Chamber auxiliary structure for improving stability of etching machine

Abstract

The utility model relates to the technical field of etching machines, and discloses a chamber auxiliary structure for improving the stability of an etching machine, which comprises a cavity and a gas inlet, a shielding case is arranged at the center of the upper inner wall of the cavity, a coupling coil is arranged at the upper part of the center of the outer side of the shielding case, and a support table is arranged at the center of the lower inner wall of the cavity. A substrate is arranged at the center of the upper end face of the supporting table, an auxiliary device is arranged at the center of the upper end face of the supporting table and comprises an annular block, a plurality of through holes are formed in the center of the outer side of the annular block in an up-and-down mode, a first magnetic block is arranged at one end of the annular block, and a second magnetic block is arranged at the other end of the annular block. The first magnetic block and the second magnetic block attract each other, and an insertion ring is arranged at the center of the lower end face of the annular block. According to the utility model, the uniformity and consistency of etching can be improved through the auxiliary device, so that the stability of the etching process is improved.

Description

TECHNICAL FIELD

[0001] The utility model relates to etching machine technical field especially relates to improve etching machine stability with chamber auxiliary structure. BACKGROUND

[0002] In the semiconductor manufacturing process, etching machine is a kind of key process equipment, is used to remove the part not needed on material surface by chemical reaction or physical action, to form the microstructure required, and its etching process precision, stability and consistency are crucial.

[0003] The traditional etching machine when using, due to its gas supply and distribution aspect exists the insufficient, leads to the uneven distribution of gas in the chamber, makes it easy to cause the influence etching uniformity and consistency, further influence semiconductor device's performance and yield, thereby reduce the etching process stability, therefore, the technical personnel of the prior art provides the chamber auxiliary structure for improving etching machine stability to solve the problems presented in the above background technology. SUMMARY

[0004] The utility model discloses a chamber auxiliary structure for improving etching machine stability is provided to solve the shortcomings in the prior art, and the auxiliary device can improve the uniformity and consistency of etching, thereby improving the etching process stability.

[0005] To achieve the above object, the utility model provides the following technical scheme: chamber auxiliary structure for improving etching machine stability, including cavity and gas inlet, the gas inlet is arranged at the upper end surface center of cavity, the cavity upper inner wall center is equipped with shield, the shield outer side center is equipped with coupling coil on upper place, the cavity lower inner wall center is equipped with support station, the support station upper end surface center is equipped with substrate, the cavity front end surface center is equipped with sealing door on lower place, the support station upper end surface center is equipped with auxiliary device;

[0006] The auxiliary device includes annular block, the annular block is arranged at the upper end surface of support station, a plurality of through holes are arranged in the upper and lower of the annular block outer side center, the first magnetic block is arranged at one end of the annular block, the second magnetic block is arranged at the other end of the annular block, the first magnetic block and the second magnetic block are mutually adsorbed, and the insertion ring is arranged at the center of the lower end surface of the annular block.

[0007] Through the through hole of the annular block, the gas flow and uniform distribution can be realized, and the uniformity and consistency of etching can be improved, thereby improving the etching process stability, and the first magnetic block and the second magnetic block are mutually adsorbed, so that the annular block can be quickly fixed and disassembled.

[0008] Further, the support table upper end face center is provided with a slot, the slot is connected between the ring, the two inner side wall center of the slot is provided with a ring-shaped protrusion, the two ring-shaped protrusions are respectively clamped between the ring, the two inner side wall center of the slot is provided with a rubber block, and the two rubber blocks are respectively provided with a clamping block;

[0009] Through the above technical scheme, through the sleeve connection of the ring and the slot, and through the cooperation of the ring-shaped protrusion and the rubber block, the clamping block can clamp the ring, the quick disassembly and positioning of the ring-shaped block are realized, the operator can quickly insert and pull out the ring, and the operation convenience and maintenance efficiency of the equipment are improved.

[0010] Further, the two clamping blocks are provided with arc blocks at the upper and lower end faces, and the rubber block, the clamping block and the arc block are annular in shape, and the ring-shaped protrusion is elastic rubber;

[0011] Through the above technical scheme, when the ring is inserted into the slot, the ring-shaped protrusion is elastic rubber, which can clamp the ring through elastic deformation, and provide preliminary fixation.

[0012] Further, four adjusting devices are circularly arranged at the lower center of the inner wall of the shielding cover, the adjusting device comprises a flange plate, the flange plate is arranged at the inner wall of the shielding cover, a fixed block is arranged at the center of one side of the flange plate, a micro motor is arranged at the center of the inner side wall of the fixed block, a rotating shaft is arranged at the output end of the micro motor, and guide vanes are fixedly connected to one end of the rotating shaft;

[0013] Through the above technical scheme, the rotating shaft is driven to rotate by the micro motor, and the guide vanes are driven to rotate by the rotating shaft, so that the rotation speed and angle of the guide vanes can be adjusted, the dynamic adjustment of gas flow can be realized, the flow path and speed of the gas can be changed, and the precise control of the gas flow in the cavity can be realized, thereby improving the uniformity and consistency of etching.

[0014] Further, a plurality of bolts are circularly arranged at the center of one side of the flange plate, and the plurality of bolts are sequentially penetrated through the flange plate and the shielding cover to the inside of the shielding cover;

[0015] Through the above technical scheme, the fastening effect of the bolts can satisfy the accurate positioning and firm fixation of the flange plate on the shielding cover, so that displacement or loosening caused by vibration or gas flow during etching is prevented.

[0016] Further, the rotating shaft penetrates through the inner side wall of the fixed block to the side wall of the fixed block, and is rotatably connected with the fixed block through a bearing;

[0017] Through the above technical scheme, the rotation connection between the rotating shaft and the fixed block is realized through the bearing, so that the rotating shaft can be kept stable and smooth during rotation.

[0018] The utility model has the advantages of the following:

[0019] 1、The utility model discloses a cavity auxiliary structure for improving the stability of etching machine, which comprises a cavity body, a rotating shaft, a fixed block, a ring block, a first magnetic block, a second magnetic block, a ring protrusion and a rubber block.

[0020] 2、The utility model discloses a cavity auxiliary structure for improving the stability of etching machine, which comprises a cavity body, a rotating shaft, a fixed block, a ring block, a first magnetic block, a second magnetic block, a ring protrusion and a rubber block. BRIEF DESCRIPTION OF DRAWINGS

[0021] Figure 1 It is a perspective view of the cavity auxiliary structure for improving the stability of etching machine.

[0022] Figure 2 It is a side sectional view of the cavity auxiliary structure for improving the stability of etching machine.

[0023] Figure 3 It is a perspective view of the auxiliary device of the cavity auxiliary structure for improving the stability of etching machine.

[0024] Figure 4 It is an enlarged view of A in the utility model. Figure 2

[0025] It is an enlarged view of B in the utility model. Figure 5 Figure 2

[0026] Legend:

[0027] ​​1, cavity; 2, gas inlet; 3, shield; 4, coupling coil; 5, support table; 6, substrate; 7, sealing door; 8, auxiliary device; 801, annular block; 802, through hole; 803, first magnetic block; 804, second magnetic block; 805, ring; 806, slot; 807, annular protrusion; 808, rubber block; 809, clamping block; 810, arc block; 9, adjusting device; 901, flange; 902, bolt; 903, fixed block; 904, micro motor; 905, rotating shaft; 906, guide vane. DETAILED DESCRIPTION

[0028] The technical solutions in the embodiments of the utility model will be clearly and completely described below with reference to the drawings in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, rather than all the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by those skilled in the art without creative labor fall within the scope of protection of the utility model.

[0029] Referring to Figures 1-5 An embodiment provided by the utility model: improve the chamber auxiliary structure for etching machine stability, including cavity 1 and gas inlet 2, gas inlet 2 is arranged at the upper end surface center of cavity 1, the inner wall center of cavity 1 is equipped with shield 3, the outer side center of shield 3 is equipped with coupling coil 4, the lower inner wall center of cavity 1 is equipped with support table 5, the upper end surface center of support table 5 is equipped with substrate 6, the lower center of the front end surface of cavity 1 is equipped with sealing door 7, the upper end surface center of support table 5 is equipped with auxiliary device 8, through auxiliary device 8, the uniformity and consistency of etching can be improved, so that the etching process stability is improved.

[0030] The lower center of the inner wall of shield 3 is circularly arranged with four adjusting devices 9, adjusting device 9 includes flange 901, flange 901 is arranged at the inner wall of shield 3, the center of one side of flange 901 is equipped with fixed block 903, the inner side wall center of fixed block 903 is equipped with micro motor 904, the output end of micro motor 904 is equipped with rotating shaft 905, one end of rotating shaft 905 is fixedly connected with guide vane 906, rotating shaft 905 is rotated by micro motor 904, and guide vane 906 is rotated by rotating shaft 905, so that the rotating speed and angle of guide vane 906 can be adjusted, the dynamic adjustment of gas flow can be realized, the flow path and speed of gas can be changed, the accurate control of gas flow in cavity 1 is realized, so that the uniformity and consistency of etching are improved.

[0031] A plurality of bolts 902 are arranged in a circular array at the center of one side of the flange plate 901, and pass through the flange plate 901 and the shielding cover 3 in sequence to the inside of the shielding cover 3. The fastening of the bolts 902 ensures the accurate positioning and firm fixing of the flange plate 901 on the shielding cover 3, preventing displacement or loosening due to vibration or gas flow during etching.

[0032] The end of the rotating shaft 905 passes through an inner side wall of the fixed block 903 to the side wall of the fixed block 903, and is rotatably connected to the fixed block 903 through a bearing. The rotating shaft 905 is rotatably connected to the fixed block 903 through a bearing, ensuring smooth rotation of the rotating shaft 905.

[0033] As shown in Figure 2 , 3 , 4, the auxiliary device 8 includes an annular block 801 arranged on the upper end face of the support table 5. A plurality of through holes 802 are arranged in an up-down array at the center of the outer side of the annular block 801. A first magnetic block 803 is arranged at one end of the annular block 801, and a second magnetic block 804 is arranged at the other end of the annular block 801. The first magnetic block 803 and the second magnetic block 804 are mutually attracted. An insertion ring 805 is arranged at the center of the lower end face of the annular block 801. The through holes 802 of the annular block 801 allow gas to flow and be uniformly distributed, improving the uniformity and consistency of etching, thereby improving the stability of the etching process. The mutual attraction between the first magnetic block 803 and the second magnetic block 804 allows the annular block 801 to be quickly fixed and detached.

[0034] An insertion slot 806 is arranged at the center of the upper end face of the support table 5 and is connected to the insertion ring 805. Ring-shaped protrusions 807 are arranged at the upper ends of the two inner side walls of the insertion slot 806. The two ring-shaped protrusions 807 are clamped to the insertion ring 805. Rubber blocks 808 are arranged at the lower ends of the two inner side walls of the insertion slot 806. Clamping blocks 809 are arranged at the ends of the two rubber blocks 808. The insertion ring 805 is connected to the insertion slot 806, and the ring-shaped protrusions 807 and the rubber blocks 808 work together to clamp the insertion ring 805 with the clamping blocks 809, allowing the annular block 801 to be quickly assembled and disassembled and accurately positioned. This facilitates the insertion and removal of the insertion ring 805 by the operator, improving the operational convenience and maintenance efficiency of the equipment.

[0035] Arc-shaped blocks 810 are arranged at the upper and lower end faces of the two clamping blocks 809. The rubber blocks 808, the clamping blocks 809, and the arc-shaped blocks 810 are all ring-shaped. The ring-shaped protrusions 807 are made of elastic rubber. When the insertion ring 805 is inserted into the insertion slot 806, the elastic rubber of the ring-shaped protrusions 807 deforms to clamp the insertion ring 805, providing preliminary fixation.

[0036] Working principle: in order to improve the stability of the etching machine chamber auxiliary structure using, through the etching gas from the gas inlet 2 into the cavity 1 inside, again through the shield 3 for shielding external electromagnetic interference, ensure the stability of the plasma generated, again through the coupling coil 4 for generating radio frequency electromagnetic field, excitation reaction gas to form plasma, again through the micro motor 904 drive shaft 905 rotation, again through the shaft 905 drive guide vane 906 rotation, make it meet the ability to adjust the rotation speed and angle of guide vane 906, can realize the dynamic adjustment of gas flow, and can change the flow path and speed of gas, realize the precise control of the gas flow in the cavity 1, thereby improving the uniformity and consistency of etching.

[0037] Through the through hole 802 of the ring block 801, it can be used for gas flow and uniform distribution, and can improve the uniformity and consistency of etching, thereby improving the stability of etching process, and the mutual adsorption between the first magnetic block 803 and the second magnetic block 804 makes the ring block 801 realize fast fixing and dismounting, and the cooperation of the ring convex block 807 and the rubber block 808 makes the clamping block 809 clamp the ring 805, realizes the fast mounting and dismounting and precise positioning of the ring block 801, and makes it convenient for the operator to quickly insert and pull out the ring 805, thereby improving the operation convenience and maintenance efficiency of the equipment, so as to complete the etching of the substrate 6.

[0038] Finally, it should be pointed out that: the above only for the preferred embodiments of the present application, and not for limiting the present application, although the foregoing detailed description of the present application is made with reference to the foregoing embodiments, for the skilled in the art, it can still modify the technical solutions recorded in the foregoing embodiments, or make equivalent replacement for part of the technical features, any modification, equivalent replacement, improvement, etc. within the spirit and principles of the present application, should be included in the protection scope of the present application.

Claims

1. Chamber auxiliary structure for improving the stability of etching machine, comprising a cavity (1) and a gas inlet (2), the gas inlet (2) is arranged at the center of the upper end face of the cavity (1), characterized in that: The cavity (1) is provided with a shielding cover (3) at the center of the upper inner wall, a coupling coil (4) is arranged at the center of the lower outer wall of the shielding cover (3), a supporting table (5) is arranged at the center of the lower inner wall of the cavity (1), a substrate (6) is arranged at the center of the upper end surface of the supporting table (5), a sealing door (7) is arranged at the center of the lower end surface of the cavity (1), and an auxiliary device (8) is arranged at the center of the upper end surface of the supporting table (5). The auxiliary device (8) comprises an annular block (801), the annular block (801) is arranged at the upper end surface of the supporting table (5), a plurality of through holes (802) are arranged in an upper and lower arrangement mode at the center of the outer side of the annular block (801), a first magnetic block (803) is arranged at one end of the annular block (801), a second magnetic block (804) is arranged at the other end of the annular block (801), the first magnetic block (803) and the second magnetic block (804) are mutually adsorbed, and an insertion ring (805) is arranged at the center of the lower end surface of the annular block (801).

2. The chamber assist structure for improving etcher stability of claim 1, wherein: The center of the upper end surface of the supporting table (5) is provided with a slot (806), the slot (806) is connected in a sleeved mode with the insertion ring (805), the upper end of the center of the two inner side walls of the slot (806) is provided with an annular protrusion (807), the two annular protrusions (807) are clamped to the insertion ring (805) respectively, the lower end of the center of the two inner side walls of the slot (806) is provided with a rubber block (808), and the end of the two rubber blocks (808) is provided with a clamping block (809).

3. The chamber assist structure for improving stability of an etcher as defined in claim 2, wherein: The upper and lower end surfaces of the two clamping blocks (809) are provided with arc-shaped blocks (810), the shapes of the rubber blocks (808), the clamping blocks (809) and the arc-shaped blocks (810) are annular respectively, and the annular protrusions (807) are elastic rubber.

4. The chamber assist structure for improving stability of an etcher of claim 1, wherein: Four adjusting devices (9) are arranged in a circular arrangement mode at the lower center of the inner wall of the shielding cover (3), the adjusting device (9) comprises a flange plate (901), the flange plate (901) is arranged at the inner wall of the shielding cover (3), a fixed block (903) is arranged at the center of one side of the flange plate (901), a micro motor (904) is arranged at the center of one inner side wall of the fixed block (903), a rotating shaft (905) is arranged at the output end of the micro motor (904), and a guide vane (906) is fixedly connected to one end of the rotating shaft (905).

5. The chamber assist structure for improving stability of an etcher as defined in claim 4, wherein: A plurality of bolts (902) are arranged in a circular arrangement mode at the center of one side of the flange plate (901), and the plurality of bolts (902) pass through the flange plate (901) and the shielding cover (3) in sequence to the inside of the shielding cover (3).

6. The chamber assist structure for improving stability of an etcher as defined in claim 4, wherein: The end of the rotating shaft (905) penetrates through one inner side wall of the fixed block (903) to one side wall of the fixed block (903), and is rotatably connected with the fixed block (903) through a bearing.

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