Wafer-level mask splicing exposure positioning device

Abstract

The utility model discloses a wafer level mask plate splicing exposure positioning device which comprises a bottom plate and supporting frames, the supporting frames are symmetrically installed at the top end of the bottom plate, four sets of mask plate bodies are arranged outside the bottom plate at equal intervals, a plurality of sets of holes are formed in the side walls of the mask plate bodies at equal intervals, pins are arranged outside the holes, and the pins are connected with the supporting frames. First magnets are arranged on the two sides of the pin and extend into the pin, and limiting plates are installed on the side walls of the first magnets in the pin. According to the splicing exposure positioning device, the masks can be conveniently spliced, the splicing stability is improved, modular disassembly and replacement after damage are facilitated, the splicing convenience of the splicing exposure positioning device on the masks is improved, the masks can be conveniently, rapidly and stably positioned and clamped, and the splicing exposure positioning device is convenient to use. The labor intensity of workers is reduced, and the efficiency of quickly and stably clamping and positioning the mask plate by the splicing exposure positioning device is improved.

Description

Technical Field

[0001] This utility model relates to the technical field of splicing exposure positioning devices, specifically a wafer-level mask splicing exposure positioning device. Background Technology

[0002] A photomask, also known as a lithography mask or photomask, is a precision component used in the photolithography process in microelectronics and integrated optoelectronics manufacturing. In order to overcome the size limitations of photomasks and produce larger panels, splicing exposure technology has been widely used in the panel manufacturing industry. Splicing exposure technology refers to dividing a designated area of ​​the array substrate of the panel into several continuous repeating unit areas. The sub-units on the photomask with light-shielding strips correspond to a unit area of ​​the array substrate. The sub-units of the photomask are sequentially aligned with each unit area of ​​the array substrate and exposed, so that the designated area of ​​the array substrate is exposed.

[0003] As disclosed in the authorization announcement number CN114429423B, a splicing system and splicing method includes: a support platform, on which a mask is placed, the mask having multiple backplate adsorption areas, each backplate adsorption area having at least one first positioning point, a backplate picking device disposed on one side of the support platform, the backplate picking device being used to pick up the backplate and carry the backplate to move, and the backplate having at least one second positioning point.

[0004] Although it achieves the goal of setting a matching second positioning point on the corresponding back plate by using a mask plate with a first positioning point, and then attaching multiple back plates to the mask plate after accurate positioning, it eliminates the seam after splicing individual film-attached back plates.

[0005] However, this does not solve the problem that existing splicing exposure positioning devices are generally not conducive to convenient splicing of photomasks, affecting the stability during splicing, and making it inconvenient to disassemble and replace them in modules after damage. This affects the convenience of splicing photomasks by the splicing exposure positioning device, and makes it difficult to quickly and stably position and clamp the photomasks, which affects the labor intensity of manual labor and the efficiency of the splicing exposure positioning device in quickly and stably clamping and positioning the photomasks. Utility Model Content

[0006] The purpose of this invention is to provide a wafer-level mask splicing and exposure positioning device to solve the problems mentioned in the background art, such as the inconvenience of splicing masks, affecting the stability during splicing, the difficulty of modular disassembly and replacement after damage, the inconvenience of splicing masks, the difficulty of quickly and stably positioning and clamping masks, the impact on manual labor intensity, and the efficiency of the splicing and exposure positioning device in quickly and stably clamping and positioning masks.

[0007] To achieve the above objectives, this utility model provides the following technical solution: a wafer-level mask splicing exposure positioning device, comprising a base plate and a support frame. The support frame is symmetrically installed on the top of the base plate. Four sets of mask bodies are arranged at equal intervals on the outside of the base plate. Multiple sets of holes at equal intervals are installed on the side walls of each mask body. Pins are provided on the outside of each hole. First magnets are provided on both sides of each pin. The first magnets extend into the inside of the pins. Limiting plates are installed on the side walls of the first magnets inside the pins. Limiting blocks are symmetrically installed inside each pin. Springs are provided inside each pin. One end of each spring is connected to one set of limiting plates, and the other end of each spring is connected to another set of limiting plates. Second magnets are installed inside each hole. The second magnets are magnetically connected to the first magnets.

[0008] Preferably, each of the support frames has a support shaft symmetrically installed at its bottom end, and each support shaft has a cylinder mounted on its surface, with a push rod installed at the output end of each cylinder.

[0009] Preferably, a rotating shaft is movably mounted on the side of the push rod away from the cylinder, and a rocker arm is fitted onto the surface of the rotating shaft.

[0010] Preferably, each of the support frames has an L-shaped frame symmetrically installed at its bottom end, and each of the L-shaped frames has a limit post installed on its side wall.

[0011] Preferably, each of the support frames has a bearing seat symmetrically installed inside, and each bearing seat extends through the support frame to its exterior.

[0012] Preferably, each of the bearing housings has a rotating shaft installed inside, and the rotating shaft extends through the bearing housing to its exterior.

[0013] Preferably, the bottom end of each rotating shaft is connected to a rocker arm, and the top end of each rotating shaft is equipped with a clamping arm.

[0014] Preferably, each of the clamping arms has a support column symmetrically and movably installed on its side wall, and the surface of each support column is fitted with a flexible sleeve.

[0015] Compared with the prior art, the beneficial effects of this utility model are: the splicing exposure positioning device not only realizes the convenient splicing of the mask, increases the stability during splicing, facilitates modular disassembly and replacement after damage, and improves the convenience of splicing the mask, but also facilitates the rapid and stable positioning and clamping of the mask, reduces the labor intensity of manual labor, and improves the efficiency of the splicing exposure positioning device in rapidly and stably clamping and positioning the mask.

[0016] (1) Insert multiple sets of pins into the holes on both sides to make the two sets of holes in close contact. Insert the pins completely into the holes. Under the magnetic connection of the first magnet and the second magnet, the first magnet and the second magnet will come into contact. When the two sets of first magnets inside the pin move in opposite directions, under the limit of the limit block, the two sets of first magnets will drive the two sets of limit plates to move in opposite directions inside the pin. The two sets of limit plates will drive the spring to deform elastically, so that the two sets of first magnets will move in opposite directions and connect magnetically with the second magnet inside the hole. When disassembly is required, pull the multiple sets of holes apart. When the first magnet and the second magnet are separated, under the elastic support of the spring, the spring will pull the two sets of limit plates and the first magnet, so that the limit plates and the first magnet will be reset and the first magnet will be put back into the pin. This realizes the convenient splicing of the mask by the splicing exposure positioning device, increases the stability during splicing, and improves the convenience of the splicing exposure positioning device for splicing the mask.

[0017] (2) The photomask is placed between multiple sets of support columns. The cylinder drives the push rod to move, the push rod drives the rotating shaft to move, and the rotating shaft drives the rocker arm to rotate around the rotating shaft. During the rotation of the rocker arm, the rocker arm is limited by the limit column to avoid damage caused by excessive rotation stroke. Under the support of the bearing seat, the rotating shaft drives the clamping arm to rotate, and the clamping arm drives the support column and the flexible sleeve to rotate, so that the four sets of flexible sleeves rotate to clamp the photomask. Because the flexible sleeve is made of flexible material, the wear on the photomask is reduced during the clamping process, thereby achieving fast and stable clamping and positioning of the photomask. This realizes the fast and stable positioning and clamping of the photomask by the splicing exposure positioning device, reduces the labor intensity of manual labor, and improves the efficiency of the splicing exposure positioning device in fast and stable clamping and positioning of the photomask. Attached Figure Description

[0018] Figure 1 This is a three-dimensional structural diagram of the present invention;

[0019] Figure 2 This is a front view structural diagram of the present utility model;

[0020] Figure 3 This is a front view cross-sectional structural diagram of the pin of this utility model;

[0021] Figure 4 This is a three-dimensional structural diagram of the pin of this utility model;

[0022] Figure 5 This is a three-dimensional structural diagram of the mask version of this utility model;

[0023] Figure 6 This is a three-dimensional structural diagram of the L-shaped frame of this utility model;

[0024] Figure 7 This is a three-dimensional structural diagram of the rotating shaft of this utility model;

[0025] Figure 8 This is a three-dimensional structural diagram of the clamping arm of this utility model.

[0026] In the diagram: 1. Base plate; 2. Support frame; 3. Mask version body; 4. Hole; 5. Pin; 6. First magnet; 7. Spring; 8. Limiting plate; 9. Limiting block; 10. Second magnet; 11. Support shaft; 12. Cylinder; 13. Push rod; 14. Rotating shaft; 15. Rocker arm; 16. L-shaped frame; 17. Limiting post; 18. Rotating shaft; 19. Bearing seat; 20. Clamping arm; 21. Supporting post; 22. Flexible sleeve. Detailed Implementation

[0027] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. All other embodiments obtained by those skilled in the art based on the embodiments of the present utility model without creative effort are within the scope of protection of the present utility model.

[0028] Please see Figure 1-8 An embodiment of this utility model provides a wafer-level mask splicing exposure positioning device, including a base plate 1 and a support frame 2. The support frame 2 is symmetrically installed on the top of the base plate 1. Four sets of mask bodies 3 with equal spacing are arranged on the outside of the base plate 1. Multiple sets of holes 4 with equal spacing are installed on the side walls of the mask bodies 3. Pins 5 are arranged on the outside of the holes 4. First magnets 6 are arranged on both sides of the pins 5. The first magnets 6 extend into the inside of the pins 5. Limiting plates 8 are installed on the side walls of the first magnets 6 inside the pins 5. Limiting blocks 9 are symmetrically installed inside the pins 5. Springs 7 are arranged inside the pins 5. One end of the springs 7 is connected to one set of limiting plates 8, and the other end of the springs 7 is connected to another set of limiting plates 8. Second magnets 10 are installed inside the holes 4. The second magnets 10 are magnetically connected to the first magnets 6.

[0029] When using a wafer-level mask splicing and exposure positioning device, multiple mask bodies 3 are spliced ​​together. During the splicing process, to enhance the tightness of the spliced ​​mask, pins 5 are used for reinforcement. Multiple sets of pins 5 are inserted into the interiors of adjacent holes 4, ensuring tight contact between the two sets of holes 4. With the pins 5 fully inserted into the holes 4, the magnetic connection between the first magnet 6 and the second magnet 10 causes them to contact each other. When the two sets of first magnets 6 inside the pin 5 move in opposite directions, under the limitation of the limiting block 9, the two sets of first magnets 6 drive the two sets of limiting plates 8 to move in opposite directions within the pin 5. The two sets of limiting plates 8 cause the spring 7 to elastically deform, allowing the two sets of... The first magnet 6 moves in the opposite direction and magnetically connects with the second magnet 10 inside the hole 4 to splice the two adjacent mask versions 3. When disassembly is required, the two mask versions 3 are manually pulled. At this time, the first magnet 6 and the second magnet 10 are separated. Under the elastic support of the spring 7, the spring 7 pulls the two sets of limiting plates 8 and the first magnet 6, so that the limiting plates 8 and the first magnet 6 are reset and the first magnet 6 is put into the inside of the pin 5, so as to facilitate the removal and replacement of the mask version 3. This realizes the convenient splicing of the mask plates by the splicing exposure positioning device, increases the stability during splicing, facilitates modular disassembly and replacement after damage, and improves the convenience of the splicing exposure positioning device for splicing the mask plates.

[0030] Support shafts 11 are symmetrically installed at the bottom of each support frame 2. Cylinders 12 are fitted on the surface of each support shaft 11. Push rods 13 are installed at the output end of each cylinder 12.

[0031] A rotating shaft 14 is movably mounted on the side of the push rod 13 away from the cylinder 12, and a rocker arm 15 is fitted on the surface of the rotating shaft 14.

[0032] L-shaped frames 16 are symmetrically installed at the bottom of each support frame 2. Limiting posts 17 are installed on the side walls of each L-shaped frame 16. Bearing seats 19 are symmetrically installed inside each support frame 2. The bearing seats 19 extend through the support frame 2 to its outside.

[0033] All bearing housings 19 are fitted with rotating shafts 18, which extend through the bearing housings 19 to the outside. The bottom end of each rotating shaft 18 is connected to a rocker arm 15, and the top end of each rotating shaft 18 is fitted with a clamping arm 20.

[0034] Support columns 21 are symmetrically and movably installed on the side walls of the clamping arms 20, and flexible sleeves 22 are fitted on the surface of each support column 21.

[0035] When positioning the assembled mask is required, the mask is placed between multiple sets of support columns 21. Four sets of cylinders 12 are activated. Under the movable support of the support shaft 11, the cylinders 12 drive the push rod 13 to move. The push rod 13 drives the rotating shaft 14 to move. Under the limiting support of the rotating shaft 18, the rotating shaft 14 drives the rocker arm 15 to rotate around the rotating shaft 18. During the rotation of the rocker arm 15, the limiting column 17 limits the rocker arm 15 to prevent damage caused by excessive rotational stroke. The bearing seat 19 supports... With the support in place, the rotating shaft 18 drives the clamping arm 20 to rotate, which in turn drives the support column 21 and the flexible sleeve 22 to rotate. This causes the four sets of flexible sleeves 22 to rotate and clamp the photomask. Because the flexible sleeves 22 are made of flexible material, wear on the photomask is reduced during the clamping process, thus enabling the photomask to be clamped and positioned quickly and stably. This achieves the goal of the splicing exposure positioning device to clamp and position the photomask quickly and stably, reducing the labor intensity of manual labor and improving the efficiency of the splicing exposure positioning device in clamping and positioning the photomask quickly and stably.

[0036] Working Principle: When using the wafer-level mask splicing exposure positioning device, multiple mask bodies 3 are spliced ​​together. During the splicing process, to enhance the tightness of the spliced ​​parts, pins 5 are used for reinforcement. Multiple sets of pins 5 are inserted into the interiors of adjacent holes 4, ensuring tight contact between the two sets of holes 4. When the pins 5 are fully inserted into the holes 4, the magnetic connection between the first magnet 6 and the second magnet 10 brings them into contact. When the two sets of first magnets 6 inside the pins 5 move in opposite directions, under the limitation of the limiting block 9, the two sets of first magnets 6 drive the two sets of limiting plates 8 to move in opposite directions within the pins 5. The two sets of limiting plates 8 cause the spring 7 to elastically deform, causing the two sets of first magnets 6 to move in opposite directions and magnetically connect with the second magnet 10 inside the holes 4. When disassembly is required, the multiple sets of holes 4 are pulled apart. When the first magnet 6 and the second magnet 10 separate, under the elastic support of the spring 7, the spring 7 pulls... Two sets of limiting plates 8 and the first magnet 6 are used to reset the limiting plates 8 and the first magnet 6, and to retract the first magnet 6 into the inside of the pin 5. When it is necessary to position the assembled mask, the mask is placed between multiple sets of support columns 21. The cylinder 12 drives the push rod 13 to move, and the push rod 13 drives the rotating shaft 14 to move. Under the limiting support of the rotating shaft 18, the rotating shaft 14 drives the rocker arm 15 to rotate around the rotating shaft 18. During the rotation of the rocker arm 15, the limiting is achieved. The column 17 limits the rocker arm 15 to prevent damage caused by excessive rotation. Supported by the bearing seat 19, the rotating shaft 18 drives the clamping arm 20 to rotate. The clamping arm 20 drives the support column 21 and the flexible sleeve 22 to rotate, so that the four sets of flexible sleeves 22 rotate to clamp the photomask. Because the flexible sleeve 22 is made of flexible material, it reduces the wear on the photomask during the clamping process, thereby quickly and stably clamping and positioning the photomask to complete the use of the splicing exposure positioning device.

Claims

1. A wafer-level mask splicing and exposure positioning device, characterized in that: Includes a base plate (1) and a support frame (2). The support frame (2) is symmetrically installed on the top of the base plate (1). Four sets of mask versions (3) are arranged at equal intervals on the outside of the base plate (1). Multiple sets of holes (4) are installed at equal intervals on the side walls of each mask version (3). Pins (5) are provided on the outside of each hole (4). First magnets (6) are provided on both sides of each pin (5). The first magnets (6) extend into the inside of each pin (5). 5) Limiting plates (8) are installed on the side walls of the first magnet (6) inside. Limiting blocks (9) are symmetrically installed inside the pins (5). Springs (7) are provided inside the pins (5). One end of each spring (7) is connected to a set of limiting plates (8). The other end of each spring (7) is connected to another set of limiting plates (8). A second magnet (10) is installed inside each hole (4). The second magnet (10) is magnetically connected to the first magnet (6).

2. The wafer-level mask splicing and exposure positioning device according to claim 1, characterized in that: The bottom ends of the support frame (2) are symmetrically equipped with support shafts (11), and cylinders (12) are fitted on the surface of the support shafts (11). Push rods (13) are installed at the output ends of the cylinders (12).

3. The wafer-level mask splicing and exposure positioning device according to claim 2, characterized in that: The push rod (13) is movably mounted with a rotating shaft (14) on the side away from the cylinder (12), and a rocker arm (15) is fitted on the surface of the rotating shaft (14).

4. The wafer-level mask splicing and exposure positioning device according to claim 3, characterized in that: The bottom of each support frame (2) is symmetrically equipped with an L-shaped frame (16), and each L-shaped frame (16) has a limit post (17) installed on its side wall.

5. The wafer-level mask splicing and exposure positioning device according to claim 4, characterized in that: The support frame (2) is symmetrically equipped with bearing seats (19) inside, and the bearing seats (19) extend through the support frame (2) to its outside.

6. The wafer-level mask splicing exposure positioning device according to claim 5, characterized in that: Each bearing housing (19) is fitted with a rotating shaft (18), which extends through the bearing housing (19) to its exterior.

7. The wafer-level mask splicing and exposure positioning device according to claim 6, characterized in that: The bottom end of each rotating shaft (18) is connected to a rocker arm (15), and the top end of each rotating shaft (18) is equipped with a clamping arm (20).

8. The wafer-level mask splicing exposure positioning device according to claim 7, characterized in that: Each of the clamping arms (20) has a symmetrically movable support column (21) on its side wall, and each of the support columns (21) has a flexible sleeve (22) fitted on its surface.

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