Reaction kettle fouling cleaning device

Abstract

The utility model discloses a kind of reaction kettle fouling cleaning device, device includes reaction kettle body, annular flush coil pipe being internally arranged, coil pipe support pole of supporting coil pipe, and cleaning liquid pipeline connected to discharge pipe.The flush coil pipe bottom is equipped with two groups of oblique spray ports, respectively directional impact kettle wall and stirring mechanism;Cleaning liquid pipeline integration delivery pump, drain pipe and parallel bypass, bypass configuration pressure pulse generator to generate high-frequency pulse jet flow.Through multi-angle spraying and pulse cleaning synergistic effect, the efficient peeling of reaction kettle inner wall and stirring part fouling is realized.The utility model adopts closed-circuit circulation cleaning, without manual entering kettle, cleaning cycle can be effectively shortened and realize water-saving purpose, while guaranteeing that cleaning waste liquid can be recycled, significantly improve the safety, environmental protection and equipment continuous operation efficiency of calcium hydrogen phosphate production.

Description

Technical Field

[0001] This utility model relates to the field of chemical production technology, specifically a device for cleaning scale buildup in reaction vessels. Background Technology

[0002] In the production of dicalcium phosphate, the neutralization reaction is one of the core processes that determines product quality. The reactor, as the core equipment for the neutralization reaction, has long faced the industry-wide problem of scale buildup on its walls. In existing technologies, when materials are continuously stirred and reacted in the neutralization reactor, the generated dicalcium phosphate crystals and unreacted raw materials easily adhere to the reactor walls and the surface of the stirring components, forming a stubborn scale layer. This phenomenon leads to multiple problems: First, the scale layer hinders effective mixing and heat transfer, resulting in reduced reaction efficiency and directly affecting product purity and crystal morphology; second, as the scale layer thickens, the effective volume of the reactor is significantly reduced, forcing frequent shutdowns for cleaning during production, severely restricting continuous production; third, traditional cleaning methods rely on manual entry into confined spaces, requiring 3-4 people to operate together, posing significant safety hazards such as falls from heights and mechanical injuries, and the cleaning cycle is as long as 8-12 hours, greatly impacting production efficiency.

[0003] The current industry solutions mainly include two methods: physical scraping and chemical immersion. Physical scraping requires operators to wear full protective gear and enter the reactor to mechanically remove the material using specialized tools. This method is labor-intensive and can easily damage the inner walls of the equipment. Chemical immersion involves injecting strong acid solutions for corrosion cleaning. Although this method can reduce manual intervention, there is a risk of cleaning agent residue, which may contaminate subsequent batches of products. In addition, high-concentration acid solutions place extremely high demands on the corrosion resistance of the equipment materials. Summary of the Invention

[0004] The technical problem to be solved by this utility model is to provide a reactor scaling cleaning device to solve the problems mentioned in the background art and achieve the purpose of reactor scaling cleaning that is both highly efficient, safe and reliable, and seamlessly integrated with the production process.

[0005] To solve the above-mentioned technical problems, the technical solution adopted by this utility model is: a scale cleaning device for a reaction vessel, including a reaction vessel body, a flushing coil is provided inside the reaction vessel body, the flushing coil is supported by multiple coil support rods fixed to the inner wall of the reaction vessel body, and a spray nozzle is provided at the bottom of the flushing coil.

[0006] The flushing coil is connected to a cleaning fluid pipeline, which is equipped with a delivery pump. One end of the cleaning fluid pipeline passes through the upper part of the reactor body and is connected to the cleaning fluid pipeline, while the other end is connected to the discharge pipe at the bottom of the reactor body.

[0007] In a preferred embodiment, a discharge valve is provided on the discharge pipe, and a second valve is provided on the cleaning fluid pipeline near the discharge pipe.

[0008] In a preferred embodiment, the cleaning fluid pipeline is further provided with a drain pipe, and the drain pipe is provided with a drain valve.

[0009] In a preferred embodiment, the cleaning fluid pipeline is equipped with a first valve at a location near the connection point of the drain pipe.

[0010] In a preferred embodiment, a bypass is connected in parallel to the cleaning fluid pipeline, with both ends of the bypass connected to the cleaning fluid pipelines at the front and rear ends of the first valve;

[0011] The bypass is equipped with a bypass valve and a pressure pulse generator.

[0012] In a preferred embodiment, the bottom of the flushing coil is provided with two sets of nozzles, both of which are obliquely arranged and respectively facing the inner wall of the reactor and the stirring mechanism inside the reactor.

[0013] In a preferred embodiment, multiple support rod fixing plates are circumferentially distributed and fixed on the inner wall of the reactor body. One end of the coil support rod is fixed to the support rod fixing plate, and the other end extends towards the center of the reactor body to support the flushing coil.

[0014] The scale cleaning device for reaction vessels provided by this utility model, by adopting the above-described structure, has the following beneficial effects:

[0015] (1) By setting the annular flushing coil and the bottom oblique nozzle in the reactor, combined with two sets of nozzles facing the reactor wall and the stirring mechanism respectively, a multi-angle, three-dimensional cleaning coverage is formed. After the cleaning liquid is driven by the high-pressure delivery pump, it can directionally impact the scale in the traditional cleaning dead corners such as the reactor wall, stirring shaft and blades, effectively remove stubborn deposits, effectively improve the cleaning coverage rate, and significantly reduce the need for manual secondary cleaning.

[0016] (2) A closed-loop cleaning system is adopted, which allows operators to complete the cleaning process without entering the reactor, thus completely avoiding the risks of working in a confined space. Combined with the linkage control of multiple valves, the entire process of cleaning liquid injection, circulation rinsing and waste liquid discharge is fully automated. A single person can remotely control the system, reducing manpower input. Attached Figure Description

[0017] The present invention will be further described below with reference to the accompanying drawings and embodiments:

[0018] Figure 1 This is a schematic diagram of the overall structure of this utility model.

[0019] Figure 2 This is a top view of the flushing coil structure of this utility model.

[0020] In the diagram: 1. Reactor body; 2. Flushing coil; 201. Coil support rod; 3. Cleaning fluid pipeline; 4. First valve; 401. Second valve; 402. Discharge pipe; 5. Discharge valve; 501. Transfer pump; 6. Drain pipe; 7. Drain valve; 701. Bypass; 8. Bypass valve; 801. Pressure pulse generator; 9. Support rod fixing plate; 10. Detailed Implementation

[0021] like Figure 1-2 A scale cleaning device for a reaction vessel includes a reaction vessel body, a flushing coil inside the reaction vessel body, the flushing coil being supported by multiple coil support rods fixed to the inner wall of the reaction vessel body, and a spray nozzle at the bottom of the flushing coil.

[0022] The flushing coil is connected to a cleaning fluid pipeline, which is equipped with a delivery pump. One end of the cleaning fluid pipeline passes through the upper part of the reactor body and is connected to the cleaning fluid pipeline, while the other end is connected to the discharge pipe at the bottom of the reactor body.

[0023] In a preferred embodiment, a discharge valve is provided on the discharge pipe, and a second valve is provided on the cleaning fluid pipeline near the discharge pipe.

[0024] In a preferred embodiment, the cleaning fluid pipeline is further provided with a drain pipe, and the drain pipe is provided with a drain valve.

[0025] In a preferred embodiment, the cleaning fluid pipeline is equipped with a first valve at a location near the connection point of the drain pipe.

[0026] In a preferred embodiment, a bypass is connected in parallel to the cleaning fluid pipeline, with both ends of the bypass connected to the cleaning fluid pipelines at the front and rear ends of the first valve;

[0027] The bypass is equipped with a bypass valve and a pressure pulse generator.

[0028] In a preferred embodiment, the bottom of the flushing coil is provided with two sets of nozzles, both of which are obliquely arranged and respectively facing the inner wall of the reactor and the stirring mechanism inside the reactor.

[0029] In a preferred embodiment, multiple support rod fixing plates are circumferentially distributed and fixed on the inner wall of the reactor body. One end of the coil support rod is fixed to the support rod fixing plate, and the other end extends towards the center of the reactor body to support the flushing coil.

[0030] The specific structural parameters of the reaction vessel scaling cleaning device disclosed in this invention are as follows:

[0031] The reactor body 1 is a vertical cylindrical structure, with eight stainless steel support plates 10 welded circumferentially to the inner wall, and each plate is evenly distributed at a 45° interval.

[0032] The flushing coil 2 is made of 316L stainless steel pipe bent into a square coil structure. The ratio of the outer diameter of the coil to the inner diameter of the reactor is 1:3. The flushing coil 2 is fixed by eight coil support rods 3. One end of the coil support rod 3 is connected to the support rod fixing plate 10 by bolts, and the other end is located below the flushing coil 2 and supports the flushing coil 2, so that the coil is 200mm away from the reactor wall.

[0033] Two sets of nozzles 201 are symmetrically opened at the bottom of the flushing coil 2. Each set contains multiple fan-shaped nozzles with a diameter of 5mm. One set is angled towards the vessel wall at 30°, and the other set is angled towards the anchor-type stirring blades inside the reactor at 45°.

[0034] In the piping system, the cleaning fluid pipe 4 enters from the top of the reactor and is connected to the flushing coil 2 through a flange. The pipe is connected to the discharge pipe 5 and the drain pipe 7.

[0035] A pneumatic discharge valve 501 is installed on the discharge pipe 5, and a second valve 402 (ball valve) is installed on the cleaning fluid pipeline 4 near the discharge pipe 5.

[0036] The drain pipe 7 is connected to the middle of the cleaning fluid pipeline 4 via a tee. The drain valve 701 is a butterfly valve, and the upstream cleaning fluid pipeline 4 is equipped with a first valve 401 (stop valve).

[0037] Bypass 8 uses a DN25 stainless steel pipe connected in parallel to the front and rear ends of the first valve 401. Bypass valve 801 is a solenoid valve, and pressure pulse generator 9 is a plunger-type pulse pump that can generate a pulse water flow of 0.5-2Hz with a pressure peak of 8MPa.

[0038] The transfer pump 6 is a corrosion-resistant centrifugal pump with a rated flow of 10 m³ / h, a head of 60 m, and an outlet pressure that can be adjusted to 0.5-4 MPa via a frequency converter.

[0039] All valves and pressure pulse generators are connected to the PLC control system, supporting manual / automatic switching modes.

[0040] The cleaning process of the above-mentioned reactor scaling cleaning device is as follows:

[0041] Close the discharge valve 501, open the first valve 401 and the second valve 402, and start the delivery pump 6 to draw the cleaning fluid (3% citric acid solution) from the discharge pipe 5 and inject it into the flushing coil 2 through the cleaning fluid pipeline 4.

[0042] The cleaning fluid is sprayed at high speed from nozzle 201 under a pressure of 4 MPa, impacting the scale buildup on the vessel wall and agitator blades. After rinsing for 30 minutes, the first valve 401 is closed, the bypass valve 801 is opened, and the pressure pulse generator 9 is started.

[0043] The pulse pump periodically increases the cleaning fluid pressure to 8 MPa at a frequency of 1 Hz for 20 minutes. The high-frequency pulse jet produces a fatigue stripping effect on stubborn scale, while the bypass flow regulation prevents system overpressure.

[0044] Turn off transfer pump 6 and bypass valve 801, and open drain valve 701 to discharge waste liquid into the neutralization treatment tank. After confirming that the tank is empty, close all valves and the system returns to standby mode.

Claims

1. A device for cleaning scale buildup in a reaction vessel, comprising a reaction vessel body (1), characterized in that: The reactor body (1) is provided with a flushing coil (2). The flushing coil (2) is supported by multiple coil support rods (3) fixed on the inner wall of the reactor body (1). A nozzle (201) is provided at the bottom of the flushing coil (2). The flushing coil (2) is connected to a cleaning fluid pipe (4), and a delivery pump (6) is provided on the cleaning fluid pipe (4). One end of the cleaning fluid pipe (4) is inserted into the upper part of the reactor body (1) and connected to the cleaning fluid pipe (4), and the other end is connected to the discharge pipe (5) at the bottom of the reactor body (1).

2. The reactor scaling cleaning device according to claim 1, characterized in that: The discharge pipe (5) is equipped with a discharge valve (501), and the cleaning fluid pipe (4) is equipped with a second valve (402) near the discharge pipe (5).

3. The reactor scaling cleaning device according to claim 1, characterized in that: The cleaning fluid pipeline (4) is also provided with a drain pipe (7), and the drain pipe (7) is provided with a drain valve (701).

4. The reactor scaling cleaning device according to claim 3, characterized in that: The cleaning fluid pipeline (4) is equipped with a first valve (401) at a position near the connection point of the drain pipe (7).

5. The reactor scaling cleaning device according to claim 4, characterized in that: A bypass (8) is connected in parallel to the cleaning fluid pipeline (4), and both ends of the bypass (8) are connected to the front and rear ends of the cleaning fluid pipeline (4) of the first valve (401); The bypass (8) is equipped with a bypass valve (801) and a pressure pulse generator (9).

6. The reactor scaling cleaning device according to claim 1, characterized in that: The bottom of the flushing coil (2) is provided with two sets of nozzles (201). Both sets of nozzles (201) are obliquely arranged and are respectively directed toward the inner wall of the reactor body (1) and the stirring mechanism inside the reactor body (1).

7. The reactor scaling cleaning device according to claim 1, characterized in that: Multiple support rod fixing plates (10) are circumferentially fixed on the inner wall of the reactor body (1). One end of the coil support rod (3) is fixed on the support rod fixing plate (10), and the other end extends toward the center of the reactor body (1) to support the flushing coil (2).

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