Synthesizer and semiconductor preparation system
By designing a combination of a rotatable synthesis container, a protective container, a heating layer, and a detector, the problem of inconvenient loading and unloading of materials from sealed containers was solved, achieving an efficient and safe diffusion process and improving loading and unloading efficiency as well as temperature control accuracy.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-02-17
- Publication Date
- 2026-04-07
AI Technical Summary
The loading and unloading operations of sealed containers in existing diffusion processes are inconvenient, resulting in low loading and unloading efficiency.
Design a synthesis apparatus in which a synthesis container can be rotated to a loading and unloading position by a drive component. The opening of the synthesis container is tilted upward at the loading position and tilted downward at the unloading position. The opening is horizontal at the working position. Combined with components such as a protective container, a heating layer, a temperature detector, and a pressure detector, a safe and uniform diffusion process can be achieved.
It improves the efficiency of loading and unloading, ensures uniform temperature distribution and control precision, enhances safety, prevents container breakage and leakage, and improves the operational safety and effectiveness of the diffusion process.
Smart Images
Figure CN224092058U_ABST
Abstract
Description
Technical Field
[0001] This application belongs to the field of semiconductor fabrication technology, specifically relating to a synthesis apparatus and a semiconductor fabrication system. Background Technology
[0002] Semiconductor synthesis processes are key technologies for manufacturing semiconductor materials and devices, typically including chemical vapor deposition (CVD), physical vapor deposition (PVD), molecular beam epitaxy (MBE), liquid phase epitaxy (LPE), ion implantation, and diffusion. Among these, diffusion, driven by the thermal motion and concentration gradient of atoms, introduces impurity atoms into semiconductor materials at high temperatures to alter their electrical properties. Diffusion processes are usually performed within sealed containers; however, loading and unloading the sealed container is inconvenient when the container is horizontal. Utility Model Content
[0003] The technical problem to be solved by this application is that the loading and unloading operations of the sealed container in the existing diffusion process are inconvenient. In order to solve this technical problem, a synthesis apparatus and semiconductor preparation system that facilitates loading and unloading are provided.
[0004] The technical solution proposed in this application is as follows:
[0005] A synthesis apparatus, comprising:
[0006] Base;
[0007] Mounting plate, rotatably connected to the base;
[0008] A driving component is disposed on the base and connected to the mounting plate to drive the mounting plate to rotate;
[0009] A synthesis container is disposed on the mounting plate, and the synthesis container can pass through the loading position and the unloading position as it rotates with the mounting plate;
[0010] When the synthesis container is in the loading position, the opening of the synthesis container is tilted upward relative to the horizontal direction; when the synthesis container is in the unloading position, the opening of the synthesis container is tilted downward relative to the horizontal direction.
[0011] Using the above-described synthesis apparatus, during loading, the driving component rotates the synthesis container to the loading position to facilitate material loading; after the diffusion process is completed, the driving component rotates the synthesis container to the unloading position to facilitate material unloading. Therefore, this synthesis apparatus makes loading and unloading operations more convenient and improves loading and unloading efficiency.
[0012] Furthermore, the synthesis container can also pass through the working position as it rotates with the mounting plate; when the synthesis container is in the working position, the opening direction of the synthesis container is horizontal.
[0013] Furthermore, the synthesis apparatus also includes a heating layer and an insulation layer, the heating layer being disposed on the outside of the synthesis container, and the insulation layer being disposed on the outside of the heating layer.
[0014] Furthermore, the synthesis apparatus also includes a plurality of displacement sensors, which are spaced apart on the synthesis container and abut against the outer wall of the synthesis container.
[0015] Furthermore, the synthesis apparatus also includes a first pressure detector disposed in the synthesis container.
[0016] Furthermore, the synthesis apparatus also includes a first temperature detector and a second temperature detector. The first temperature detector is disposed on the heating layer to detect the temperature of the heating layer, and the second temperature detector abuts against the outer wall of the synthesis container to detect the temperature of the synthesis container.
[0017] Furthermore, the outer side of the synthesis container is divided into multiple heating zones along its length; the heating layer includes multiple heating elements, each of which is disposed over a corresponding heating zone;
[0018] The synthesis apparatus includes a plurality of first temperature detectors and second temperature detectors, each first temperature detector being disposed on a corresponding heating element, and each second temperature detector abutting against a corresponding heating zone.
[0019] Furthermore, the synthesis apparatus also includes a protective container disposed on the mounting plate, and the synthesis container is disposed within the protective container.
[0020] Furthermore, the protective container is provided with an air inlet and an air outlet;
[0021] The synthesis apparatus further includes an air intake assembly and an exhaust assembly. The air intake assembly is connected to the synthesis container through the air intake port, and the exhaust assembly is connected to the synthesis container through the exhaust port.
[0022] A semiconductor fabrication system includes the synthesis apparatus described above.
[0023] In summary, the synthesis apparatus and semiconductor fabrication system provided in this application have at least the following advantages:
[0024] 1. The synthesis container can tilt upwards and downwards, which facilitates loading and unloading and improves loading and unloading efficiency;
[0025] 2. A protective container is installed outside the synthesis container, which can provide physical protection and improve the uniformity of temperature distribution inside the synthesis container;
[0026] 3. The temperature of the heating layer and the synthesis container are detected by the first temperature detector and the second temperature detector respectively, thereby improving the accuracy of temperature control;
[0027] 4. Equip with a displacement sensor and a primary pressure detector to prevent excessive pressure from causing the synthesis container to shatter, thereby improving safety during use;
[0028] 5. A second pressure detector is installed to detect the pressure inside the protective container. Pressure changes can be used to determine whether there is a leak in the synthesis container and pipelines inside the protective container, thereby improving safety. Attached Figure Description
[0029] The accompanying drawings are provided to further understand this application and form part of the specification. They are used together with the embodiments of this application to explain this application and do not constitute a limitation thereof.
[0030] Figure 1 This is a schematic diagram of the synthesis apparatus provided in one embodiment of this application.
[0031] Label Explanation:
[0032] 110. Base; 111. Supporting slope; 120. Mounting plate; 130. Drive unit; 140. Synthesis container; 150. Protective container; 161. Heating layer; 162. Insulation layer; 171. First temperature detector; 172. Second temperature detector; 181. Intake assembly; 182. Exhaust assembly; 183. Displacement sensor; 184. First pressure detector; 185. Second pressure detector; 191. Controller; 192. Host computer. Detailed Implementation
[0033] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the scope of protection of this application.
[0034] In the description of this application, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are used only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the equipment or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this application.
[0035] This application provides a semiconductor fabrication system for preparing semiconductor materials or semiconductor devices. The semiconductor fabrication system includes a synthesis apparatus that synthesizes semiconductor materials using a diffusion process.
[0036] like Figure 1 As shown, in one embodiment, the synthesis apparatus includes a base 110, a mounting plate 120, a drive unit 130, and a synthesis container 140.
[0037] Mounting plate 120 is rotatably connected to base 110, and synthesis container 140 is disposed on mounting plate 120. Driving element 130 is disposed on base 110 and connected to mounting plate 120 to drive mounting plate 120 to rotate relative to base 110.
[0038] The synthesis container 140 can pass through the loading position and the unloading position as it rotates with the mounting plate 120. When the synthesis container 140 is in the loading position, the opening of the synthesis container 140 is tilted upward relative to the horizontal direction to facilitate the loading of materials; when the synthesis container 140 is in the unloading position, the opening of the synthesis container 140 is tilted downward relative to the horizontal direction to facilitate the unloading of materials from the synthesis container 140.
[0039] Using the above-described synthesis apparatus, during loading, the driving component 130 rotates the synthesis container 140 to the loading position to facilitate material loading; after the diffusion process is completed, the driving component 130 rotates the synthesis container 140 to the unloading position to facilitate material unloading. Therefore, this synthesis apparatus makes loading and unloading operations more convenient and improves loading and unloading efficiency.
[0040] Furthermore, the synthesis device can also pass through the working position during the rotation of the mounting plate 120. When the synthesis container 140 is in the working position, the opening direction of the synthesis container 140 is horizontal. Figure 1 As shown, the synthesis container 140 is in the working position at this time, and the material in the synthesis container 140 can be diffused. In the horizontal state, the diffusion can be more uniform, improve the effect of the diffusion process, and thus improve the quality of semiconductor materials and devices.
[0041] Combination Figure 1 It should be noted that, in the preferred embodiment, the synthesis container 140 is made of quartz material, and the opening of the synthesis container 140 is located at one end. Optionally, the synthesis container 140 is a quartz tube, quartz jar, or other quartz material container. Further, it can be determined that, in this embodiment, the opening direction of the synthesis container 140 is its own length direction. Therefore, when the synthesis container 140 is in the loading or unloading position, the synthesis container 140 is tilted relative to the horizontal direction, and the opening is tilted upwards or downwards; when the synthesis container 140 is in the working position, the synthesis container 140 is placed horizontally. Optionally, in this embodiment, when the synthesis container 140 is in the working position, the tilt angle of the synthesis container 140 relative to the horizontal direction is 0°; when the synthesis container 140 is in the loading or unloading position, the tilt angle of the synthesis container 140 relative to the horizontal direction is 10~20°.
[0042] In one embodiment, the base 110 has a supporting inclined surface 111, one end of the mounting plate 120 is rotatably connected to the top of the supporting inclined surface 111, and the driving member 130 is disposed at the bottom of the supporting inclined surface 111 and connected to the mounting plate 120 to drive the mounting plate 120 to rotate relative to the base 110, so that the synthesis container 140 on the mounting plate 120 can pass through the aforementioned loading position, unloading position, and working position. Specifically, the driving member 130 is a cylinder or a hydraulic cylinder, and the driving member 130 is hinged to the base 110, and the driving end of the driving member 130 is hinged to the mounting plate 120.
[0043] In one embodiment, the synthesis apparatus further includes a protective container 150, which is disposed on the mounting plate 120 and located on the top surface of the mounting plate 120. A synthesis container 140 is disposed within the protective container 150. As described above, the synthesis container 140 is preferably made of quartz. Therefore, the protective container 150 provides physical protection for the synthesis container 140, reducing the risk of breakage. Simultaneously, the protective container 150 also prevents the synthesis container 140 from being corrosive or contaminated by external substances or particles, maintaining cleanliness and performance stability, thereby ensuring the accuracy and repeatability of the diffusion process. Furthermore, the protective container 150 also needs to be kept sealed. If the synthesis container 140 breaks during the diffusion process, the protective container 150 can provide a certain degree of obstruction and protection, improving operational safety.
[0044] Optionally, the protective container 150 is made of stainless steel. The thermal conductivity of stainless steel helps to make the temperature distribution within the synthesis container 140 more uniform, and it also acts as a thermal buffer layer, making temperature changes within the synthesis container 140 more stable. This facilitates precise temperature control during the diffusion process and improves the consistency and uniformity of the diffusion effect.
[0045] In one embodiment, the synthesis apparatus further includes a heating layer 161, which covers the outside of the synthesis container 140 for heating the synthesis container 140. Further, the synthesis container 140 is divided into multiple heating zones along its length, and the heating layer 161 includes multiple heating elements, each covering a corresponding heating zone to heat that zone. By providing multiple heating zones and multiple heating elements for zoned heating, the uniformity of temperature distribution can be further improved. Furthermore, the synthesis apparatus also includes a heat insulation layer 162, which covers the outside of the heating layer 161 to provide heat insulation, preventing excessive heat loss and improving the accuracy of temperature control and the uniformity of temperature distribution within the synthesis container 140.
[0046] In one embodiment, the synthesis apparatus further includes a first temperature detector 171 and a second temperature detector 172. The first temperature detector 171 is disposed on the heating layer 161 and is used to detect the temperature of the heating layer 161. The second temperature detector 172 abuts against the outer wall of the synthesis container 140 to detect the temperature of the synthesis container 140, thereby more accurately detecting the temperature inside the synthesis container 140. At the same time, the action of the heating element is adjusted according to the detection results of the first temperature detector 171 and the second temperature detector 172, thereby improving the accuracy of temperature control.
[0047] Furthermore, there are multiple first temperature detectors 171 and multiple second temperature detectors 172. Each first temperature detector 171 is disposed on a corresponding heating element, and each second temperature detector 172 is in contact with a corresponding heating zone. By precisely controlling the multiple temperatures, the uniformity of temperature distribution is improved.
[0048] In one embodiment, the protective container 150 has an air inlet and an exhaust outlet; the synthesis apparatus further includes an air inlet assembly 181 and an exhaust assembly 182. The air inlet assembly 181 is connected to the synthesis container 140 through the air inlet to introduce gas into the synthesis container 140; the exhaust assembly 182 is connected to the synthesis container 140 through the exhaust outlet to cooperate with the air inlet assembly 181 to achieve gas replacement within the synthesis container 140. It should be noted that connecting pipes can be provided inside the protective container 150 to connect the air inlet and exhaust outlet to the synthesis container 140, thereby connecting the air inlet assembly 181 and the exhaust assembly 182 to the synthesis container 140. Optionally, specifically... Figure 1 In the illustrated embodiment, both the intake assembly 181 and the exhaust assembly 182 are equipped with self-regulating valves to facilitate gas flow.
[0049] It should be explained that during the heating process, the gas inside the synthesis container 140 can be replaced with nitrogen through the cooperation of the air inlet component 181 and the exhaust component 182, which can achieve gas protection and constant pressure inside the synthesis container 140 at the same time. After the diffusion process is completed, compressed air is introduced into the synthesis container 140 through the air inlet component 181, while the exhaust component 182 discharges the high temperature gas to quickly cool down the material inside the synthesis container 140.
[0050] In one embodiment, the synthesis apparatus further includes a plurality of displacement sensors 183, which are spaced apart from each other in the synthesis container 140 and abut against the outer wall of the synthesis container 140 to detect the displacement of the outer wall of the synthesis container 140, thereby determining whether the pressure in the synthesis container 140 is too high. If the pressure is too high, a portion of the gas in the synthesis container 140 can be discharged through the exhaust assembly 182 to reduce the pressure, preventing the synthesis container 140 from breaking due to excessive pressure and improving safety. Preferably, at least one of the plurality of displacement sensors 183 abuts against the end of the synthesis container 140 away from the opening, and the other displacement sensors 183 are spaced apart at least along the length of the synthesis container 140, or they are divided into multiple groups, with multiple groups of displacement sensors 183 spaced apart along the length of the synthesis container 140, and multiple displacement sensors 183 in each group spaced apart along the circumference of the synthesis container 140, to further improve the displacement detection accuracy and improve safety.
[0051] In one embodiment, the synthesis apparatus further includes a first pressure detector 184, which is disposed in the synthesis container 140 and used to detect the pressure inside the synthesis container 140. Thus, the first pressure detector 184, in conjunction with the aforementioned displacement sensor 183, provides more accurate and reliable monitoring through dual monitoring of pressure and displacement, further enhancing the safety of use.
[0052] In one embodiment, the synthesis apparatus further includes a second pressure detector 185, which is disposed in the protective container 150 and used to detect the pressure inside the protective container 150. Thus, based on the pressure changes within the protective container 150, it can be determined whether the synthesis container 140 or the pipeline connected to the synthesis container 140 is leaking. It should be explained that, under normal circumstances, pressure changes within the synthesis container 140 will cause it to expand and deform to some extent, and the temperature inside the protective container 150 will also rise, but these will not have a significant impact on the pressure inside the protective container 150. If a leak occurs, the pressure change within the protective container 150 will be more noticeable; therefore, the second pressure detector 185 can detect the pressure change within the protective container 150 to determine whether a gas leak has occurred.
[0053] In one embodiment, the synthesis apparatus further includes a controller 191 and a host computer 192. The controller 191 is connected to the aforementioned drive unit 130, heating unit, first temperature detector 171, second temperature detector 172, displacement sensor 183, first pressure detector 184, second temperature detector 172, and air intake assembly 181 and air exhaust assembly 182 to achieve automatic operation of the diffusion process of the synthesis apparatus. The host computer 192 is connected to the controller 191 to control the operating parameters of the synthesis apparatus.
[0054] To facilitate understanding of the technical solution of this application, this document combines... Figure 1 The working process of the synthesis apparatus in the above embodiments will be described as follows:
[0055] First, the mounting plate 120 is driven to rotate clockwise by the drive unit 130, causing the protective container 150 and the synthesis container 140 to tilt relative to the horizontal direction, with the openings of both tilted upwards. Material is added to the synthesis container 140, and then the synthesis container 140 and the protective container 150 are sealed. Next, the drive unit 130 drives the mounting plate 120 to rotate counterclockwise to a horizontal position.
[0056] The heating element heats the synthesis container 140. During heating, the inlet assembly 181 and the exhaust assembly 182 operate, replacing the gas inside the synthesis container 140 with nitrogen and ensuring pressure stability during the diffusion process. Simultaneously, the heating element can heat based on the detection results of the first temperature detector 171 and the second temperature detector 172 to ensure temperature accuracy. After the diffusion process is complete, the inlet assembly 181 inputs compressed gas into the synthesis container 140 and exhausts it through the exhaust assembly 182, causing rapid cooling of the material inside the synthesis container 140.
[0057] After cooling is complete, the drive unit 130 drives the mounting plate 120 to rotate counterclockwise, causing the protective container 150 and the synthesis container 140 to tilt relative to each other in the horizontal direction, with the openings of both tilted downwards. Unloading can then be completed by opening the openings of the protective container 150 and the synthesis container 140.
[0058] In summary, the synthesis apparatus and semiconductor fabrication system provided in this application have at least the following advantages:
[0059] 1. The synthesis container 140 can tilt upwards and downwards, thereby facilitating loading and unloading and improving loading and unloading efficiency;
[0060] 2. A protective container 150 is installed outside the synthesis container 140, which can provide physical protection and improve the uniformity of temperature distribution inside the synthesis container 140.
[0061] 3. The temperature of the heating layer 161 and the synthesis container 140 are detected by the first temperature detector 171 and the second temperature detector 172 respectively, thereby improving the accuracy of temperature control;
[0062] 4. A displacement sensor 183 and a first pressure detector 184 are installed to prevent the synthesis container 140 from breaking due to excessive pressure through dual monitoring, thereby improving the safety of use.
[0063] 5. A second pressure detector 185 is installed to detect the pressure inside the protective container 150. The pressure changes can be used to determine whether there is a leak in the synthesis container 140 and the pipeline inside the protective container 150, thereby improving safety.
[0064] Although embodiments of this application have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and variations can be made to these embodiments without departing from the principles and spirit of this application, the scope of which is defined by the appended claims and their equivalents.
Claims
1. A synthesis apparatus, characterized in that, include: Base; Mounting plate, rotatably connected to the base; A driving component is disposed on the base and connected to the mounting plate to drive the mounting plate to rotate; A synthesis container is disposed on the mounting plate, and the synthesis container can pass through the loading position and the unloading position as it rotates with the mounting plate; When the synthesis container is in the loading position, the opening of the synthesis container is tilted upward relative to the horizontal direction; when the synthesis container is in the unloading position, the opening of the synthesis container is tilted downward relative to the horizontal direction.
2. The synthesis apparatus according to claim 1, characterized in that, The synthesis container can also pass through the working position as it rotates with the mounting plate; when the synthesis container is in the working position, the opening direction of the synthesis container is horizontal.
3. The synthesis apparatus according to claim 1, characterized in that, The synthesis apparatus further includes a heating layer and an insulation layer, the heating layer being disposed on the outside of the synthesis container, and the insulation layer being disposed on the outside of the heating layer.
4. The synthesis apparatus according to claim 3, characterized in that, The synthesis apparatus also includes multiple displacement sensors, which are spaced apart on the synthesis container and abut against the outer wall of the synthesis container.
5. The synthesis apparatus according to claim 4, characterized in that, The synthesis apparatus further includes a first pressure detector, which is disposed in the synthesis container.
6. The synthesis apparatus according to claim 3, characterized in that, The synthesis apparatus further includes a first temperature detector and a second temperature detector. The first temperature detector is disposed on the heating layer to detect the temperature of the heating layer, and the second temperature detector abuts against the outer wall of the synthesis container to detect the temperature of the synthesis container.
7. The synthesis apparatus according to claim 6, characterized in that, The outer side of the synthesis container is divided into multiple heating zones along its length; the heating layer includes multiple heating elements, each of which is covered by a corresponding heating zone. The synthesis apparatus includes a plurality of first temperature detectors and second temperature detectors, each first temperature detector being disposed on a corresponding heating element, and each second temperature detector abutting against a corresponding heating zone.
8. The synthesis apparatus according to claim 1, characterized in that, The synthesis apparatus further includes a protective container, which is disposed on the mounting plate, and the synthesis container is disposed inside the protective container.
9. The synthesis apparatus according to claim 8, characterized in that, The protective container is provided with an air inlet and an exhaust outlet; The synthesis apparatus further includes an air intake assembly and an exhaust assembly. The air intake assembly is connected to the synthesis container through the air intake port, and the exhaust assembly is connected to the synthesis container through the exhaust port.
10. A semiconductor fabrication system, characterized in that, Includes the synthesis apparatus according to any one of claims 1-9.