Quartz boat carrier structure for reducing particles on surface of wafer
By designing a quartz boat structure and using a robotic arm to drive rollers to reduce friction, the problem of particle adsorption in non-cantilever paddle-type operations was solved, thus improving the surface quality of the wafer.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-03-07
- Publication Date
- 2026-04-03
AI Technical Summary
In the prior art, when a quartz boat or carrier in a non-cantilevered paddle-type operation enters or exits the furnace tube, it rubs against the bottom of the furnace tube, causing particles to adhere to the wafer surface and affecting wafer quality.
A quartz boat carrier structure was designed, comprising two parallel support rods, a connecting unit, a mounting component, and a roller unit. A robotic arm drives the push-pull rods, causing the rollers to move the boat carrier within the furnace tube, thereby reducing friction and minimizing particle generation.
It effectively reduces particle adsorption on the wafer surface, improves wafer surface quality, and is suitable for furnace tube surfaces with air inlet pipes and profile thermocouples.
Smart Images

Figure CN224084012U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to a quartz boat structure for reducing particles on the wafer surface, belonging to the field of integrated circuit or discrete device chip manufacturing technology. Background Technology
[0002] The horizontal diffusion furnace is the core equipment in the diffusion process. According to the operation mode, it can generally be divided into cantilever paddle operation, non-cantilever paddle operation, and soft landing operation.
[0003] Due to process requirements, some diffusion processes must adopt non-cantilever paddle-type operation (the quartz boat carrying the wafer is placed directly inside the furnace tube and in contact with the bottom of the furnace tube). However, some furnace tubes have air inlet pipes, profile thermocouples, etc. arranged on the bottom surface, which makes it impossible to use conventional quartz boats or quartz carriers.
[0004] In non-cantilever paddle-type operations, during the loading and unloading process, the quartz boat carrying the wafers or the boat carrier carrying the quartz boat rubs against the bottom of the furnace tube, which easily generates particles that adhere to the wafer surface, thus affecting the surface and parameter quality of the wafers. Summary of the Invention
[0005] The technical problem to be solved by this utility model is to provide a quartz boat structure that reduces particles on the wafer surface, which is simple in structure and easy to use, and reduces the adsorption of particles on the wafer surface caused by friction between the quartz boat or quartz boat carrier and the bottom of the furnace tube during the loading and unloading process.
[0006] The technical solution adopted by this utility model to solve the above problems is as follows: a quartz boat structure for reducing wafer surface particles, including two parallel support rods, which are fixedly connected by a connecting unit to form a boat body, and a quartz boat is supported on the boat body; a mounting member is provided at both ends of the boat body, and a push-pull rod is connected to the mounting member, and the other end of the push-pull rod is fixedly connected to a robot arm; roller units are symmetrically arranged inside the boat body, and the robot arm drives the push-pull rod to move forward or backward, so that the roller units drive the boat body to move inside the furnace tube.
[0007] The mounting component includes two inclined and symmetrically arranged mounting rods. One end of each mounting rod is fixed to the end of the corresponding side of the carrier body, and the other ends of the mounting rods are in contact with and fixedly connected. A reinforcing rib is provided between the two mounting rods to form a triangle.
[0008] The connecting unit includes multiple connecting ribs evenly distributed along the length of the support rod, and the spacing between adjacent connecting ribs matches the length of the quartz boat to be loaded.
[0009] The spacing between the two support rods is matched to the width of the quartz boat to be loaded.
[0010] Each roller unit includes a roller frame, on which two symmetrically arranged rollers are provided.
[0011] The support rod, connecting unit, mounting component, and roller unit are all made of quartz material.
[0012] Compared with the prior art, the advantages of this utility model are: a quartz boat structure for reducing particles on the wafer surface is simple in structure and easy to use; the robotic arm pushes the push-pull bar forward or backward, so that the roller drives the boat body to move in the furnace tube, which reduces the friction between the boat body and the furnace tube, that is, reduces the generation of particles, thereby reducing the occurrence of particles adsorbing on the wafer surface and improving the wafer surface quality. Attached Figure Description
[0013] Figure 1 This is a schematic diagram of a quartz boat structure for reducing particles on the wafer surface according to an embodiment of the present invention;
[0014] Figure 2 for Figure 1 Top view;
[0015] Figure 3 for Figure 1 AA section view;
[0016] In the diagram, 1 is the support rod, 2 is the connecting rib, 3 is the hanging rod, 4 is the reinforcing rib, 5 is the roller frame, and 6 is the roller. Detailed Implementation
[0017] The present invention will be further described in detail below with reference to the accompanying drawings and embodiments.
[0018] like Figure 1 , 2 As shown in Figure 3, a quartz boat structure for reducing wafer surface particles in this embodiment includes two parallel support rods, the spacing between which matches the width of the quartz boat to be loaded. The two support rods are fixedly connected by multiple connecting ribs, which are spaced apart along the length of the support rods to form the boat body, on which the quartz boat is supported. Hangers are provided at both ends of the boat body, used to fix push-pull rods. The other end of the push-pull rods is fixed to the diffusion furnace robot arm. A roller frame is symmetrically arranged inside the boat body, with both ends located on the inner sides of the two support rods. Two symmetrically arranged rollers are mounted on the roller frame, fixed to the roller frame by bearings, allowing the rollers to rotate on the roller frame. The robot arm pushes the push-pull rods forward or backward, causing the rollers to move the boat body within the furnace tube, reducing the friction between the boat body and the furnace tube, thus reducing particle generation and consequently reducing particle adsorption on the wafer surface, improving wafer surface quality.
[0019] The diameter of the quartz roller needs to be determined by a comprehensive consideration of the inner diameter of the furnace tube and the height of the bottom air inlet pipe and profile thermocouple, so that it can be used on the furnace tube road surface with air inlet pipe and profile thermocouple.
[0020] The spacing between the connecting ribs is determined according to the length of the quartz boat to be installed, so that the two ends of the quartz boat are supported on the adjacent connecting ribs.
[0021] The aforementioned mounting components include two inclined and symmetrically arranged mounting rods. One end of each mounting rod is fixed to the corresponding end of the vessel body, and the other ends of the mounting rods are in contact with and fixedly connected. Reinforcing ribs are also provided between the two mounting rods, forming a triangular hollow structure.
[0022] The aforementioned support rods, hanging rods, connecting ribs, reinforcing ribs, roller frames, and rollers are all made of quartz material.
[0023] This application features a simple and ingenious structure that is easy to use. It can be used on furnace tube surfaces with air inlet pipes and profile thermocouples, and reduces particle adsorption on the wafer surface during entry and exit from the carrier body, thereby improving the wafer surface quality.
[0024] In addition to the above embodiments, this utility model also includes other implementation methods. All technical solutions formed by equivalent transformation or equivalent substitution should fall within the protection scope of the claims of this utility model.
Claims
1. A quartz boat structure for reducing grain particles on wafer surface, characterized in that: The device includes two parallel support rods, which are fixedly connected by a connecting unit to form a boat carrier body. A quartz boat is supported on the boat carrier body. Hanging components are respectively provided at both ends of the boat carrier body, and push-pull rods are connected to the hanging components. The other end of the push-pull rods is fixedly connected to a robot arm. Roller units are symmetrically arranged inside the boat carrier body. The robot arm drives the push-pull rods to move forward or backward, so that the roller units drive the boat carrier body to move inside the furnace tube.
2. The quartz boat structure for reducing wafer surface particles according to claim 1, characterized in that: The mounting component includes two inclined and symmetrically arranged mounting rods. One end of each mounting rod is fixed to the end of the corresponding side of the carrier body, and the other ends of the mounting rods are in contact with and fixedly connected. A reinforcing rib is provided between the two mounting rods to form a triangle.
3. The quartz boat structure for reducing wafer surface particles according to claim 1, characterized in that: The connecting unit includes multiple connecting ribs spaced apart along the length of the support rod, and the spacing between adjacent connecting ribs matches the length of the quartz boat to be loaded.
4. The quartz boat structure for reducing wafer surface particles according to claim 1, characterized in that: The spacing between the two support rods is matched to the width of the quartz boat to be loaded.
5. The quartz boat structure for reducing wafer surface particles according to claim 1, characterized in that: Each roller unit includes a roller frame, on which two symmetrically arranged rollers are provided.
6. The quartz boat structure for reducing wafer surface particles according to claim 1, characterized in that: The support rod, connecting unit, mounting component, and roller unit are all made of quartz material.