Graphene paste washing device

Abstract

The utility model relates to a graphene paste washing device, which relates to the field of graphene preparation and comprises a reaction kettle, a water inlet pipe, a lifting component and a filter plate, a feed port and a discharge port are formed in the reaction kettle, and the water inlet pipe is communicated to the interior of the reaction kettle; the lifting assembly is fixedly arranged in the reaction kettle and is arranged at the top of the reaction kettle; the filter plate is installed on the lifting assembly, and water through holes are formed in the filter plate. According to the utility model, the filter plate is controlled to move up and down, so that liquid in the reaction kettle penetrates through the water through holes of the filter plate to generate turbulent flow to mix and clean graphene, and the whole process realizes cleaning without mechanical stirring through a hydrodynamic principle, so that the influence of violent collision on graphene performance can be reduced, and the integrity of a graphene crystal structure is protected.

Description

Technical Field

[0001] This utility model relates to the field of graphene preparation, and in particular to a graphene paste washing device. Background Technology

[0002] The oxidation-reduction method is a common method for preparing graphene, which has the advantages of low cost and suitability for large-scale production. After preparing graphene (especially graphene oxide or reduced graphene obtained by oxidation-reduction method) in a reaction vessel, water washing is a key step to remove impurities (such as residual acid, metal ions, unreacted oxidants / reducants, etc.) from the graphene. Since there are acidic substances in the graphene impurities, the water washing of graphene is generally carried out in a reaction vessel.

[0003] Currently, a Chinese patent with announcement number CN214159596U and announcement date of September 10, 2021, proposes a novel water washing reactor. The reactor body forms an internal containment space, and a stirring device is installed in the containment space. The top of the containment space is provided with a feed inlet and the bottom is provided with a discharge outlet. Multiple spray heads are arranged in the containment space, and the spray heads are connected to an alkaline water storage tank.

[0004] When in use, after the material enters the reactor through the feed inlet, the stirring device is turned on to stir the material. After the stirring stops, the spray head is turned on to spray the alkaline water onto the material to start washing. Since the density of the alkaline water is greater than that of the material, the alkaline water gradually sinks during the washing process, washing the material layer by layer and evenly.

[0005] Regarding the aforementioned technologies, during the water washing of graphene, the continuous rotation of the stirring device in the reaction vessel causes violent collisions with the graphene sheets, resulting in breakage or local deformation of the graphene sheets and affecting the performance of the graphene. Utility Model Content

[0006] In order to reduce the collision between the stirring device and graphene during the water washing process and reduce the impact on the performance of graphene, this utility model provides a graphene paste water washing device.

[0007] This utility model provides a graphene paste washing device, which adopts the following technical solution:

[0008] A graphene paste washing device includes: a reaction vessel, a water inlet pipe, a lifting assembly, and a filter plate; the reaction vessel is provided with a feed inlet and a discharge outlet, and the water inlet pipe is connected to the interior of the reaction vessel; the lifting assembly is fixedly installed inside the reaction vessel and is located at the top of the reaction vessel; the filter plate is installed on the lifting assembly and is provided with water passage holes.

[0009] When washing graphene paste, the graphene paste needs to be added to a reaction vessel along with cleaning water to liquefy the graphene. Using the above technical solution, the graphene paste is first added to the reaction vessel through the feed inlet, and cleaning water is injected into the reaction vessel through the water inlet pipe. Then, a lifting assembly moves a filter plate up and down inside the reaction vessel to mix the graphene and cleaning water, thus washing the graphene paste. During the descent of the filter plate, it compresses the liquid below the reaction vessel, causing the liquid to be squeezed upwards through the filter holes, thereby agitating the graphene and achieving paste dispersion and mixing.

[0010] Thus, during the water washing operation, the filter plate drives the liquid in the reaction vessel to pass through the water passage during the lifting and lowering process, generating turbulent motion. This achieves both the mixing and cleaning of graphene and reduces the impact of violent collisions on the performance of graphene. Through the extrusion and turbulence stirring method, the risk of mechanical damage to the graphene crystal structure during the cleaning process is effectively reduced.

[0011] Optionally, the reactor is further provided with fixed nozzles and movable nozzles; multiple fixed nozzles are arranged in a ring around the inner wall above the reactor, and all of the fixed nozzles are positioned towards the filter plate; multiple movable nozzles are arranged in a ring around the filter plate, and all of the movable nozzles are positioned towards the side wall of the reactor; both the fixed nozzles and the movable nozzles are connected to the water inlet pipe.

[0012] By adopting the above technical solution, during the up-and-down movement of the filter plate, the filter plate drives the movable nozzle to move up and down, which can rinse the inner wall of the reactor; at the same time, the filter plate passes through the fixed nozzle during its up-and-down movement, and the fixed nozzle can be aimed at the filter plate to rinse, reducing the graphene adhering to the inner wall of the reactor and the filter plate, and improving the cleanliness of the reactor.

[0013] Optionally, it may also include multiple rotating components, all of which are mounted on the inner wall of the reactor, and the fixed nozzle is mounted on the rotating components.

[0014] By adopting the above technical solution, the rotating component drives the fixed nozzle to swing up and down to adjust the rinsing angle. During the cleaning process, when the filter plate moves below the fixed nozzle, the rotating component controls the fixed nozzle to rotate downward to rinse the upper surface of the filter plate. When the filter plate moves above the fixed nozzle, the rotating component controls the fixed nozzle to rotate upward to rinse the lower surface of the filter plate. This allows the rinsing water flow to cover both the upper and lower surfaces of the filter plate, further improving the cleanliness of the filter plate, effectively reducing cleaning blind spots, and improving water utilization efficiency.

[0015] Optionally, the rotating assembly includes a fixed component, a rotating component, and a driving component; the fixed component is fixedly installed on the inner wall of the reactor, the rotating component is rotatably mounted on the fixed component, the fixed nozzle is mounted on the rotating component, and the driving component is fixedly installed on the fixed component for driving the rotating component to rotate.

[0016] By adopting the above technical solution, when it is necessary to adjust the spray angle, the drive component drives the rotating component to make precise angle adjustment through the gear transmission mechanism, so that the fixed nozzle can wash the upper and lower surfaces of the filter plate.

[0017] Optionally, the rotating assembly further includes a protective cover that covers the outside of the drive component.

[0018] By adopting the above technical solution, the protective cover forms a sealed cavity, which can isolate the driving components from the working environment. When rinsing the inside of the reactor, the protective cover effectively prevents water mist and impurities from entering the driving components, reducing the probability of damage to the driving components and extending the service life of the equipment under humid conditions.

[0019] Optionally, the bottom of the filter plate is arc-shaped, and the middle position of the filter plate is lower than the edge position.

[0020] To facilitate material discharge from the bottom of the reactor, the bottom of the reactor is generally designed with a low-lying structure in the middle. By adopting the above technical solution, the filter plate is designed with a low-lying arc shape in the middle, so that the shape of the filter plate corresponds to the shape of the bottom of the reactor. This allows the filter plate to move downwards as far as possible, thereby increasing the mixing range of the filter plate and increasing the cleaning efficiency. At the same time, the arc shape of the filter plate can also guide the directional flow of cleaning wastewater, so that the waste liquid quickly converges to the central discharge area, accelerating the discharge speed of waste liquid and reducing residue.

[0021] Optionally, the lifting assembly is a multi-stage telescopic structure, and the lifting assembly is arranged vertically at the top of the reactor.

[0022] By adopting the above technical solution, a multi-stage telescopic structure is installed on the top of the reactor. When the telescopic structure extends, it controls the filter plate to move downwards, and when it shortens, it drives the filter plate to move upwards. At the same time, the multi-stage telescopic structure can also reduce the vertical space occupied by the lifting components inside the reactor, thereby improving the utilization rate of the internal space of the reactor.

[0023] Optionally, a pH sensor is also installed inside the reactor, with the probe of the pH sensor located at the bottom of the reactor.

[0024] By adopting the above technical solution, the pH sensor monitors the acidity and alkalinity parameters of the solution at the bottom of the reactor in real time. Users can judge the cleanliness of graphene based on the parameters of the pH sensor, and thus better grasp the cleaning effect of graphene.

[0025] In summary, this utility model has at least one of the following beneficial technical effects:

[0026] When washing graphene paste with water, the up-and-down movement of the filter plate is controlled to cause the liquid in the reactor to flow through the water holes of the filter plate to generate turbulent motion, thereby mixing and cleaning the graphene. This can reduce the impact of violent collisions on the performance of graphene and effectively reduce the risk of mechanical damage to the graphene crystal structure during the cleaning process.

[0027] By installing fixed nozzles on the inner wall of the reactor to clean the filter plates, and by installing movable nozzles on the filter plates, the movable nozzles clean the inner wall of the reactor as the filter plates move up and down. This effectively reduces the impurities remaining on the filter plates and the inner wall of the reactor, and improves the cleanliness of the reactor interior.

[0028] The fixed nozzle is installed inside the reactor via a rotating assembly. Controlling the rotation of the rotating assembly controls the rotation of the fixed nozzle. When the filter plate moves above the fixed nozzle, the fixed nozzle is rotated upwards to rinse the bottom of the filter plate; when the filter plate moves below the fixed nozzle, the fixed nozzle is rotated downwards to rinse the top of the filter plate, effectively reducing the rinsing blind spot. Attached Figure Description

[0029] Figure 1 This is a schematic diagram of the overall structure of an embodiment of this application;

[0030] Figure 2 This is a schematic diagram of the internal structure of an embodiment of this application;

[0031] Figure 3 This is a schematic diagram of the internal structure of another usage state according to an embodiment of this application;

[0032] Figure 4 yes Figure 3 Enlarged view of part I in the middle;

[0033] Figure 5 yes Figure 3 Enlarged view of part II.

[0034] Explanation of reference numerals in the attached drawings: 100, reaction vessel; 101, feed inlet; 102, discharge outlet; 110, sensor; 120, fixed nozzle; 130, movable nozzle; 200, water inlet pipe; 300, lifting assembly; 400, filter plate; 401, water passage hole; 500, rotating assembly; 510, fixed component; 520, rotating component; 530, driving component; 540, protective cover. Detailed Implementation

[0035] The following combination Figures 1 to 5 The present invention will be described in further detail below.

[0036] This utility model discloses a graphene paste washing device. (Refer to...) Figures 1 to 3 A graphene paste washing device mainly includes four core structures: a reaction vessel 100, a water inlet pipe 200, a lifting assembly 300, and a filter plate 400. The reaction vessel 100 has a feed inlet 101 on its side wall and a discharge outlet 102 at its bottom. The lifting assembly 300 is installed on the top of the reaction vessel 100, and the filter plate 400 is suspended at the bottom of the lifting assembly 300. The filter plate 400 has multiple water passage holes 401. During the washing operation, the lifting assembly 300 drives the filter plate 400 to reciprocate vertically inside the reaction vessel 100. The filter plate 400 squeezes the liquid, causing it to pass through the water passage holes 401 and generate turbulence, thus dispersing and cleaning the graphene. At the same time, a pH sensor 110 is installed at the bottom of the reaction vessel 100 to monitor the acidity and alkalinity of the cleaning solution in real time, ensuring that the cleaning process is controllable.

[0037] Reference Figures 1 to 3 The reactor body is cylindrical in shape, and the reactor 100 is composed of three sections connected by bolts. A circular feed inlet 101 is opened on the side wall of the reactor 100 at the upper quarter position. The bottom of the reactor 100 is tapered to form a discharge outlet 102. Multiple sets of fixed nozzles 120 are evenly arranged around the inner wall of the reactor 100. The fixed nozzles 120 are connected to the water inlet pipe 200 through a ring pipe. The fixed nozzles 120 are installed on the inner wall of the reactor 100 through a rotating assembly 500.

[0038] Reference Figure 4 The rotating assembly 500 includes a fixed component 510, a rotating component 520, a driving component 530, and a protective cover 540. The protective cover 540 is a shell structure fixedly installed on the inner wall of the reactor 100. The protective cover 540 includes a waterproof chamber and a fixed plate. The fixed component 510 is fixedly installed on the fixed plate of the waterproof cover by screws. The rotating component 520 is rotatably connected to the fixed component 510 by a pin. The pin is fixedly installed to the rotating component 520 and a driven gear is installed on the pin. The driving component 530 uses a waterproof motor and is fixedly installed in the waterproof chamber. A driving gear is installed on the output shaft of the driving component 530. The driving gear meshes with the driven gear so that the driving component 530 can control the rotation of the rotating component 520, thereby driving the fixed nozzle to rotate.

[0039] Reference Figure 2 and Figure 3The reactor 100 is equipped with an installation part on its top. The lifting assembly 300 adopts a four-stage hydraulic telescopic cylinder and is fixedly installed on the installation part on the top of the reactor 100 in the vertical direction. The filter plate 400 is fixedly installed on the bottom of the lifting assembly 300. The filter plate 400 is arc-shaped with a downward concave middle and a drainage hole in the middle. Multiple water passage holes 401 are evenly opened on the filter plate 400 to facilitate the flow of graphene through the water passage holes 401 during the up and down movement of the filter plate 400, thereby generating turbulence.

[0040] Reference Figure 5 Above the filter plate 400, there are multiple fixed blocks welded to the filter plate 400 evenly distributed around the edge of the filter plate 400. Multiple movable nozzles 130 are installed on each fixed block. The multiple movable nozzles 130 are all facing outward and aligned with the side wall of the reactor 100. At the same time, an annular coil is also provided on the fixed block. The annular coil is connected to the water inlet pipe 200 to supply water to the movable nozzles 130.

[0041] The implementation principle of the graphene paste washing device in this embodiment of the utility model is as follows:

[0042] When washing graphene, graphene paste and cleaning solution are fed into reactor 100 through inlet 101. After the lifting assembly 300 is started, the multi-stage telescopic rod drives the arc-shaped filter plate 400 to reciprocate in the vertical direction. When the filter plate 400 moves downward, it squeezes the lower liquid. The liquid passes through the water passage holes 401 on the filter plate 400 to form an upward jet. When the filter plate 400 moves upward, the upper liquid passes through the water passage holes 401 of the filter plate 400 and flows downward. When the liquid passes through the water passage holes 401 of the filter plate 400, turbulence is generated to achieve gentle and thorough mixing, so that the graphene paste is fully mixed and in contact with the cleaning solution.

[0043] After the graphene is cleaned, the discharge port 102 at the bottom of the reactor 100 is opened to discharge the graphene and cleaning solution together into the reactor 100 for pressure filtration. After the material is discharged from the reactor 100, water is introduced through the water inlet pipe 200. The movable nozzle 130 moves with the filter plate 400 to perform circumferential rinsing of the reactor wall. The fixed nozzle 120 rinses both sides of the filter plate 400 through the angle adjustment mechanism. The rinsing wastewater is discharged from the discharge port 102 at the bottom of the reactor 100 along with the graphene.

[0044] The filtered graphene paste is then put back into the reactor 100 for water washing, and this process is repeated. When the pH sensor 110 at the bottom of the reactor 100 detects that the acidity or alkalinity of the cleaning solution meets the standard during the graphene water washing stage, it indicates that the water washing stage is over.

[0045] In summary, when washing graphene paste with water, this application controls the up-and-down movement of the filter plate 400, causing the liquid in the reaction vessel 100 to flow through the water passages 401 of the filter plate 400 to generate turbulence and mix and clean the graphene. The entire process achieves cleaning without mechanical stirring through the principle of fluid dynamics, which can reduce the impact of violent collisions on the performance of graphene, effectively reduce the risk of mechanical damage to the graphene crystal structure during the cleaning process, and protect the integrity of the graphene crystal structure.

[0046] The above are all preferred embodiments of this utility model, and are not intended to limit the scope of protection of this utility model. Therefore, all equivalent changes made according to the structure, shape and principle of this utility model should be covered within the scope of protection of this utility model.

Claims

1. A graphene paste washing device, characterized in that, include: Reactor (100), water inlet pipe (200), lifting assembly (300) and filter plate (400); The reactor (100) is provided with a feed inlet (101) and a discharge outlet (102), and the water inlet pipe (200) is connected to the interior of the reactor (100); The lifting assembly (300) is fixedly installed inside the reactor (100), and the lifting assembly (300) is installed on the top of the reactor (100); The filter plate (400) is mounted on the lifting assembly (300), and the filter plate (400) is provided with water passage holes (401).

2. The graphene paste washing device according to claim 1, characterized in that: The reactor (100) is also equipped with a fixed nozzle (120) and a movable nozzle (130). Multiple fixed nozzles (120) are provided, and the multiple fixed nozzles (120) are arranged in a ring around the inner wall above the reactor (100), and the multiple fixed nozzles (120) are all arranged facing the filter plate (400); Multiple movable nozzles (130) are provided, and the multiple movable nozzles (130) are arranged around the filter plate (400), and the multiple movable nozzles (130) are all arranged facing the side wall of the reactor (100); Both the fixed nozzle (120) and the movable nozzle (130) are connected to the water inlet pipe (200).

3. The graphene paste washing device according to claim 2, characterized in that: It also includes multiple rotating components (500), all of which are mounted on the inner wall of the reactor (100), and the fixed nozzle (120) is mounted on the rotating components (500).

4. The graphene paste washing device according to claim 3, characterized in that: The rotating assembly (500) includes a fixing member (510), a rotating member (520), and a driving member (530); The fixing member (510) is fixedly installed on the inner wall of the reactor (100), the rotating member (520) is rotatably mounted on the fixing member (510), the fixed nozzle (120) is mounted on the rotating member (520), and the driving member (530) is fixedly installed on the fixing member (510) to drive the rotating member (520) to rotate.

5. The graphene paste washing device according to claim 4, characterized in that: The rotating assembly (500) also includes a protective cover (540) which covers the outside of the drive member (530).

6. A graphene paste washing device according to any one of claims 1-5, characterized in that: The bottom of the filter plate (400) is arc-shaped, and the middle position of the filter plate (400) is lower than the edge position.

7. A graphene paste washing device according to any one of claims 1-5, characterized in that: The lifting assembly (300) is a multi-stage telescopic structure, and the lifting assembly (300) is arranged vertically on the top of the reactor (100).

8. A graphene paste washing device according to any one of claims 1-5, characterized in that: The reactor (100) is also equipped with a pH sensor (110), and the probe of the pH sensor (110) is located at the bottom of the reactor (100).

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