Silicon material screening device
By using an inclined screen and a feeding section with automatic discharge design, the problem of manual material handling required in traditional silicon material screening devices is solved, achieving automated grading and screening, reducing operational difficulty and pollution risk, and improving the purity and grading effect of silicon material.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- 双良硅材料(包头)有限公司
- Filing Date
- 2025-05-08
- Publication Date
- 2026-05-19
AI Technical Summary
Existing silicon material screening devices require manual removal of each screen frame to recover silicon material after screening, which is cumbersome and prone to material spillage and secondary pollution.
The inclined screening and holding sections allow the screened silicon material to automatically slide towards the discharge port under gravity for automatic discharge. Combined with non-metallic materials and a rolling support structure, this reduces operational difficulty and pollution risk.
It improves the ease of operation for silicon material screening, reduces labor intensity, avoids cross-contamination of materials, and ensures the purity and grading effect of silicon material.
Smart Images
Figure CN224253443U_ABST
Abstract
Description
Technical Field
[0001] This application relates to the field of sorting technology, specifically to a silicon material screening device. Background Technology
[0002] Silicon material, as the raw material for Czochralski silicon single crystal production, is relatively expensive. The waste materials generated after production cannot be directly recycled, such as ground material, bottom material, furnace material, and foam material. These waste materials are often of different sizes and mixed together after being crushed. The size of the material blocks directly affects the processing method and selling price of the blocks. Therefore, it is necessary to separate the blocks of different sizes.
[0003] The related silicon material sorting screen includes multiple screen frames arranged sequentially from top to bottom, with the screen aperture gradually decreasing from top to bottom to achieve the purpose of grading and screening. However, after screening, operators need to manually remove each screen frame to recover the screened silicon material, which is inconvenient.
[0004] Therefore, how to provide a silicon material screening device that improves operational convenience has become a technical problem that urgently needs to be solved by those skilled in the art. Utility Model Content
[0005] The purpose of this application is to provide a silicon material screening device to solve the problem of inconvenient silicon material screening operation.
[0006] To solve the above-mentioned technical problems, this application provides a silicon material screening device, comprising:
[0007] Cabinet;
[0008] Multiple screen frames are installed on the cabinet from top to bottom. Each screen frame includes a screening section, and at least the screening sections except for the uppermost screening section are arranged at an angle.
[0009] A material holding frame is installed on the cabinet and located below the bottommost screen frame. The material holding frame includes a material holding part, which is inclined. The inclined screen part and the material holding part have a discharge port at the lower end in the height direction.
[0010] Traditional silicon material sorting screens, while capable of grading through multiple screen frames, require manual removal of each frame after screening to recover the silicon material due to the lack of automatic material discharge. This process is cumbersome and prone to spillage and secondary contamination. In contrast, the silicon material screening device provided in this application features an inclined screen section (except for the uppermost section) with a discharge port at the lower end. The silicon material on the screen naturally slides towards the discharge port under gravity, achieving automatic discharge. The inclined design of the holding section also facilitates the concentrated discharge of the finest particles, enabling the separation and collection of silicon material at each grade without manual intervention. This structural innovation effectively solves the problem of repeated disassembly and reassembly of screen frames in traditional equipment, improving the convenience of silicon material screening operations, reducing labor intensity, and minimizing the risk of cross-contamination caused by manual material handling.
[0011] Optionally, the angle between the inclined screening section and the horizontal direction is in the range of 30°-45°, and the angle between the material holding section and the horizontal direction is in the range of 30°-45°.
[0012] Optionally, the uppermost screen frame is a first screen frame, which is movably supported on the upper part of the cabinet. The first screen frame has a material receiving cavity with an opening at the upper end, and part of the side wall surrounding the material receiving cavity can be detached.
[0013] Optionally, the area of the screening section gradually increases from top to bottom, and the area of the material holding section is larger than the area of the screening section at the bottom.
[0014] Optionally, the two ends of the cabinet along the first direction are open ends. Except for the uppermost screen frame, the other screen frames and the material holding frames are movably installed inside the cabinet along the first direction. The discharge port is located at the lower end of the corresponding screen part and the material holding part along the first direction. The first direction and the height direction are perpendicular to each other.
[0015] Optionally, except for the uppermost screen frame, the remaining screen frames and the material holding frame are provided with first support parts on both sides of the second direction, and the cabinet is provided with second support parts on the inner walls of both sides of the second direction. The first support parts are supported by the second support parts, and either the first support part or the second support part is a rolling wheel. The first direction, the second direction and the height direction are perpendicular to each other.
[0016] Optionally, the wall of the cabinet is provided with a dust removal pipe interface.
[0017] Optionally, the bottom of the cabinet is provided with casters, and at least one of the casters is provided with a braking structure;
[0018] And / or, the outer wall of the cabinet is provided with a handle.
[0019] Optionally, the sieve frame and the material holding frame are made of non-metallic materials.
[0020] Optionally, the number of sieve frames is two, with the diameter of the sieve holes of the upper sieve frame ranging from 30mm to 45mm, and the diameter of the sieve holes of the lower sieve frame ranging from 15mm to 20mm. Attached Figure Description
[0021] Figure 1 A schematic diagram of a specific embodiment of the silicon material screening device provided in this application;
[0022] Figure 2 for Figure 1 A cross-sectional view of the silicon material screening device along its height.
[0023] Figure 3 for Figure 1 A schematic diagram of the silicon material screening device from the second angle;
[0024] Figure 4 for Figure 1 A schematic diagram of the silicon material screening device from the third angle;
[0025] Figure 5 for Figure 1 A schematic diagram of the structure of one of the screens in a silicon material screening device;
[0026] Figure 6 for Figure 1 A schematic diagram of the material holding frame in a silicon material screening device;
[0027] in, Figures 1-6 The accompanying figure labels are as follows:
[0028] 1-Cabinet body; 1a-Dust removal pipe interface; 11-Roller; 12-Handle;
[0029] 2-Screen frame; 21-Screening section; 2-1-First screen frame; 2-1a-Material receiving cavity; 2-11-Divider wall; 2-12-Screen frame body; 2-121-First wall; 2-122-Second wall; 2-123-Third wall;
[0030] 3-Material container; 31-Material container section;
[0031] 4-Push-pull handle;
[0032] O-Discharge port. Detailed Implementation
[0033] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.
[0034] The terms "first," "second," etc., used in the specification and claims of this application are used to distinguish similar objects and not to describe a specific order or sequence. It should be understood that such use of data can be interchanged where appropriate so that embodiments of this application can be implemented in orders other than those illustrated or described herein, and the objects distinguished by "first," "second," etc., are generally of the same class and the number of objects is not limited; for example, a first object can be one or more. Furthermore, in the specification and claims, "and / or" indicates at least one of the connected objects, and the character " / " generally indicates that the preceding and following objects are in an "or" relationship.
[0035] It should be understood that the phrase "some embodiments" throughout the specification means that a specific feature, structure, or characteristic related to an embodiment is included in at least one embodiment of this application. Therefore, "some embodiments" appearing throughout the specification does not necessarily refer to the same embodiment. Furthermore, these specific features, structures, or characteristics can be combined in any suitable manner in one or more embodiments.
[0036] In this description, unless otherwise expressly specified and limited, the terms "connected," "linked," and "fixed" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. Those skilled in the art will understand the specific meaning of these terms in this document based on the specific circumstances.
[0037] Please refer to Figures 1-6 , Figure 1 A schematic diagram of a specific embodiment of the silicon material screening device provided in this application; Figure 2 for Figure 1 A cross-sectional view of the silicon material screening device along its height. Figure 3 for Figure 1 A schematic diagram of the silicon material screening device from the second angle; Figure 4 for Figure 1 A schematic diagram of the silicon material screening device from the third angle; Figure 5 for Figure 1 A schematic diagram of the structure of one of the screens in a silicon material screening device; Figure 6for Figure 1 A schematic diagram of the material holding frame in a silicon material screening device.
[0038] This application provides a silicon material screening device, including:
[0039] Cabinet 1;
[0040] Multiple screen frames 2 are installed on the cabinet 1 from top to bottom. Each screen frame 2 includes a screening section 21, and at least the screening sections 21 except for the uppermost screening section 21 are inclined.
[0041] The material holding frame 3 is installed on the cabinet 1 and located below the bottom screen frame 2. The material holding frame 3 includes a material holding part 31, which is inclined. The inclined screen part 21 and the material holding part 31 have a discharge port O at the lower end in the height direction.
[0042] In the silicon material screening device of this application embodiment, multiple screen frames 2 and material holding frames 3 are installed on the cabinet 1 from top to bottom to achieve the purpose of graded screening. For example, in some embodiments, there are two screen frames 2. The screening part 21 of both screen frames 2 has screen holes. The aperture of the screen holes gradually decreases from top to bottom. Large-diameter silicon material cannot pass through the screen holes of the upper screen frame 2 and will remain in the upper screen frame 2. Silicon material that passes through the screen holes of the upper screen frame 2 falls into the lower screen frame 2. Medium-diameter silicon material cannot pass through the screen holes of the lower screen frame 2 and will remain in the lower screen frame 2. Small-diameter silicon material passes through the screen holes of the lower screen frame 2 and falls into the interior of the material holding frame 3. The material holding part 31 of the material holding frame 3 is not provided with screen holes. Therefore, small-diameter silicon material will remain in the interior of the material holding frame 3. In this way, the three-level sorting of silicon material is realized.
[0043] Traditional silicon material sorting screens, while capable of grading and screening through multiple screen frames, require manual removal of each frame after screening to recover the silicon material due to the lack of automatic material discharge. This process is cumbersome and prone to spillage and secondary contamination. In contrast, the silicon material screening device provided in this application features an inclined screen section 21 (excluding the uppermost section 21) with a discharge port O at its lower end. The silicon material on the screen naturally slides towards the discharge port O under gravity, achieving automatic discharge. The inclined design of the holding section 31 also facilitates the concentrated discharge of the finest particles, enabling the separation and collection of silicon material at each grade without manual intervention. The silicon material discharged from the discharge port O is conveyed to the desired recycling location via a conveyor belt. This structural innovation effectively solves the problem of repeated disassembly and reassembly of the screen frames 2 in traditional equipment, improving the convenience of silicon material screening operations, reducing labor intensity, and minimizing the risk of cross-contamination caused by manual material handling.
[0044] In some embodiments of this application, the angle between the inclined screening section 21 and the horizontal direction ranges from 30° to 45°, and the angle between the material holding section 31 and the horizontal direction ranges from 30° to 45°.
[0045] Verification has shown that if the angle between the inclined screening section 21 / collecting section 31 and the horizontal direction is less than 30°, the silicon material cannot overcome the frictional force between itself and the screening section 21 / collecting section 31 under gravity, resulting in the silicon material not being able to be automatically discharged. If the angle between the inclined screening section 21 / collecting section 31 and the horizontal direction is greater than 45°, the silicon material may slide directly to the discharge port O without being screened, affecting the screening effect of the silicon material. Based on this, in some embodiments of this application, the angle between the inclined screening section 21 / collecting section 31 and the horizontal direction has the above-mentioned value range, specifically 30°, 35°, 40°, 45°, etc., which ensures both the grading effect of the silicon material and that the silicon material can naturally slide to the discharge port O under gravity, completing the automatic separation and collection of silicon materials at each level.
[0046] Please continue to refer to this. Figure 1 In some embodiments of this application, the uppermost screen frame 2 is a first screen frame 2-1, which is movably supported on the upper end of the cabinet 1. The first screen frame 2-1 has a material receiving cavity 2-1a with an upper opening, and part of the side wall surrounding the material receiving cavity 2-1a can be detached.
[0047] Depend on Figure 1 As can be seen, the first screen frame 2-1 includes a screen frame body 2-12 and a partition wall 2-11. The screen frame body 2-12 and the partition wall 2-11 form a material receiving cavity 2-1a. The partition wall 2-11 is detachably connected to the screen frame body 2-12. During operation, the silicon material to be screened is located inside the material receiving cavity 2-1a. The first screen frame 2-1 is movably supported on the upper end of the cabinet 1. The operator can manually push and pull the first screen frame 2-1 to ensure that silicon material except for the largest particle size can pass smoothly through the screen holes of the first screen frame 2-1, and avoid silicon material jamming as much as possible. After screening, the partition wall 2-11 can be removed. At this time, there is an opening on one side of the material receiving cavity 2-1a, which forms a discharge port, which facilitates the discharge of silicon material inside the material receiving cavity 2-1a and improves the convenience of silicon material screening operation.
[0048] Depend on Figure 1 and Figure 4 As can be seen, mounting grooves are provided on both sides of the screen frame body 2-12 in the second direction. The partition wall 2-11 extends along the second direction, and the two ends of the partition wall 2-11 in the extension direction are inserted into the corresponding mounting grooves, so as to realize the detachable connection between the partition wall 2-11 and the screen frame body 2-12.
[0049] Depend on Figure 4As can be seen, the two side walls of the screen frame body 2-12 in the second direction include a first wall portion 2-121, a second wall portion 2-122, and a third wall portion 2-123 connected sequentially. The first wall portion 2-121 extends along the first direction. Along the direction away from the first wall portion 2-121, the two second wall portions 2-122 extend inclined towards each other. The third wall portion 2-123 extends along the first direction. The two second wall portions 2-122 are respectively provided with mounting grooves. The partition wall portion 2-11 is detachably connected to the two second wall portions 2-122. When the partition wall portion 2-11 is detached, a discharge port is formed between the two third wall portions 2-123. The width of the two third wall portions 2-123 along the second direction is smaller than the width of the two first wall portions 2-121 along the second direction, which is conducive to the concentrated discharge of silicon material, so that the silicon material falls onto the material belt as much as possible and avoids the silicon material scattering elsewhere.
[0050] Furthermore, in some embodiments of this application, the area of the screening section 21 gradually increases from top to bottom, and the area of the holding section 31 is larger than the area of the bottommost screening section 21.
[0051] As configured above, the area of the screening section 21 gradually increases from top to bottom, and the lower screening section 21 can better receive the silicon material falling from the upper screening section 21, thus minimizing the possibility of the silicon material scattering elsewhere; similarly, the area of the holding section 31 is larger than the area of the bottommost screening section 21, and the holding section 31 can better receive the silicon material falling from the bottommost screening section 21, thus minimizing the possibility of the silicon material scattering elsewhere.
[0052] Please continue to refer to this. Figure 1 and Figure 2 In some embodiments of this application, the two ends of the cabinet 1 along the first direction are open ends. Except for the uppermost screen frame 2, the other screen frames 2 and the material holding frame 3 are movably installed inside the cabinet 1 along the first direction. The discharge port O is located at the lower end of the corresponding screen part 21 and the material holding part 31 along the first direction. The first direction and the height direction are perpendicular to each other.
[0053] As set up above, the discharge port O is located at the lower end of the corresponding screening section 21 and the holding section 31 along the first direction. Except for the uppermost screen frame 2, the other screen frames 2 and holding frames 3 are all movably installed inside the cabinet 1 along the first direction. During normal operation, except for the uppermost screen frame 2, the other screen frames 2 and holding frames 3 are stationary inside the cabinet 1, and the silicon material can be screened and discharged by itself. If the silicon material gets stuck, the operator can manually push and pull the screen frames 2 and holding frames 3, or pull out the screen frames 2 and holding frames 3 to manually clear the stuck silicon material and ensure that the silicon material screening work is carried out smoothly.
[0054] Please continue to refer to this. Figure 5 and Figure 6In some embodiments of this application, except for the uppermost screen frame 2, the remaining screen frames 2 and the material holding frame 3 are provided with first support parts on both sides of the second direction, and the cabinet 1 is provided with second support parts on the inner walls of both sides of the second direction. The first support parts are supported by the second support parts, and either the first support part or the second support part is a rolling wheel. The first direction, the second direction and the height direction are perpendicular to each other.
[0055] As set up above, except for the topmost screen frame 2, the other screen frames 2 and the cabinet 1 are in rolling contact, which converts the sliding friction between the screen frames 2 and the cabinet 1 into rolling friction. This helps to reduce the pulling resistance of the screen frames 2 and improve the ease of operation. At the same time, it can reduce the wear on the metal guide beam of the cabinet 1, minimize the generation of metal debris, and avoid metal contamination of silicon material as much as possible.
[0056] Similarly, the rolling contact between the material holding frame 3 and the cabinet 1 transforms the sliding friction between them into rolling friction, which helps to reduce the pulling resistance of the material holding frame 3 and improve the ease of operation. At the same time, it can reduce the wear on the metal guide beam of the cabinet 1, minimize the generation of metal debris, and avoid metal contamination of silicon material as much as possible.
[0057] Among them, the metal guide rail beam of cabinet 1 uses hollow square steel, which can ensure strength while reducing the weight of the whole vehicle.
[0058] Depend on Figures 1-6 It can also be seen that the outer walls of the screen frame 2 and the material holding frame 3 are equipped with push-pull handles 4, which make it easy for operators to apply force.
[0059] Please continue to refer to this. Figure 1 In this embodiment of the application, a dust removal pipe interface 1a is provided on the wall of the cabinet 1.
[0060] As set up above, the dust removal pipe interface 1a is used to connect with the dust removal pipe of the dust collection device, so that the dust collection device can easily pick up the dust generated during the screening process and ensure a clean working environment.
[0061] Furthermore, the bottom of the cabinet 1 is provided with rollers 11, and at least one roller 11 is provided with a braking structure.
[0062] As described above, the bottom of the cabinet 1 is equipped with rollers 11, which makes it easy for operators to push the silicon material screening device to the required position, reducing the workload of operators and improving the convenience of operation; at least one roller 11 is equipped with a brake structure, which helps to lock the silicon material screening device to the required position and avoid the silicon material screening device from shaking randomly during operation.
[0063] The braking structure can be implemented in various ways. For example, the braking structure can be a brake pad, which is installed on the side of the roller 11. An external force (such as a foot pedal) pushes the brake pad to press the edge of the roller 11 inward. The contact surface between the brake pad and the roller 11 generates frictional resistance, which restricts the movement of the roller 11.
[0064] Furthermore, the outer wall of the cabinet 1 is provided with a handle 12, which makes it easy for the operator to apply force and pull the silicon material screening device to the required position.
[0065] In some embodiments of this application, the sieve frame 2 and the material holding frame 3 are made of non-metallic materials.
[0066] Because metal structures may generate trace metal debris during vibration and friction, this debris can mix within the silicon material, potentially causing contamination and reducing its purity. Therefore, the sieve frame 2 and the material holding frame 3 are made of non-metallic materials to minimize the generation of metal debris, thus reducing metal contamination of the silicon material and improving its purity.
[0067] The materials of the screen frame 2 and the material holding frame 3 include, but are not limited to, polytetrafluoroethylene (PTFE).
[0068] In addition, in some embodiments of this application, there are two sieve frames 2, with the diameter of the sieve hole of the upper sieve frame 2 ranging from 30mm to 45mm, and the diameter of the sieve hole of the lower sieve frame 2 ranging from 15mm to 20mm.
[0069] Taking the diameter of the screen holes in the upper screen frame 2 as 40mm and the diameter of the screen holes in the lower screen frame 2 as 20mm, as set above, this embodiment of the application can realize three-level sorting of silicon material. The diameter of large-particle silicon material is greater than 40mm, the diameter of medium-particle silicon material is between 20mm and 40mm, and the diameter of small-particle silicon material is less than 20mm.
[0070] Of course, the sieve holes of the sieve frame 2 are not limited to the above-described embodiments. The diameter of the sieve holes can be adaptively adjusted according to the actual grading requirements of silicon material.
[0071] The above are merely preferred embodiments of this application. It should be noted that those skilled in the art can make various improvements and modifications without departing from the principles of this application, and these improvements and modifications should also be considered within the scope of protection of this application.
Claims
1. A silicon material screening device, characterized in that, include: Cabinet (1); Multiple screen frames (2) are installed on the cabinet (1) from top to bottom. Each screen frame (2) includes a screening section (21), and at least the screening sections (21) except for the uppermost screening section (21) are inclined. The material holding frame (3) is installed on the cabinet (1) and located below the bottom screen frame (2). The material holding frame (3) includes a material holding part (31), which is inclined. The inclined screen part (21) and the material holding part (31) have a discharge port (O) at the lower end in the height direction.
2. The silicon material screening device according to claim 1, characterized in that, The angle between the inclined screening section (21) and the horizontal direction is in the range of 30°-45°, and the angle between the material holding section (31) and the horizontal direction is in the range of 30°-45°.
3. The silicon material screening device according to claim 1, characterized in that, The uppermost sieve frame (2) is the first sieve frame (2-1), which is movably supported on the upper end of the cabinet (1). The first sieve frame (2-1) has a material-containing cavity (2-1a) with an opening at the upper end, and part of the side wall surrounding the material-containing cavity (2-1a) can be detached.
4. The silicon material screening device according to claim 1, characterized in that, The area of the screening section (21) gradually increases from top to bottom, and the area of the holding section (31) is larger than the area of the screening section (21) at the bottom.
5. The silicon material screening device according to claim 1, characterized in that, The cabinet (1) has open ends at both ends along the first direction. Except for the uppermost screen frame (2), the other screen frames (2) and the material holding frame (3) are movably installed inside the cabinet (1) along the first direction. The discharge port (O) is located at the lower end of the corresponding screen part (21) and the material holding part (31) along the first direction. The first direction and the height direction are perpendicular to each other.
6. The silicon material screening device according to claim 5, characterized in that, Except for the topmost sieve frame (2), the remaining sieve frames (2) and the material holding frame (3) are provided with first support parts on both sides of the second direction. The cabinet (1) is provided with second support parts on both sides of the inner wall of the second direction. The first support part is supported by the second support part. Either the first support part or the second support part is a rolling wheel. The first direction, the second direction and the height direction are perpendicular to each other.
7. The silicon material screening device according to any one of claims 1-5, characterized in that, The wall of the cabinet (1) is provided with a dust removal pipe interface (1a).
8. The silicon material screening device according to any one of claims 1-5, characterized in that, The bottom of the cabinet (1) is provided with rollers (11), and at least one of the rollers (11) is provided with a braking structure; And / or, the outer wall of the cabinet (1) is provided with a handle (12).
9. The silicon material screening device according to any one of claims 1-5, characterized in that, The sieve frame (2) and the material holding frame (3) are made of non-metallic materials.
10. The silicon material screening device according to any one of claims 1-5, characterized in that, The number of sieve frames (2) is two. The diameter of the sieve hole of the upper sieve frame (2) is in the range of 30mm-45mm. The diameter of the sieve hole of the lower sieve frame (2) is in the range of 15mm-20mm.