Deposition furnace device for depositing coatings on surface of matrix and inner walls of pores of matrix

Abstract

The utility model relates to the technical field of semiconductor materials, in particular to a deposition furnace device for depositing coatings on the surface of a base body and the inner walls of pores of the base body, which comprises a furnace body, a deposition device and a heating component, a plurality of supporting assemblies used for containing a base body are arranged in the deposition device. Air inlet holes are formed in the positions, close to the supporting assemblies, of the side wall of the deposition device; a gas outlet is formed in the top of the deposition device. According to the deposition furnace device, reaction gas needed by deposition of a coating is input into the deposition device through the gas inlet hole, and the reaction gas introduced into the deposition device is located below the base body and permeates to the upper portion of the base body from the lower portion of the base body under the action of pressure, airflow and the like; therefore, the uniformity and consistency of the coatings deposited on the surface of the substrate and the inner side walls of the pores are ensured, and the phenomenon that the pores are blocked by the deposited coatings is avoided; the problems in the prior art are solved.

Description

TECHNICAL FIELD

[0001] The utility model relates to the technical field of semiconductor material, especially relate to a kind of deposition furnace device for depositing coating on the surface of base body and its pore inner wall. BACKGROUND

[0002] In recent years, integrated circuit field presents the rapid development situation;Compared with traditional monocrystalline silicon material, silicon carbide crystal material exhibits more broad application prospect in high-frequency, high-voltage, high-temperature power and radio frequency semiconductor and other frontier fields by its unique physical and chemical characteristics.The commonly used method for preparing silicon carbide crystal is physical vapor transport method (PVT) ;Due to the significant difference between the vapor pressure of silicon and carbon, part of carbon powder will enter the crystal growth interface during the growth of silicon carbide single crystal, and then carbon inclusion defects will be caused, which will adversely affect the quality and performance of the crystal.At present, it is common to place airflow filtering assembly between powder and silicon carbide seed crystal to filter out most of the carbon powder mixed in the atmosphere, thereby reducing the probability of carbon powder entering the crystal growth interface and ensuring the quality of crystal growth;Airflow filtering assembly is usually selected from porous graphite sheet, porous tantalum carbide, etc.;However, porous graphite is easily corroded by silicon-rich atmosphere generated by sublimation of silicon carbide powder, becoming a new source of carbon particles or appearing phenomena such as burning of porous graphite and blocking of pores on porous graphite, losing normal filtering function and use effect;Porous tantalum carbide ceramic material has poor mechanical properties and is extremely fragile, which can easily break during installation, handling, processing or use, increasing the cost of silicon carbide crystal growth;Therefore, it is urgent to improve porous graphite material or tantalum carbide ceramic material.

[0003] In the prior art, traditional chemical vapor deposition (CVD) and deposition device are usually used to deposit coating on porous graphite material to reduce the corrosion of silicon-rich atmosphere on porous graphite to some extent;However, the deposition device cannot uniformly deposit coating on the surface of porous graphite and the inner wall of its pores, and some pores on porous graphite are also blocked by the deposited coating, affecting its filtering effect.

[0004] The utility model provides a kind of deposition furnace device for depositing coating on the surface of base body and its pore inner wall to solve the problems existing in prior art, such as the existing deposition device cannot uniformly deposit coating on the surface of base body and the inner wall of its pores, and pores are blocked by deposited coating. UTILITY MODEL CONTENTS

[0005] The utility model aims at: providing a kind of deposition furnace device for depositing coating on the surface of base body and its pore inner wall to solve the problems existing in prior art, such as the existing deposition device cannot uniformly deposit coating on the surface of base body and the inner wall of its pores, and pores are blocked by deposited coating.

[0006] The utility model discloses a technical scheme: a deposition furnace device for depositing coating on the surface of base body and the inner wall of pore, which comprises a furnace body, a deposition device arranged in the furnace body and a heating assembly.

[0007] The deposition device is internally provided with a plurality of support assemblies for placing base bodies; the deposition device is provided with air inlet holes on the side wall thereof and close to each support assembly; and the deposition device is provided with an air outlet on the top thereof.

[0008] Preferably, the support assembly comprises a fixed support, and a plurality of needle-shaped support columns vertically arranged on the fixed support; the fixed support is fixedly arranged on the side wall of the deposition device.

[0009] The air inlet hole close to the support assembly is arranged on the side wall of the deposition device at a position higher than the height of the fixed support and lower than the height of the needle-shaped support column.

[0010] Preferably, the fixed support is a support ring; and at least three needle-shaped support columns are arranged on the support ring at intervals.

[0011] The outer diameter of the support ring is the same as the inner diameter of the deposition device, so that the outer side surface of the support ring abuts against the inner side wall of the deposition device.

[0012] Preferably, the fixed support comprises at least three support plates arranged at the same height on the side wall of the deposition device at intervals; and at least one needle-shaped support column is vertically arranged on each support plate.

[0013] Preferably, the heating assembly comprises an electric resistance heating element; the electric resistance heating element is arranged on the circumferential side of the deposition device and is arranged at intervals with the deposition device.

[0014] The electric resistance heating element is made of graphite material or made of any one of tungsten, molybdenum and tantalum in the form of simple substance or alloy material.

[0015] Preferably, the furnace body is further provided with a heat preservation assembly; and the heat preservation assembly is arranged between the heating assembly and the furnace body.

[0016] Compared with the prior art, the utility model has the following advantages:

[0017] (1) The utility model provides a kind of deposition furnace device for depositing coating on the surface of matrix and its pore inner wall, the deposition furnace device is inputed the reaction gas required for deposition coating to the inside of deposition device by gas inlet hole, and make the reaction gas passed into the inside of deposition device be in the lower of matrix, under the action of pressure, gas flow etc., it is penetrated from the lower of matrix to the upper of matrix, so that reaction gas can uniformly reach on the surface of matrix and on the inner wall of its pore, to ensure the uniformity and consistency of deposition coating on the surface of matrix and on the inner wall of its pore, avoid the phenomenon that deposited coating blocks pore to occur;The problems that existing deposition device in the prior art cannot uniformly deposit coating on the surface of matrix and on the inner wall of its pore, pore can be blocked by deposited coating etc. BRIEF DESCRIPTION OF DRAWINGS

[0018] The utility model will be further described below in connection with the drawings and examples:

[0019] Figure 1 It is the structure schematic view of the deposition furnace device described in the utility model;

[0020] Figure 2 It is the structure schematic view of the deposition furnace device described in the utility model Figure 1 It is the enlarged view of P area in it;

[0021] Figure 3 It is the structure schematic view of the deposition furnace device described in other embodiments of the utility model;

[0022] Figure 4 It is the structure schematic view of the deposition furnace device described in other embodiments of the utility model;

[0023] Wherein: 1, furnace body;2, deposition device;3, support assembly;31, fixed support piece;32, needle-shaped support column;4, gas inlet hole;41, gas pipeline;42, regulating valve;5, gas outlet;6, matrix;7, heat preservation component;8, heating assembly. DETAILED DESCRIPTION

[0024] The content of the utility model will be further explained in detail in connection with specific examples:

[0025] A kind of deposition furnace device for depositing coating on the surface of matrix and its pore inner wall, including furnace body 1, deposition device 2, heating assembly 8 being arranged in the inside of furnace body 1.

[0026] The furnace body 1 is made of stainless steel; in other embodiments, the furnace body 1 can be made of other materials with high strength, high temperature resistance, certain heat insulation performance, corrosion resistance, such as copper, aluminum, iron, etc. The furnace body 1 also needs to be provided with an openable sealing door to ensure that the inside of the furnace body 1 is in a good sealed state during the operation of the device, preventing foreign matter from entering the inside of the furnace body 1 and affecting the deposition effect.

[0027] The heating assembly 8 is arranged on the side of the deposition device 2, used for heating the deposition device 2, so that the temperature inside the deposition device 2 reaches the temperature condition required for deposition reaction; and the heating assembly 8 and the deposition device 2 need to maintain a certain distance, which helps to achieve uniform heating of the deposition device 2, while avoiding direct contact between the heating assembly 8 and the deposition device 2, which may cause damage to the heating assembly 8 and the deposition device 2 or other safety hazards. In this embodiment, the heating assembly 8 includes a resistance heating element made of graphite material, which is arranged as a heating body on the side of the deposition device 2 for heating the deposition device 2; while in other embodiments, the heating assembly 8 can include a resistance heating element made of tungsten, molybdenum, tantalum or copper, etc.

[0028] The deposition device 2 is made of graphite material; as shown in Figure 1 The inside of the deposition device 2 is provided with five support assemblies 3 for placing the substrate 6, and the five support assemblies 3 are arranged at intervals to ensure that the substrate 6 can be stably placed and uniformly heated during the deposition process; as shown in Figure 2As shown, the side wall of the deposition device 2 is provided with a plurality of gas inlet holes 4 near each support assembly 3, the gas inlet holes 4 are connected with the external gas conveying system through the gas conveying pipeline 41, and are used for introducing the reaction gas into the interior of the deposition device 2; the gas pressure of the plurality of gas inlet holes 4 on the deposition device 2 gradually decreases from the bottom to the top of the deposition device 2, so that the deposition device 2 has a certain pressure difference from top to bottom; and the pressure difference of the gas pressure of the adjacent two gas inlet holes 4 is 0.005-0.05 bar, that is, the gas pressure of the gas inlet hole 4 relatively closer to the bottom of the deposition device 2 is greater than that of the gas inlet hole 4 far away from the bottom of the deposition device 2; therefore, the gas conveying pipeline 41 is also provided with an adjusting valve 42 for adjusting the gas pressure of each gas inlet hole. The top of the deposition device 2 is also provided with a gas outlet 5 connected with the external exhaust system, which is used for timely exhausting the gas in the deposition reaction process and the waste gas generated in the deposition reaction, so as to maintain the balance of the gas pressure in the furnace body 1 and the stability of the reaction environment. The support assembly 3 includes a fixed support 31 and a needle-shaped support column 32 vertically arranged on the fixed support 31; and the fixed support 31 includes four support plates uniformly and spacedly arranged at the same height on the side wall of the deposition device 2, and one needle-shaped support column 32 is vertically arranged on each support plate; so as to ensure that the substrate 6 can be stably placed parallel to the bottom of the deposition device 2; the gas inlet hole 4 near each support assembly 3 is arranged at a position higher than the height of the support plate but lower than the height of the needle-shaped support column 32, so as to make the reaction gas introduced into the interior of the deposition device 2 be below the substrate 6 and penetrate from the lower part of the substrate 6 to the upper part of the substrate 6 under the action of pressure and gas flow, so that the reaction gas can uniformly reach the surface of each substrate 6, thereby ensuring the uniformity and consistency of the deposition reaction. In other embodiments, the side wall, bottom and top of the deposition device 2 are made of a material resistant to high temperature, corrosion and having a certain strength, such as graphite material, ceramic material and the like, so as to ensure stable operation in a high temperature and specific gas environment; preferably, graphite material is used. Meanwhile, in other embodiments, such as Figure 3 As shown, the interior of the deposition device 2 can also be provided with only one support assembly 3, so that the deposition furnace device can perform deposition treatment on only one substrate 6 at a time; similarly, the deposition device 2 can also be provided with a plurality of support assemblies 3, so that the deposition furnace device can simultaneously perform deposition treatment on a plurality of substrates 6; the fixed support 31 can include at least three support plates spacedly arranged at the same height on the side wall of the deposition device 2, and at least one needle-shaped support column 32 is arranged on each support plate; such as Figure 4As shown, the fixed support 31 can also include a support ring, at least three needle-shaped support columns 32 are arranged on the support ring in intervals; and the outer diameter of the support ring is the same as the inner diameter of the deposition device 2, so that the outer side surface of the support ring abuts against the inner side wall of the deposition device 2, thereby fixing the position of the support ring; the fixed support 31 can also be designed into other structures or shapes that can meet the fixing and supporting functions. In the present embodiment or in other embodiments, the support plate, the support ring, the needle-shaped support column 32 and the like need to be made of high-strength, high-temperature-resistant materials, such as graphite, ceramic materials, alloy materials and the like, to withstand the weight of the substrate 6 and various stresses during deposition; preferably, the needle-shaped support column 32 and the support plate or the support ring are made of the same material, and the tip of the needle-shaped support column 32 needs to be finely processed to reduce the contact area with the substrate 6 and avoid damaging the surface of the substrate 6, while being able to stably support the substrate 6 and prevent the substrate 6 from shaking or shifting during deposition.

[0029] In addition, the interior of the deposition device 2 is also provided with a heat preservation assembly 7, and the heat preservation assembly 7 is arranged between the heating assembly 8 and the furnace body 1. The heat preservation assembly 7 can be made of high-efficiency heat insulation materials, such as ceramic fiber cotton, aluminum silicate fiber felt and the like, which can effectively reduce the heat loss of the heat generated by the heating assembly 8 to the outside of the furnace body 1, reduce energy consumption, maintain the stability of the internal temperature of the furnace body 1, and improve the overall thermal efficiency and working performance of the deposition furnace device; the thickness of the heat preservation assembly 7 can be controlled within the range of 50-200mm.

[0030] The above embodiments are only for illustrating the technical concept and characteristics of the present application, and the purpose is to enable those skilled in the art to understand the content of the present application and implement it, and cannot limit the protection scope of the present application. For those skilled in the art, it is obvious that the present application is not limited to the details of the above exemplary embodiments, and can be implemented in other specific forms without departing from the spirit or basic characteristics of the present application, therefore, from any point of view, the embodiments should be regarded as exemplary and non-limiting, the scope of the present application is defined by the appended claims rather than the above description, therefore, all changes falling within the meaning and scope of the equivalent elements of the claims are intended to be included in the present application.

Claims

1. A deposition furnace apparatus for depositing a coating on a surface of a substrate and on inner walls of pores thereof, characterized by, The deposition furnace device comprises a furnace body (1), a deposition device (2) arranged inside the furnace body (1), and a heating assembly (8); The deposition device (2) is internally provided with a plurality of support assemblies (3) for placing substrates (6); the deposition device (2) is provided with air inlet holes (4) on the side wall thereof and close to each support assembly (3); and the top of the deposition device (2) is provided with an air outlet (5).

2. The deposition furnace apparatus for depositing a coating on a surface of a substrate and on inner walls of pores of the substrate according to claim 1, characterized by: The support assembly (3) comprises a fixed support (31) and a plurality of needle-shaped support columns (32) vertically arranged on the fixed support (31); the fixed support (31) is fixedly arranged on the side wall of the deposition device (2); The air inlet hole (4) close to the support assembly (3) is arranged on the side wall of the deposition device (2) at a position higher than the height of the fixed support (31) and lower than the height of the needle-shaped support column (32).

3. A deposition furnace apparatus for depositing a coating on a surface of a substrate and on inner walls of pores of the substrate according to claim 2, characterized in that: The fixed support (31) is a support ring; at least three needle-shaped support columns (32) are arranged on the support ring at intervals; The outer diameter of the support ring is the same as the inner diameter of the deposition device (2), so that the outer side surface of the support ring is in abutment with the inner side wall of the deposition device (2).

4. The deposition furnace apparatus for depositing a coating on a surface of a substrate and on inner walls of pores of the substrate according to claim 2, characterized by: The fixed support (31) comprises at least three support plates arranged at the same height on the side wall of the deposition device (2) at intervals; and at least one needle-shaped support column (32) is vertically arranged on each support plate.

5. The deposition furnace apparatus for depositing a coating on a surface of a substrate and on inner walls of pores of the substrate according to claim 2, characterized by: The heating assembly (8) comprises an electric resistance heating element; the electric resistance heating element is arranged on the peripheral side of the deposition device (2) and is arranged at intervals with the deposition device (2); The electric resistance heating element is made of graphite material or made of any one of tungsten, molybdenum, tantalum, or an alloy material.

6. The deposition furnace apparatus for depositing a coating on a surface of a substrate and on inner walls of pores of the substrate according to claim 2, characterized by: The inside of the furnace body (1) is further provided with a heat preservation assembly (7); the heat preservation assembly (7) is arranged between the heating assembly (8) and the furnace body (1).

Images