A mixed gas uniform mixing device

CN224524597UActive Publication Date: 2026-07-21SHANGHAI YAMEI MICROWAVE INSTRUMENT FACTORY CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
SHANGHAI YAMEI MICROWAVE INSTRUMENT FACTORY CO LTD
Filing Date
2025-08-21
Publication Date
2026-07-21

AI Technical Summary

Technical Problem

During the preparation of tantalum aluminum nitride alloy thin films, the mixing rate of nitrogen and argon in the mixing tank is slow, resulting in uneven output of the mixed gas, which affects the performance and quality stability of the thin film.

Method used

A gas homogenization device is used, including a premixed gas component and a mixing component. By designing the gas inlet, guide plate and partition plate, it is ensured that the gas enters as required and forms a rotating airflow and collision mixing in the mixing chamber. The gas ratio is adjusted according to the volume difference of the gas storage tank to improve the mixing rate and uniformity.

Benefits of technology

It achieves efficient and uniform mixing of nitrogen and argon, ensuring consistent film performance and quality stability, adapting to the needs of multi-component gas mixing, and improving the accuracy and flexibility of mixed gas ratio control.

✦ Generated by Eureka AI based on patent content.

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Abstract

The application discloses a mixed gas uniform mixing device, relates to the technical field of gas mixing, and comprises two gas storage tanks and a gas mixing tank. The gas mixing tank is communicated with a premixing gas element for preliminarily mixing different gases. The premixing gas element is provided with two gas inlets. Valves for controlling the opening and closing of the two gas inlets are arranged at the two gas inlets. The two gas inlets are respectively connected with the two gas storage tanks. The two gas inlets are oppositely arranged and located on the same plane, and are arranged in a staggered mode. A gas mixing cavity is formed in the premixing gas element, and the two gas inlets are communicated with the gas mixing cavity. Two flow guide plates are arranged in the gas mixing cavity. The two flow guide plates are respectively arranged at the two gas inlets and are arranged in an inclined mode. The two flow guide plates are arranged in parallel with each other to guide the gases output by the two gas inlets to deflect along the flow guide plates, form rotating gas flows in the gas mixing cavity and collide with each other to be mixed. A gas mixing assembly for promoting the mixing of the gases is arranged in the gas mixing tank. The application has the effects of improving the mixing speed of the gases and the uniformity of the mixed gases.
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