Adjustable clamp for observing cleavage plane of silicon wafer
By designing an adjustable clamp that includes a base, an adjustment slide, and clamping bolts, the problem of inconvenient position adjustment of silicon wafer samples under a metallographic microscope was solved, achieving stable clamping of silicon wafer samples and multi-point observation, thus improving observation efficiency.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-03-26
- Publication Date
- 2026-04-14
AI Technical Summary
Existing metallurgical microscopes are inconvenient to adjust the position of silicon wafer samples when observing the cleavage surfaces of silicon wafers, making it difficult to achieve efficient observation from multiple positions.
An adjustable clamp was designed, comprising a base, an adjusting slide, a fixing magnet, a clamp, and a clamping bolt. The fixing magnet is used to attach the sample to the microscope position, and the clamping bolt and clamp plate are used to move to achieve stable clamping and position adjustment of the sample. Combined with the cushioning of the sponge pad, the stability of the sample during the observation process and multi-point observation are ensured.
This method enables stable fixation and multi-point observation of silicon wafer samples under a metallographic microscope, improving observation efficiency and avoiding damage to the samples during the adjustment process.
Smart Images
Figure CN224122839U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of silicon wafer production, and in particular to an adjustable fixture for observing the cleavage surface of silicon wafers. Background Technology
[0002] Metallurgical microscope systems organically combine traditional optical microscopes with computers (digital cameras) through photoelectric conversion. They can not only perform microscopic observations on the eyepieces, but also observe real-time dynamic images on the computer (digital camera) display screen. However, when observing the cleavage plane of silicon wafers with a metallurgical microscope, it is necessary to observe the smooth plane of crystal cleavage at multiple positions of the silicon wafer sample. Existing metallurgical microscopes are very inconvenient to adjust the position of the silicon wafer sample. Utility Model Content
[0003] The purpose of this invention is to provide an adjustable fixture for observing the cleavage surface of silicon wafers in order to solve the above-mentioned problems.
[0004] This utility model achieves the above objectives through the following technical solutions:
[0005] An adjustable fixture for observing the cleavage surface of a silicon wafer includes a base, an adjustment groove on the top of the base, fixed magnetic blocks embedded at the four corners of the bottom side of the base, and a fixture inside the adjustment groove.
[0006] The fixture includes a sliding seat, with two symmetrical clamping plates slidably connected to the top of the sliding seat. Buffers are fixed to the opposite sides of the two clamping plates. Two clamping bolts are rotatably connected to the upper end of the sliding seat, and a guide seat for sliding within the adjusting groove is fixed to the bottom of the sliding seat.
[0007] Preferably, the adjusting slide is parallel to the long side of the base, and the guide seat adopts an inverted T-shaped structure.
[0008] Preferably, the top of the base has 10cm scales on both the front and back sides of the adjustment slide, with an accuracy of 1mm, and the front and back sides of the base have markings for aligning the scales.
[0009] Preferably, each clamping plate has two lugs fixed at its lower end, and the lugs are connected to the clamping bolts by threads, with a knob at the front end of the clamping bolts.
[0010] Preferably, the top of the sliding seat has two clamping grooves for allowing the lugs to slide.
[0011] Preferred materials: cushioning components can be made of elastic and frictional materials such as sponge pads and rubber pads.
[0012] Preferably, the bottom of the base may be provided with one or more lifting plates, and the four corners of the lifting plates are inlaid with through-hole lifting magnetic blocks.
[0013] The advantages compared with existing technologies are as follows: the sample is stably attracted and fixed in the observation position of the metallographic microscope by the four fixed magnetic blocks at the bottom of the base. After the sample is fixed once by the clamping bolts, the sliding seat is moved to different positions to complete the observation of multiple points of the sample cross section. Attached Figure Description
[0014] To more clearly illustrate the technical solutions in the embodiments of this utility model or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this utility model. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.
[0015] Figure 1 This is a schematic diagram of the structure of an adjustable fixture for observing the cleavage surface of a silicon wafer, as described in this utility model.
[0016] Figure 2 This is a cross-sectional view of an adjustable fixture for observing the cleavage surface of a silicon wafer, as described in this utility model.
[0017] Figure 3 This is a schematic diagram of the heightening plate structure of an adjustable clamp for observing the cleavage surface of a silicon wafer, as described in this utility model;
[0018] Figure 4 This is a schematic diagram of the sliding seat structure of an adjustable clamp for observing the cleavage surface of a silicon wafer, as described in this utility model.
[0019] Figure 5 This is a schematic diagram of the clamping groove structure of an adjustable fixture for observing the cleavage surface of a silicon wafer, as described in this utility model.
[0020] Figure 6 This is a schematic diagram of the clamping plate structure of an adjustable clamp for observing the cleavage surface of a silicon wafer, as described in this utility model.
[0021] Figure 7 This is a schematic diagram of the base structure of an adjustable clamp for observing the cleavage surface of a silicon wafer as described in this utility model;
[0022] Figure 8 This is a schematic diagram of the adjusting groove structure of an adjustable fixture for observing the cleavage surface of a silicon wafer, as described in this utility model.
[0023] The annotations in the attached figures are explained as follows:
[0024] 1. Base; 2. Fixing magnet; 3. Adjusting slide; 4. Heightening plate; 5. Heightening magnet; 6. Sliding seat; 7. Clamping plate; 8. Sponge pad; 9. Clamping bolt; 10. Guide seat; 11. Clamping slide. Detailed Implementation
[0025] In the description of this utility model, it should be noted that, unless otherwise explicitly specified and limited, the terms "installation," "connection," and "joining" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model based on the specific circumstances.
[0026] The present invention will be further described below with reference to the accompanying drawings:
[0027] like Figures 1-8 As shown, an adjustable fixture for observing the cleavage surface of a silicon wafer includes a base 1. An adjustment groove 3 is provided on the top of the base 1. Fixed magnets 2 are embedded at the four corners of the bottom side of the base 1. A sliding seat 6 is provided inside the adjustment groove 3. Two symmetrical clamping plates 7 are slidably connected to the top of the sliding seat 6. A buffer is fixed on the opposite side of the two clamping plates 7. The buffer can be made of elastic and frictional materials such as sponge pads 8 and rubber pads. Two clamping bolts 9 are rotatably connected to the upper end of the sliding seat 6. A guide seat 10 for sliding in the adjustment groove 3 is fixed at the bottom of the sliding seat 6.
[0028] In this embodiment: the adjusting slide 3 is parallel to the long side of the base 1, the guide seat 10 adopts an inverted T-shaped structure, and the top of the base 1 is provided with 10cm scales on both the front and rear sides of the adjusting slide 3 with an accuracy of 1mm. The front and rear sides of the base 1 are provided with markings for aligning the scales. The moving distance of the base 1 can be observed through the markings on the front and rear sides of the base 1. At the same time, the guide seat 10 slides inside the adjusting slide 3 to avoid the sample shaking during the adjustment of the base 1.
[0029] In this embodiment: each clamping plate 7 has two lugs fixed at its lower end, and the lugs are connected to the clamping bolts 9 by threads. The clamping bolts 9 have a knob at the front end, and the top of the sliding seat 6 has two clamping grooves 11 for sliding the lugs. The clamping bolts 9 are rotated by the knob, and the rotation of the clamping bolts 9 is used to move the clamping plates 7 along the clamping grooves 11 through the lugs, so that the two clamping plates 7 can clamp and fix the sample.
[0030] In this embodiment: The bottom of the base 1 may be provided with one or more lifting plates 4. The four corners of the lifting plates 4 are inlaid with through lifting magnetic blocks 5. The height of the entire sample can be adjusted by placing one or more lifting plates 4 at the bottom of the base 1. At the same time, the four lifting magnetic blocks 5 are used to correspond with the fixed magnetic blocks 2, so that the lifting magnetic blocks 5 correspond to the bottom of the base 1.
[0031] Working principle: When using this device, first place it in the observation position of the microscope. Then place the sample to be observed between the two clamping plates 7 on the top of the sliding seat 6. Then turn the knob to rotate the clamping bolt 9. The rotation of the clamping bolt 9 will drive the lugs of the two clamping plates 7 to move closer to each other, and then the two clamping plates 7 will move closer to the sample to be observed. During this process, the sponge pad 8 is attached to the side of the sample to increase friction and avoid damage to the sample. Then the cross section of the sample can be observed through the microscope.
[0032] When observing other points on the sample cross section, push the sliding seat 6 to move the guide seat 10 along the adjusting groove 3. After the mark on the base 1 moves to the corresponding mark on the top of the base 1, the sample cross section can be observed with a microscope. Repeat this process multiple times to observe multiple points on the sample cross section.
[0033] The foregoing has shown and described the basic principles, main features, and advantages of this utility model. Those skilled in the art should understand that this utility model is not limited to the above embodiments. The embodiments and descriptions in the specification are merely illustrative of the principles of this utility model. Various changes and modifications can be made to this utility model without departing from its spirit and scope, and all such changes and modifications fall within the scope of the claimed utility model.
Claims
1. An adjustable clamp for observing the cleavage surface of a silicon wafer, characterized in that: Includes a base (1), the top of which is provided with an adjustment groove (3), and fixed magnets (2) are embedded at the four corners of the bottom side of the base (1). The adjustment groove (3) is provided with a clamp. The clamp includes a sliding seat (6), and two symmetrical clamping plates (7) are slidably connected to the top of the sliding seat (6). A buffer is fixed on the opposite side of the two clamping plates (7). Two clamping bolts (9) are rotatably connected to the upper end of the sliding seat (6). A guide seat (10) for sliding in the adjusting groove (3) is fixed to the bottom of the sliding seat (6).
2. The adjustable fixture for observing the cleavage surface of a silicon wafer according to claim 1, characterized in that: The adjusting groove (3) is parallel to the long side of the base (1), and the guide seat (10) adopts an inverted T-shaped structure.
3. The adjustable fixture for observing the cleavage surface of a silicon wafer according to claim 1, characterized in that: The base (1) has 10cm scales on both the front and back sides of the adjustment slide (3) with an accuracy of 1mm. The base (1) also has markings on both the front and back sides for aligning the scales.
4. An adjustable fixture for observing the cleavage surface of a silicon wafer according to claim 1, characterized in that: Each clamp (7) has two lugs fixed at its lower end, and the lugs are connected to the clamping bolt (9) by threads. The clamping bolt (9) has a knob at its front end.
5. An adjustable fixture for observing the cleavage surface of a silicon wafer according to claim 1, characterized in that: The top of the sliding seat (6) has two clamping grooves (11) for allowing the lugs to slide.
6. An adjustable fixture for observing the cleavage surface of a silicon wafer according to claim 1, characterized in that: The buffer is made of sponge pad (8) and rubber pad, which are materials with elasticity and friction.
7. An adjustable fixture for observing the cleavage surface of a silicon wafer according to claim 1, characterized in that: The base (1) has one or more lifting plates (4) at its bottom, and the four corners of the lifting plates (4) are inlaid with through-hole lifting magnetic blocks (5).