A liquid supply device

Abstract

This application relates to the field of semiconductor chemical mechanical planarization technology, and provides a liquid supply device. The liquid supply device includes: a frame, a liquid dispensing mechanism connected to a first liquid supply device, and a liquid supply mechanism connected between the liquid dispensing mechanism and a processing device. The frame includes at least two mounting spaces, one mounting space housing the liquid dispensing mechanism and the other mounting space housing the liquid supply mechanism. The liquid dispensing mechanism includes several different types of metering containers, and the metering containers can be selected and installed according to the type of the second liquid. The metering containers are connected to the second liquid supply device and are used to meter the volume of the second liquid delivered by the second liquid supply device to the liquid dispensing mechanism. This solution integrates the liquid dispensing mechanism and the liquid supply mechanism into one unit and is equipped with different types of metering containers, enabling the configuration and supply of multiple types of processing liquids using a single liquid supply device.

Description

Technical Field

[0001] This application relates to the field of semiconductor chemical mechanical planarization technology, and more particularly to a liquid supply device. Background Technology

[0002] CMP (Chemical Mechanical Planarization) slurry is a key material used for the precision polishing of semiconductor wafer surfaces. Through the synergistic effect of chemical etching and mechanical polishing, it efficiently removes excess material from the wafer surface, achieving sub-nanometer surface planarization and ensuring precise interconnection of the chip's multi-layer structure. The performance of the slurry directly affects chip yield and reliability, and the component ratios and reactivity must be adjusted according to specific process requirements.

[0003] In current planarization scenarios, the grinding slurry supply process involves slurry preparation and supply operations, with separate equipment for both. Grinding slurries are composed of grinding concentrate and chemical solutions, and different types of grinding slurries require different chemical solutions. To produce multiple types of grinding slurries, multiple sets of one-to-one slurry preparation and supply equipment are needed. Each set of equipment must specifically process a designated chemical solution to produce the corresponding type of grinding slurry. This large number of devices results in excessively high initial setup costs, and when certain types of grinding slurries are not needed, the equipment remains idle, leading to low utilization and resource waste.

[0004] Therefore, how to provide a liquid supply device with high integration and high utilization rate is a technical problem that urgently needs to be solved by those skilled in the art. Utility Model Content

[0005] The purpose of this application is to provide a liquid supply device that integrates a liquid preparation mechanism and a liquid supply mechanism into one unit, and is equipped with different types of quantitative containers, so as to realize the preparation and supply of various types of processing liquids using a single liquid supply device.

[0006] The solution to the technical problem provided in this application is as follows:

[0007] A liquid supply device is connected to a processing apparatus, a first liquid supply device for providing a first liquid, and a second liquid supply device for providing a second liquid of a different type, the liquid supply device comprising:

[0008] A frame, a liquid dispensing mechanism connected to the first liquid supply device, and a liquid supply mechanism connected between the liquid dispensing mechanism and the processing device;

[0009] The frame includes at least two mounting spaces, one of which is equipped with the liquid dispensing mechanism and the other of which is equipped with the liquid supply mechanism;

[0010] The liquid dispensing mechanism includes several different types of metering containers, and the metering containers can be selected and installed according to the type of the second liquid. The metering containers are connected to the second liquid supply device and are used to meter the volume of the second liquid delivered by the second liquid supply device to the liquid dispensing mechanism.

[0011] Preferably, the liquid dispensing mechanism further includes a liquid dispensing tank with a first upper limit liquid level. The liquid dispensing tank includes at least a first liquid inlet and a second liquid inlet. The first liquid supply device is connected to the first liquid inlet, and the second liquid supply device is connected to the second liquid inlet through the metering container. When the liquid level of the mixture of the first liquid and the second liquid in the liquid dispensing tank reaches the first upper limit liquid level, both the first liquid supply device and the second liquid supply device stop operating.

[0012] Preferably, the metering container is conical, located above the dispensing tank, with its tip facing the dispensing tank.

[0013] Preferably, the liquid mixing tank further includes a circulating liquid outlet and a circulating liquid inlet, and the liquid mixing mechanism further includes a circulating liquid pump connected between the circulating liquid outlet and the circulating liquid inlet, for pumping out the mixed liquid in the liquid mixing tank and pumping the mixed liquid back into the liquid mixing tank, wherein the mixed liquid forms a processing liquid after circulation.

[0014] Preferably, the liquid supply mechanism includes a storage tank with a second upper limit liquid level. The storage tank includes at least a processing liquid inlet and a processing liquid outlet. The liquid dispensing tank is connected to the processing liquid inlet, and the processing device is connected to the processing liquid outlet. When the liquid level of the processing liquid in the storage tank reaches a preset liquid level, the liquid dispensing tank stops supplying liquid to the storage tank. The preset liquid level is lower than the second upper limit liquid level.

[0015] Preferably, the liquid supply mechanism further includes a stirring device having a driving part and a stirring part. The driving part is disposed on the outer wall surface of the storage tank, and the stirring part is located inside the storage tank, and is used to rotate under the drive of the driving part to stir the processing liquid.

[0016] Preferably, the liquid supply mechanism further includes a liquid supply pump having a liquid inlet and a liquid outlet. The liquid inlet is connected to the liquid outlet of the processing liquid, and the liquid outlet is connected to the processing device and the storage tank respectively. The liquid supply pump is used to output the processing liquid in the storage tank to the processing device, and is also used to pump out the processing liquid in the storage tank and pump the processing liquid back into the storage tank.

[0017] Preferably, the storage tank also has a safety level below the preset liquid level. When the liquid level of the processing liquid in the storage tank reaches the safety level, the supply liquid pump starts; when the liquid level of the processing liquid in the storage tank is lower than the safety level, the supply liquid pump stops working.

[0018] Preferably, the liquid supply device further includes a humidification device connected to the storage tank, used to process the input inert gas and pure water and output humidified inert gas into the storage tank.

[0019] Preferably, the frame includes a first mounting space and a second mounting space. In the height direction of the frame, the first mounting space is located above the second mounting space, and the first mounting space and the second mounting space are arranged adjacent to each other. The liquid dispensing mechanism is located in the first mounting space, and the liquid supply mechanism is located in the second mounting space.

[0020] According to the specific embodiments provided in this application, the following technical effects are disclosed:

[0021] This application provides a liquid supply device, connected to a processing device, comprising a first liquid supply device for providing a first liquid, and a second liquid supply device for providing different types of second liquids. The liquid supply device includes: a frame, a dispensing mechanism connected to the first liquid supply device, and a supply mechanism connected between the dispensing mechanism and the processing device. The frame includes at least two mounting spaces, one for the dispensing mechanism and the other for the supply mechanism. The dispensing mechanism includes several different types of metering containers, which can be selected and installed according to the type of the second liquid. The metering containers are connected to the second liquid supply device and are used to meter the volume of the second liquid supplied from the second liquid supply device to the dispensing mechanism. In this solution, the dispensing mechanism and the supply mechanism are integrated and mounted on the frame to form an integrated liquid supply device. The dispensing mechanism is equipped with several different types of metering containers, which can be selected and installed according to the type of the second liquid to accommodate the addition requirements of different types of second liquids. Thus, only a single liquid supply device is needed to configure and supply multiple types of processing liquids, reducing the initial setup cost of the device and significantly improving the utilization rate of the device compared to existing technologies. Attached Figure Description

[0022] To more clearly illustrate the technical solutions in the embodiments of this application or the prior art, the drawings used in the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0023] Figure 1 This is an overall schematic diagram of the liquid supply device provided in the embodiments of this application.

[0024] Figure label:

[0025] 10. Frame; 20. Quantitative container; 30. Liquid preparation tank; 40. Storage tank; 50. Weighing sensor; 60. Humidification device; 100. First installation space; 110. Second installation space; 300. First liquid inlet; 310. Second liquid inlet; 320. Circulating liquid outlet; 330. Circulating liquid inlet; 340. Circulating liquid pump; 400. Processing liquid inlet; 410. Processing liquid outlet; 420. Overflow port; 430. Drive unit; 440. Stirring unit; 450. Supply liquid pump; 600. Drain port. Detailed Implementation

[0026] To make the objectives, technical solutions, and advantages of this application clearer, the technical solutions in the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. Based on the embodiments in this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.

[0027] As described in the background section, in current planarization scenarios, the process of supplying polishing slurry involves slurry preparation and supply operations, with separate equipment for slurry preparation and supply. Polishing slurry is composed of polishing concentrate and chemical solutions, and different types of polishing slurry require different chemical solutions. To produce multiple types of polishing slurry, multiple sets of one-to-one slurry preparation and supply equipment are required. Each set of equipment must specifically process a designated chemical solution to produce the corresponding type of polishing slurry. Such a large number of devices results in excessively high initial setup costs, and when certain types of polishing slurry are not needed for production, the equipment remains idle, leading to low utilization and resource waste.

[0028] Based on this, this application provides a liquid supply device, which aims to solve the technical problems of high initial layout costs and low equipment utilization rate caused by the large number of devices in the prior art.

[0029] like Figure 1As shown, the liquid supply device includes a frame 10, on which a liquid dispensing mechanism and a liquid supply mechanism are mounted, achieving integrated installation of the two devices. A processing unit is located outside the liquid supply device, comprising a first liquid supply device for providing a first liquid and a second liquid supply device for providing a second liquid. All three are connected to the liquid supply device. The liquid supply device mixes the first and second liquids to form a processing liquid, which is then delivered to the processing unit for grinding. The liquid dispensing mechanism is equipped with different types of metering containers 20 to meter the volume of the second liquid supplied by the second liquid supply device to the dispensing mechanism. In actual production, the metering containers can be selected and installed according to the type of the second liquid to meet the addition requirements of different types of second liquids.

[0030] The following is a detailed analysis of the liquid supply device. (Reference) Figure 1 The liquid supply device includes a frame 10, a liquid dispensing mechanism connected to a first liquid supply device, and a liquid supply mechanism connected between the liquid dispensing mechanism and the processing device. The frame 10 includes at least two installation spaces, one of which is equipped with the liquid dispensing mechanism and the other is equipped with the liquid supply mechanism. The liquid dispensing mechanism includes several different types of metering containers 20, and the metering containers 20 can be selected and installed according to the type of the second liquid. The metering containers 20 are connected to the second liquid supply device and are used to meter the volume of the second liquid delivered by the second liquid supply device to the liquid dispensing mechanism.

[0031] In this embodiment, the first liquid supply device is specifically a grinding slurry supply device, and the first liquid supplied is specifically a grinding slurry; the second liquid supply device is specifically a chemical liquid supply device, and the second liquid supplied is specifically a chemical liquid; the processing device is specifically a grinding device, used to grind the wafer using a grinding slurry formed by mixing the grinding slurry and the chemical liquid.

[0032] The mixing mechanism is used to mix the input grinding stock solution with chemical solution to form a grinding slurry, and then deliver the grinding slurry to the supply mechanism. The supply mechanism is used to store the grinding slurry and deliver it to the grinding device. The mixing mechanism and the supply mechanism are integrated into one unit, which reduces the occupation of workshop space. The staff can centrally manage the mixing and supply processes, reducing labor and time costs. Furthermore, the mixing mechanism and the supply mechanism are installed in independent spaces, avoiding the impact of one device on the other during operation. There are multiple quantitative containers 20 of various types. Different types of grinding slurries are prepared by mixing grinding concentrate with different types of chemical liquids. In actual operation, after receiving a production instruction for a certain type of grinding slurry, the liquid supply device obtains the type of chemical liquid and the ratio of grinding concentrate to chemical liquid. Considering that there are many types of chemical liquids, different properties of different chemical liquids, and different volumes of different chemical liquids when added, a single quantitative container 20 cannot meet the addition requirements of multiple chemical liquids. Therefore, multiple quantitative containers 20 are set up. The staff can select and install them according to the type of chemical liquid. In this way, only a single liquid supply device is needed to realize the preparation and supply of multiple types of grinding slurries. Compared with the existing technology, there is no need to set up multiple sets of one-to-one liquid preparation and supply mechanisms, which reduces the initial layout cost of the device and eliminates the situation where the device is idle when a certain type of grinding slurry is not needed for production, thus significantly improving the utilization rate of the device.

[0033] For example, when the chemical liquid supply device needs to deliver chemical liquid A to the liquid preparation mechanism, the volume of chemical liquid A is large, measured in liters (L), so a 1L quantitative container A is required for measurement; when the chemical liquid supply device needs to deliver chemical liquid B to the liquid preparation mechanism, the volume of chemical liquid B is smaller than the volume of chemical liquid A, measured in milliliters (mL), and the measurement accuracy of quantitative container A is insufficient, so a 100mL quantitative container B is required for measurement.

[0034] For example, when the chemical liquid supply device needs to deliver chemical liquid C to the liquid dispensing mechanism, if the viscosity of chemical liquid C is high, a large-capacity, low-flow-rate metering container C should be used for measurement; when the chemical liquid supply device needs to deliver chemical liquid D to the liquid dispensing mechanism, if the viscosity of chemical liquid D is low, a small-capacity, high-flow-rate metering container D should be used for measurement.

[0035] Preferably, refer to Figure 1 The frame 10 includes a first mounting space 100 and a second mounting space 110. In the height direction of the frame 10, the first mounting space 100 is located above the second mounting space 110, and the first mounting space 100 and the second mounting space 110 are arranged adjacent to each other. The liquid dispensing mechanism is located in the first mounting space 100, and the liquid supply mechanism is located in the second mounting space 110.

[0036] In one specific embodiment, a horizontal plate is provided in the middle of the interior of the frame 10, dividing the internal installation space into a first installation space 100 and a second installation space 110. The liquid dispensing tank 30 of the liquid dispensing mechanism is located in the first installation space 100 and its bottom is fixed to the horizontal plate. The storage tank 40 of the liquid supply mechanism is located in the second installation space 110 and its bottom is fixed to the base plate of the frame 10. The first installation space 100 and the second installation space 110 are arranged adjacent to each other, which can reduce the length of the connecting pipe between the liquid dispensing mechanism and the liquid supply mechanism, simplify the pipe installation path, and place the liquid dispensing mechanism above the liquid supply mechanism so that the grinding liquid flows naturally into the liquid supply mechanism under the action of gravity. This avoids the need for additional liquid pumps to draw grinding liquid due to poor installation positions of the liquid dispensing mechanism and the liquid supply mechanism, which would increase the configuration cost of the device.

[0037] Preferably, refer to Figure 1 The liquid preparation mechanism also includes a liquid preparation tank 30 with a first upper limit liquid level (HH). The liquid preparation tank 30 includes at least a first liquid inlet 300 and a second liquid inlet 310. The grinding raw material supply device is connected to the first liquid inlet 300, and the chemical liquid supply device is connected to the second liquid inlet 310 through a metering container 20. When the liquid level of the mixture of grinding raw material and chemical liquid in the liquid preparation tank 30 reaches the first upper limit liquid level (HH), both the grinding raw material supply device and the chemical liquid supply device stop operating.

[0038] The grinding solution and chemical solution flow into the mixing tank 30 through two inlets and mix there. A level sensor is installed next to the mixing tank 30 to detect whether the liquid level has reached the first upper limit (HH). If it has not reached the upper limit, it indicates that the mixing tank 30 is not full, and both the grinding solution supply device and the chemical solution supply device can continue to operate for continuous liquid supply. If the upper limit is reached, it indicates that the mixing tank 30 is almost full and has reached the warning level; in this case, both devices must stop supplying liquid. Valves are connected between the grinding solution supply device and the first inlet 300, between the chemical solution supply device and the metering container 20, and between the metering container 20 and the second inlet 310 to regulate the flow rate of the liquid. The type of valve is not limited here and can be determined according to the actual operating conditions.

[0039] Preferably, the metering container 20 is conical, located above the liquid preparation tank 30, with the tip of the metering container facing the liquid preparation tank.

[0040] In this process, when the liquid chemicals are discharged from the metering container 20, the liquid chemicals, under their own weight and guided by the shape of the container, more easily gather towards the tip and are discharged smoothly, thus reducing the amount of residual liquid inside the metering container 20. Furthermore, as the amount of liquid chemicals decreases, the cross-sectional area of ​​its flow path gradually decreases, resulting in an increased flow rate of the liquid chemicals and improving the delivery efficiency of the liquid chemicals.

[0041] Preferably, refer to Figure 1 The liquid preparation tank also includes a circulation outlet 320 and a circulation inlet 330. The liquid preparation mechanism also includes a circulation pump 340 connected between the circulation outlet 320 and the circulation inlet 330, which is used to pump out the mixed liquid in the liquid preparation tank 30 and pump the mixed liquid back into the liquid preparation tank. The mixed liquid forms a grinding liquid after circulation.

[0042] The grinding solution and the chemical solution are fed into the mixing tank 30 in a pre-set ratio. Since they cannot be quickly and stably mixed in the short time after entering the mixing tank 30, the mixed liquid of grinding solution and chemical solution is pumped out and then pumped in by the circulating liquid pump 340, so that the grinding solution and chemical solution are fully and evenly mixed in multiple cycles to form a grinding solution.

[0043] In one specific embodiment, the liquid supply device further includes a weighing sensor 50 located at the bottom of the liquid dispensing tank 30 for real-time detection of the weight of the liquid dispensing tank 30.

[0044] In an optional embodiment, the weighing sensor 50 can control the amount of grinding stock injected into the mixing tank 30 based on the weight of the mixing tank 30, the volume of the chemicals in the metering container 20, and the first upper limit liquid level (HH).

[0045] In an optional embodiment, the weighing sensor 50 can also control the start and stop of the circulating liquid pump 340 based on the weight of the liquid dispensing tank 30.

[0046] Preferably, refer to Figure 1 The liquid supply mechanism includes a storage tank 40 with a second upper limit liquid level (H). The storage tank 40 includes at least a processing liquid inlet end 400 and a processing liquid outlet end 410. The liquid dispensing tank 30 is connected to the processing liquid inlet end 400, and the grinding device is connected to the processing liquid outlet end 410. When the level of the grinding liquid in the storage tank 40 reaches the preset liquid level, the liquid dispensing tank 30 stops supplying liquid to the storage tank 40. The preset liquid level is lower than the second upper limit liquid level (H).

[0047] The second upper limit level (H) is a warning level for the storage tank 40. In the event of a lost device command or device malfunction, if the grinding fluid in the storage tank 40 exceeds the second upper limit level (H), the grinding fluid will overflow through the overflow port 420 above the second upper limit level (H). A valve is provided between the dispensing tank 30 and the processing liquid inlet 400 to regulate the flow rate of the grinding fluid. When the level of the grinding fluid in the storage tank 40 reaches the preset level, the valve closes, and the dispensing tank 30 stops supplying liquid to the storage tank 40.

[0048] Preferably, refer to Figure 1 The liquid supply mechanism also includes a stirring device having a drive unit 430 and a stirring unit 440. The drive unit 430 is located on the outer wall of the storage tank 40, and the stirring unit 440 is located inside the storage tank 40 and is used to rotate under the drive of the drive unit 430 to stir the grinding liquid.

[0049] The drive unit 430 can be a drive motor, with the output shaft of the drive motor facing the inside of the storage tank 40. The output shaft is connected to the stirring unit 440 through an output rod. The rotation of the output shaft drives the stirring unit 440 to rotate, thereby stirring the grinding liquid and preventing suspended substances in the grinding liquid from stratifying and condensing. The stirring unit 440 can be a single-layer fan body with high rotation speed, low vibration, and low failure rate.

[0050] It should be noted that the length of the output rod is not less than two-thirds of the depth of the storage tank 40, and the preset liquid level is higher than the position of the stirring part 440 and lower than the second upper limit liquid level (H).

[0051] In one optional embodiment, the stirring device can be turned on and off at timed intervals.

[0052] In one specific embodiment, the storage tank 40 further includes an intermediate liquid level (M), a low liquid level (L), and a replenishment liquid level (LL), with the liquid levels of the three gradually decreasing. The intermediate liquid level (M) is located in the middle of the storage tank 40, below the second upper limit liquid level (H). The low liquid level (L) indicates that the level of the grinding fluid is below this value, requiring replenishment of grinding fluid into the storage tank 40. The replenishment liquid level (LL) indicates that the level of the grinding fluid is below this value, meaning there is no usable grinding fluid left in the storage tank 40. Each liquid level is equipped with a liquid level sensor to achieve real-time liquid level detection.

[0053] Preferably, refer to Figure 1 The liquid supply mechanism also includes a liquid supply pump 450 with a liquid inlet and a liquid outlet. The liquid inlet is connected to the liquid outlet 410 of the processing liquid, and the liquid outlet is connected to the grinding device and the storage tank 40 respectively. The liquid supply pump 450 is used to output the grinding liquid in the storage tank 40 to the grinding device, and is also used to pump out the grinding liquid in the storage tank 40 and pump the grinding liquid back into the storage tank 40.

[0054] The liquid outlet of the supply pump 450 can be connected to the processing liquid inlet 400, and it also has a separate opening in the storage tank 40 connected to this opening. The supply pump 450 is used not only to output the grinding liquid in the storage tank 40 to the grinding device, but also to circulate and pump out the grinding liquid to compensate for the mixing speed of the stirring device and accelerate the uniform mixing speed of the grinding liquid at different depths in the storage tank 40.

[0055] Preferably, refer to Figure 1 The storage tank 40 also has a safety level below a preset level. When the grinding fluid in the storage tank 40 reaches the safety level, the supply pump 450 starts. When the grinding fluid in the storage tank 40 is below the safety level, the supply pump 450 stops working.

[0056] The safety level can be superimposed on the aforementioned low liquid level (L) setting. If the grinding fluid is lower than the safety level, it means that there is not enough grinding fluid for the grinding device to use, and the supply pump 450 will not work. The supply pump 450 will only work when the grinding fluid is higher than the safety level to supply liquid to the grinding device.

[0057] Preferably, refer to Figure 1 The liquid supply device also includes a humidification device 60 connected to the storage tank 40, which processes the input inert gas and pure water and outputs humidified inert gas into the storage tank.

[0058] The inert gas is supplied by an inert gas supply device outside the liquid supply device, and the pure water is supplied by a pure water device outside the liquid supply device. The humidifying inert gas is used to maintain the humidity inside the storage tank 40 to avoid the impact of improper humidity on the grinding fluid.

[0059] In an optional embodiment, the inert gas is nitrogen.

[0060] In one specific embodiment, the humidification device 60 includes a drain port 600 for discharging excess pure water. The drain port 600, the processing liquid outlet 410, and the overflow port 420 are connected by pipes to form a waste outlet at the confluence of the pipes to discharge waste liquid. The waste liquid includes overflowing grinding liquid, remaining useless grinding liquid in the storage tank 40, and excess pure water.

[0061] In one specific embodiment, the liquid supply device also includes a control panel mounted on the frame 10, through which operators can adjust the liquid mixing mechanism and the liquid supply mechanism online.

[0062] In a complete grinding slurry supply process, refer to Figure 1The liquid supply device includes a main controller, which acquires grinding slurry production instructions, the type of chemical liquid, and the mixing ratio of grinding stock solution to chemical liquid. It controls the opening of valves between the grinding stock solution supply device and the mixing tank 30, as well as valves between the chemical liquid supply device and the mixing tank 30, to ensure smooth flow of the grinding stock solution and chemical liquid into the mixing tank 30. Operators use a control panel to know the type of chemical liquid being added, pre-select and install a metering container 20 to measure the volume of chemical liquid supplied to the mixing tank 30. Once the mixture of grinding stock solution and chemical liquid reaches a certain volume in the mixing tank 30, the main controller activates a circulating pump 340 to circulate and pump the mixed liquid into and out of the mixing tank 30, ensuring thorough mixing of the grinding stock solution and chemical liquid to form the grinding slurry. The main controller also controls the opening of valves between the mixing tank 30 and the storage tank 40, allowing the grinding slurry in the mixing tank 30 to flow into the storage tank 40. When the grinding slurry reaches a certain amount in the storage tank 40, the main controller controls the stirring device to start, so as to stir the grinding slurry evenly. At the same time, it controls the supply pump 450 to start, so as to circulate and pump the grinding slurry out and into the storage tank 40, and deliver the grinding slurry to the grinding device.

[0063] In the description of this specification, the references to terms such as "one embodiment," "some embodiments," "example," "specific example," or "some examples," etc., indicate that a specific feature, structure, material, or characteristic described in connection with that embodiment or example is included in at least one embodiment or example of this application. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples.

[0064] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one of that feature. In the description of this application, "multiple" means at least two, such as two, three, etc., unless otherwise explicitly specified.

[0065] Although embodiments of this application have been shown and described above, it is understood that the above embodiments are exemplary and should not be construed as limiting this application. Those skilled in the art can make changes, modifications, substitutions and variations to the above embodiments within the scope of this application.

Claims

1. A liquid supply device, connected to a processing apparatus, a first liquid supply device for providing a first liquid, and a second liquid supply device for providing a second liquid of a different type, characterized in that, The liquid supply device includes: The frame (10) includes a liquid dispensing mechanism connected to the first liquid supply device and a liquid supply mechanism connected between the liquid dispensing mechanism and the processing device. The frame (10) includes at least two installation spaces, one of which is equipped with the liquid dispensing mechanism and the other of which is equipped with the liquid supply mechanism; The liquid dispensing mechanism includes several different types of metering containers (20), and the metering containers (20) can be selected and installed according to the type of the second liquid. The metering containers (20) are connected to the second liquid supply device and are used to meter the volume of the second liquid delivered by the second liquid supply device to the liquid dispensing mechanism.

2. The liquid supply device according to claim 1, characterized in that, The liquid dispensing mechanism further includes a liquid dispensing tank (30), which includes at least a first liquid inlet (300) and a second liquid inlet (310). The first liquid supply device is connected to the first liquid inlet (300), and the second liquid supply device is connected to the second liquid inlet (310) through the metering container (20).

3. The liquid supply device according to claim 2, characterized in that, The metering container (20) is conical, located above the liquid preparation tank (30), with the tip of the metering container (20) facing the liquid preparation tank (30).

4. The liquid supply device according to claim 2, characterized in that, The liquid mixing tank (30) further includes a circulating liquid outlet (320) and a circulating liquid inlet (330). The liquid mixing mechanism further includes a circulating liquid pump (340) connected between the circulating liquid outlet (320) and the circulating liquid inlet (330), used to pump out the mixture of the first liquid and the second liquid in the liquid mixing tank (30) and pump the mixture back into the liquid mixing tank (30), wherein the mixture forms a processing liquid after circulation.

5. The liquid supply device according to claim 4, characterized in that, The liquid supply mechanism includes a storage tank (40), which includes at least a liquid inlet (400) and a liquid outlet (410). The liquid dispensing tank (30) is connected to the liquid inlet (400), and the processing device is connected to the liquid outlet (410).

6. The liquid supply device according to claim 5, characterized in that, The liquid supply mechanism also includes a stirring device having a driving part (430) and a stirring part (440). The driving part (430) is disposed on the outer wall of the storage tank (40), and the stirring part (440) is located inside the storage tank (40) for rotating under the drive of the driving part (430) to stir the processing liquid.

7. The liquid supply device according to claim 5, characterized in that, The liquid supply mechanism further includes a supply liquid pump (450) having a liquid inlet and a liquid outlet. The liquid inlet is connected to the liquid outlet end (410) of the processing liquid, and the liquid outlet is connected to the processing device and the storage tank (40). The supply liquid pump (450) is used to output the processing liquid in the storage tank (40) to the processing device, and is also used to pump out the processing liquid in the storage tank (40) and pump the processing liquid back into the storage tank (40).

8. The liquid supply device according to claim 7, characterized in that, The storage tank (40) has a safe liquid level. When the liquid level of the processing liquid in the storage tank (40) reaches the safe liquid level, the supply liquid pump (450) starts. When the liquid level of the processing liquid in the storage tank (40) is lower than the safe liquid level, the supply liquid pump (450) stops working.

9. The liquid supply device according to claim 5, characterized in that, The liquid supply device also includes a humidification device (60) connected to the storage tank (40), which processes the input inert gas and pure water and outputs humidified inert gas into the storage tank (40).

10. The liquid supply device according to claim 1, characterized in that, The frame includes a first mounting space (100) and a second mounting space (110). In the height direction of the frame (10), the first mounting space (100) is located above the second mounting space (110). The liquid dispensing mechanism is located in the first mounting space (100), and the liquid supply mechanism is located in the second mounting space (110).

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