Semiconductor track type rotary automatic cleaning carrier

Abstract

The utility model discloses a semiconductor track type rotary automatic cleaning carrier which comprises a horizontal guide rail and a walking frame connected to the top of the horizontal guide rail in a sliding mode, a walking motor is fixedly installed on the front face of the walking frame, and an output shaft of the walking motor penetrates through and extends into the walking frame. A walking motor is installed on the top of the walking frame, a walking gear is fixedly connected to an output shaft of the walking motor, the walking gear is meshed with the top of the horizontal guide rail, a bearing frame is rotationally connected to the top of the walking frame, and a rotating motor is installed in the walking frame. According to the wafer cleaning and taking device, the walking motor, the rotating motor, the micro air pump, the electromagnet and other assemblies are integrated, automatic and efficient cleaning and taking of wafers are achieved, stable adsorption and easy taking of the wafers are ensured through cooperative work of the micro air pump and the electromagnet, the risk of wafer damage is reduced, and the working efficiency is improved through cooperative use of the walking motor and the rotating motor. Therefore, the wafer can rotate in all directions in the cleaning process, and the cleaning uniformity and the drying efficiency are improved.

Description

Technical Field

[0001] This utility model relates to the field of semiconductor cleaning technology, and more specifically, to a semiconductor track-type rotary automatic cleaning carrier. Background Technology

[0002] Wafer cleaning is a crucial step in semiconductor manufacturing. Traditional wafer cleaning methods have many problems in feeding wafers into the cleaning equipment and in unloading them after cleaning.

[0003] Traditional cleaning processes often rely on relatively simple carriers, lacking efficient automated design for wafer fixation and transportation. The wafer positioning and fixation are not convenient and quick enough, which may cause wafer displacement during transportation, affecting the cleaning effect or even causing wafer damage. Furthermore, wafers are easily damaged when unloading due to excessive contact between the wafer and the carrier after cleaning. Therefore, the professionals have provided a semiconductor track-type rotary automatic cleaning carrier to solve the above-mentioned problems. Utility Model Content

[0004] To address the problems existing in the prior art, the purpose of this utility model is to provide a semiconductor track-type rotary automatic cleaning carrier, which enables the wafer to rotate in all directions during the cleaning process, thereby improving the uniform cleaning effect and drying efficiency.

[0005] To achieve the above objectives, the present invention adopts the following technical solution;

[0006] A semiconductor track-type rotary automatic cleaning carrier includes a horizontal guide rail and a traveling frame slidably connected to its top. A traveling motor is fixedly mounted on the front of the traveling frame. The output shaft of the traveling motor passes through and extends into the interior of the traveling frame. A traveling gear is fixedly connected to the output shaft of the traveling motor. The traveling gear meshes with the top of the horizontal guide rail. A support frame is rotatably connected to the top of the traveling frame. A rotary motor is installed inside the traveling frame and connected to the support frame. Uniformly distributed limiting seats are fixedly mounted inside the support frame. The top of the limiting seats passes through and extends into the top of the support frame. Uniformly distributed suction holes are opened on the top of the limiting seats. A miniature air pump communicating with its interior is fixedly mounted on the limiting seats. Auxiliary components are arranged inside the limiting seats.

[0007] The auxiliary component includes a mounting groove, which is formed on the inner wall of the limiting seat. An electromagnet is fixedly installed on the inner wall of the mounting groove. A synchronization ring is slidably connected to the inner wall of the mounting groove. A top rod is fixedly connected to the top of the synchronization ring. The top rod is located at the bottom of the adsorption hole. A magnetic block is fixedly installed at the bottom of the synchronization ring. The magnetic block is magnetically connected to the electromagnet.

[0008] As a further description of the above technical solution: a limiting block is fixedly connected to the side of the synchronization ring, and the limiting block is slidably connected to the inner wall of the mounting groove.

[0009] As a further description of the above technical solution: a soft pad is fixedly connected to the top of the top rod.

[0010] As a further description of the above technical solution: both the output shaft of the rotary motor and the support frame are fixedly mounted with synchronous pulleys, and the two synchronous pulleys are connected by a synchronous belt drive.

[0011] As a further description of the above technical solution: a limiting ring is fixedly connected to the inner wall of the mounting groove, and the limiting ring is in contact with the bottom of the synchronization ring.

[0012] Compared with existing technologies, the advantages of this utility model are:

[0013] In this invention, by integrating components such as a walking motor, a rotary motor, a micro air pump, and an electromagnet, automated and efficient cleaning and unloading of wafers is achieved. The coordinated work of the micro air pump and the electromagnet ensures the stable adsorption and easy removal of the wafers, reducing the risk of wafer damage. The combined use of the walking motor and the rotary motor enables the wafers to rotate in all directions during the cleaning process, improving cleaning uniformity and drying efficiency. Attached Figure Description

[0014] Figure 1 This is a three-dimensional structural diagram of the support frame of this utility model;

[0015] Figure 2 This is a front view cross-sectional structural diagram of the present invention;

[0016] Figure 3 This is a schematic diagram of the cross-sectional structure of the limiting seat of this utility model;

[0017] Figure 4 For the present utility model Figure 3 Enlarged structural diagram at point A in the middle.

[0018] Explanation of the labels in the diagram:

[0019] 1. Horizontal guide rail; 2. Walking frame; 3. Walking motor; 4. Walking gear; 5. Bearing frame; 6. Rotary motor; 7. Limit seat; 8. Adsorption hole; 9. Miniature air pump; 10. Auxiliary components; 1001. Mounting slot; 1002. Electromagnet; 1003. Synchronization ring; 1004. Top rod; 1005. Magnetic block; 11. Limit block; 12. Soft pad; 13. Synchronization wheel; 14. Limit ring. Detailed Implementation

[0020] The technical solutions of the present invention will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present invention.

[0021] Please see Figures 1-4 In this utility model, a semiconductor track-type rotary automatic cleaning carrier includes a horizontal guide rail 1 and a traveling frame 2 slidably connected to its top. A traveling motor 3 is fixedly installed on the front of the traveling frame 2. The output shaft of the traveling motor 3 passes through and extends into the interior of the traveling frame 2. A traveling gear 4 is fixedly connected to the output shaft of the traveling motor 3. The traveling gear 4 meshes with the top of the horizontal guide rail 1. A support frame 5 is rotatably connected to the top of the traveling frame 2. A rotary motor 6 is installed inside the traveling frame 2 and is connected to the support frame 5. A uniformly distributed limiting seat 7 is fixedly installed inside the support frame 5. The top of the limiting seat 7 passes through and extends into the top of the support frame 5. A uniformly distributed adsorption hole 8 is opened on the top of the limiting seat 7. A micro air pump 9 communicating with its interior is fixedly installed on the limiting seat 7. An auxiliary component 10 is provided inside the limiting seat 7.

[0022] The auxiliary component 10 includes a mounting groove 1001, which is formed on the inner wall of the limiting seat 7. An electromagnet 1002 is fixedly mounted on the inner wall of the mounting groove 1001. A synchronization ring 1003 is slidably connected to the inner wall of the mounting groove 1001. A push rod 1004 is fixedly connected to the top of the synchronization ring 1003. The push rod 1004 is located at the bottom of the adsorption hole 8. A magnetic block 1005 is fixedly mounted at the bottom of the synchronization ring 1003. The magnetic block 1005 is magnetically connected to the electromagnet 1002.

[0023] A limiting block 11 is fixedly connected to the side of the synchronous ring 1003, and the limiting block 11 is slidably connected to the inner wall of the mounting groove 1001; a synchronous wheel 13 is fixedly installed on both the output shaft of the rotary motor 6 and the support frame 5, and the two synchronous wheels 13 are connected by a synchronous belt drive.

[0024] During semiconductor wafer cleaning, a carrier is used to feed the wafers into the cleaning equipment. Initially, the electromagnet 1002 and the micro air pump 9 are not in operation. The operator manually or automatically places the wafers onto the top limiting seat 7 of the carrier 5, ensuring the wafers cover the multiple suction holes 8. Then, the micro air pump 9 starts operating, generating suction to expel gas from the limiting seat 7, creating a negative pressure inside. The suction holes 8 at the top then generate suction to hold and limit the wafers. Subsequently, the travel motor 3 starts operating, driving the travel gear 4, which is fixedly connected to it, to rotate synchronously. The travel gear 4, meshing with the teeth on the top of the horizontal guide rail 1, begins to move, thereby moving the travel frame 2 sliding on the horizontal guide rail 1. The machine 3 continues to operate until the carrier frame 5 enters the cleaning equipment for cleaning. The rotary motor 6 can drive the synchronous wheel 13 to rotate the carrier frame 5, thereby changing the position of the wafer for cleaning. After cleaning, the rotating carrier frame 5 is dried, which also helps to improve the drying efficiency. After completion, the walking frame 2 continues to move to the material picking position. At this time, the micro air pump 9 inflates the limit seat 7 to make its internal air pressure normal. The electromagnet 1002 is energized to generate the same magnetic pole as the magnetic block 1005. The magnetic block 1005 is subjected to the magnetic field and begins to push the synchronous ring 1003 and the push rod 1004 to move upward. The push rod 1004 passes through the adsorption hole 8 and contacts the wafer, gently lifting it. The wafer is separated from the top of the limit seat 7, making it easier to pick up the material.

[0025] In this invention, by integrating components such as a walking motor 3, a rotary motor 6, a micro air pump 9, and an electromagnet 1002, automated and efficient cleaning and unloading of wafers is achieved. The coordinated work of the micro air pump 9 and the electromagnet 1002 ensures the stable adsorption and easy removal of wafers, reducing the risk of wafer damage. The combined use of the walking motor 3 and the rotary motor 6 enables the wafers to rotate in all directions during the cleaning process, improving cleaning uniformity and drying efficiency.

[0026] Please see Figure 3 The top of the top rod 1004 is fixedly connected to a soft pad 12.

[0027] In this invention, during the upward movement of the push rod 1004, the soft pad 12 will contact the bottom of the wafer. The soft pad 12 can prevent the push rod 1004 from directly contacting the wafer, thereby avoiding wear and slippage.

[0028] Please see Figure 3 and 4 In this case, a limiting ring 14 is fixedly connected to the inner wall of the mounting groove 1001, and the limiting ring 14 contacts the bottom of the synchronization ring 1003.

[0029] In this invention, the limiting ring 14 can limit the synchronous ring 1003 when it is reset, thus preventing the magnetic block 1005 from colliding directly with the electromagnet 1002 and causing damage.

[0030] The above description is merely a preferred embodiment of this utility model; however, the protection scope of this utility model is not limited thereto. Any equivalent substitutions or modifications made by those skilled in the art within the technical scope disclosed in this utility model, based on the technical solution and its improved concept, should be included within the protection scope of this utility model.

Claims

1. A semiconductor track-type rotary automatic cleaning carrier, comprising a horizontal guide rail (1) and a traveling frame (2) slidably connected to its top, characterized in that: A walking motor (3) is fixedly installed on the front of the walking frame (2). The output shaft of the walking motor (3) passes through and extends into the interior of the walking frame (2). A walking gear (4) is fixedly connected to the output shaft of the walking motor (3). The walking gear (4) meshes with the top of the horizontal guide rail (1). A support frame (5) is rotatably connected to the top of the walking frame (2). A rotary motor (6) is installed inside the walking frame (2). The rotary motor (6) is connected to the support frame (5). A uniformly distributed limiting seat (7) is fixedly installed inside the support frame (5). The top of the limiting seat (7) passes through and extends into the top of the support frame (5). A uniformly distributed adsorption hole (8) is opened on the top of the limiting seat (7). A micro air pump (9) communicating with its interior is fixedly installed on the limiting seat (7). An auxiliary component (10) is provided inside the limiting seat (7). The auxiliary component (10) includes a mounting groove (1001) which is formed on the inner wall of the limiting seat (7). An electromagnet (1002) is fixedly installed on the inner wall of the mounting groove (1001). A synchronization ring (1003) is slidably connected to the inner wall of the mounting groove (1001). A top rod (1004) is fixedly connected to the top of the synchronization ring (1003). The top rod (1004) is located at the bottom of the adsorption hole (8). A magnetic block (1005) is fixedly installed at the bottom of the synchronization ring (1003). The magnetic block (1005) is magnetically connected to the electromagnet (1002).

2. The semiconductor track-type rotary automatic cleaning carrier according to claim 1, characterized in that: The side of the synchronization ring (1003) is fixedly connected to a limiting block (11), and the limiting block (11) is slidably connected to the inner wall of the mounting groove (1001).

3. The semiconductor track-type rotary automatic cleaning carrier according to claim 1, characterized in that: A soft pad (12) is fixedly connected to the top of the top rod (1004).

4. The semiconductor track-type rotary automatic cleaning carrier according to claim 1, characterized in that: Both the output shaft of the rotary motor (6) and the support frame (5) are fixedly mounted with synchronous pulleys (13), and the two synchronous pulleys (13) are connected by a synchronous belt drive.

5. A semiconductor track-type rotary automatic cleaning carrier according to claim 1, characterized in that: A limiting ring (14) is fixedly connected to the inner wall of the mounting groove (1001), and the limiting ring (14) is in contact with the bottom of the synchronization ring (1003).

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