Wafer lifting, clamping and rotating cleaning device

Abstract

The utility model provides a wafer lifting, clamping and rotating cleaning device, and relates to the technical field of wafer cleaning, the wafer lifting, clamping and rotating cleaning device comprises a cleaning tank and a pre-cleaning mechanism, one side of the inner wall of the cleaning tank is provided with a transmission track, one side of the outer wall of the cleaning tank is provided with a feeding port, one side of the inner wall of the cleaning tank is provided with a megasonic cleaning machine, and the other side of the inner wall of the cleaning tank is provided with a feeding port. The pre-washing mechanism comprises a fixed aluminum plate and two servo motors, and speed reducers are arranged on the tops of the two servo motors. In the utility model, under the action of the two lifting cylinders and the four vertical guide rails, the two lifting cylinders and the four vertical guide rails drive the two fixed plates, the two movable plates, the four driving rotating shafts and the four rotating shaft sleeves to move upwards, so that the rotating shaft clamping sleeves are ensured to be on a track transmission plane and then extend out through the two clamping centering cylinders; the wafer is driven to rotate to drive the rotating shaft and the related components to move inwards together and stop after extending to the limiting positions of the first limiting screw and the second limiting screw, the air cylinder is magnetically opened and fed back in place, and at the moment, wafer clamping is completed.

Description

Technical Field

[0001] This utility model relates to the field of wafer cleaning technology, and in particular to a wafer lifting, clamping and rotating cleaning device. Background Technology

[0002] A wafer is a thin sheet used in semiconductor manufacturing, usually made of single-crystal silicon. Its diameter can range from a few millimeters to hundreds of millimeters. It is mainly used to manufacture integrated circuits (ICs), sensors and other electronic components. The surface of a wafer is precision polished to ensure that it is flat and smooth, suitable for subsequent microfabrication processes. During the wafer manufacturing process, dust, chemical residues and other impurities can be adsorbed on the surface, which may affect the quality of subsequent processes.

[0003] In the existing technology, the drive components of existing equipment are often installed below the cleaning tank, which is inconvenient to install and debug and occupies a lot of space. It is not conducive to the layout of gas and liquid pipelines at the bottom of the equipment. The integration is poor. The drive shafts need to be installed and positioned separately. Errors need to be corrected manually one by one, which is time-consuming and labor-intensive. The drive shafts of existing equipment are all driven by independent servo motors. The position is adjusted by the servo-driven screw to ensure stable wafer clamping and that the speed meets the process requirements. This is costly and cumbersome to control. Utility Model Content

[0004] The purpose of this invention is to solve the problem that existing equipment often has its drive components installed below the cleaning tank, which is inconvenient to install and debug and occupies a lot of space. Therefore, a wafer lifting, clamping and rotating cleaning device is proposed.

[0005] To achieve the above objectives, the present invention adopts the following technical solution: a wafer lifting, clamping, and rotating cleaning device, comprising a cleaning tank and a pre-washing mechanism, wherein a transmission track is provided on one side of the inner wall of the cleaning tank, a feed inlet is provided on one side of the outer wall of the cleaning tank, and a mega-sound cleaning machine is provided on one side of the inner wall of the cleaning tank.

[0006] The pre-washing mechanism includes a fixed aluminum plate and two servo motors. Each of the two servo motors is equipped with a speed reducer on its top. Four vertical guide rails are fixedly installed on one side of the outer wall of the fixed aluminum plate, and four horizontal guide rails are fixedly installed on one side of the outer wall of the fixed aluminum plate. Each of the two speed reducers is fixedly equipped with a movable plate on its top, and the outer walls of the two movable plates are connected to the interior of the fixed aluminum plate. Each of the two movable plates is fixedly equipped with a waterproof cover on its top.

[0007] Preferably, two lifting cylinders are fixedly installed on the top of the fixed aluminum plate, and the output ends of the two lifting cylinders are fixedly connected to the bottom of the two moving plates.

[0008] Preferably, a motor mounting plate is fixedly installed on the top of each of the two movable plates, and one side of the outer wall of each of the two motor mounting plates is fixedly connected to the opposite side of the outer wall of each of the two reducers.

[0009] Preferably, two connecting plates are fixedly installed on one side of the outer wall of the four vertical guide rails, and a clamping and centering cylinder is fixedly installed on one side of the outer wall of each of the two connecting plates, and the output end of the two clamping and centering cylinders is fixedly connected to one side of the outer wall of the four horizontal guide rails.

[0010] Preferably, two first limiting screws are provided on one side of the outer wall of the fixed aluminum plate, a limiting block is fixedly installed on one side of the outer wall of each of the two connecting plates, a second limiting screw is provided on one side of the outer wall of each of the two limiting blocks, and a floating joint is fixedly installed on the output end of each of the two clamping and centering cylinders.

[0011] Preferably, each of the two clamping and centering cylinders is provided with an adjusting valve at its top, and each of the two reducers is fixedly mounted with a first synchronous pulley, the outer walls of the two first synchronous pulleys being meshed with a first synchronous belt.

[0012] Preferably, two fixing plates are provided on the other side of the outer wall of the four transverse guide rails. The inner surface of each of the two fixing plates is rotatably connected to four drive shafts through four bearings. The outer surface of each of the four drive shafts is fixedly installed with a shaft sleeve.

[0013] Preferably, a second synchronous pulley is fixedly installed at the bottom of each of the two drive shafts, and the inner surface of each of the two first synchronous belts is meshed with the outer surface of each of the two second synchronous pulleys, and a third synchronous pulley is fixedly installed on the outer surface of each of the four drive shafts.

[0014] Preferably, an oil seal end cap is provided on one side of the inner wall of each of the two fixing plates, and an oil seal is provided on one side of the inner wall of each of the two fixing plates.

[0015] Preferably, the outer walls of both waterproof covers are fixedly fitted with waterproof plates, and the outer walls of the four third synchronous pulleys are meshed with two second synchronous belts.

[0016] Compared with the prior art, the advantages and positive effects of this utility model are as follows:

[0017] In this invention, two lifting cylinders and four vertical guide rails drive two fixed plates, two moving plates, four drive shafts, and four shaft sleeves to move upward, ensuring that the shaft clamping sleeves are on the track transmission plane. Then, two clamping and centering cylinders extend, causing the wafer rotation drive shaft and related components to move inward together. After extending to the limit positions of the first and second limit screws, they stop, and the cylinder magnetic feedback is in place. At this point, the wafer clamping is complete. The pre-washing component is installed on the side of the cleaning tank. Installation and debugging are quick, maintenance is simple, and it occupies little space, freeing up the bottom layer of the equipment frame. It facilitates the installation and arrangement of gas and liquid pipelines, has good overall integrity, and the components can be installed and calibrated individually before being placed into the machine. The shaft height error is small, and installation and adjustment are convenient.

[0018] In this invention, after clamping is completed, two servo motors and two reducers drive two first synchronous pulleys and two first synchronous belts to rotate, thereby driving two second synchronous pulleys to rotate, which in turn drive two third synchronous pulleys and two second synchronous belts to rotate, thereby pulling four drive shafts to rotate. The end drive shafts are connected to the inner shafts and then pulled to rotate by the second synchronous belts, realizing the synchronous rotation of the four drive shafts and meeting the speed required for the wafer cleaning process. The four drive shafts are driven by two sets of servo motors, and the lifting, clamping and centering are all composed of cylinders, which is low in cost and easy to control. Attached Figure Description

[0019] Figure 1 A perspective view of a wafer lifting, clamping, and rotating cleaning device is provided for this utility model;

[0020] Figure 2 Partial figures of a wafer lifting, clamping, and rotating cleaning device are provided for this utility model;

[0021] Figure 3 This invention provides a partial schematic diagram of a wafer lifting, clamping, and rotating cleaning device.

[0022] Figure 4 A partial top view of a wafer lifting, clamping, and rotating cleaning device is provided for this utility model;

[0023] Figure 5 A partial side view of a wafer lifting, clamping, and rotating cleaning device is provided for this utility model.

[0024] Legend:

[0025] 1. Cleaning tank; 2. Pre-washing mechanism; 3. Conveyor track; 4. Feed inlet; 5. Megasonic cleaning machine; 201. Fixed aluminum plate; 202. Servo motor; 203. Reducer; 204. Vertical guide rail; 205. Horizontal guide rail; 206. Moving plate; 207. Waterproof cover; 208. Lifting cylinder; 209. Motor fixing plate; 210. Connecting plate; 211. Clamping and centering cylinder; 212. First limit screw; 21 3. Limiting block; 214. Second limiting screw; 215. Floating joint; 216. Adjusting valve; 217. First synchronous pulley; 218. First synchronous belt; 219. Fixing plate; 220. Drive shaft; 221. Shaft sleeve; 222. Second synchronous pulley; 223. Third synchronous pulley; 224. Oil seal end cap; 225. Oil seal; 226. Bearing; 227. Waterproof plate; 228. Second synchronous belt. Detailed Implementation

[0026] To better understand the above-mentioned objectives, features and advantages of this utility model, the present utility model will be further described below with reference to the accompanying drawings and embodiments. It should be noted that, unless otherwise specified, the embodiments and features in the embodiments of this application can be combined with each other.

[0027] Many specific details are set forth in the following description in order to provide a full understanding of the present invention. However, the present invention may also be implemented in other ways different from those described herein. Therefore, the present invention is not limited to the specific embodiments disclosed in the following specification.

[0028] Example 1: As Figures 1-5 As shown, this utility model provides a wafer lifting, clamping, and rotating cleaning device, including a cleaning tank 1 and a pre-washing mechanism 2. A transmission track 3 is provided on one side of the inner wall of the cleaning tank 1, a feed inlet 4 is provided on one side of the outer wall of the cleaning tank 1, and a mega-sound cleaning machine 5 is provided on one side of the inner wall of the cleaning tank 1.

[0029] The pre-washing mechanism 2 includes a fixed aluminum plate 201 and two servo motors 202. A reducer 203 is mounted on the top of each of the two servo motors 202. Four vertical guide rails 204 and four horizontal guide rails 205 are fixedly installed on one side of the outer wall of the fixed aluminum plate 201. Moving plates 206 are fixedly installed on the top of each of the two reducers 203, and the outer walls of the two moving plates 206 are connected to the interior of the fixed aluminum plate 201. Waterproof covers 207 are fixedly installed on the top of each of the two moving plates 206. Two lifting cylinders 208 are fixedly installed on the top of the fixed aluminum plate 201, and the output ends of the two lifting cylinders 208 are fixedly connected to the bottom of the two moving plates 206. The tops of the two moving plates 206 are fixedly... Motor mounting plates 209 are installed, and one side of the outer wall of each of the two motor mounting plates 209 is fixedly connected to the opposite side of the outer wall of each of the two reducers 203. Two connecting plates 210 are fixedly installed on one side of the outer wall of each of the four vertical guide rails 204. Clamping and centering cylinders 211 are fixedly installed on one side of the outer wall of each of the two connecting plates 210, and the output ends of the two clamping and centering cylinders 211 are fixedly connected to one side of the outer wall of each of the four horizontal guide rails 205. Two first limit screws 212 are provided on one side of the outer wall of the fixed aluminum plate 201. Limit blocks 213 are fixedly installed on one side of the outer wall of each of the two connecting plates 210. Second limit screws 214 are provided on one side of the outer wall of each of the two limit blocks 213. Floating joints 215 are fixedly installed on the output ends of the two clamping and centering cylinders 211.

[0030] The overall effect of Embodiment 1 is as follows: Activating two lifting cylinders 208 causes two moving plates 206 and two connecting plates 210 to move along four vertical guide rails 204 until they reach the appropriate positions, specifically the positions of the two first limiting screws 212. This allows the two fixing plates 219, four drive shafts 220, and four shaft sleeves 221 to move upwards, ensuring the shaft clamping sleeves are on the plane of the transmission track 3. Then, activating two clamping and centering cylinders 211 causes the wafer to rotate. The shaft 220 and related components move inward along the four transverse guide rails 205. After extending to the limit position of the second limit screw 214, it stops. At this time, the two clamping and centering cylinders 211 are magnetically activated, and the wafer clamping work is completed. Since the pre-washing mechanism 2 is installed on the side of the cleaning tank 1, the installation and debugging are quick, the maintenance is simple, the space occupied is small, the bottom layer of the equipment frame is freed up, the gas and liquid pipelines are easy to install and arrange, the overall integrity is good, the components can be installed and calibrated separately, and then placed into the machine. The shaft height error is small, and the installation and adjustment are convenient.

[0031] Example 2: As Figures 2-5As shown, each of the two clamping and centering cylinders 211 has a regulating valve 216 on its top. The output ends of both reducers 203 are fixedly mounted with first synchronous pulleys 217. The outer walls of both first synchronous pulleys 217 are meshed with first synchronous belts 218. Two fixing plates 219 are provided on the other side of the outer walls of the four transverse guide rails 205. The inner walls of the two fixing plates 219 are rotatably connected to four drive shafts 220 via four bearings 226. The outer walls of the four drive shafts 220 are fixedly mounted with shaft sleeves 221. The bottom of two drive shafts 220... Each of the four drive shafts 220 has a second synchronous pulley 222 fixedly installed on its outer wall, and the inner walls of the two first synchronous belts 218 are meshed with the outer walls of the two second synchronous pulleys 222. The outer walls of the four drive shafts 220 are fixedly installed with third synchronous pulleys 223. The inner walls of the two fixed plates 219 are provided with oil seal end caps 224 and oil seals 225. The outer walls of the two waterproof covers 207 are fixedly installed with waterproof plates 227. The outer walls of the four third synchronous pulleys 223 are meshed with two second synchronous belts 228.

[0032] The overall effect of Embodiment 2 is as follows: after clamping, two servo motors 202 and two reducers 203 are started, causing them to drive two first synchronous pulleys 217 and two first synchronous belts 218 to rotate. Since the four drive shafts 220 are rotatably connected to the two fixed plates 219 through four bearings 226, and the four oil seal end caps 224 and four oil seals 225 ensure the effectiveness of the four bearings 226 and the four drive shafts 220. Furthermore, since two second synchronous pulleys 222 are fixedly installed at the bottom of two drive shafts 220, and the two first synchronous belts 218 are meshed with the two second synchronous pulleys 222, the two second synchronous pulleys 222 and the two drive shafts 218 can be driven. The rotating shaft 220 rotates, and since a third synchronous pulley 223 is fixedly installed at the bottom of each of the four driving shafts 220, and the four third synchronous pulleys 223 are connected and driven by two second synchronous belts 228, the two third synchronous pulleys 223 and the two second synchronous belts 228 can rotate simultaneously, thereby pulling the four driving shafts 220 and the four shaft sleeves 221 to rotate. The end driving shaft 220 is rotated through the inner driving shaft 220 and then pulled by the second synchronous belt 228 to rotate, which can realize the synchronous rotation of the four driving shafts 220 to meet the speed required for the wafer cleaning process. The four driving shafts 220 are driven by two sets of servo motors 202, and the lifting, clamping and centering are all composed of cylinders, which is low in cost and easy to control.

[0033] Working principle: First, the robotic arm places the wafer into the cleaning tank 1 along the feed inlet 4. When the sensor in the tank detects the correct position, the pre-washing mechanism 2 performs a clamping and rotating cleaning action. Then, through the action of two lifting cylinders 208 and four vertical guide rails 204, it drives two fixed plates 219, two moving plates 206, four drive shafts 220, and four shaft sleeves 221 to move upward, ensuring that the shaft clamping sleeves are on the plane of the transfer track 3. Then, the two clamping and centering cylinders 211 extend, driving the wafer to rotate. The rotating shaft 220 and related components move inward together, extending to the limit positions of the first limit screw 212 and the second limit screw 214, and then stop. The two clamping and centering cylinders 211 are magnetically activated, completing the wafer clamping operation. Then, the two servo motors 202 and the two reducers 203 drive the two first synchronous pulleys 217 and the two first synchronous belts 218 to rotate, thereby driving the two second synchronous pulleys 222 to rotate, and further driving the two third synchronous pulleys 223 and the two second synchronous belts 228 to rotate. This, in turn, pulls the four drive shafts 220 to rotate. The end drive shaft 220 is then rotated via the inner drive shaft 220 and pulled by the second synchronous belt 228, achieving synchronous rotation of the four drive shafts 220 to meet the speed requirements of the wafer cleaning process. After cleaning, the two clamping and centering cylinders 211 retract, releasing the wafer. The two lifting cylinders 208 retract, and the four drive shafts 220 and the four shaft sleeves 221 are lowered below the plane of the transfer track 3, facilitating the transfer of the wafer to the next station. In summary, by using the wafer pre-washing mechanism... 2. Transfer to the side of the cleaning tank 1, and develop relevant wafer clamping and cleaning according to the installation position. The four drive shafts 220 of the corresponding structure for wafer lifting and centering are driven by two sets of servo motors 202. Lifting, clamping and centering are all composed of cylinders, which is low in cost and easy to control. The pre-washing mechanism 2 is installed on the side of the cleaning tank 1. It is quick to install and debug, easy to maintain and repair, occupies little space, frees up the bottom layer of the equipment frame, facilitates the installation and layout of gas and liquid pipelines, has good integrity, and the components can be installed and calibrated separately before being placed into the machine. The shaft height error is small and the installation and adjustment are convenient.

[0034] The above are merely preferred embodiments of this utility model and are not intended to limit the utility model in any other way. Any person skilled in the art may make changes or modifications to the above-disclosed technical content to create equivalent embodiments for application in other fields. However, any simple modifications, equivalent changes, and modifications made to the above embodiments based on the technical essence of this utility model without departing from the technical solution of this utility model shall still fall within the protection scope of this utility model.

Claims

1. A wafer lifting, clamping, and rotating cleaning device, comprising a cleaning tank (1) and a pre-washing mechanism (2), characterized in that: A transmission track (3) is provided on one side of the inner wall of the cleaning tank (1), a feed inlet (4) is provided on one side of the outer wall of the cleaning tank (1), and a mega-sound cleaning machine (5) is provided on one side of the inner wall of the cleaning tank (1). The pre-washing mechanism (2) includes a fixed aluminum plate (201) and two servo motors (202). A reducer (203) is provided on the top of each of the two servo motors (202). Four vertical guide rails (204) are fixedly installed on one side of the outer wall of the fixed aluminum plate (201). Four horizontal guide rails (205) are fixedly installed on one side of the outer wall of the fixed aluminum plate (201). A movable plate (206) is fixedly installed on the top of each of the two reducers (203). The outer walls of the two movable plates (206) are connected to the interior of the fixed aluminum plate (201). A waterproof cover (207) is fixedly installed on the top of each of the two movable plates (206).

2. The wafer lifting, clamping, and rotating cleaning device according to claim 1, characterized in that: Two lifting cylinders (208) are fixedly installed on the top of the fixed aluminum plate (201), and the output ends of the two lifting cylinders (208) are fixedly connected to the bottom of the two moving plates (206).

3. The wafer lifting, clamping, and rotating cleaning device according to claim 2, characterized in that: The top of each of the two movable plates (206) is fixedly mounted with a motor fixing plate (209), and one side of the outer wall of each of the two motor fixing plates (209) is fixedly connected to the opposite side of the outer wall of each of the two reducers (203).

4. The wafer lifting, clamping, and rotating cleaning device according to claim 3, characterized in that: Two connecting plates (210) are fixedly installed on one side of the outer wall of the four vertical guide rails (204). A clamping and centering cylinder (211) is fixedly installed on one side of the outer wall of each of the two connecting plates (210), and the output end of the two clamping and centering cylinders (211) is fixedly connected to one side of the outer wall of the four horizontal guide rails (205).

5. The wafer lifting, clamping, and rotating cleaning device according to claim 4, characterized in that: Two first limiting screws (212) are provided on one side of the outer wall of the fixed aluminum plate (201), and a limiting block (213) is fixedly installed on one side of the outer wall of each of the two connecting plates (210). A second limiting screw (214) is provided on one side of the outer wall of each of the two limiting blocks (213), and a floating joint (215) is fixedly installed on the output end of each of the two clamping and centering cylinders (211).

6. The wafer lifting, clamping, and rotating cleaning device according to claim 5, characterized in that: The top of each of the two clamping and centering cylinders (211) is provided with a regulating valve (216), and the output ends of the two reducers (203) are fixedly installed with first synchronous pulleys (217), and the outer walls of the two first synchronous pulleys (217) are meshed with first synchronous belts (218).

7. The wafer lifting, clamping, and rotating cleaning device according to claim 6, characterized in that: Two fixing plates (219) are provided on the other side of the outer wall of the four transverse guide rails (205). The inner surface of the two fixing plates (219) is rotatably connected to four drive shafts (220) through four bearings (226). The outer surface of the four drive shafts (220) is fixedly installed with shaft sleeves (221).

8. The wafer lifting, clamping, and rotating cleaning device according to claim 7, characterized in that: Two of the drive shafts (220) are fixedly mounted with second synchronous pulleys (222) at their bottoms, and the inner walls of the two first synchronous belts (218) are meshed with the outer walls of the two second synchronous pulleys (222). The outer walls of the four drive shafts (220) are fixedly mounted with third synchronous pulleys (223).

9. A wafer lifting, clamping, and rotating cleaning device according to claim 8, characterized in that: An oil seal end cap (224) is provided on one side of the inner wall of each of the two fixing plates (219), and an oil seal (225) is provided on one side of the inner wall of each of the two fixing plates (219).

10. A wafer lifting, clamping, and rotating cleaning device according to claim 9, characterized in that: The outer walls of the two waterproof covers (207) are fixedly fitted with waterproof plates (227), and the outer walls of the four third synchronous pulleys (223) are meshed with two second synchronous belts (228).

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