Wafer processing irradiation mask apparatus positioning device

Abstract

The utility model discloses a wafer processing irradiation mask equipment positioning device, including the connection box, the upper surface fixed connection of connection box has the connecting plate, the upper surface of connecting plate is established with six mobile grooves, the upper surface penetration rotation connection of connecting plate has the adsorption pipe, the upper surface fixed connection of adsorption pipe has the adsorption tray, the bottom rotation connection of adsorption pipe has the connecting pipe. The utility model discloses, through setting rotary ring, rotary disc, fixed ring, worm wheel ring, moving block, moving column, connecting column, connecting frame and positioning roller etc., fixed ring drives rotary disc to rotate, and rotary disc moves through arc -shaped groove and drives moving column, and moving column drives moving block to slide in corresponding mobile groove, and moving block moves through connecting column and drives connecting frame, and connecting frame drives corresponding positioning roller to move, makes positioning roller adhere in one side of wafer, and carries out quick positioning to wafer, avoids the displacement of wafer before adsorption, and influences the exposure accuracy of circuit pattern.

Description

Technical Field

[0001] This utility model relates to the field of wafer processing technology, and in particular to a positioning device for wafer processing irradiation mask equipment. Background Technology

[0002] A wafer is a circular silicon wafer used in the fabrication of silicon semiconductor integrated circuits. It is named for its circular shape. Its raw material is high-purity polycrystalline silicon, which is pulled into a single-crystal silicon rod and then processed through slicing, grinding, polishing and other processes. Wafer processing irradiation mask equipment is a key piece of equipment in semiconductor manufacturing, mainly used to form precise circuit patterns on the surface of the wafer.

[0003] However, in existing equipment, most wafers are transferred by mechanical grippers. However, due to the inertia of the robotic arm or the vibration of the drive motor of the adsorption disk, the wafer is easily displaced before adsorption, which affects the exposure accuracy of the circuit pattern. Therefore, a positioning device for wafer processing irradiation mask equipment is proposed. Utility Model Content

[0004] The purpose of this invention is to address the shortcomings of existing technologies by proposing a positioning device for wafer processing irradiation mask equipment.

[0005] To achieve the above objectives, the present invention adopts the following technical solution: a positioning device for a wafer processing irradiation mask, comprising a connecting box, a connecting plate fixedly connected to the upper surface of the connecting box, six moving slots formed on the upper surface of the connecting plate, an adsorption tube rotatably connected through the upper surface of the connecting plate, an adsorption disk fixedly connected to the upper surface of the adsorption tube, a connecting tube rotatably connected to the bottom of the adsorption tube, one end of the connecting tube extending to the outside of the connecting box and fixedly connected, and a rotating structure provided on the connecting box;

[0006] The rotating structure includes a rotating rod rotatably connected to an opposite side inside the connecting box, and a worm gear is fixedly connected to the rotating rod.

[0007] As a further description of the above technical solution:

[0008] A first servo motor is fixedly connected to one side of the connecting box, and the output shaft of the first servo motor is fixedly connected to one end of the rotating rod.

[0009] As a further description of the above technical solution:

[0010] A rotating ring is rotatably connected to the bottom of the connecting plate, and a rotating disk is fixedly connected to the bottom of the rotating ring. Six arc-shaped grooves are opened on the upper surface of the rotating disk. A fixed ring is fixedly connected to the bottom of the rotating disk, and a worm gear ring is fixedly connected to the bottom of the fixed ring. The worm gear ring meshes with the worm.

[0011] As a further description of the above technical solution:

[0012] Each of the moving slots is slidably connected to a moving block, and the bottom of each moving block is fixedly connected to a moving column. Each moving column is slidably connected inside the corresponding arc-shaped slot.

[0013] As a further description of the above technical solution:

[0014] Each of the moving blocks has a connecting column fixedly connected to its upper surface, and one side of each connecting column is fixedly connected to a connecting frame. A positioning roller is rotatably connected inside each connecting frame.

[0015] As a further description of the above technical solution:

[0016] A second servo motor is fixedly connected to the bottom of the connecting box, and the output shaft of the second servo motor is fixedly connected to a first sprocket via a coupling.

[0017] As a further description of the above technical solution:

[0018] A second sprocket is fixedly connected to the adsorption tube, and a chain is movably sleeved on the second sprocket and the first sprocket.

[0019] This utility model has the following beneficial effects:

[0020] Compared with existing technologies, this wafer processing irradiation mask positioning device, by setting up a first servo motor, a rotating rod, a worm gear, a rotating ring, a rotating disk, a fixed ring, a worm wheel ring, a moving block, a moving column, a connecting column, a connecting frame, and positioning rollers, etc., allows the first servo motor to drive the worm gear to rotate via the rotating rod. The worm gear drives the fixed ring to rotate via the worm wheel ring. The fixed ring drives the rotating disk to rotate. The rotating disk drives the moving column to move via an arc groove. The moving column drives the moving block to slide within the corresponding moving groove. The moving block drives the connecting frame to move via the connecting column. The connecting frame drives the corresponding positioning roller to move, so that the positioning roller is in contact with one side of the wafer, quickly positioning the wafer and preventing the wafer from shifting before adsorption, which would affect the exposure accuracy of the circuit pattern. Attached Figure Description

[0021] Figure 1 This is a three-dimensional structural schematic diagram of a positioning device for a wafer processing irradiation mask proposed in this utility model;

[0022] Figure 2 This is a cross-sectional view of a positioning device for a wafer processing irradiation mask according to the present invention;

[0023] Figure 3 This is a schematic diagram of the connecting pipe of the positioning device for a wafer processing irradiation mask equipment proposed in this utility model;

[0024] Figure 4 This is an exploded view of the second sprocket and chain of a positioning device for a wafer processing irradiation mask according to the present invention;

[0025] Figure 5 This is a schematic diagram of the rotating structure of a positioning device for a wafer processing irradiation mask according to the present invention;

[0026] Figure 6 This is an exploded view of the rotating structure of a positioning device for a wafer processing irradiation mask according to the present invention.

[0027] Figure 7 This is a schematic diagram of the moving block and moving column of the positioning device for a wafer processing irradiation mask equipment proposed in this utility model;

[0028] Figure 8 This is an exploded view of the moving block and moving column of the positioning device for a wafer processing irradiation mask proposed in this utility model.

[0029] Legend:

[0030] 1. Connecting box; 2. Connecting plate; 3. Adsorption tube; 4. Adsorption plate; 5. Connecting tube; 6. Rotating structure; 601. First servo motor; 602. Rotating rod; 603. Worm gear; 604. Rotating ring; 605. Rotating disk; 606. Fixed ring; 607. Worm gear ring; 608. Moving block; 609. Moving column; 6010. Connecting column; 6011. Connecting frame; 6012. Positioning roller; 7. Second servo motor; 8. First sprocket; 9. Second sprocket; 10. Chain. Detailed Implementation

[0031] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0032] Reference Figures 1 to 8The present invention provides a positioning device for a wafer processing irradiation mask: including a connecting box 1, which is fixedly connected to the upper surface of a wafer positioning platform to facilitate the movement of the connecting box 1 in all directions. A connecting plate 2 is fixedly connected to the upper surface of the connecting box 1. Six moving slots are provided on the upper surface of the connecting plate 2. An adsorption tube 3 is rotatably connected through the upper surface of the connecting plate 2. An adsorption plate 4 is fixedly connected to the upper surface of the adsorption tube 3. A connecting tube 5 is rotatably connected to the bottom of the adsorption tube 3. One end of the connecting tube 5 extends to the outside of the connecting box 1 and is fixedly connected. The other end of the connecting tube 5 is fixedly connected to the suction port of a vacuum pump. A rotating structure 6 is provided on the connecting box 1. A PLC control module is fixedly installed on one side of the connecting box 1. The PLC control module is electrically connected to a first servo motor 601 and a second servo motor 7 to facilitate the control of the operation of the first servo motor 601 and the second servo motor 7.

[0033] To achieve positioning, the rotating structure 6 includes a rotating rod 602 rotatably connected to one side of the connecting box 1. A first servo motor 601 is fixedly connected to one side of the connecting box 1. The output shaft of the first servo motor 601 is fixedly connected to one end of the rotating rod 602. A worm gear 603 is fixedly connected to the rotating rod 602. A rotating ring 604 is rotatably connected to the bottom of the connecting plate 2. A rotating disk 605 is fixedly connected to the bottom of the rotating ring 604. Six arc-shaped grooves are formed on the upper surface of the rotating disk 605. A fixing ring 606 is fixedly connected to the bottom of the rotating disk 605. A worm gear ring 607 is fixedly connected to the bottom of the fixing ring 606. The worm gear ring 607 meshes with the worm gear 603. A moving block 608 is slidably connected in each moving groove. A moving column 609 is fixedly connected to the bottom of each moving block 608. Each moving column 609 is slidably connected in the corresponding arc-shaped groove. Each movable block 608 has a fixed connecting post 6010 on its upper surface. One side of each connecting post 6010 is fixedly connected to a connecting frame 6011. A positioning roller 6012 is rotatably connected inside each connecting frame 6011. The first servo motor 601 drives the worm gear 603 to rotate through the rotating rod 602. The worm gear 603 drives the fixed ring 606 to rotate through the worm wheel ring 607. The fixed ring 606 drives the rotating disk 605 to rotate. The rotating disk 605 drives the movable post 609 to move through the arc groove. The movable post 609 drives the movable block 608 to slide in the corresponding movable groove. The movable block 608 drives the connecting frame 6011 to move through the connecting post 6010. The connecting frame 6011 drives the corresponding positioning roller 6012 to move, so that the positioning roller 6012 is attached to one side of the wafer for rapid positioning of the wafer, avoiding displacement of the wafer before adsorption, which would affect the exposure accuracy of the circuit pattern.

[0034] To achieve the rotation, a second servo motor 7 is fixedly connected to the bottom of the connecting box 1. The output shaft of the second servo motor 7 is fixedly connected to a first sprocket 8 via a coupling. A second sprocket 9 is fixedly connected to the adsorption tube 3. A chain 10 is movably mounted on both the second sprocket 9 and the first sprocket 8. The second servo motor 7 drives the first sprocket 8 to rotate, and the first sprocket 8 drives the second sprocket 9 to rotate via the chain 10. The second sprocket 9 drives the adsorption disk 4 to rotate via the adsorption tube 3. The adsorption disk 4 drives the wafer to rotate in steps, which facilitates high-precision overlay of multiple areas when the wafer is processed to irradiate the mask.

[0035] Working principle: The wafer is placed on the adsorption plate 4 by a mechanical gripper. Then, the first servo motor 601 drives the worm gear 603 to rotate via the rotating rod 602. The worm gear 603 drives the fixed ring 606 to rotate via the worm wheel ring 607. The fixed ring 606 drives the rotating disk 605 to rotate. The rotating disk 605 drives the moving column 609 to move via the arc groove. The moving column 609 drives the moving block 608 to slide in the corresponding moving groove. The moving block 608 drives the connecting frame 6011 to move via the connecting column 6010. The connecting frame 6011 drives the corresponding positioning roller 6012 to move, so that the positioning roller 6012 is in contact with one side of the wafer, and the wafer is quickly positioned to avoid displacement of the wafer before adsorption, which would affect the exposure accuracy of the circuit pattern.

[0036] Finally, it should be noted that the above description is only a preferred embodiment of the present utility model and is not intended to limit the present utility model. Although the present utility model has been described in detail with reference to the foregoing embodiments, those skilled in the art can still modify the technical solutions described in the foregoing embodiments or make equivalent substitutions for some of the technical features. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the present utility model should be included within the protection scope of the present utility model.

Claims

1. A wafer processing illumination mask apparatus positioning device comprising a connection box (1), characterized in that: A connecting plate (2) is fixedly connected to the upper surface of the connecting box (1). Six moving slots are provided on the upper surface of the connecting plate (2). An adsorption tube (3) is rotatably connected through the upper surface of the connecting plate (2). An adsorption plate (4) is fixedly connected to the upper surface of the adsorption tube (3). A connecting tube (5) is rotatably connected to the bottom of the adsorption tube (3). One end of the connecting tube (5) extends to the outside side of the connecting box (1) and is fixedly connected. A rotating structure (6) is provided on the connecting box (1). The rotating structure (6) includes a rotating rod (602) rotatably connected to the opposite side inside the connecting box (1), and a worm gear (603) is fixedly connected to the rotating rod (602).

2. A wafer processing illumination mask apparatus positioning device according to claim 1, wherein: A first servo motor (601) is fixedly connected to one side of the connecting box (1), and the output shaft of the first servo motor (601) is fixedly connected to one end of the rotating rod (602).

3. A wafer processing illumination mask apparatus positioning device according to claim 1, wherein: A rotating ring (604) is rotatably connected to the bottom of the connecting plate (2). A rotating disk (605) is fixedly connected to the bottom of the rotating ring (604). Six arc-shaped grooves are opened on the upper surface of the rotating disk (605). A fixing ring (606) is fixedly connected to the bottom of the rotating disk (605). A worm gear ring (607) is fixedly connected to the bottom of the fixing ring (606). The worm gear ring (607) meshes with the worm (603).

4. A wafer processing illumination mask apparatus positioning device according to claim 3, wherein: Each of the movable slots is slidably connected to a movable block (608), and the bottom of each movable block (608) is fixedly connected to a movable column (609). Each movable column (609) is slidably connected inside the corresponding arc-shaped slot.

5. A wafer processing illumination mask apparatus positioning device according to claim 4, wherein: Each of the moving blocks (608) has a connecting post (6010) fixedly connected to its upper surface, and one side of each connecting post (6010) is fixedly connected to a connecting frame (6011). Each connecting frame (6011) has a positioning roller (6012) rotatably connected inside it.

6. A wafer processing illumination mask apparatus positioning device according to claim 1, wherein: The bottom of the connecting box (1) is fixedly connected to a second servo motor (7), and the output shaft of the second servo motor (7) is fixedly connected to a first sprocket (8) through a coupling.

7. A wafer processing illumination mask apparatus positioning device according to claim 6, wherein: A second sprocket (9) is fixedly connected to the adsorption tube (3), and a chain (10) is movably sleeved on the second sprocket (9) and the first sprocket (8).

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