Cavity door structure of magnetron sputtering machine and magnetron sputtering machine

Abstract

The application relates to the technical field of magnetron sputtering machines, and provides a cavity door structure of a magnetron sputtering machine and the magnetron sputtering machine.The cavity door structure of the magnetron sputtering machine comprises a coating cavity, a fixed cover plate and a movable cover plate.The coating cavity comprises a first end and a second end arranged oppositely, the fixed cover plate is arranged at the first end, the fixed cover plate is fixedly connected with the coating cavity to seal the first end, and the movable cover plate is arranged at the second end and used for sealing or opening the coating cavity.The cavity door structure of the magnetron sputtering machine provided by the application is provided with the fixed cover plate and the movable cover plate, the fixed cover plate is arranged at the first end of the coating cavity, the fixed cover plate is fixedly connected with the coating cavity to seal the coating cavity, the movable cover plate is arranged at the second end of the coating cavity and used for sealing or opening the coating cavity.In this way, the movable space of the fixed cover plate is not needed, so that the workshop space is saved, and the cost is saved.

Description

Technical Field

[0001] This application relates to the field of magnetron sputtering machine technology, and more particularly to a cavity gate structure for a magnetron sputtering machine and a magnetron sputtering machine. Background Technology

[0002] Vacuum coating technology is a very environmentally friendly film formation technique. Films formed through vacuum coating possess advantages such as high hardness, high wear resistance, good chemical stability, strong adhesion to the substrate, and a bright metallic appearance. Therefore, vacuum coating is increasingly widely used in the decorative treatment of metal substrates such as copper, aluminum, silver, gold, and stainless steel.

[0003] Current vacuum coating equipment typically has a coating chamber in the middle, with the winding side and cathode side moving in and out from the two ends of the coating chamber, respectively. However, as the width of the film roll increases, it places greater demands on the user's available space. Utility Model Content

[0004] In view of this, the purpose of this application is to provide a cavity door structure for a magnetron sputtering machine that is conducive to saving space.

[0005] To achieve the above objectives, this application provides a cavity gate structure for a magnetron sputtering machine, the cavity gate structure of which includes:

[0006] A coating cavity, the coating cavity including a first end and a second end disposed opposite to each other;

[0007] A fixed cover plate is disposed at the first end, and the fixed cover plate is fixedly connected to the coating cavity to seal the first end;

[0008] A movable cover plate is disposed at the second end, and the movable cover plate is used to seal or open the coating cavity.

[0009] In a preferred embodiment, the cavity structure of the magnetron sputtering machine further includes a support assembly disposed within the coating cavity, the support assembly being connected to and supporting the cathode within the coating cavity.

[0010] In a preferred embodiment, the support assembly supports one end of the cathode, and the fixed cover plate supports the other end of the cathode.

[0011] In a preferred embodiment, the support assembly includes a support plate and a support block. The support plate is connected to the inner wall of the coating cavity, and the support block is disposed on the support plate. The support block is provided with a support groove for supporting the cathode.

[0012] In a preferred embodiment, the bottom of the support block is provided with a slot for engaging with the support plate;

[0013] And / or, the support assembly includes a plurality of the support plates and a plurality of the support blocks, with at least one support block disposed on each of the support plates.

[0014] In a preferred embodiment, the cavity door structure of the magnetron sputtering machine further includes a flange, which is disposed between the movable cover plate and the coating cavity. The flange is fixedly connected to the coating cavity, and the movable cover plate is detachably connected to the flange.

[0015] In a preferred embodiment, the coating cavity and the flange are connected by a fillet weld;

[0016] A continuous weld mark is provided between the inner side of the coating cavity and the flange, and an intermittent weld mark is provided between the outer side of the coating cavity and the flange.

[0017] In a preferred embodiment, the coating cavity and the fixed cover plate are connected by a fillet weld;

[0018] A continuous weld mark is provided between the inner side of the coating cavity and the fixed cover plate, and an intermittent weld mark is provided between the outer side of the coating cavity and the fixed cover plate.

[0019] In a preferred embodiment, the cathode within the coating cavity is connected to the fixed cover plate via fasteners.

[0020] Based on the same inventive concept, this application also provides a magnetron sputtering machine, which includes the cavity gate structure of the magnetron sputtering machine described in any one of the above.

[0021] As can be seen from the above, the cavity door structure of the magnetron sputtering machine provided in this application uses a fixed cover plate and a movable cover plate. The fixed cover plate is located at the first end of the coating cavity and is fixedly connected to the coating cavity to seal it. The movable cover plate is located at the second end of the coating cavity and is used to seal or open the coating cavity. Thus, there is no need to provide space for the fixed cover plate to move, thereby saving factory space and reducing costs. Attached Figure Description

[0022] To more clearly illustrate the technical solutions in this application or related technologies, the drawings used in the description of the embodiments or related technologies will be briefly introduced below. Obviously, the drawings described below are only embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0023] Figure 1 This is a schematic diagram of the cavity gate structure of a magnetron sputtering machine in one embodiment of this application;

[0024] Figure 2This is a partial structural schematic diagram of the cavity gate structure of a magnetron sputtering machine in one embodiment of this application;

[0025] Figure 3 for Figure 2 Enlarged structural diagram at point A;

[0026] Figure 4 This is a schematic diagram of the support block in one embodiment of this application.

[0027] Figure Labels

[0028] 100. The cavity door structure of a magnetron sputtering machine;

[0029] 1. Coating cavity; 11. First end; 12. Second end;

[0030] 2. Fix the cover plate;

[0031] 3. Cathode;

[0032] 4. Move the cover plate;

[0033] 5. Support component; 51. Support plate; 52. Support block; 521. Support groove; 522. Slot;

[0034] 6. Flange. Detailed Implementation

[0035] To make the objectives, technical solutions, and advantages of this application clearer, the following detailed description is provided in conjunction with specific embodiments and the accompanying drawings.

[0036] It should be noted that, unless otherwise defined, the technical or scientific terms used in the embodiments of this application should have the ordinary meaning understood by one of ordinary skill in the art to which this application pertains. The terms "first," "second," and similar terms used in the embodiments of this application do not indicate any order, quantity, or importance, but are merely used to distinguish different components. Terms such as "comprising" or "including" mean that the element or object preceding the word encompasses the elements or objects listed after the word and their equivalents, without excluding other elements or objects. Terms such as "connected" or "linked" are not limited to physical or mechanical connections, but can include electrical connections, whether direct or indirect. Terms such as "upper," "lower," "left," and "right" are only used to indicate relative positional relationships; when the absolute position of the described object changes, the relative positional relationship may also change accordingly.

[0037] Reference Figures 1-2As shown, an embodiment of this application discloses a cavity gate structure 100 for a magnetron sputtering machine. The cavity gate structure 100 of the magnetron sputtering machine includes a coating cavity 1, a fixed cover plate 2, and a movable cover plate 4. The coating cavity 1 includes a first end 11 and a second end 12 disposed opposite to each other. The fixed cover plate 2 is disposed at the first end 11 and is fixedly connected to the coating cavity 1 to seal the first end 11. The movable cover plate 4 is disposed at the second end 12 and is used to seal or open the coating cavity 1.

[0038] The coating cavity 1 is a cylindrical structure, with the first end 11 and the second end 12 representing the two ends of the cylindrical structure. Optionally, the coating cavity 1 can be a cylindrical or square tube, etc.

[0039] The magnetron sputtering machine cavity door structure 100 provided in this embodiment is equipped with a fixed cover plate 2 and a movable cover plate 4. The fixed cover plate 2 is disposed at the first end 11 of the coating cavity 1 and is fixedly connected to the coating cavity 1 to seal the coating cavity 1. The movable cover plate 4 is disposed at the second end 12 of the coating cavity 1 and is used to seal or open the coating cavity 1. In this way, there is no need to provide a movable space for the fixed cover plate 2, thereby saving factory space and helping to save costs.

[0040] Specifically, when it is necessary to open the coating chamber 1, the coating chamber 1 is opened by driving the movable cover plate 4 to move. After the coating chamber 1 is opened, the substrate can enter and exit the coating chamber 1 through the second end 12, and the cathode 3 can also enter and exit the coating chamber 1 through the second end 12, so as to realize the replacement and maintenance of the cathode 3.

[0041] Among them, the movable cover plate 4 can move along the axial direction of the coating cavity 1 (e.g., Figure 1 The cover plate 4 can be moved (in the direction of the middle arrow) to open or seal the coating cavity 1. In another embodiment, the movable cover plate 4 can be moved radially (perpendicular to) the coating cavity 1. Figure 1 The movable cover plate 4 (in the direction of the middle arrow) moves to open or seal the coating cavity 1. In another embodiment, the movable cover plate 4 can be rotatably connected to the coating cavity 1 via a pivot to open or seal the coating cavity 1.

[0042] Reference Figure 2 and 3 As shown, in one embodiment, the cavity structure 100 of the magnetron sputtering machine further includes a support component 5. The support component 5 is disposed within the coating cavity 1 and is connected to and supports the cathode 3 within the coating cavity 1. By using the support component 5 to support the cathode 3, deformation of the cathode 3 due to bending moment can be avoided, thus improving the long-term operational stability of the equipment.

[0043] In one embodiment, the support component 5 supports one end of the cathode 3, and the fixing cover plate 2 supports the other end of the cathode 3, preventing the cathode 3 from deforming due to bending moment. Simultaneously, since both ends of the cathode 3 are supported, the thickness of the fixing cover plate 2 can be significantly reduced, thereby saving costs and reducing equipment weight.

[0044] Reference Figure 3 and 4 As shown, in one embodiment, the support assembly 5 includes a support plate 51 and a support block 52. The support plate 51 is connected to the inner wall of the coating cavity 1, and the support block 52 is disposed on the support plate 51. The support block 52 is provided with a support groove 521 for supporting the cathode 3. The support groove 521 supports the end of the cathode 3, facilitating the installation and removal of the cathode 3. Furthermore, the support groove 521 is an arc-shaped groove, which matches the shape of the end of the cathode 3, allowing for better positioning of the cathode 3.

[0045] Optionally, the support plate 51 is connected to the inner wall of the coating cavity 1 by bolts or screws. In other embodiments, the support plate 51 is directly welded to the inner wall of the coating cavity 1.

[0046] Reference Figure 4 As shown, in one embodiment, the bottom of the support block 52 is provided with a slot 522 that engages with the support plate 51. The connection between the support block 52 and the support plate 51 is achieved by engaging with the support plate 51 through the slot 522, which facilitates the installation and disassembly of the support block 52 and the support plate 51. At the same time, it is convenient to adjust the installation position of the support block 52 according to installation needs.

[0047] In one embodiment, the support assembly 5 includes multiple support plates 51 and multiple support blocks 52, with at least one support block 52 disposed on each support plate 51. Specifically, the coating cavity 1 is provided with multiple cathodes 3 arranged in a ring, and each support block 52 supports the corresponding cathode 3, thereby supporting and positioning all cathodes 3. Optionally, at least one support plate 51 may have one support block 52, or at least one support plate 51 may have multiple support blocks 52, such as two or three support blocks 52.

[0048] Reference Figure 1 and 2 As shown, in one embodiment, the cavity door structure 100 of the magnetron sputtering machine further includes a flange 6. The flange 6 is disposed between the movable cover plate 4 and the coating cavity 1. The flange 6 is fixedly connected to the coating cavity 1, and the movable cover plate 4 is detachably connected to the flange 6. The movable cover plate 4 is connected to the coating cavity 1 through the flange 6, which facilitates the installation and removal of the movable cover plate 4, while ensuring the sealing performance of the coating cavity 1.

[0049] In one embodiment, the coating cavity 1 and the flange 6 are connected by a fillet weld. A continuous weld mark is provided between the inner side of the coating cavity 1 and the flange 6, and an intermittent weld mark is provided between the outer side of the coating cavity 1 and the flange 6, so as to ensure the welding strength between the coating cavity 1 and the flange 6, and at the same time save welding materials.

[0050] In one embodiment, the coating cavity 1 and the fixed cover plate 2 are connected by fillet welds. Continuous weld marks are provided between the inner side of the coating cavity 1 and the fixed cover plate 2, and intermittent weld marks are provided between the outer side of the coating cavity 1 and the fixed cover plate 2, so as to ensure the welding strength between the coating cavity 1 and the fixed cover plate 2, and at the same time save welding materials.

[0051] In one embodiment, the cathode 3 and the fixed cover plate 2 are connected by fasteners to ensure the connection strength between the cathode 3 and the fixed cover plate 2, and to facilitate the installation and removal of the cathode 3. Optionally, the fasteners are bolts or screws, etc.

[0052] Based on the same inventive concept, another embodiment of this application discloses a magnetron sputtering machine, which includes the cavity gate structure 100 of the magnetron sputtering machine in any of the above embodiments.

[0053] The magnetron sputtering machine provided in this embodiment has a cavity door structure consisting of a fixed cover plate 2 and a movable cover plate 4. The fixed cover plate 2 is located at the first end 11 of the coating cavity 1 and is fixedly connected to the coating cavity 1 to seal the coating cavity 1. The movable cover plate 4 is located at the second end 12 of the coating cavity 1 and is used to seal or open the coating cavity 1. Thus, there is no need to provide space for the fixed cover plate 2 to move, thereby saving factory space and reducing costs.

[0054] It should be noted that some embodiments of this application have been described above. Other embodiments are within the scope of the appended claims. In some cases, the actions or steps described in the claims can be performed in a different order than that shown in the above embodiments and still achieve the desired result. In addition, the processes depicted in the drawings do not necessarily require the specific order or sequential order shown to achieve the desired result.

[0055] Those skilled in the art should understand that the discussion of any of the above embodiments is merely exemplary and is not intended to imply that the scope of this application (including the claims) is limited to these examples; within the framework of this application, the technical features of the above embodiments or different embodiments can also be combined, the steps can be implemented in any order, and there are many other variations of different aspects of the above embodiments of this application, which are not provided in detail for the sake of brevity.

[0056] The embodiments of this application are intended to cover all such substitutions, modifications, and variations that fall within the broad scope of the appended claims. Therefore, any omissions, modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the embodiments of this application should be included within the protection scope of this application.

Claims

1. A chamber door structure for a magnetron sputtering machine, characterized by, include: A coating cavity, the coating cavity including a first end and a second end disposed opposite to each other; A fixed cover plate is disposed at the first end, and the fixed cover plate is fixedly connected to the coating cavity to seal the first end; A movable cover plate is disposed at the second end, and the movable cover plate is used to seal or open the coating cavity.

2. The chamber door structure of a magnetron sputter machine according to claim 1, characterized in that, The cavity structure of the magnetron sputtering machine also includes a support assembly, which is disposed inside the coating cavity and is connected to and supports the cathode inside the coating cavity.

3. The chamber door structure of a magnetron sputter machine according to claim 2, characterized in that The support assembly supports one end of the cathode, and the fixed cover plate supports the other end of the cathode.

4. The chamber door structure of a magnetron sputtering machine according to claim 2, wherein, The support assembly includes a support plate and a support block. The support plate is connected to the inner wall of the coating cavity, and the support block is disposed on the support plate. The support block is provided with a support groove for supporting the cathode.

5. The chamber door structure of a magnetron sputter machine according to claim 4, characterized in that The bottom of the support block is provided with a slot for engaging with the support plate; And / or, the support assembly includes a plurality of the support plates and a plurality of the support blocks, with at least one support block disposed on each of the support plates.

6. The chamber door structure of a magnetron sputter machine according to claim 1, wherein, The cavity door structure of the magnetron sputtering machine also includes a flange, which is disposed between the movable cover plate and the coating cavity. The flange is fixedly connected to the coating cavity, and the movable cover plate is detachably connected to the flange.

7. A chamber door structure for a magnetron sputter machine according to claim 6, characterized in that The coating cavity and the flange are connected by a fillet weld. A continuous weld mark is provided between the inner side of the coating cavity and the flange, and an intermittent weld mark is provided between the outer side of the coating cavity and the flange.

8. The cavity gate structure of the magnetron sputtering machine according to claim 1, characterized in that, The coating cavity and the fixed cover plate are connected by a fillet weld. A continuous weld mark is provided between the inner side of the coating cavity and the fixed cover plate, and an intermittent weld mark is provided between the outer side of the coating cavity and the fixed cover plate.

9. The chamber door structure of a magnetron sputter machine according to claim 1, wherein, The cathode inside the coating chamber is connected to the fixed cover plate by fasteners.

10. A magnetron sputtering machine characterized by comprising: Includes the cavity door structure of the magnetron sputtering machine as described in any one of claims 1-9.

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