Photoresistor emptying detection device and machine table

Abstract

The utility model discloses a photoresist emptying detection device and a machine table. The photoresist emptying detection device comprises a first gas detection sensor arranged on a photoresist container and a second gas detection sensor arranged on a photoresist pipeline, the device further comprises an analysis control system, and the analysis control system is connected with the first gas detection sensor and the second gas detection sensor and judges whether the photoresist is emptied or not according to detection results of the first gas detection sensor and the second gas detection sensor. Through the photoresist emptying detection method in which the two sensors are matched with each other, the actual consumption condition of the photoresist is accurately identified, the problem of bubbles in a pipeline is timely eliminated, and meanwhile, the photoresist allowance can be further confirmed according to signals of the sensors on the photoresist container. Manual confirmation is not needed, and production efficiency is improved.

Description

Technical Field

[0001] This utility model belongs to the field of semiconductor manufacturing, and in particular relates to a photoresist evaporation detection device and machine. Background Technology

[0002] In semiconductor processing systems, photoresist is an essential material in the photolithography coating process. Generally, infrared detection is used to check for cavities in the photoresist circuit to determine if replenishment is needed. Due to the influence of cavities in the liquid, scattering and reflection occur, causing changes in light intensity. The infrared receiver uses a photodetector to detect these changes and outputs a corresponding voltage signal to detect the presence of cavities. During operation, if a cavity is detected, it is determined that the photoresist is emptied, regardless of whether the photoresist is actually used up; the machine displays the same information. However, in reality, when the receiver detects a cavity, the photoresist may not actually be emptied, but rather contain air bubbles, requiring de-bubbling. Therefore, when the machine displays "empty," it cannot immediately determine whether the photoresist is actually used up; manual confirmation is necessary.

[0003] Therefore, in order to improve production efficiency, more accurately identify the actual consumption status of photoresist and eliminate air bubbles in the pipeline in a timely manner, it is necessary to provide a photoresist purging detection device and machine. Utility Model Content

[0004] The purpose of this invention is to solve all or part of the aforementioned problems by providing a photoresist venting detection device and machine. The device involves installing a set of gas detection sensors on both the photoresist container and the photoresist pipeline. The analysis and control system determines whether the photoresist has vented based on the detection signals from both sets of sensors, confirming whether to perform bubble removal or replace the photoresist. Simultaneously, the signal from the sensor on the photoresist container further confirms the remaining photoresist level. This photoresist venting detection method, using a dual-sensor approach, accurately identifies the actual consumption status of the photoresist and promptly eliminates air bubbles in the pipeline, eliminating the need for manual confirmation and improving production efficiency.

[0005] This invention provides a photoresist venting detection device, including a first gas detection sensor mounted on the photoresist container and a second gas detection sensor mounted on the photoresist pipeline; it also includes an analysis and control system, which is connected to both the first and second gas detection sensors and determines whether the photoresist has vented based on the detection results of the first and second gas detection sensors. This photoresist pipeline venting detection method, using a dual-sensor approach, accurately identifies the actual consumption status of the photoresist and promptly eliminates air bubbles in the pipeline, eliminating the need for manual confirmation and improving production efficiency.

[0006] The analysis and control system is configured to: determine that the photoresist container has been emptied when the detection result of the first gas detection sensor is emptied; and determine that there are air bubbles in the photoresist pipeline when the detection result of the first gas detection sensor is not emptied and the detection result of the second gas detection sensor is that there is a cavity.

[0007] The first gas detection sensor is a capacitive gas detection sensor, which has high sensitivity and good stability. By changing the capacitance, it can detect the photoresist margin in the photoresist container.

[0008] The capacitive gas detection sensor includes two electrodes, which are attached opposite each other to the bottle body. The length of each electrode is not less than the vertical distance between the lowest and highest liquid levels in the photoresist container. This effectively monitors the photoresist margin of the photoresist container, avoiding detection blind spots caused by changes in liquid level.

[0009] The second gas detection sensor is an infrared gas detection sensor. It has high detection sensitivity and utilizes the different optical properties of bubbles and photoresist to monitor the photoresist pipeline in real time.

[0010] The infrared gas detection sensor includes an infrared light emitter and an infrared light receiver; the infrared light emitter is installed on one side of the photoresistive conduit, and the infrared light receiver is installed on the other side of the photoresistive conduit, opposite to the infrared light emitter. This allows for effective detection of air bubbles in the photoresistive conduit.

[0011] A machine tool is also provided, employing the aforementioned photoresist venting detection device. Through the cooperation of the capacitive gas detection sensor and the infrared gas detection sensor, the actual consumption status of the photoresist is accurately identified, and air bubbles in the pipeline are promptly eliminated without manual verification, thus improving production efficiency.

[0012] The photoresist container comprises a bottle body and a cap, with the bottle body and cap tightly connected. This prevents external dust and impurities from entering, ensuring the quality and stability of the photoresist.

[0013] One end of the photoresist conduit extends into the bottle body through the bottle cap, and the other end is connected to a photoresist storage tank. This ensures that the photoresist can be smoothly extracted and delivered to the point of use, while improving work efficiency.

[0014] A control valve is installed on the photoresist pipeline to control the photoresist flow rate.

[0015] Compared with existing technologies, the advantages of this invention are as follows: A set of gas detection sensors is installed on both the photoresist container and the photoresist pipeline. The analysis and control system determines whether the photoresist has been emptied based on the detection signals from both sets of sensors, confirming the need for degassing or replacement. Simultaneously, the sensor signal from the photoresist container further confirms the remaining photoresist level. This dual-sensor cooperating method for detecting photoresist pipeline emptying accurately identifies the actual consumption of photoresist and promptly eliminates air bubbles in the pipeline, eliminating the need for manual confirmation and improving production efficiency. Attached Figure Description

[0016] To more clearly illustrate the technical solutions in the specific embodiments of this utility model, the drawings used in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this utility model. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0017] Figure 1 This is a schematic diagram of the optical resist evaporation detection device and its equipment.

[0018] Figure 2 This is a schematic diagram showing the state of the photoresist circuit without air bubbles.

[0019] Figure 3 This is a schematic diagram showing the presence of air bubbles in a photoresist circuit.

[0020] Reference numerals: 1-First gas detection sensor, 11-Electrode plate, 2-Second gas detection sensor, 21-Infrared light emitter, 22-Infrared light receiver, 3-Photoresist container, 31-Bottle body, 32-Bottle cap, 4-Photoresist pipeline, 5-Photoresist storage tank. Detailed Implementation

[0021] The technical solutions in specific embodiments of this utility model will be clearly and completely described below. Obviously, the described embodiments are only a part of the embodiments of this utility model, and not all of them. Based on the embodiments of this utility model, all other embodiments obtained by those skilled in the art without creative effort are within the protection scope of this utility model.

[0022] Example 1

[0023] This embodiment provides a photoresist evaporation detection device, such as... Figure 1As shown, the system includes a first gas detection sensor 1 mounted on the photoresist container 3 and a second gas detection sensor 2 mounted on the photoresist pipeline 4. It also includes an analysis and control system connected to both the first and second gas detection sensors 1 and 2, respectively, and determining whether the photoresist has been purged based on the detection results from both sensors. Through the cooperation of the two sensors, the actual consumption status of the photoresist is accurately identified, and air bubbles in the pipeline are promptly eliminated without manual verification, thus improving production efficiency.

[0024] The analysis and control system is configured to: determine that the photoresist container 3 has been emptied when the detection result of the first gas detection sensor 1 is emptied; and determine that there are air bubbles in the photoresist pipeline 4 when the detection result of the first gas detection sensor 1 is not emptied and the detection result of the second gas detection sensor 2 is that there is a cavity.

[0025] The first gas detection sensor 1 is a capacitive gas detection sensor. The capacitive gas detection sensor includes two plates 11, which are attached opposite each other to the photoresist container 3. The length of the plates 11 is not less than the vertical distance between the lowest and highest liquid levels in the photoresist container 3. After replacing the photoresist, the analysis and control system records the capacitance value at this time and identifies the new photoresist, calculates the capacitance value when this type of photoresist is emptied, and uses the difference between the two to calculate the photoresist margin. Continuous and stable monitoring of the photoresist margin in the photoresist container 1 avoids detection blind spots due to liquid level changes.

[0026] The second gas detection sensor 2 is an infrared gas detection sensor. The infrared gas detection sensor includes an infrared light emitter 21 and an infrared light receiver 22; the infrared light emitter 21 is installed on one side of the photoresistive conduit 4, and the infrared light receiver 22 is installed on the other side of the photoresistive conduit 4, opposite to the infrared light emitter 21. Figure 2 , 3 As shown, if there is a photoresistor in the photoresistor tube 4, the infrared light receiver 22 can detect the signal; if there is a cavity in the photoresistor tube, the presence of the cavity will cause a change in light intensity, and the infrared light receiver 22 will not be able to detect the signal.

[0027] Example 2

[0028] This embodiment provides a machine tool that uses the photoresist evaporation detection device described in Embodiment 1. The photoresist container 3 includes a bottle body 31 and a bottle cap 32. The bottle body 31 and the bottle cap 32 are sealed together, which can be achieved by using a sealing gasket or threaded seal. One end of the photoresist pipeline 4 extends into the bottle body 31 through the bottle cap 32, and the other end is connected to a photoresist storage tank 5 to prevent external dust and impurities from entering, ensuring the quality and stability of the photoresist. A control valve is provided on the photoresist pipeline 4 to control the photoresist flow rate. When the infrared gas detection sensor detects a cavity, but the capacitive gas detection sensor does not detect photoresist evaporation, the analysis and control system determines that the photoresist is not evaporated and requires defoaming treatment; when the capacitive gas detection sensor detects evaporation, the analysis and control system determines that the photoresist is evaporated and requires replacement.

[0029] The working principle of this utility model is as follows: A capacitive gas detection sensor is installed on the photoresist container 3, with two electrodes 11 attached to the bottle body 31. An infrared gas detection sensor is installed on the photoresist tube 4. When the infrared gas detection sensor detects a cavity, but the capacitive gas detection sensor does not detect the photoresist being emptied, the analysis and control system determines that the photoresist is not emptied and requires degassing. When the capacitive gas detection sensor detects emptying, the analysis and control system determines that the photoresist is emptied and needs to be replaced. After replacing the photoresist, the analysis and control system records the capacitance value between the two electrodes 11 and identifies the new photoresist. It also calculates the capacitance value between the electrodes 11 when this type of photoresist is emptied, and the difference between the two values ​​can be used to calculate the photoresist margin.

[0030] It will be apparent to those skilled in the art that this invention is not limited to the details of the exemplary embodiments described above, and that it can be implemented in other specific forms without departing from the spirit or essential characteristics of this invention. Therefore, the embodiments should be considered illustrative and non-limiting in all respects, and the scope of this invention is defined by the appended claims rather than the foregoing description. Thus, it is intended that all variations falling within the meaning and scope of equivalents of the claims be included within this invention. No reference numerals in the claims should be construed as limiting the scope of the claims.

Claims

1. A photoresist evaporation detection device, characterized in that, It includes a first gas detection sensor (1) disposed on the photoresist container (3) and a second gas detection sensor (2) disposed on the photoresist pipeline (4); it also includes an analysis and control system, which is connected to the first gas detection sensor (1) and the second gas detection sensor (2) respectively, and determines whether the photoresist is emptied based on the detection results of the first gas detection sensor (1) and the second gas detection sensor (2).

2. The optical resist evaporation detection device according to claim 1, characterized in that, The analysis and control system is configured such that: when the detection result of the first gas detection sensor (1) is that the container (3) has been emptied, the analysis and control system determines that the photoresist container (3) has been emptied; when the detection result of the first gas detection sensor (1) is that the container (3) has not been emptied and the detection result of the second gas detection sensor (2) is that there is a cavity, the analysis and control system determines that there are bubbles in the photoresist pipeline (4).

3. The optical resist evaporation detection device according to claim 1, characterized in that, The first gas detection sensor (1) is a capacitive gas detection sensor.

4. The optical resist evaporation detection device according to claim 3, characterized in that, The capacitive gas detection sensor includes two electrodes (11), which are attached to the photoresist container (3) with the electrodes (11) facing each other. The length of the electrodes (11) is not less than the vertical distance between the lowest liquid point and the highest liquid point of the photoresist container (3).

5. The optical resist evaporation detection device according to claim 1, characterized in that, The second gas detection sensor (2) is an infrared gas detection sensor.

6. The optical resist evaporation detection device according to claim 5, characterized in that, The infrared gas detection sensor includes an infrared light emitter (21) and an infrared light receiver (22); the infrared light emitter (21) is installed on one side of the photoresistive tube, and the infrared light receiver (22) is installed on the other side of the photoresistive tube (4), opposite to the infrared light emitter (21).

7. A machine tool, characterized in that, The photoresist evaporation detection device according to any one of claims 1-6 is used.

8. The machine tool according to claim 7, characterized in that, The photoresist container includes a bottle body (31) and a bottle cap (32), wherein the bottle body (31) and the bottle cap (32) are connected in a sealed manner.

9. The machine tool according to claim 8, characterized in that, One end of the photoresist tube extends into the bottle body (31) through the bottle cap (32), and the other end is connected to the photoresist storage tank (5).

10. The machine tool according to claim 7, characterized in that, A control valve is installed on the photoresist pipeline.

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