Corrosion device for silicon dioxide oxide layer

By using a stirring roller and spray head in the corrosion device, the problem of uneven distribution of the corrosion liquid was solved, achieving uniform distribution of the corrosion liquid and improving the corrosion effect. This improved the uniformity and precision of corrosion and extended the service life of the device.

CN224205570UActive Publication Date: 2026-05-05DANDONG AN SHUN MICROELECTRONICS CO LTD
View PDF 0 Cites 0 Cited by

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
DANDONG AN SHUN MICROELECTRONICS CO LTD
Filing Date
2025-04-18
Publication Date
2026-05-05

AI Technical Summary

Technical Problem

In traditional wet etching of silicon dioxide oxide layers, the etchant is unevenly distributed on the sample surface, resulting in localized over- or under-etching. Furthermore, the etchant has poor fluidity within the etching tank, making it difficult to achieve uniform distribution, which affects device performance and reliability.

Method used

A corrosion device including a stirring roller and a rotating sample stage was designed. The corrosion liquid is stirred by the spiral blades on the stirring roller, and the corrosion liquid is sprayed evenly by the spray head to ensure that the corrosion liquid is evenly distributed in the corrosion liquid chamber. The rotating sample stage ensures that the sample surface is evenly in contact with the corrosion liquid.

Benefits of technology

This method achieves uniform distribution of the corrosive liquid, avoids excessively high or low local concentrations, ensures the uniformity and precision of corrosion, improves the corrosion effect, reduces maintenance costs, and extends the life of the equipment.

✦ Generated by Eureka AI based on patent content.

Smart Images

  • Figure CN224205570U_ABST
    Figure CN224205570U_ABST
Patent Text Reader

Abstract

The utility model relates to the technical field of corrosion devices, and discloses a corrosion device for a silicon dioxide oxide layer, which solves the problems in the background technology and comprises a support, a motor is arranged on the support, the output end of the motor is connected with a rotating shaft, a first driving wheel and a second driving wheel are arranged on the rotating shaft, and the first driving wheel and the second driving wheel are arranged on the support. The first driving wheel is connected with the first driven wheel through a first belt, the second driving wheel is connected with the second driven wheel through a second belt, the first driven wheel is connected with the stirring roller, the stirring roller is arranged in the corrosive liquid bin, the second driven wheel is provided with a linkage rod, and the linkage rod is connected with the stirring roller. The device has the advantages that it can be guaranteed that corrosive liquid is evenly distributed in the corrosive liquid bin, the situation that the local concentration is too high or too low is avoided, meanwhile, it is guaranteed that the corrosive liquid covers the surface of the whole sample, and corrosion dead corners are avoided.
Need to check novelty before this filing date? Find Prior Art

Description

Technical Field

[0001] This utility model belongs to the field of corrosion device technology, specifically a corrosion device for silicon dioxide oxide layer. Background Technology

[0002] In the fields of semiconductor manufacturing, microelectronics engineering, and materials science, the etching of silicon dioxide (SiO2) oxide layers is a critical process. Silicon dioxide layers are widely used in the manufacture of integrated circuits, MEMS (microelectromechanical systems) devices, and optical components, and the quality of its etching process directly affects the performance and reliability of the devices.

[0003] Traditional wet etching typically uses hydrofluoric acid or its buffer solution as the etchant. Its basic principle is to dissolve the silica layer through a chemical reaction, generating volatile hexafluorosilicic acid and water. In the traditional immersion etching process, the distribution of the etchant on the sample surface is uneven, leading to local over- or under-etching. Furthermore, the etchant has poor fluidity within the etching chamber, making it difficult to achieve uniform distribution and creating a concentration gradient within the chamber, resulting in different corrosion rates in different areas. To address this, we propose an etching device for silica oxide layers. Utility Model Content

[0004] To address the problems mentioned in the background art, this utility model provides the following technical solution: a silica oxide layer etching device, comprising a support, a motor mounted on the support, the output end of the motor being connected to a rotating shaft, a first driving wheel and a second driving wheel mounted on the rotating shaft, the first driving wheel being connected to a first driven wheel via a first belt, the second driving wheel being connected to a second driven wheel via a second belt, the first driven wheel being connected to a stirring roller, the stirring roller being disposed inside an etching liquid chamber, a linkage rod being mounted on the second driven wheel, a rotating sample stage being mounted on the linkage rod, an etching chamber being disposed outside the rotating sample stage, and the etching chamber and the etching liquid chamber being connected by a communicating device.

[0005] Preferably, the connecting device includes a connecting channel, one end of which passes through the corrosion liquid tank and the other end of which passes through the corrosion tank. A pump body is provided at the connection between the connecting channel and the corrosion liquid tank, and a spray head is provided at the other end of the connecting channel. The connecting channel and the pump body are used to transport the corrosion liquid from the corrosion liquid tank to the corrosion tank, and the spray head is used to spray the corrosion liquid evenly onto the sample surface to improve the uniformity and accuracy of corrosion.

[0006] Preferably, the stirring roller is provided with stirring blades, which are spiral-shaped and rotate on the stirring roller. The spiral stirring blades can improve the stirring efficiency, ensure that the corrosion liquid is evenly distributed in the corrosion liquid chamber, and avoid local concentrations that are too high or too low. The spiral design can also reduce the bubbles generated during the stirring process, further improving the uniformity of the corrosion liquid.

[0007] Preferably, the rotating sample stage is provided with multiple sample fixing slots and anti-slip textures. The multiple sample fixing slots are used to fix multiple samples at the same time, which improves the batch processing capacity of the device. The anti-slip textures are used to increase the friction between the sample and the rotating sample stage, prevent the sample from sliding or displacing during rotation, and ensure corrosion uniformity.

[0008] Preferably, both the first belt and the second belt are made of corrosion-resistant materials, such as polytetrafluoroethylene or fluororubber. Belts made of corrosion-resistant materials can extend the service life of the device, reduce maintenance costs, and ensure the stability and reliability of the transmission system.

[0009] Compared with the prior art, the beneficial effects of this utility model are:

[0010] During operation, the sample to be etched is first placed in the sample fixing slot on the rotating sample stage. The motor starts, driving the rotating shaft to rotate. The rotating shaft is equipped with a first driving wheel and a second driving wheel, which transmit power to the first driven wheel and the second driven wheel through the first belt and the second belt, respectively. The first driven wheel is connected to the stirring roller. When the stirring roller rotates, the spiral blades push the etching solution to circulate in the etching solution chamber, ensuring uniform etching solution concentration and avoiding local concentrations that are too high or too low. The second driven wheel drives the rotating sample stage to rotate through the linkage rod. The rotation of the rotating sample stage ensures that the sample surface is evenly contacted with the etching solution, ensuring uniform etching. The etching solution in the etching solution chamber is transported to the etching chamber through the connecting channel. The pump body pumps the etching solution from the etching solution chamber into the connecting channel. The spray head sprays the etching solution evenly onto the sample surface on the rotating sample stage. After etching is completed, the etching chamber is opened, the sample is removed, and the etching chamber is cleaned, ready for the next etching. This ensures that the etching solution is evenly distributed in the etching solution chamber, avoiding local concentrations that are too high or too low, and also ensures that the etching solution covers the entire sample surface, avoiding etching dead spots. Attached Figure Description

[0011] The accompanying drawings are provided to further illustrate the present invention and form part of the specification. They are used together with the embodiments of the present invention to explain the present invention, but do not constitute a limitation thereof. In the drawings:

[0012] Figure 1 This is a front view of the overall structure of this utility model;

[0013] Figure 2 This is a cross-sectional view of the overall front view of this utility model;

[0014] In the diagram: 1. Support; 2. Motor; 3. Rotating shaft; 4. First driving wheel; 5. Second driving wheel; 6. First belt; 7. First driven wheel; 8. Second belt; 9. Second driven wheel; 10. Stirring roller; 11. Corrosion liquid tank; 12. Linkage rod; 13. Rotating sample stage; 14. Corrosion chamber; 15. Connecting channel; 16. Pump body; 17. Spray head. Detailed Implementation

[0015] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present utility model. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. All other embodiments obtained by those skilled in the art based on the embodiments of the present utility model without creative effort are within the protection scope of the present utility model.

[0016] Depend on Figure 1-2 The present invention includes a support 1, on which a motor 2 is mounted. The output end of the motor 2 is connected to a rotating shaft 3. A first driving wheel 4 and a second driving wheel 5 are mounted on the rotating shaft 3. The first driving wheel 4 is connected to a first driven wheel 7 via a first belt 6. The second driving wheel 5 is connected to a second driven wheel 9 via a second belt 8. The first driven wheel 7 is connected to a stirring roller 10, which is located inside a corrosion liquid chamber 11. A linkage rod 12 is mounted on the second driven wheel 9, and a rotating sample stage 13 is mounted on the linkage rod 12. A corrosion chamber 14 is fitted over the rotating sample stage 13, and the corrosion chamber 14 and the corrosion liquid chamber 11 are connected by a communication device.

[0017] The connecting device includes a connecting channel 15, one end of which passes through the corrosion liquid tank 11 and the other end of which passes through the corrosion tank 14. A pump body 16 is provided at the connection between the connecting channel 15 and the corrosion liquid tank 11, and a spray head 17 is provided at the other end of the connecting channel 15. The connecting channel 15 and the pump body 16 are used to transport the corrosion liquid from the corrosion liquid tank 11 to the corrosion tank 14, and the spray head 16 is used to spray the corrosion liquid evenly onto the sample surface to improve the uniformity and accuracy of corrosion.

[0018] The stirring roller 10 is equipped with stirring blades. The stirring blades are spiral-shaped and rotate on the stirring roller 10. The spiral stirring blades can improve the stirring efficiency, ensure that the corrosion liquid is evenly distributed in the corrosion liquid tank 11, and avoid local concentrations that are too high or too low. The spiral design can also reduce the bubbles generated during the stirring process, further improving the uniformity of the corrosion liquid.

[0019] The rotating sample stage 13 is provided with multiple sample fixing slots and anti-slip textures. The multiple sample fixing slots are used to fix multiple samples at the same time, which improves the batch processing capacity of the device. The anti-slip textures are used to increase the friction between the sample and the rotating sample stage, prevent the sample from sliding or displacing during rotation, and ensure corrosion uniformity.

[0020] Both the first belt 6 and the second belt 8 are made of corrosion-resistant materials, namely polytetrafluoroethylene or fluororubber. Belts made of corrosion-resistant materials can extend the service life of the device, reduce maintenance costs, and ensure the stability and reliability of the transmission system.

[0021] Working principle: During operation, the sample to be etched is first placed in the sample fixing slot on the rotating sample stage 13. The motor 2 starts, driving the rotating shaft 3 to rotate. The rotating shaft 3 is equipped with a first driving wheel 4 and a second driving wheel 5, which transmit power to the first driven wheel 7 and the second driven wheel 9 through the first belt 6 and the second belt 8, respectively. The first driven wheel 7 is connected to the stirring roller 10. When the stirring roller 10 rotates, the spiral blades push the etching solution to circulate in the etching solution tank 11, ensuring uniform etching solution concentration and avoiding local concentrations that are too high or too low. The second driven wheel 9 drives the rotating sample stage 13 to rotate through the linkage rod 12. The rotation of the rotating sample stage 13 ensures uniform contact between the sample surface and the etching solution, guaranteeing uniform etching. The etching solution in the etching solution tank 11 is transported to the etching tank 14 through the connecting channel 15. The pump body 16 pumps the etching solution from the etching solution tank 11 into the connecting channel 15. The spray head 16 sprays the etching solution evenly onto the sample surface on the rotating sample stage 13. After etching is complete, the etching tank 14 is opened, the sample is removed, and the etching tank 14 is cleaned, ready for the next etching. This ensures that the etching solution is evenly distributed in the etching solution tank 11, avoiding local concentrations that are too high or too low, while also ensuring that the etching solution covers the entire sample surface, avoiding etching dead zones.

[0022] It should be noted that, in this document, relational terms such as "first" and "second" are used only to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such process, method, article, or apparatus.

[0023] Although embodiments of the present invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the present invention, the scope of which is defined by the appended claims and their equivalents.

Claims

1. A device for etching a silicon dioxide oxide layer, characterized in that: The device includes a support (1), on which a motor (2) is mounted. The output end of the motor (2) is connected to a rotating shaft (3). A first driving wheel (4) and a second driving wheel (5) are mounted on the rotating shaft (3). The first driving wheel (4) is connected to a first driven wheel (7) via a first belt (6). The second driving wheel (5) is connected to a second driven wheel (9) via a second belt (8). The first driven wheel (7) is connected to a stirring roller (10). The stirring roller (10) is located inside a corrosion liquid tank (11). A linkage rod (12) is mounted on the second driven wheel (9). A rotating sample stage (13) is mounted on the linkage rod (12). A corrosion tank (14) is fitted over the rotating sample stage (13). The corrosion tank (14) and the corrosion liquid tank (11) are connected by a communication device.

2. The device for etching a silicon dioxide oxide layer according to claim 1, characterized in that: The connecting device includes a connecting channel (15), one end of which passes through the corrosion liquid tank (11) and the other end of which passes through the corrosion tank (14). A pump body (16) is provided at the connection between the connecting channel (15) and the corrosion liquid tank (11), and a spray head (17) is provided at the other end of the connecting channel (15).

3. The device for etching a silicon dioxide oxide layer according to claim 2, characterized in that: The stirring roller (10) is provided with stirring blades, which are spiral-shaped and rotate on the stirring roller (10).

4. The device for etching a silicon dioxide oxide layer according to claim 3, characterized in that: The rotating sample stage (13) is provided with multiple sample fixing slots and anti-slip textures.

5. The device for etching a silicon dioxide oxide layer according to claim 4, characterized in that: The first belt (6) and the second belt (8) are both made of corrosion-resistant materials, namely polytetrafluoroethylene or fluororubber.