the oxidation route is the bottom route.
[0006] Further, one section of the oxidation route is arranged at a position above the oxidation tank. This section of the oxidation route is the upper route. The oxidation route runs from back to front. The upper route is in front of the bottom route.
[0007] Further, the upper route is above the bottom route, the upper route is a foldback structure, and the foldback structure comprises a first upper route and a second upper route.
[0008] The substrate oxidizing device has the advantages of less pinholes on the oxidation film and good oxidation film quality. BRIEF DESCRIPTION OF DRAWINGS
[0009] Figure 1 is a side structure schematic view of the utility model.
[0010] Figure 2 is Figure 1 A-A direction schematic view in the.
[0011] Figure 3 is Figure 2 B place amplification schematic view in.
[0012] 1, oxidation groove 11, into end 12, come out end 13, reducing roller 14, conveying roller 2, oxidation route 21, bottom route 22, upper route 221, first upper route 222, second upper route 3, pump 31, water inlet pipe 32, water outlet pipe 4, flushing pipe 41, flushing hole. DETAILED DESCRIPTION
[0013] In the description of the preferred embodiment of the utility model, it needs to be explained that unless there is explicit provision and limitation, if the terms "arrangement", "installation", "connection" appear, it should be understood in a broad sense, for example, it can be fixed connection, can be detachable connection, or integrally connected, can be mechanically connected, can be directly connected, can be indirectly connected through intermediate, can be the communication inside two elements. For ordinary skilled in the art, the specific meaning of the above terms in the utility model can be understood according to the specific circumstances.
[0014] In order to more conveniently understand the utility model, the utility model is further described below in conjunction with the drawings.
[0015] As Figure 1 , 2The utility model discloses a substrate oxidizing device as shown in the figure 3, including the oxidation groove 1 of the substrate oxidation device, the oxidation groove has the left side entrance end 11 and the right side exit end 12, and there is still reducing roller 13 and conveying roller 14 in the oxidation groove, the conveying roller is connected with conveying motor still, the conveying roller guarantees the operation of substrate, and the substrate enters the oxidation groove from the entrance end, and the oxidation of substrate surface is completed in the oxidation groove, and the oxidized substrate comes out from the exit end, and the oxidation route 2 is formed to the exit end from the entrance end into the oxidation liquid of oxidation groove, through the effect of reducing roller.
[0016] The utility model discloses the above setting can make substrate pass below the oxidation groove, because the oxidation groove below has more oxidation slag, also has more aluminum ion, and the composition on the upper part of oxidation groove is not same, can make the small hole on the oxidized aluminum substrate less, can realize the purpose of the utility model.
[0017] In one technical solution, the bottom route is arranged within 15 cm from the bottom surface of the oxidation groove.
[0018] Further, one section of the oxidation route is arranged on the upper part of the oxidation groove, and this section of the oxidation route is the upper route 22; the oxidation route runs from back to front; and the upper route is in front of the bottom route.
[0019] The utility model discloses the above setting can make the oxidized substrate flush on the upper part of the oxidation groove, because the upper part of the oxidation groove has less oxidation dregs, can make the surface of substrate cleaner, need not to flush the surface of substrate additionally.
[0020] Further, the upper route is above the bottom route, and the upper route is in a U-shaped structure, which comprises a first upper route 221 below and a second upper route 222 above.
[0021] The utility model discloses the above setting can achieve the advantage that the aluminum substrate is flushed better.
[0022] Further, the oxidation groove is further provided with a pump 3, the pump has a water suction pipe 31 and a water outlet pipe 32, the water suction end of the water suction pipe is on the upper part of the oxidation groove, the upper route is provided with a flushing pipe 4, the flushing pipe has a plurality of water flushing holes 41 facing the upper route, and the water outlet pipe is communicated with the flushing pipe.
[0023] The utility model discloses above setting, still can realize to the substrate is washed, makes the substrate surface more neat. The water absorption end of water absorption pipe is on the inside top of oxidation groove, guarantees the water containing less dregs in the oxidation groove of water absorption pipe and draws out, on the other hand, the flushing pipe due to the effect of pump, make the water from the flushing hole come out has greater impetus, can reduce the existence of dregs on the aluminum substrate.
Claims
1. A substrate oxidizing device, comprising an oxidation tank having a left-hand entry end and a right-hand exit end, and a variable-diameter roller and a conveying roller in the oxidation tank, a substrate entering the oxidation tank from the entry end into oxidation liquid in the oxidation tank, the surface of the substrate being oxidized in the oxidation tank, the oxidized substrate exiting from the exit end, the substrate entering from the entry end, passing through the variable-diameter roller, and exiting from the exit end to form an oxidation route; characterized in that: One of the oxidation routes is arranged at a position close to the bottom of the oxidation tank, and this oxidation route is a bottom route. 2. The apparatus according to claim 1, wherein: One of the oxidation routes is arranged at a position above the oxidation tank, and this oxidation route is an upper route, the oxidation routes run from back to front, and the upper route is in front of the bottom route.
3. The apparatus according to claim 2, wherein: The upper route is above the bottom route, the upper route is in a meandering structure, and the meandering structure includes a first lower route and a second upper route.
4. The apparatus according to claim 2, wherein: A pump is further arranged on the oxidation tank, the pump has a water suction pipe and a water outlet pipe, the water suction end of the water suction pipe is inside and above the oxidation tank, the upper route has a flushing pipe, the flushing pipe has a plurality of water flushing holes facing the upper route, and the water outlet pipe is connected to the flushing pipe.