A plating device for copper wire

Abstract

This utility model relates to the field of copper plating wire technology and discloses a dosing device for copper plating wire, including a support frame; two bases respectively fixed to the bottom surfaces of the left and right sides of the support frame; two sets of universal wheels respectively fixedly connected to the bottom surfaces of the two bases, with two universal wheels in each set; and a dosing tank located inside the support frame, wherein an adjustment component is provided on the side of the dosing tank; a mixing component is provided inside the dosing tank, and the adjustment component includes a lifting plate located below the dosing tank, with the bottom end of the dosing tank fixedly extending through the top surface of the lifting plate to below the lifting plate. Through the adjustment component, a double-headed motor drives a bevel gear meshing transmission, which drives a threaded rod to control the smooth lifting and lowering of the lifting plate, achieving precise adjustment of the dosing tank height. This solves the drawback of traditional devices requiring manual adjustment, significantly improving the convenience and automation level of dosing position control, and is particularly suitable for complex dosing scenarios in copper plating wire reaction cylinders.

Description

Technical Field

[0001] This utility model relates to the field of copper plating technology, specifically to a chemical dosing device for copper plating. Background Technology

[0002] Plating wire bonding is a key piece of equipment used in PCB (Printed Circuit Board) manufacturing. It's primarily used to deposit a thin layer of copper on the walls of vias for subsequent electroplating. The main function of plating wire bonding is to form a conductive copper layer on the via walls through chemical deposition, thereby achieving electrical connections between the layers of a multilayer circuit board. To improve the copper plating effect, the concentration of the chemical solution (i.e., copper chloride solution) must be strictly controlled. The concentration of the chemical solution in the complexation reaction tank needs to be sampled periodically, and frequent dosing of chemicals is required in each chemical tank during production.

[0003] According to a Chinese patent publication (CN206575685U), a dosing device for PCB copper plating includes a funnel cavity, a funnel neck at the bottom of the funnel cavity, a flow rate valve connected to the bottom of the funnel neck, a guide pipe installed at the other end of the flow rate valve, and a stirring mechanism mounted on the inner wall of the funnel cavity. The stirring mechanism consists of a support frame fixed to the inner wall of the funnel cavity and a stirring wheel mounted at the center of the support frame. This invention, through the cooperation of the stirring wheel and flow rate valve in the dosing device, can control the concentration of the chemical solution used for dosing, thereby improving the copper plating quality. Furthermore, it has a simple structure, is easy to use, and is inexpensive.

[0004] However, existing devices still have the following problems: the funnel cavity needs to be manually adjusted by the operator, which makes it inconvenient to add chemicals to the copper wire. Therefore, a chemical dosing device for copper wire is proposed. Utility Model Content

[0005] The purpose of this invention is to provide a chemical dosing device for copper plating wires to solve the problems mentioned in the background art.

[0006] To achieve the above objectives, this utility model provides the following technical solution: a dosing device for copper plating wire, comprising a support frame;

[0007] Two bases are fixed to the bottom surfaces of the left and right sides of the support frame, respectively.

[0008] Two sets of casters are fixedly connected to the bottom surfaces of the two bases, with two casters in each set.

[0009] And a dosing tank located inside the support frame, wherein an adjustment component is provided on the side of the dosing tank;

[0010] The dosing tank is equipped with a mixing component.

[0011] Preferably, the adjusting assembly includes a lifting plate located below the dosing tank. The bottom end face of the dosing tank is fixedly extended through the top surface of the lifting plate to the bottom of the lifting plate. A sliding groove is formed through the inner side of the support frame. The end face of the lifting plate slides through the inner side of the support frame to the inside of the sliding groove. A threaded rod is provided above the lifting plate. The bottom end face of the threaded rod is threaded through the top surface of the lifting plate to the bottom of the lifting plate. The top end face of the threaded rod extends through the inner wall of the sliding groove to the top of the support frame. The surface of the threaded rod is rotatably connected to the inner wall of the support frame through a bearing seat. A double-headed motor is provided above the support frame. The left and right output rod ends of the double-headed motor are fixedly connected to a first rotating rod. Bevel gears are fixedly sleeved on the surface of the first rotating rod and the surface of the threaded rod. The inclined surfaces of two adjacent bevel gears mesh.

[0012] Preferably, the mixing assembly includes a second rotating rod located inside the dosing tank. A motor is fixedly connected to the top surface of the dosing tank. The bottom end face of the motor output rod extends through the top surface of the dosing tank into the interior of the dosing tank. The bottom end face of the motor output rod is fixedly connected to the top end face of the second rotating rod. A first stirring plate and a second stirring plate are fixedly connected to the surface of the second rotating rod. A conical hopper is fixedly connected to the inner side of the dosing tank. The second stirring plate is located inside the conical hopper. The bottom end face of the conical hopper extends through the bottom surface of the dosing tank into the bottom of the dosing tank. A water inlet pipe and an additive pipe are provided above the dosing tank. The bottom end faces of both the water inlet pipe and the additive pipe extend through the top surface of the dosing tank into the interior of the dosing tank. Valves are provided inside both the conical hopper and the water inlet pipe.

[0013] Preferably, a rubber seat and a connecting frame are fixedly connected to the top surface of the support frame, and the top surface of the rubber seat is fixedly connected to the bottom surface of the dual-head motor. The rubber seat reduces the vibration of the dual-head motor.

[0014] Preferably, the end face of the first rotating rod extends through the inner side of the connecting frame to the outer side of the connecting frame, and the surface of the first rotating rod is rotatably connected to the inner wall of the connecting frame through a bearing seat, and the connecting frame provides support for the first rotating rod.

[0015] Preferably, two connecting rods are fixedly connected to the top surface of the lifting plate, and a baffle is fixedly connected to the top surface of the connecting rods. The baffle is located above the motor and prevents the motor from colliding with the inner top surface of the support frame.

[0016] Preferably, a rubber plate is provided above the baffle, and the bottom surface of the rubber plate is fixedly connected to the top surface of the baffle. The rubber plate reduces the vibration caused by the impact between the baffle and the support frame.

[0017] Preferably, the top surface of the adding tube is connected to a cap by a thread to prevent the medicine from splashing out of the adding tube.

[0018] Preferably, a slot is provided through the side of the first stirring plate, and a dispersing plate is fixedly connected inside the slot to facilitate uniform mixing of the medicine liquid in the dosing tank.

[0019] Preferably, a first cleaning brush and a second cleaning brush are fixedly connected to the end face of the first stirring plate and the end face of the second stirring plate, respectively. The side of the first cleaning brush is slidably connected to the inner side of the dosing tank, and the side of the second cleaning brush is slidably connected to the side of the conical hopper. The second cleaning brush and the first cleaning brush can clean the liquid medicine adhering to the inner wall of the dosing tank and the conical hopper.

[0020] Compared with the prior art, the beneficial effects of this utility model are:

[0021] 1. This dosing device for copper plating uses a double-headed motor to drive a bevel gear through an adjustment component, which in turn drives a threaded rod to control the lifting plate to rise and fall smoothly. This achieves precise adjustment of the height of the dosing tank, solves the drawback of traditional devices that require manual adjustment, and significantly improves the convenience and automation level of dosing position control. It is especially suitable for complex dosing scenarios in copper plating reaction cylinders.

[0022] 2. The dosing device for copper plating uses a multi-stage stirring structure with a mixing component. The first stirring plate combined with the dispersing plate disperses the chemical solution, while the second stirring plate combined with the conical hopper enhances the vortex effect, effectively improving the uniformity of chemical solution mixing. At the same time, the first and second cleaning brushes follow up to clean the inner wall of the dosing tank and the inner wall of the conical hopper, reducing chemical solution residue, ensuring concentration stability, and thus improving the plating quality of the copper plating process.

[0023] 3. The dosing device for copper wire plating features a double buffer design with a rubber base and a rubber plate, which significantly reduces vibration transmission during the dual-head motor and lifting process, reducing noise pollution. The rigid support structure of the baffle and connecting rod prevents collision between the motor and the top of the inner side of the support frame, extending the service life of the core components. Attached Figure Description

[0024] Figure 1 This is a front sectional perspective view of the present invention;

[0025] Figure 2 This is a perspective view of the overall main view of this utility model;

[0026] Figure 3 This is a rear-view perspective view of the entire utility model;

[0027] Figure 4 This is a perspective view of the lifting plate of this utility model;

[0028] Figure 5 This is a perspective view of the second rotating rod of this utility model.

[0029] In the diagram: 1. Support frame; 2. Base; 3. Casters; 4. Dosing tank; 50. Adjustment assembly; 501. Lifting plate; 502. Threaded rod; 503. Dual-head motor; 504. First rotating rod; 505. Bevel gear; 506. Connecting frame; 507. Rubber seat; 508. Connecting rod; 509. Baffle; 5010. Rubber plate; 51. Mixing assembly; 511. Motor; 512. Second rotating rod; 513. First stirring plate; 514. First cleaning brush; 515. Dispersing plate; 516. Second stirring plate; 517. Second cleaning brush; 518. Water pipe; 519. Adding pipe; 5110. Pipe cover; 5111. Conical hopper. Detailed Implementation

[0030] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0031] Example 1: Please refer to Figure 1 - Figure 4 This utility model provides a technical solution: a chemical dosing device for copper plating wire, including a support frame 1;

[0032] Two bases 2 are respectively fixed to the bottom surfaces of the left and right sides of the support frame 1;

[0033] Two sets of casters 3 are fixedly connected to the bottom surfaces of the two bases 2, with two casters 3 in each set;

[0034] And the dosing tank 4 located inside the support frame 1, with an adjustment component 50 on the side of the dosing tank 4;

[0035] The dosing tank 4 is equipped with a mixing component 51.

[0036] The adjusting assembly 50 includes a lifting plate 501 located below the dosing tank 4. The bottom end face of the dosing tank 4 is fixedly inserted through the top surface of the lifting plate 501 and extends to the bottom of the lifting plate 501. A sliding groove is formed through the inner side of the support frame 1. The end face of the lifting plate 501 slides through the inner side of the support frame 1 and extends into the sliding groove. A threaded rod 502 is provided above the lifting plate 501. The bottom end face of the threaded rod 502 is threaded through the top surface of the lifting plate 501 and extends to the bottom of the lifting plate 501. The top end face of the threaded rod 502 extends through the inner wall of the sliding groove and to the top of the support frame 1. The surface of the threaded rod 502 is rotatably connected to the inner wall of the support frame 1 through a bearing seat. A sliding groove is provided above the support frame 1. The dual-head motor 503 has a first rotating rod 504 fixedly connected to the end face of each of its left and right output rods. Bevel gears 505 are fixedly sleeved on the surface of the first rotating rod 504 and the surface of the threaded rod 502. Adjacent bevel gears 505 mesh at an angle. Through the adjustment component 50, the dual-head motor 503 drives the bevel gears 505 to mesh and transmit power, thereby driving the threaded rod 502 to control the lifting plate 501 to rise and fall smoothly. This achieves precise adjustment of the height of the dosing tank 4, solving the drawback of the traditional device requiring manual adjustment. It significantly improves the convenience and automation level of dosing position control, and is especially suitable for complex dosing scenarios in copper wire deposition reaction cylinders.

[0037] The top surface of the support frame 1 is fixedly connected to a rubber seat 507 and a connecting frame 506. The top surface of the rubber seat 507 is fixedly connected to the bottom surface of the dual-head motor 503. The double buffer design of the rubber seat 507 and the rubber plate 5010 greatly reduces the vibration transmission of the dual-head motor 503 and during the lifting process, and reduces noise pollution.

[0038] The end face of the first rotating rod 504 extends through the inner side of the connecting frame 506 to the outer side of the connecting frame 506, and the surface of the first rotating rod 504 is rotatably connected to the inner wall of the connecting frame 506 through a bearing seat.

[0039] Two connecting rods 508 are fixedly connected to the top surface of the lifting plate 501. A baffle 509 is fixedly connected to the top surface of the connecting rod 508. The baffle 509 is located above the motor 511. The rigid support structure of the baffle 509 and the connecting rod 508 avoids the collision between the motor 511 and the top of the inner side of the support frame 1, thus extending the service life of the core components.

[0040] A rubber plate 5010 is provided above the baffle 509, and the bottom surface of the rubber plate 5010 is fixedly connected to the top surface of the baffle 509.

[0041] Example 2: Based on Example 1, a preferred embodiment of the chemical dosing device for copper plating wire provided by this utility model is as follows: Figure 1 - Figure 5As shown: The mixing component 51 includes a second rotating rod 512 located inside the dosing tank 4. A motor 511 is fixedly connected to the top surface of the dosing tank 4. The bottom end of the output rod of the motor 511 extends through the top surface of the dosing tank 4 into the interior of the dosing tank 4. The bottom end of the output rod of the motor 511 is fixedly connected to the top end of the second rotating rod 512. A first stirring plate 513 and a second stirring plate 516 are fixedly connected to the surface of the second rotating rod 512. A conical hopper 5111 is fixedly connected to the inner side of the dosing tank 4. The second stirring plate 516 is located inside the conical hopper 5111. The bottom end of the conical hopper 5111 extends through the bottom surface of the dosing tank 4 into the lower part of the dosing tank 4. A water inlet pipe is provided above the dosing tank 4. The bottom surfaces of the water inlet pipe 518 and the water inlet pipe 519 are fixedly inserted through the top surface of the dosing tank 4 and extend into the interior of the dosing tank 4. Valves are installed inside the conical hopper 5111 and the water inlet pipe 518. Through the mixing component 51, a multi-stage stirring structure is adopted. The first stirring plate 513, combined with the dispersing plate 515, disperses the liquid. The second stirring plate 516, in conjunction with the conical hopper 5111, enhances the vortex effect and effectively improves the uniformity of liquid mixing. At the same time, the first cleaning 514 and the second cleaning brush 517 follow up to clean the inner wall of the dosing tank 4 and the inner wall of the conical hopper 5111, reducing liquid residue, ensuring concentration stability, and thus improving the plating quality of the copper plating process.

[0042] The top surface of the adding tube 519 is connected to a tube cap 5110 by a thread. The adding tube 519 is sealed with the threaded tube cap 5110 to prevent the liquid from splashing or evaporating, which would cause waste and environmental pollution.

[0043] The first stirring plate 513 has a through groove on its side, and a dispersing plate 515 is fixedly connected inside the groove.

[0044] A first cleaning brush 514 and a second cleaning brush 517 are fixedly connected to the end face of the first stirring plate 513 and the end face of the second stirring plate 516, respectively. The side of the first cleaning brush 514 is slidably connected to the inner side of the dosing tank 4, and the side of the second cleaning brush 517 is slidably connected to the side of the conical hopper 5111. The valve design of the conical hopper 5111 and the water pipe 518 can accurately control the flow rate and dosage of the liquid, avoid over- or under-dosing, and further ensure process stability.

[0045] In use, the powder is poured into the dosing tank 4 through the adding pipe 519, and water is added to the dosing tank 4 through the water adding pipe 518. The pipe cover 5110 is then closed, and the motor 511 is turned on. The output rod of the motor 511 drives the connected second rotating rod 512 to rotate, causing the first stirring plate 513 and the second stirring plate 516 to rotate. The first stirring plate 513 and the second stirring plate 516 mix and stir the powder and water in the dosing tank 4. The first cleaning brush 514 and the second cleaning brush 517 clean the liquid medicine adhering to the inner wall of the dosing tank 1 and the conical hopper 5111. When the liquid medicine flows through the empty trough, the dispersing plate 515 disperses the liquid medicine, thereby facilitating the mixing of the liquid medicine.

[0046] The caster wheel 3 is moved, which drives the base 2 to move, so that the support frame 1 moves above the reaction cylinder. The dual-head motor 503 is turned on, and the output rod of the dual-head motor 503 drives the first rotating rod 504 to rotate. The first rotating rod 504 drives the connected bevel gear 505 to mesh and transmit power. Through the meshing transmission of the two bevel gears 505 on the same side, the threaded rod 502 is rotated. The threaded rod 502 drives the lifting plate 501 to rise and fall, thereby raising and lowering the dosing tank 4, so that the liquid medicine in the dosing tank 4 can be added to the reaction cylinder through the conical hopper 5111.

[0047] Although embodiments of the present invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made to the embodiments without departing from the principles and spirit of the present invention, the scope of which is defined by the appended claims and their equivalents.

Claims

1. A dosing device for copper plating wire, comprising a support frame (1); Two bases (2) are fixed to the bottom of the left and right sides of the support frame (1); Two sets of casters (3) are fixedly connected to the bottom surfaces of the two bases (2), and each set of casters (3) has two casters; and the dosing tank (4) located inside the support frame (1), characterized in that: The dosing tank (4) is provided with an adjustment component (50) on its side; The dosing tank (4) is equipped with a mixing component (51); The adjusting assembly (50) includes a lifting plate (501) located below the dosing tank (4). The bottom surface of the dosing tank (4) is fixedly extended through the top surface of the lifting plate (501) to the bottom of the lifting plate (501). A sliding groove is provided through the inner side of the support frame (1). The end face of the lifting plate (501) slides through the inner side of the support frame (1) to the inside of the sliding groove. A threaded rod (502) is provided above the lifting plate (501). The bottom end face of the threaded rod (502) is threaded through the top surface of the lifting plate (501) to the bottom of the lifting plate (501). 1) Below, the top surface of the threaded rod (502) extends through the inner wall of the slide groove to the top of the support frame (1). The surface of the threaded rod (502) is rotatably connected to the inner wall of the support frame (1) through a bearing seat. A double-headed motor (503) is provided above the support frame (1). The left and right output rod ends of the double-headed motor (503) are fixedly connected to a first rotating rod (504). The surface of the first rotating rod (504) and the surface of the threaded rod (502) are both fixedly fitted with bevel gears (505). The inclined surfaces of two adjacent bevel gears (505) mesh. The mixing assembly (51) includes a second rotating rod (512) located inside the dosing tank (4). A motor (511) is fixedly connected to the top surface of the dosing tank (4). The bottom end of the output rod of the motor (511) extends through the top surface of the dosing tank (4) into the interior of the dosing tank (4). The bottom end of the output rod of the motor (511) is fixedly connected to the top end of the second rotating rod (512). A first stirring plate (513) and a second stirring plate (516) are fixedly connected to the surface of the second rotating rod (512). The inner side of the dosing tank (4) is fixedly connected to... A conical hopper (5111) is provided with a second stirring plate (516) located inside the conical hopper (5111). The bottom surface of the conical hopper (5111) is fixedly extended through the bottom surface of the dosing tank (4) to the bottom of the dosing tank (4). A water pipe (518) and an additive pipe (519) are provided above the dosing tank (4). The bottom surfaces of the water pipe (518) and the additive pipe (519) are both fixedly extended through the top surface of the dosing tank (4) to the inside of the dosing tank (4). Valves are provided inside the conical hopper (5111) and the water pipe (518).

2. The dosing device for copper plating wire according to claim 1, characterized in that: The top surface of the support frame (1) is fixedly connected to a rubber seat (507) and a connecting frame (506), and the top surface of the rubber seat (507) is fixedly connected to the bottom surface of the double-headed motor (503).

3. The dosing device for copper plating wire according to claim 1, characterized in that: The end face of the first rotating rod (504) extends through the inner side of the connecting frame (506) to the outer side of the connecting frame (506), and the surface of the first rotating rod (504) is rotatably connected to the inner wall of the connecting frame (506) through a bearing seat.

4. The dosing device for copper plating wire according to claim 1, characterized in that: Two connecting rods (508) are fixedly connected to the top surface of the lifting plate (501), and a baffle (509) is fixedly connected to the top surface of the connecting rod (508). The baffle (509) is located above the motor (511).

5. A dosing device for copper plating wire according to claim 4, characterized in that: A rubber plate (5010) is provided above the baffle (509), and the bottom surface of the rubber plate (5010) is fixedly connected to the top surface of the baffle (509).

6. The dosing device for copper plating wire according to claim 1, characterized in that: The top surface of the added tube (519) is connected to a tube cap (5110) by a thread.

7. The dosing device for copper plating wire according to claim 1, characterized in that: The first stirring plate (513) has a through groove on its side, and a dispersing plate (515) is fixedly connected inside the groove.

8. A dosing device for copper plating wire according to claim 1, characterized in that: The first stirring plate (513) end face and the second stirring plate (516) end face are respectively fixedly connected to the first cleaning brush (514) and the second cleaning brush (517). The side of the first cleaning brush (514) is slidably connected to the inside side of the dosing tank (4), and the side of the second cleaning brush (517) is slidably connected to the side of the conical bucket (5111).

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