High-transmittance low-reflection film

Abstract

The utility model discloses a high-transmittance low-reflection film, which comprises a base material layer and an anti-reflection layer arranged on the base material layer, the anti-reflection layer comprises a high-folding composite layer and a low-folding coating layer which are laminated, and the high-folding composite layer comprises a high-folding coating, a sealing layer and a high-folding coating layer which are laminated in sequence from the base material layer to the low-folding coating layer; wherein the refractive index of the high-refractive-index coating is 1.73 to 1.78, the refractive index of the high-refractive-index coating film layer is 2.2 to 2.35, and the refractive index of the low-refractive-index coating film layer is 1.43 to 1.48. According to the utility model, through the specific layer structure design and the matching of the refractive indexes between the layers, the high-transmittance low-reflection thin film has a better anti-reflection effect under the condition that the high-transmittance low-reflection thin film has a certain transmittance, the film material structure is stable, and the high-transmittance low-reflection thin film is not easy to scratch or fall off in a complex environment.

Description

Technical Field

[0001] This invention belongs to the field of antireflective film technology, specifically relating to a high-transmittance, low-reflection thin film. Background Technology

[0002] With technological advancements, people are increasingly adopting intelligent lifestyles, including smart bus stop signs, which offer convenience and represent urban development. However, a major drawback is that ordinary glass / acrylic panels exhibit a reflectivity of 3%-5% under strong outdoor sunlight, making the screen content difficult to read. Therefore, developing an anti-reflective film is crucial.

[0003] Traditional antireflective coating technologies mainly involve wet coating, but this method has significant drawbacks: While wet coating (such as the sol-gel method) is simple and low-cost, it suffers from poor film uniformity, low thickness control precision, and is prone to optical performance fluctuations due to solvent residue. For example, when coating a SiO2 / TiO2 multilayer film onto a PET substrate, improper refractive index gradient design can easily lead to uneven reflectivity, resulting in a deterioration in the antireflective effect of the antireflective film.

[0004] Furthermore, conventional low-reflection films in the prior art typically employ a technique of stacking high-refractive-index coating layers and low-refractive-index coating layers as needed. Although low-reflection films produced using dry coating processes alone have excellent anti-reflection effects, their production efficiency is very low and their cost is high due to limitations in the manufacturing process. For low-reflection films used outdoors, the anti-reflection requirements are not very high, and since the application area is large, cost control is relatively more critical. Based on this, the present invention was created.

[0005] The information disclosed in this background section is intended only to enhance the understanding of the overall background of this utility model and should not be construed as an admission or in any way implying that the information constitutes prior art known to those skilled in the art. Utility Model Content

[0006] The purpose of this invention is to provide a high-transmittance, low-reflection film with low reflectivity and high transmittance.

[0007] To achieve the above objectives, the technical solution provided by a specific embodiment of this utility model is as follows:

[0008] A high-transmittance, low-reflection film includes a substrate layer and an anti-reflection layer disposed on the substrate layer. The anti-reflection layer includes a high-refractive-index composite layer and a low-refractive-index coating layer stacked together. The high-refractive-index composite layer includes a high-refractive-index layer, a bonding layer, and a high-refractive-index coating layer stacked sequentially from the substrate layer to the low-refractive-index coating layer.

[0009] The high-refractive-index coating has a refractive index of 1.73-1.78, the high-refractive-index coating layer has a refractive index of 2.2-2.35, and the low-refractive-index coating layer has a refractive index of 1.43-1.48.

[0010] In one or more embodiments of this utility model, the bonding layer is a nickel plating layer with a thickness of 2.5-4.5 nm.

[0011] In one or more embodiments of this utility model, the high-refractive-index coating layer is a niobium pentoxide coating layer, and the thickness of the high-refractive-index coating layer is 7-13 nm.

[0012] In one or more embodiments of this utility model, the low-reflection coating layer is a silicon dioxide coating layer, and the thickness of the low-reflection coating layer is 71-81 nm.

[0013] In one or more embodiments of this utility model, the bonding layer is a silicon plating layer with a thickness of 0.1-0.4 nm.

[0014] In one or more embodiments of this utility model, the high-refractive-index coating layer is a niobium pentoxide coating layer, and the thickness of the high-refractive-index coating layer is 13-19 nm.

[0015] In one or more embodiments of this utility model, the low-reflection coating layer is a silicon dioxide coating layer, and the thickness of the low-reflection coating layer is 95-105 nm.

[0016] In one or more embodiments of this utility model, the thickness of the high-refractive-index coating is 90-165 nm.

[0017] In one or more embodiments of this utility model, a hardening layer is further provided between the substrate layer and the antireflective layer.

[0018] Compared with existing technologies, this invention employs a low-reflection film structure design that combines wet coating and dry deposition processes. It utilizes the synergy of a high-refractive-index coating layer obtained through wet coating, a niobium pentoxide coating obtained through dry deposition, and a low-refractive-index silicon dioxide coating. Optical matching is achieved through the design of the high and low refractive index film thicknesses, effectively reducing the reflectivity of the low-reflection film while maintaining a certain level of transmittance. Furthermore, the addition of a nickel or silicon coating ensures interlayer adhesion between the wet high-refractive-index coating and the dry high-refractive-index niobium pentoxide coating, while also guaranteeing good environmental resistance. In addition, the low-reflection film of this invention exhibits superior interlayer adhesion, excellent environmental resistance performance, and low production cost with high production efficiency. Attached Figure Description

[0019] To more clearly illustrate the technical solutions in the embodiments of this utility model or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments recorded in this utility model. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0020] Figure 1 This is a schematic diagram of the structure of a high-transmittance, low-reflection thin film in one embodiment of the present invention;

[0021] Figure 2 The reflectance curve of the high-transmittance, low-reflection thin film in Embodiment 1 of this utility model;

[0022] Figure 3 The reflectance curve of the high-transmittance, low-reflection thin film in Embodiment 2 of this utility model;

[0023] Figure 4 The reflectance curve of the high-transmittance, low-reflection thin film in Embodiment 3 of this utility model;

[0024] Figure 5 The reflectance curve of the high-transmittance, low-reflection thin film in Embodiment 4 of this utility model;

[0025] Figure 6 The reflectance curve of the high-transmittance, low-reflectance thin film in Comparative Example 1 of this utility model;

[0026] Figure 7 The reflectance curve of the high-transmittance, low-reflectance thin film in Comparative Example 2 of this invention;

[0027] Figure 8 The reflectance curve of the high-transmittance, low-reflectance thin film in Comparative Example 3 of this invention;

[0028] Figure 9 The reflectance curve of the high-transmittance, low-reflection film in Comparative Example 4 of this invention is shown.

[0029] Explanation of key figure labels:

[0030] 1. Substrate layer; 2. Anti-reflective layer; 21. High-refractive-index coating layer; 22. Adhesive layer; 23. High-refractive-index coating layer; 24. Low-refractive-index coating layer. Detailed Implementation

[0031] To enable those skilled in the art to better understand the technical solutions of this utility model, the technical solutions of the embodiments of this utility model will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this utility model, and not all embodiments. Based on the embodiments of this utility model, all other embodiments obtained by those skilled in the art without creative effort should fall within the protection scope of this utility model.

[0032] A specific embodiment of this utility model provides a high-transmittance, low-reflection thin film, such as... Figure 1 As shown, it includes a substrate layer 1 and an antireflective layer 2 disposed on the substrate layer 1. The antireflective layer 2 includes a high-refractive-index composite layer and a low-refractive-index coating layer 24 stacked together. The high-refractive-index composite layer includes a high-refractive-index coating layer 21, a bonding layer 22, and a high-refractive-index coating layer 23 stacked sequentially from the substrate layer 1 to the low-refractive-index coating layer 24. The refractive index of the high-refractive-index coating layer 21 is 1.73-1.78, the refractive index of the high-refractive-index coating layer 23 is 2.2-2.35, and the refractive index of the low-refractive-index coating layer 24 is 1.43-1.48.

[0033] Specifically, the high-refractive-index coating layer, high-refractive-index film layer, and low-refractive-index film layer are designed with a specific layer structure. By utilizing the interplay of refractive indices between the layers, the film material has a low reflectivity, which does not affect the recognition of screen content under strong outdoor light, and has excellent anti-reflection effect.

[0034] Furthermore, the substrate layer is a PET layer with a thickness of 50-250μm.

[0035] Furthermore, the high-refractive-index coating has a thickness of 90-165nm, specifically formed by coating with Toyo Ink TYZ68-RA01-CN. The high-refractive-index coating provides a high refractive index on the one hand, and on the other hand, it also plays a hardening role and can be used as a hardening layer.

[0036] Furthermore, the bonding layer is either a nickel plating layer or a silicon plating layer. When the bonding layer is a nickel plating layer, its thickness is 2.5-4.5 nm; when the bonding layer is a silicon plating layer, its thickness is 0.1-0.4 nm. The bonding layer helps to ensure the interlayer adhesion between the high-refractive-index coating layer and the high-refractive-index coating layer, and can also improve the environmental resistance of the film material, while playing an optical matching role with the high-refractive-index coating layer.

[0037] Furthermore, when the bonding layer is a nickel plating layer, the high-refractive-index coating layer is a niobium pentoxide coating layer with a thickness of 7-13 nm, and the low-refractive-index coating layer is a silicon dioxide coating layer with a thickness of 71-81 nm.

[0038] Furthermore, when the bonding layer is a silicon coating, the high-refractive-index coating layer is a niobium pentoxide coating layer with a thickness of 13-19 nm, and the low-refractive-index coating layer is a silicon dioxide coating layer with a thickness of 95-105 nm.

[0039] Specifically, when the bonding layer is selected as either nickel plating or silicon plating, the corresponding high-reflection coating layer and low-reflection coating layer are matched with different thicknesses. By selecting different thicknesses, the optical matching between the bonding layer, high-reflection coating layer and low-reflection coating layer can be optimized, thereby giving the film material a lower reflectivity, while enhancing interlayer adhesion and reducing the possibility of the film material being easily scratched or falling off.

[0040] Furthermore, a hardening layer, such as an acrylic resin layer, can be provided between the substrate layer and the anti-reflective layer as needed to further improve the hardness and wear resistance of the membrane material.

[0041] The present invention will be further described below with reference to specific embodiments.

[0042] Example 1

[0043] The structure of the high-transmittance, low-reflection film in this embodiment is shown in the table below:

[0044] Material PET High-refractive-index coating (1.75) Ni <![CDATA[NB2O5]]> <![CDATA[SiO2]]> thickness 50μm 154.34nm 4.4nm 11.22nm 76.58nm

[0045] The reflectance and transmittance of the low-reflection film in this embodiment were tested, and the results are as follows: Figure 2 And as shown in the table below:

[0046] wavelength Reflectivity R Transmission rate TT 400nm-700nm 0.321％ 72.88％

[0047] Example 2

[0048] The structure of the high-transmittance, low-reflection film in this embodiment is shown in the table below:

[0049] Material PET High-refractive-index coating (1.75) Ni <![CDATA[NB2O5]]> <![CDATA[SiO2]]> thickness 50μm 162.34nm 3.4nm 7.22nm 79.98nm

[0050] The reflectance and transmittance of the low-reflection film in this embodiment were tested, and the results are as follows: Figure 3 And as shown in the table below:

[0051] wavelength Reflectivity R Transmission rate TT 400nm-700nm 0.337％ 77.74％

[0052] Example 3

[0053] The structure of the high-transmittance, low-reflection film in this embodiment is shown in the table below:

[0054] Material PET High-refractive-index coating (1.75) Si <![CDATA[NB2O5]]> <![CDATA[SiO2]]> thickness 50μm 100.48nm 0.2nm 18.57nm 101.26nm

[0055] The reflectance and transmittance of the low-reflection film in this embodiment were tested, and the results are as follows: Figure 4 And as shown in the table below:

[0056] wavelength Reflectivity R Transmission rate TT 400nm-700nm 0.688％ 98.54％

[0057] Example 4

[0058] The structure of the high-transmittance, low-reflection film in this embodiment is shown in the table below:

[0059] Material PET High-refractive-index coating (1.75) Si <![CDATA[NB2O5]]> <![CDATA[SiO2]]> thickness 50μm 103.48nm 0.2nm 16.57nm 102.26nm

[0060] The reflectance and transmittance of the low-reflection film in this embodiment were tested, and the results are as follows: Figure 5 And as shown in the table below:

[0061] wavelength Reflectivity R Transmission rate TT 400nm-700nm 0.6296％ 98.59％

[0062] Comparative Example 1

[0063] The structure of the high-transmittance, low-reflectance thin film in this comparative example is shown in the table below:

[0064] Material PET Coating layer (refractive index 1.52) Ni <![CDATA[NiCr2]]> <![CDATA[SiO2]]> thickness 50μm 134.16nm 1.9nm 2.1nm 85.41nm

[0065] In this comparative example, the coating layer with a refractive index of 1.52 was prepared using Toyo Ink Coating Liquid, model number TYZ52-RA01-CN.

[0066] The reflectance and transmittance of the low-reflectance film in this comparative example were tested, and the results are as follows: Figure 6 And as shown in the table below:

[0067] wavelength Reflectivity R Transmission rate TT 400nm-700nm 0.7968％ 76.41％

[0068] Comparative Example 2

[0069] The structure of the high-transmittance, low-reflectance thin film in this comparative example is shown in the table below:

[0070] Material PET High-refractive-index coating (1.75) Ni <![CDATA[NiCr2]]> <![CDATA[SiO2]]> thickness 50μm 0 2.2nm 1.2nm 82.41nm

[0071] The reflectance and transmittance of the low-reflectance film in this comparative example were tested, and the results are as follows: Figure 7 And as shown in the table below:

[0072] wavelength Reflectivity R Transmission rate TT 400nm-700nm 0.7512％ 78.30％

[0073] Comparative Example 3

[0074] The structure of the high-transmittance, low-reflectance thin film in this comparative example is shown in the table below (this comparative example is compared with Example 1, where the thickness of the nickel plating layer is 0):

[0075] Material PET High-refractive-index coating (1.75) Ni <![CDATA[NB2O5]]> <![CDATA[SiO2]]> thickness 50μm 154.34nm 0 11.22nm 76.58nm

[0076] The reflectance and transmittance of the low-reflectance film in this comparative example were tested, and the results are as follows: Figure 8 And as shown in the table below:

[0077] wavelength Reflectivity R Transmission rate TT 400nm-700nm 3.763％ 96.237％

[0078] Comparative Example 4

[0079] The structure of the high-transmittance, low-reflectance thin film in this comparative example is shown in the table below (this comparative example is compared with Example 3, where the thickness of the silicon coating is 0):

[0080] Material PET High-refractive-index coating (1.75) Si <![CDATA[NB2O5]]> <![CDATA[SiO2]]> thickness 50μm 100.48nm 0 18.57nm 101.26nm

[0081] The reflectance and transmittance of the low-reflectance film in this comparative example were tested, and the results are as follows: Figure 9 And as shown in the table below:

[0082] wavelength Reflectivity R Transmission rate TT 400nm-700nm 0.621％ 99.377％

[0083] The low-reflection films in each embodiment and comparative example were subjected to a cross-cut adhesion test, and the results are shown in the table below:

[0084]

[0085] In summary, this invention optimizes the layer structure and utilizes the interplay of refractive indices between layers to achieve a film material with low reflectivity and high transmittance. Furthermore, the design of a close-bonding layer enhances adhesion between layers, making the film material less prone to scratches or detachment in complex environments. Moreover, the combination of coating (the high-refractive-index layer is formed by coating) and magnetron sputtering (the close-bonding layer, high-refractive-index coating layer, and low-refractive-index coating layer are formed by magnetron sputtering) processes reduces equipment costs, simplifies the process, and improves production efficiency.

[0086] It will be apparent to those skilled in the art that this invention is not limited to the details of the exemplary embodiments described above, and that it can be implemented in other specific forms without departing from the spirit or essential characteristics of this invention. Therefore, the embodiments should be considered illustrative and non-limiting in all respects, and the scope of this invention is defined by the appended claims rather than the foregoing description. Thus, it is intended that all variations falling within the meaning and scope of equivalents of the claims be included within this invention. No reference numerals in the claims should be construed as limiting the scope of the claims.

[0087] Furthermore, it should be understood that although this specification describes embodiments, not every embodiment contains only one independent technical solution. This narrative style is merely for clarity. Those skilled in the art should consider the specification as a whole, and the technical solutions in each embodiment can also be appropriately combined to form other embodiments that can be understood by those skilled in the art.

Claims

1. A high-transmittance, low-reflection thin film, characterized in that, It includes a substrate layer and an anti-reflection layer disposed on the substrate layer. The anti-reflection layer includes a high-refractive-index composite layer and a low-refractive-index coating layer stacked together. The high-refractive-index composite layer includes a high-refractive-index coating layer, a bonding layer, and a high-refractive-index coating layer stacked sequentially from the substrate layer to the low-refractive-index coating layer. The high-refractive-index coating has a refractive index of 1.73-1.78, the high-refractive-index coating layer has a refractive index of 2.2-2.35, and the low-refractive-index coating layer has a refractive index of 1.43-1.

48.

2. The high transmittance, low reflectance thin film according to claim 1, characterized in that, The bonding layer is a nickel plating layer with a thickness of 2.5-4.5 nm.

3. The high transmittance, low reflectance thin film according to claim 2, characterized in that, The high-refractive-index coating layer is a niobium pentoxide coating layer, and the thickness of the high-refractive-index coating layer is 7-13 nm.

4. The high transmittance, low reflectance thin film according to claim 2, characterized in that, The low-reflection coating layer is a silicon dioxide coating layer, and the thickness of the low-reflection coating layer is 71-81 nm.

5. The high transmittance, low reflectance thin film according to claim 1, characterized in that, The bonding layer is a silicon-plated layer with a thickness of 0.1-0.4 nm.

6. The high transmittance, low reflectance thin film according to claim 5, characterized in that, The high-refractive-index coating layer is a niobium pentoxide coating layer, and the thickness of the high-refractive-index coating layer is 13-19 nm.

7. The high transmittance, low reflectance thin film according to claim 5, characterized in that, The low-reflection coating layer is a silicon dioxide coating layer, and the thickness of the low-reflection coating layer is 95-105 nm.

8. The high transmittance, low reflectance thin film according to claim 1, characterized in that, The thickness of the high-refractive-index coating is 90-165 nm.

9. The high transmittance, low reflectance thin film according to claim 1, characterized in that, A hardening layer is also provided between the substrate layer and the anti-reflective layer.

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