Thinning machine

Abstract

The thinning machine comprises a rotary table assembly, a grinding assembly, a liquid receiving disc and a sealing assembly, the rotary table assembly is used for bearing a to-be-machined part, the grinding assembly is used for grinding the to-be-machined part on the rotary table assembly, the liquid receiving disc is used for receiving waste liquid, and the sealing assembly comprises an annular sealing groove and a flange structure; the annular sealing groove is formed in the liquid receiving disc and used for storing sealing liquid, the flange structure comprises an annular drainage flange and an annular sealing flange, the annular drainage flange is used for guiding waste liquid on the rotary table assembly to flow into the liquid receiving disc, and the annular sealing flange is arranged between the annular drainage flange and the rotary table assembly; and the sealing ring is used for being inserted into the sealing liquid in the annular sealing groove. The problem that in the prior art, sealing is conducted through a sealing ring, and defects exist can be effectively solved.

Description

Technical Field

[0001] This application relates to the field of semiconductor processing equipment technology, and in particular to a thinning machine. Background Technology

[0002] In related technologies, during the chip manufacturing process, a thinning machine is needed to thin the wafer so that the wafer with a smaller thickness can be used to manufacture more complex integrated circuits.

[0003] When using a thinning machine for thinning, the wafer is placed on a turntable assembly and thinned by a grinding assembly. A drip tray can also collect wastewater. In related technologies, sealing rings are typically installed between the turntable assembly and the drip tray. These sealing rings seal against both the turntable assembly and the drip tray to prevent silicon powder, water mist, and other contaminants generated during the grinding process from escaping into the thinning machine and contaminating it.

[0004] However, using sealing rings has its shortcomings. On the one hand, due to machining errors in both the turntable assembly and the drip tray, the gap between the turntable assembly and the drip tray where the sealing ring is installed also has errors. When this gap is too small, the sealing ring is compressed too much, causing resistance when the turntable assembly rotates, making it difficult to turn. When the gap is too large, the sealing ring does not contact the turntable assembly and / or the drip tray, and the sealing effect fails.

[0005] On the other hand, since the turntable assembly rotates during operation, it will cause the seals to wear out, especially when the gap is too small, which will further aggravate the wear of the seals. This requires the seals to be replaced regularly, which will increase costs. Utility Model Content

[0006] In view of the above-mentioned shortcomings in the related technologies, this application provides a thinning machine to solve the problem of the shortcomings of the sealing by the sealing ring in the related technologies.

[0007] To address the aforementioned technical problems, in a first aspect, this application provides a thinning machine, which includes:

[0008] A turntable assembly, rotatably arranged about its own main rotation axis, the turntable assembly being used to carry the workpiece to be processed;

[0009] A grinding assembly for grinding the workpiece on the turntable assembly;

[0010] A liquid receiving tray is provided around the main rotation axis and disposed on the outside of the turntable assembly. The liquid receiving tray is used to receive waste liquid.

[0011] A sealing assembly, the sealing assembly comprising:

[0012] An annular sealing groove is provided on the liquid receiving tray and arranged around the main rotation axis, and is used to store sealing liquid.

[0013] A flange structure, the flange structure comprising:

[0014] An annular drainage flange is provided around the main rotation axis and disposed on the outside of the turntable assembly. The annular drainage flange is used to guide the waste liquid on the turntable assembly into the receiving tray.

[0015] An annular sealing flange is provided, which surrounds the main rotation axis and is disposed between the annular drainage flange and the turntable assembly. The annular sealing flange is used to insert into the sealing fluid in the annular sealing groove.

[0016] In a possible implementation of the first aspect, both the annular drainage flange and the annular sealing flange extend vertically, with the annular drainage flange positioned directly above the liquid receiving tray and connected to the turntable assembly.

[0017] The flange structure further includes:

[0018] A connecting segment is disposed between the annular drainage flange and the annular sealing flange. One end of the connecting segment is connected between the upper and lower ends of the annular drainage flange, and the other end is connected to the upper end of the annular sealing flange.

[0019] In a possible implementation of the first aspect, the opening of the annular sealing groove is oriented vertically, and the annular sealing groove includes:

[0020] First inner wall;

[0021] The second inner sidewall is disposed opposite to the first inner sidewall and is located on the side of the first inner sidewall close to the turntable assembly. The upper end of the second inner sidewall is higher than the upper end of the first inner sidewall.

[0022] In one possible implementation of the first aspect, the thinning machine further includes:

[0023] A liquid level detection element, wherein the liquid level detection element is used to detect the liquid level of the sealing fluid in the annular sealing groove;

[0024] A liquid supply assembly is used to supply pure water to the annular sealing groove according to the liquid level detected by the liquid level detection element.

[0025] In one possible implementation of the first aspect, the thinning machine further includes:

[0026] A liquid supply assembly is used to supply pure water to the annular sealing groove at a low flow rate and continuously, or the liquid supply assembly is used to supply a preset amount of pure water to the annular sealing groove at preset time intervals.

[0027] In one possible implementation of the first aspect, the turntable assembly includes:

[0028] A turntable, rotatably disposed about the main rotation axis, wherein the flange structure is disposed on the turntable;

[0029] A chuck table, wherein multiple chuck tables are provided and all of the multiple chuck tables are provided on the rotary table, and the chuck tables are used to support and fix the workpiece to be processed;

[0030] The thinning machine also includes:

[0031] A rotary table drive assembly is used to drive the rotary table to rotate, thereby causing multiple chuck tables to move around the main rotation axis, so that the grinding assembly can perform grinding processing on the workpieces on each of the chuck tables with different precision.

[0032] In one possible implementation of the first aspect, the turntable includes:

[0033] A turntable body is connected to the turntable drive assembly, and a plurality of chuck tables are disposed on the turntable body and located on the upper side of the turntable body;

[0034] The lower liquid shield is connected to the main body of the turntable and located on the upper side of the main body of the turntable. The lower liquid shield is provided with a plurality of first through holes, and the plurality of first through holes are provided in a one-to-one correspondence with a plurality of chuck stages. The first through holes allow the corresponding chuck stage to protrude upward from the lower liquid shield. The flange structure is provided on the lower liquid shield.

[0035] In one possible implementation of the first aspect, the chuck stage is rotatably disposed on the turntable body, and the rotation axis of the chuck stage is a secondary rotation axis, which is parallel to the primary rotation axis;

[0036] A liquid-blocking structure is provided between the first through hole and the corresponding chuck stage. The liquid-blocking structure is used to prevent the waste liquid from entering the gap between the first through hole and the corresponding chuck stage.

[0037] In a possible implementation of the first aspect, the liquid-blocking structure includes:

[0038] An annular liquid-blocking component, the annular liquid-blocking component protruding upward from the lower liquid-proof cover, the annular liquid-blocking component surrounding the secondary rotation axis and disposed on the outer side of the chuck stage;

[0039] An annular shielding member is provided around the secondary rotation axis and disposed on the upper side of the annular liquid-blocking member; in a direction perpendicular to the extension direction of the secondary rotation axis, one end of the annular shielding member is connected to the chuck table, and the other end is disposed on the side of the annular liquid-blocking member away from the chuck table.

[0040] In one possible implementation of the first aspect, the turntable further includes:

[0041] An upper liquid-proof cover is connected to a lower liquid-proof cover and is spaced apart on the upper side of the lower liquid-proof cover. The upper liquid-proof cover and the lower liquid-proof cover together form a drainage space.

[0042] The upper liquid-proof cover is provided with a plurality of second through holes, and the plurality of second through holes are provided in a one-to-one correspondence with the plurality of chuck stages. The second through holes allow the corresponding chuck stage to protrude upward from the upper liquid-proof cover.

[0043] The inner wall of the second through hole has a liquid inlet gap with the corresponding chuck stage, the liquid inlet gap allowing the waste liquid to enter the drain space; the outer edges of the upper liquid shield and the lower liquid shield have a drain gap allowing the waste liquid to flow out of the drain space.

[0044] In one possible implementation of the first aspect, the thinning machine further includes:

[0045] A frame, wherein the turntable assembly is rotatably mounted on the frame;

[0046] Gas source;

[0047] An air flotation component is disposed between the frame and the turntable assembly. The air source supplies gas to the air flotation component, and the air flotation component blows air into the turntable assembly so that the turntable assembly and the air flotation component are spaced apart.

[0048] Compared with related technologies, this application has at least the following beneficial effects:

[0049] In this application, since the liquid receiving tray is provided with an annular sealing groove and the turntable assembly is provided with an annular sealing flange, and since both the annular sealing groove and the annular sealing flange are arranged around the main rotation axis of the turntable assembly, and the annular sealing groove is used to store sealing liquid, and the annular sealing flange is used to be inserted into the sealing liquid in the annular sealing groove, this application can form a liquid seal between the liquid receiving tray and the turntable assembly by inserting the annular sealing flange into the sealing liquid in the annular sealing groove.

[0050] Through liquid sealing, even if machining errors cause the gap between the inner wall of the annular sealing groove and the annular sealing flange to be too large or too small, the sealing fluid can adaptively fill the gap. This prevents excessive resistance due to a too-small gap and seal failure due to a too-large gap. Thus, it not only ensures that the turntable assembly can rotate relative to the liquid receiving tray, but also achieves an effective seal between the liquid receiving tray and the turntable assembly.

[0051] On the other hand, compared with the sealing rings in related technologies, the sealing fluid does not experience wear like the sealing rings and has a relatively long service life, thus enabling a more durable seal and helping to reduce costs.

[0052] In summary, by using liquid sealing, this application can effectively solve the problems of shortcomings in related technologies that rely on sealing rings for sealing. Attached Figure Description

[0053] To more clearly illustrate the technical solutions in the embodiments of this application, the drawings used in the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0054] Figure 1 This is one of the schematic diagrams of a thinning machine structure provided in an embodiment of this application;

[0055] Figure 2 A schematic diagram of a sealing assembly provided in an embodiment of this application;

[0056] Figure 3 This is a second schematic diagram of the structure of a thinning machine provided in an embodiment of this application;

[0057] Figure 4 A schematic diagram of the liquid-blocking structure provided in the embodiments of this application;

[0058] Figure 5 This is a schematic diagram illustrating the cooperation between the upper waterproof cover, the lower liquid-proof cover, and the chuck platform provided in the embodiments of this application.

[0059] Explanation of reference numerals in the attached figures:

[0060] 1-Turntable assembly; 11-Turntable; 111-Turntable body; 112-Lower liquid shield; 1121-First through hole; 113-Upper liquid shield; 12-Chuck stage; 13-Chuck stage drive component;

[0061] 2- Drip tray;

[0062] 3-Sealing assembly; 31-Annular sealing groove; 311-First inner wall; 312-Second inner wall; 32-Flange structure; 321-Annular drainage flange; 322-Annular sealing flange; 323-Connecting section;

[0063] 4-Sealing fluid;

[0064] 5-Turntable drive assembly; 51-Drive pulley; 52-Transmission belt; 53-Turntable drive component;

[0065] 6-Liquid-blocking structure; 61-Annular liquid-blocking component; 62-Annular shielding component;

[0066] 7- Drainage space;

[0067] 8-Inlet gap;

[0068] 9-Drainage gap;

[0069] 10-Rack;

[0070] 20-Air flotation component. Detailed Implementation

[0071] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.

[0072] In this application, the terms "upper," "lower," "left," "right," "front," "rear," "top," "bottom," "inner," "outer," "vertical," "horizontal," "lateral," and "longitudinal" indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. These terms are primarily for the purpose of better describing this application and its embodiments, and are not intended to limit the indicated device, element, or component to having a specific orientation, or to be constructed and operated in a specific orientation.

[0073] Furthermore, in addition to indicating location or positional relationship, some of the aforementioned terms may also have other meanings. For example, the term "above" may also be used in some cases to indicate a certain dependency or connection relationship. Those skilled in the art can understand the specific meaning of these terms in this application based on the specific circumstances.

[0074] Furthermore, the terms "installation," "setup," "equipped with," "connection," and "linked" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral structure; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium, or an internal connection between two devices, components, or parts. Those skilled in the art can understand the specific meaning of these terms in this application based on the specific circumstances.

[0075] Furthermore, the terms "first," "second," etc., are primarily used to distinguish different devices, elements, or components (which may be the same or different in specific type and construction), and are not intended to indicate or imply the relative importance or quantity of the indicated devices, elements, or components. Unless otherwise stated, "a plurality of" means two or more.

[0076] As described in the background section of this application, in the related art, during the chip manufacturing process, a thinning machine is needed to thin the wafer so that the wafer with a smaller thickness can be used to manufacture more complex integrated circuits.

[0077] When using a thinning machine for thinning, the wafer is placed on a turntable assembly and thinned by a grinding assembly. A drip tray can also collect wastewater. In related technologies, sealing rings are typically installed between the turntable assembly and the drip tray. These sealing rings seal against both the turntable assembly and the drip tray to prevent silicon powder, water mist, and other contaminants generated during the grinding process from escaping into the thinning machine and contaminating it.

[0078] However, using sealing rings has its shortcomings. On the one hand, due to machining errors in both the turntable assembly and the drip tray, the gap between the turntable assembly and the drip tray where the sealing ring is installed also has errors. When this gap is too small, the sealing ring is compressed too much, causing resistance when the turntable assembly rotates, making it difficult to turn. When the gap is too large, the sealing ring does not contact the turntable assembly and / or the drip tray, and the sealing effect fails.

[0079] On the other hand, since the turntable assembly rotates during operation, it will cause the seals to wear out, especially when the gap is too small, which will further aggravate the wear of the seals. This requires the seals to be replaced regularly, which will increase costs.

[0080] In view of the above-mentioned problems, this application provides a thinning machine to solve the shortcomings of the sealing technology using sealing rings.

[0081] The technical solution of this application will be further described below with reference to specific embodiments and accompanying drawings:

[0082] like Figure 1As shown, the thinning machine includes a turntable assembly 1, a grinding assembly, a liquid receiving tray 2, and a sealing assembly 3. The turntable assembly 1 is rotatably mounted around its main rotation axis L1 and is used to support the workpiece to be processed. The grinding assembly is used to grind the workpiece on the turntable assembly 1. The liquid receiving tray 2 is located around the main rotation axis L1 and on the outside of the turntable assembly 1, and is used to collect waste liquid.

[0083] like Figure 1 and Figure 2 As shown, the sealing assembly 3 includes an annular sealing groove 31 and a flange structure 32. The annular sealing groove 31 is disposed on the liquid receiving tray 2 and arranged around the main rotation axis L1, and is used to store the sealing liquid 4.

[0084] like Figure 2 As shown, the flange structure 32 includes an annular drainage flange 321 and an annular sealing flange 322. The annular drainage flange 321 surrounds the main rotation axis L1 and is located on the outside of the turntable assembly 1, guiding waste liquid on the turntable assembly 1 into the receiving tray 2. The annular sealing flange 322 surrounds the main rotation axis L1 and is located between the annular drainage flange 321 and the turntable assembly 1, and is inserted into the sealing liquid 4 in the annular sealing groove 31.

[0085] In this application, since the liquid receiving tray 2 is provided with an annular sealing groove 31 and the turntable assembly 1 is provided with an annular sealing flange 322, and since both the annular sealing groove 31 and the annular sealing flange 322 are arranged around the main rotation axis L1 of the turntable assembly 1, and the annular sealing groove 31 is used to store the sealing liquid 4, and the annular sealing flange 322 is used to be inserted into the sealing liquid 4 in the annular sealing groove 31, this application can form a liquid seal between the liquid receiving tray 2 and the turntable assembly 1 by inserting the annular sealing flange 322 into the sealing liquid 4 in the annular sealing groove 31.

[0086] Through liquid sealing, even if there are processing errors that cause the gap between the inner wall of the annular sealing groove 31 and the annular sealing flange 322 to be too large or too small, the sealing fluid 4 can adaptively fill the gap. This prevents excessive resistance due to a too small gap and seal failure due to a too large gap. Thus, it not only ensures that the turntable assembly 1 can rotate relative to the liquid receiving tray 2, but also achieves an effective seal between the liquid receiving tray 2 and the turntable assembly 1.

[0087] On the other hand, compared with the sealing ring in related technologies, the sealing fluid 4 does not experience wear like the sealing ring and has a relatively long service life, thus enabling a more durable seal and helping to reduce costs.

[0088] In summary, by using liquid sealing, this application can effectively solve the problems of shortcomings in related technologies that rely on sealing rings for sealing.

[0089] Furthermore, since the turntable assembly 1 is provided with an annular drainage flange 321 surrounding the main rotation axis L1, and since the annular drainage flange 321 is used to guide the waste liquid on the turntable assembly 1 into the receiving tray 2, and the annular sealing flange 322 is disposed between the annular drainage flange 321 and the turntable assembly 1, the waste liquid can flow into the receiving tray 2 along the annular drainage flange 321, thereby preventing the waste liquid from flowing into the annular sealing groove 31. This prevents the debris generated by grinding in the waste liquid from depositing in the annular sealing groove 31, thereby preventing the deposited debris from affecting the liquid sealing effect and wearing the annular sealing groove 31 and the annular sealing flange 322.

[0090] In this embodiment of the application, the grinding assembly may include a grinding disc and a grinding spindle. The grinding disc is used to grind the workpiece. In this embodiment, the grinding disc may be a grinding wheel for grinding and thinning the workpiece, and / or a polishing wheel for polishing and thinning the workpiece. The grinding spindle is used to mount and fix the grinding disc and provide rotational power and pressure to the grinding disc. The grinding assembly may also be composed of any other components, as long as the grinding assembly can perform the grinding function. The composition of the grinding assembly is flexible and can be configured according to actual needs; this embodiment does not impose specific limitations on this.

[0091] For the workpiece to be processed, in this embodiment of the application, the workpiece to be processed can be a wafer, a glass sheet or other materials that need to be thinned. The type of workpiece to be processed is flexible and can be selected according to actual needs. This embodiment of the application does not make specific limitations on this.

[0092] Regarding waste liquid, in the embodiments of this application, waste liquid includes both waste liquid generated by reducing the temperature of the workpiece to be processed and waste liquid generated by rinsing the surface debris of the workpiece to be processed.

[0093] For flange structure 32, further, as Figure 2 As shown, both the annular drainage flange 321 and the annular sealing flange 322 are vertical (e.g., Figure 2 Extending in the Z direction, the annular drainage flange 321 is positioned directly above the liquid receiving tray 2 and connected to the turntable assembly 1.

[0094] like Figure 2 As shown, the flange structure 32 also includes a connecting section 323, which is disposed between the annular drainage flange 321 and the annular sealing flange 322. One end of the connecting section 323 is connected between the upper and lower ends of the annular drainage flange 321, and the other end is connected to the upper end of the annular sealing flange 322.

[0095] This arrangement allows the annular drainage flange 321, connecting section 323, and annular sealing flange 322 to be arranged in an H-shape, thus forming an H-shaped flange structure 32. This not only makes the flange structure 32 a unified whole, enhancing its overall stability, but also simplifies the connection between the flange structure 32 and the turntable assembly 1 by connecting the annular drainage flange 321 to the turntable assembly 1, thereby facilitating the connection between them.

[0096] In other embodiments, the flange structure 32 may consist only of an annular drainage flange 321 and an annular sealing flange 322, with the annular drainage flange 321 positioned directly above the liquid receiving tray 2. Both the annular drainage flange 321 and the annular sealing flange 322 extend vertically and are connected to the turntable assembly 1. This arrangement simplifies the specific structure of the flange structure 32 to some extent and facilitates its processing.

[0097] For the annular sealing groove 31, further, such as Figure 2 As shown, the opening of the annular sealing groove 31 is vertically oriented, and the annular sealing groove 31 includes a first inner sidewall 311 and a second inner sidewall 312. The second inner sidewall 312 is disposed opposite to the first inner sidewall 311, and the second inner sidewall 312 is disposed on the side of the first inner sidewall 311 near the turntable assembly 1. The upper end of the second inner sidewall 312 is higher than the upper end of the first inner sidewall 311.

[0098] With this configuration, since the upper end of the second inner sidewall 312 is higher than the upper end of the first inner sidewall 311, when the annular sealing groove 31 is filled with sealing liquid 4, under the blocking effect of the second inner sidewall 312, the sealing liquid 4 will only overflow from the annular sealing groove 31 on the side of the first inner sidewall 311 and flow into the liquid receiving tray 2, and will not flow from the side of the second inner sidewall 312 into the space between the turntable assembly 1 and the liquid receiving tray 2. This helps to enhance the sealing effect between the turntable assembly 1 and the liquid receiving tray 2.

[0099] In addition, the blocking effect of the second inner wall 312 can keep the annular sealing groove 31 full of sealing liquid 4, thereby further ensuring the liquid sealing effect.

[0100] Furthermore, the thinning machine also includes a liquid level detection element (not shown in the figure) and a liquid supply assembly. The liquid level detection element is used to detect the liquid level of the sealing liquid 4 in the annular sealing groove 31, and the liquid supply assembly is used to supply pure water to the annular sealing groove 31 according to the liquid level detected by the liquid level detection element.

[0101] This design allows for timely detection of whether the sealing fluid 4 level in the annular sealing groove 31 is equal to or lower than the preset level by monitoring the fluid level. When the fluid level is too low, the supply component can promptly replenish the sealing fluid 4 into the annular sealing groove 31, ensuring that the sealing fluid 4 is always maintained at a suitable level and thus maintaining a good liquid seal.

[0102] On the other hand, pure water can also be used as the sealing fluid 4. Since pure water has good fluidity and wettability, it can form a uniform liquid film in the annular sealing groove 31, effectively filling the gap between the annular sealing groove 31 and the annular sealing flange 322. Therefore, it can enhance the liquid sealing effect and more effectively prevent contaminants such as silicon powder and water mist from entering the thinning machine, thus further ensuring the normal operation of the thinning machine.

[0103] For the liquid level detection device, in this embodiment of the application, the liquid level detection device can be an ultrasonic liquid level sensor or a capacitive liquid level sensor, etc. The type of liquid level detection device is flexible and can be selected according to actual needs. This embodiment of the application does not make specific limitations on this.

[0104] Furthermore, the liquid supply assembly is used to supply pure water to the annular sealing groove 31 at a low flow rate and continuously, or the liquid supply assembly is used to supply a preset amount of pure water to the annular sealing groove at preset time intervals.

[0105] This configuration ensures that, whether a low-flow-rate continuous supply of pure water is provided or a preset amount of pure water is supplied at predetermined intervals, there is always sufficient pure water in the annular sealing groove 31. This maintains a good liquid seal and more effectively prevents contaminants such as silicon powder and water mist from entering the thinning machine, thereby further ensuring the normal operation of the thinning machine.

[0106] On the other hand, low-flow continuous supply or timed and quantitative supply can precisely control the amount of pure water used, avoid unnecessary waste, and thus reduce the cost of using pure water.

[0107] Furthermore, the liquid supply component can also supply grinding fluid during the grinding process. The grinding fluid can not only reduce the temperature of the workpiece but also wash away the debris on the surface of the workpiece, thereby ensuring the quality of the grinding process.

[0108] In this embodiment, the structure of the liquid supply component is flexible and can be configured according to actual needs. This embodiment does not impose any specific limitations on this.

[0109] For turntable assembly 1, further, such as Figure 1As shown, the rotary table assembly 1 includes a rotary table 11 and a chuck table 12. The rotary table 11 is rotatably mounted around the main rotation axis L1, and a flange structure 32 is disposed on the rotary table 11. Multiple chuck tables 12 are provided, and all multiple chuck tables 12 are disposed on the rotary table 11. The chuck tables 12 are used to support and fix the workpiece to be processed.

[0110] like Figure 1 As shown, the thinning machine also includes a turntable drive assembly 5, which drives multiple chuck tables 12 to move around the main rotation axis L1 by driving the turntable 11 to rotate, so that the grinding assembly can perform grinding processing of different precision on the workpieces to be processed on each chuck table 12.

[0111] With this configuration, on the one hand, setting up multiple chuck stages 12 allows multiple workpieces to be processed to be carried on the turntable assembly 1. When the turntable drive assembly 5 drives the turntable 11 to rotate, the workpieces to be processed can be sent to the grinding assembly for processing in sequence through the rotation of the turntable 11, which can realize multi-station processing and thus improve processing efficiency.

[0112] On the other hand, the grinding assembly performs grinding operations on each workpiece on each chuck stage 12 with different precision. This means that by using the grinding assembly to perform grinding operations on the workpieces with different precision, the workpieces can meet the processing requirements without the need to change equipment for processing tasks with different precision requirements, thereby improving processing efficiency and reducing costs.

[0113] Furthermore, such as Figure 3 As shown, the turntable 11 includes a turntable body 111 and a lower liquid cover 112. The turntable body 111 is connected to the turntable drive assembly 5. Multiple chuck platforms 12 are disposed on the turntable body 111 and located on the upper side of the turntable body 111.

[0114] The lower liquid cover 112 is connected to the turntable body 111 and located on the upper side of the turntable body 111. The lower liquid cover 112 is provided with a plurality of first through holes 1121, and the plurality of first through holes 1121 are provided in a one-to-one correspondence with a plurality of chuck tables 12. The first through holes 1121 allow the corresponding chuck table 12 to protrude upward from the lower liquid cover 112. The flange structure 32 is provided on the lower liquid cover 112.

[0115] This configuration allows the flange structure 32 to be positioned on the lower liquid shield 112, and the turntable body 111 to be connected to the turntable drive assembly 5. This facilitates the placement of the flange structure 32 on the turntable 11. Furthermore, since the lower liquid shield 112 and the turntable body 111 are spatially independent, the flange structure 32 will not affect the connection between the turntable drive assembly 5 and the turntable body 111, thus ensuring the effective drive of the turntable drive assembly 5 to rotate the turntable 11.

[0116] On the other hand, the lower liquid shield 112 is connected to the turntable body 111 and located on the upper side of the turntable body 111, which can effectively prevent the grinding liquid from splashing onto the lower part of the turntable body 111 during the grinding process, thus avoiding corrosion and damage to the internal components of the thinning machine. At the same time, the first through hole 1121 on the lower liquid shield 112 is correspondingly set with the chuck table 12, which can ensure the normal operation of the chuck table 12.

[0117] Furthermore, such as Figure 3 As shown, the turntable drive assembly 5 includes a drive wheel 51, a transmission belt 52, and a turntable drive component 53. The transmission belt 52 is sleeved on the outer side of both the drive wheel 51 and the turntable body 111, and is drively connected to both. The turntable drive component 53 drives the drive wheel 51 to rotate, so that the drive wheel 51 drives the turntable body 111 to rotate via the transmission belt 52.

[0118] With this configuration, the transmission belt 52 is first fitted onto the outside of the drive wheel 51 and the turntable body 111, and drives the transmission through friction. This transmission method can provide a relatively smooth power transmission, reduce vibration and impact, and make the rotation of the turntable 11 more uniform and stable, which is beneficial to improving the accuracy and quality of the grinding process.

[0119] Secondly, the transmission belt 52 has a certain degree of elasticity, which can play a role in buffering and shock absorption during transmission. When the turntable drive 53 starts or stops, and when encountering some minor resistance changes during the grinding process, the transmission belt 52 can absorb some of the impact force, protecting the turntable drive 53 and turntable 11 and other related components, and extending the service life of the equipment.

[0120] Finally, the turntable drive assembly 5, consisting of the drive wheel 51, the transmission belt 52, and the turntable drive component 53, has a relatively simple structure and is easy to design, manufacture, and install.

[0121] Regarding the turntable drive component 53, in this embodiment of the application, the turntable drive component 53 can be a stepper motor, a servo motor, or a hydraulic motor, etc. The type of turntable drive component 53 is quite flexible. Specifically, it can be selected according to actual needs. This embodiment of the application does not make specific limitations in this regard.

[0122] In other embodiments, the turntable drive assembly 5 may further include a drive gear, a driven gear, and a drive motor. The drive gear is connected to the drive motor, and the driven gear is mounted on the turntable body 111. The drive motor drives the drive gear to rotate, and through the meshing transmission between the gears, the driven gear drives the turntable body 111 to rotate.

[0123] With this configuration, since gear transmission is a highly efficient transmission method, the power of the drive motor can be effectively transmitted to the turntable body 111, thereby reducing energy loss and improving energy utilization.

[0124] Furthermore, such as Figure 1 As shown, the chuck stage 12 is rotatably mounted on the turntable body 111. The rotation axis of the chuck stage 12 is the secondary rotation axis L2, which is parallel to the primary rotation axis L1. Figure 3 As shown, a liquid-blocking structure 6 is provided between the first through hole 1121 and the corresponding chuck stage 12. The liquid-blocking structure 6 is used to prevent waste liquid from entering the gap between the first through hole 1121 and the corresponding chuck stage 12.

[0125] With this configuration, the chuck table 12 is rotatably mounted on the turntable body 111. In this way, during the grinding process, the chuck table 12 can also rotate the workpiece on it relative to the grinding assembly, which to a certain extent helps to improve the efficiency of the grinding process and thus helps to reduce time costs.

[0126] On the other hand, a liquid-blocking structure 6 is provided between the first through hole 1121 and the corresponding chuck stage 12, which can effectively block waste liquid from entering the gap between the two, thereby preventing waste liquid from leaking into the thinning machine and avoiding corrosion and damage to the internal components of the thinning machine, thus extending the service life of the equipment.

[0127] Furthermore, such as Figure 4 As shown, the liquid-blocking structure 6 includes an annular liquid-blocking component 61 and an annular shielding component 62. The annular liquid-blocking component 61 protrudes upward from the lower liquid-proof cover 112 and is located around the secondary rotation axis L2 on the outer side of the chuck platform 12.

[0128] An annular baffle 62 surrounds the secondary rotation axis L2 and is disposed above the annular liquid-blocking member 61. In a direction perpendicular to the extension direction of the secondary rotation axis L2 (e.g., Figure 4 In the X direction, one end of the annular blocking member 62 is connected to the chuck table 12, and the other end is located on the side of the annular liquid blocking member 61 away from the chuck table 12.

[0129] With this configuration, the annular liquid-blocking component 61 protrudes upward from the lower liquid-proof cover 112 and surrounds the secondary rotation axis L2, forming a first layer of protection on the outside of the chuck platform 12, initially preventing waste liquid from splashing into the gap between the chuck platform 12 and the first through hole 1121 from the side. The annular shielding component 62 is positioned above the annular liquid-blocking component 61, with one end connected to the chuck platform 12 and the other end on the side of the annular liquid-blocking component 61 away from the chuck platform 12. This adds another layer of protection in the vertical direction. The annular shielding component 62 guides the waste liquid on the chuck platform 12 to the lower liquid-proof cover 112, preventing waste liquid from entering the gap from above. Thus, through this multi-layered protection design, the liquid-blocking effect is greatly improved.

[0130] In addition, since both the annular liquid-blocking component 61 and the annular shielding component 62 are arranged around the secondary rotation axis L2, the liquid-blocking structure 6 can adapt well to the rotation of the chuck table 12. The liquid-blocking effect will not be affected by the rotation of the chuck table 12, nor will it generate additional resistance or interference to the rotation of the chuck table 12, thus ensuring the normal operation of the turntable assembly 1.

[0131] In a preferred embodiment, such as Figure 4 As shown, the annular shield 62 is L-shaped, and the L-shaped annular shield 62 and the chuck platform 12 together form a gap between them, and the upper end of the annular liquid blocking member 61 is located in the gap.

[0132] This design allows the L-shaped annular baffle to block waste liquid in both the vertical and horizontal directions. Vertically, it prevents waste liquid from falling from above into the area between the annular baffle 61 and the chuck table 12; horizontally, it prevents waste liquid from splashing into the area between the annular baffle 61 and the chuck table 12 from the side. This significantly improves the waste liquid blocking effect, more effectively preventing waste liquid from entering the gap between the chuck table 12 and the first through hole 1121, and thus more effectively protecting internal components from waste liquid corrosion.

[0133] In other embodiments, the annular shield 62 may extend linearly in the horizontal direction. This arrangement simplifies the structure of the annular shield 62 and facilitates its processing.

[0134] In other embodiments, the liquid-blocking structure 6 may include an L-shaped annular liquid-blocking component. The annular liquid-blocking component is arranged around the secondary rotation axis L2. The annular liquid-blocking component includes a vertical section and a horizontal section. The vertical section is disposed on the lower liquid-proof cover 112, one end of the horizontal section is connected to the upper end of the vertical section, and the other end is located on the lower side of the chuck table 12.

[0135] This design prevents waste liquid from splashing into the gap between the chuck table 12 and the first through hole 1121 from the side via the vertical section, and prevents waste liquid from falling into the gap between the chuck table 12 and the first through hole 1121 from the top via the horizontal section. Therefore, the L-shaped annular liquid-blocking component ensures the liquid-blocking effect of the liquid-blocking structure 6, while also simplifying its structural composition and facilitating its manufacturing.

[0136] Furthermore, such as Figure 1 As shown, the turntable assembly 1 also includes multiple chuck stage drivers 13, which are arranged in a one-to-one correspondence with multiple chuck stages 12, and the chuck stage drivers 13 are used to drive the corresponding chuck stage 12 to rotate around the secondary rotation axis L2.

[0137] With this configuration, since each chuck table 12 has a corresponding chuck table drive 13, the rotational speed of the corresponding chuck table 12 can be precisely controlled through the chuck table drive 13. Therefore, during the grinding process, the rotational speed of the chuck table 12 can be flexibly adjusted according to different processing requirements, ensuring that the workpiece is accurately and uniformly ground, thereby improving processing accuracy and product quality.

[0138] Regarding the chuck stage driver 13, in this embodiment of the application, the chuck stage driver 13 can be a stepper motor, a servo motor, or a hydraulic motor, etc. The type of chuck stage driver 13 is quite flexible. Specifically, it can be selected according to actual needs. This embodiment of the application does not make specific limitations on this.

[0139] For turntable 11, further, such as Figure 3 As shown, the turntable 11 also includes an upper liquid shield 113, which is connected to the lower liquid shield 112 and is spaced apart on the upper side of the lower liquid shield 112. The upper liquid shield 113 and the lower liquid shield 112 together form a drainage space 7.

[0140] The upper liquid-proof cover 113 is provided with multiple second through holes, each corresponding to a different chuck platform 12. The second through holes allow the corresponding chuck platform 12 to protrude upwards from the upper liquid-proof cover 113. For example... Figure 5 As shown, there is a liquid inlet gap 8 between the inner wall of the second through hole and the corresponding chuck stage 12, which allows waste liquid to enter the drain space 7; Figure 5 As shown, there is a drain gap 9 between the outer edges of the upper liquid shield 113 and the lower liquid shield 112, which allows waste liquid to flow out of the drain space 7.

[0141] With this configuration, the waste liquid can not only flow along the upper liquid shield 113 into the receiving tray 2, but also flow through the liquid inlet gap 8, the liquid outlet space 7, and the liquid outlet gap 9 into the receiving tray 2. That is, the waste liquid can flow into the receiving tray 2 through two separate paths, which helps to improve the efficiency of the waste liquid flowing into the receiving tray 2 and helps to discharge the waste liquid into the receiving tray 2 as soon as possible, thereby further helping to avoid the impact of the waste liquid on the grinding process.

[0142] For thinning machines, further, such as Figure 1 As shown, the thinning machine also includes a frame 10, an air flotation component 20, and an air source. The turntable assembly 1 is rotatably mounted on the frame 10. The air flotation component 20 is disposed between the frame 10 and the turntable assembly 1. The air source is used to supply gas to the air flotation component 20, and the air flotation component 20 is used to blow air onto the turntable assembly 1 so that the turntable assembly 1 and the air flotation component 20 are spaced apart.

[0143] The air-bearing component 20 blows air onto the turntable assembly 1, causing the turntable assembly 1 and the air-bearing component 20 to be spaced apart, forming an air-bearing support for the turntable assembly 1. In this way, when the turntable assembly 1 rotates, the friction between it and the air-bearing component 20 changes from traditional mechanical contact friction to gas friction, which greatly reduces friction, reduces wear on the turntable assembly 1 and the frame 10, improves the rotational flexibility and accuracy of the turntable assembly 1, and also extends the service life of related components.

[0144] Furthermore, because the air-bearing support reduces direct contact and friction between mechanical parts, the noise generated when the turntable assembly 1 rotates is also significantly reduced. This improves the working environment and reduces the harm of noise to operators.

[0145] Furthermore, the air flotation component 20 is an air flotation pad, which has air channels inside and air holes on its surface. When gas enters the air flotation pad through the air channels, it can be evenly sprayed out from the air holes and form an air film between the air flotation pad and the turntable assembly 1, thereby lifting the turntable assembly 1 and achieving air flotation support. When grinding the workpiece, the vacuum adsorption pipeline inside the air flotation pad operates to perform vacuum adsorption on the turntable body 111, preventing the turntable body 111 from rotating.

[0146] This configuration, using an air-floating pad, not only ensures effective air-floating support for the turntable assembly 1 by the air-floating component 20, but also reduces the manufacturing cost of the thinning machine due to the typically low manufacturing cost of the air-floating pad. Furthermore, since the vacuum adsorption of the turntable body 111 by the air-floating pad prevents rotation of the turntable body 111, it also prevents positional changes on the chuck table 12 on the turntable body 111, thereby ensuring the grinding accuracy of the workpiece on the chuck table 12.

[0147] In other embodiments, the air flotation component 20 can also be an air flotation platform, which includes a flat platform and multiple air flotation units distributed below the platform. By spraying air onto the platform through each air flotation unit, an air flotation layer can be formed between the platform and the turntable assembly 1, thereby achieving air flotation support for the turntable assembly 1.

[0148] This configuration, through the air-float platform, not only ensures effective air-float support for the turntable assembly 1 by the air-float component 20, but also, because the air-float platform is typically composed of multiple air-float units working together, it can withstand the weight of the turntable assembly 1 and the workpiece placed on it. This allows the thinning machine to handle larger and heavier workpieces, expanding its processing range and application areas.

[0149] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of this application, and are not intended to limit them. Although this application has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some or all of the technical features therein. Such modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of this application.

Claims

1. A thinning machine, characterized in that, include: A turntable assembly, rotatably arranged about its own main rotation axis, the turntable assembly being used to carry the workpiece to be processed; A grinding assembly for grinding the workpiece on the turntable assembly; A liquid receiving tray is provided around the main rotation axis and disposed on the outside of the turntable assembly. The liquid receiving tray is used to receive waste liquid. A sealing assembly, the sealing assembly comprising: An annular sealing groove is provided on the liquid receiving tray and arranged around the main rotation axis, and is used to store sealing liquid. A flange structure, the flange structure comprising: An annular drainage flange is provided around the main rotation axis and disposed on the outside of the turntable assembly. The annular drainage flange is used to guide the waste liquid on the turntable assembly into the receiving tray. An annular sealing flange is provided, which surrounds the main rotation axis and is disposed between the annular drainage flange and the turntable assembly. The annular sealing flange is used to insert into the sealing fluid in the annular sealing groove.

2. The thinning machine according to claim 1, characterized in that, Both the annular drainage flange and the annular sealing flange extend vertically. The annular drainage flange is located directly above the liquid receiving tray and is connected to the turntable assembly. The flange structure further includes: A connecting segment is disposed between the annular drainage flange and the annular sealing flange. One end of the connecting segment is connected between the upper and lower ends of the annular drainage flange, and the other end is connected to the upper end of the annular sealing flange.

3. The thinning machine according to claim 1 or 2, characterized in that, The annular sealing groove has its opening facing vertically, and the annular sealing groove includes: First inner wall; The second inner sidewall is disposed opposite to the first inner sidewall and is located on the side of the first inner sidewall close to the turntable assembly. The upper end of the second inner sidewall is higher than the upper end of the first inner sidewall.

4. The thinning machine according to claim 1 or 2, characterized in that, The thinning machine also includes: A liquid level detection element, wherein the liquid level detection element is used to detect the liquid level of the sealing fluid in the annular sealing groove; A liquid supply assembly is used to supply pure water to the annular sealing groove according to the liquid level detected by the liquid level detection element.

5. The thinning machine according to claim 1 or 2, characterized in that, The thinning machine also includes: A liquid supply assembly is used to supply pure water to the annular sealing groove at a low flow rate and continuously, or the liquid supply assembly is used to supply a preset amount of pure water to the annular sealing groove at preset time intervals.

6. The thinning machine according to claim 1 or 2, characterized in that, The turntable assembly includes: A turntable, rotatably disposed about the main rotation axis, wherein the flange structure is disposed on the turntable; A chuck table, wherein multiple chuck tables are provided and all of the multiple chuck tables are provided on the rotary table, and the chuck tables are used to support and fix the workpiece to be processed; The thinning machine also includes: A rotary table drive assembly is used to drive the rotary table to rotate, thereby causing multiple chuck tables to move around the main rotation axis, so that the grinding assembly can perform grinding processing on the workpieces on each of the chuck tables with different precision.

7. The thinning machine according to claim 6, characterized in that, The turntable includes: A turntable body is connected to the turntable drive assembly, and a plurality of chuck tables are disposed on the turntable body and located on the upper side of the turntable body; The lower liquid shield is connected to the main body of the turntable and located on the upper side of the main body of the turntable. The lower liquid shield is provided with a plurality of first through holes, and the plurality of first through holes are provided in a one-to-one correspondence with a plurality of chuck stages. The first through holes allow the corresponding chuck stage to protrude upward from the lower liquid shield. The flange structure is provided on the lower liquid shield.

8. The thinning machine according to claim 7, characterized in that, The chuck stage is rotatably mounted on the turntable body, and the rotation axis of the chuck stage is a secondary rotation axis, which is parallel to the primary rotation axis. A liquid-blocking structure is provided between the first through hole and the corresponding chuck stage. The liquid-blocking structure is used to prevent the waste liquid from entering the gap between the first through hole and the corresponding chuck stage.

9. The thinning machine according to claim 8, characterized in that, The liquid-blocking structure includes: An annular liquid-blocking component, the annular liquid-blocking component protruding upward from the lower liquid-proof cover, the annular liquid-blocking component surrounding the secondary rotation axis and disposed on the outer side of the chuck stage; An annular shielding member is provided around the secondary rotation axis and disposed on the upper side of the annular liquid-blocking member; in a direction perpendicular to the extension direction of the secondary rotation axis, one end of the annular shielding member is connected to the chuck table, and the other end is disposed on the side of the annular liquid-blocking member away from the chuck table.

10. The thinning machine according to claim 7, characterized in that, The turntable also includes: An upper liquid-proof cover is connected to a lower liquid-proof cover and is spaced apart on the upper side of the lower liquid-proof cover. The upper liquid-proof cover and the lower liquid-proof cover together form a drainage space. The upper liquid-proof cover is provided with a plurality of second through holes, and the plurality of second through holes are provided in a one-to-one correspondence with the plurality of chuck stages. The second through holes allow the corresponding chuck stage to protrude upward from the upper liquid-proof cover. The inner wall of the second through hole has a liquid inlet gap with the corresponding chuck stage, the liquid inlet gap allowing the waste liquid to enter the drain space; the outer edges of the upper liquid shield and the lower liquid shield have a drain gap allowing the waste liquid to flow out of the drain space.

11. The thinning machine according to claim 1 or 2, characterized in that, The thinning machine also includes: A frame, wherein the turntable assembly is rotatably mounted on the frame; Gas source; An air flotation component is disposed between the frame and the turntable assembly. The air source supplies gas to the air flotation component, and the air flotation component blows air into the turntable assembly so that the turntable assembly and the air flotation component are spaced apart.

Images