A polishing liquid supply device
By introducing structures such as float plates and buzzers into the polishing slurry supply device, the polishing slurry level can be monitored in real time, solving the problem that existing devices cannot know the level in a timely manner, and ensuring the stability of polishing quality and production efficiency.
Patent Information
- Application Number
- CN202521471167.6
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-07-14
- Publication Date
- 2026-07-24
- Estimated Expiration
- 2035-07-14
AI Technical Summary
Existing polishing slurry supply devices cannot accurately and promptly determine the amount of polishing slurry stored, resulting in poor polishing effects or affecting the normal operation of processing equipment, thus increasing production costs.
A polishing fluid supply device was designed, comprising a float plate, a first magnetic plate, a second magnetic plate, a pressure head, a switch, and a buzzer. The device monitors the polishing fluid level in real time, and the buzzer sounds an alarm when the level is insufficient, reminding staff to add polishing fluid.
It enables real-time monitoring of polishing slurry levels, preventing insufficient polishing slurry from affecting polishing quality and production efficiency, and ensuring the continuity and efficiency of polishing operations.
Smart Images

Figure CN224544249U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of polishing slurry supply technology, specifically to a polishing slurry supply device. Background Technology
[0002] Polishing slurry is a water-soluble polishing agent that does not pollute the environment. When used in the polishing process of various processed parts, it can protect the processed parts to make them smoother and shinier and less prone to rust. Therefore, the supply equipment for polishing slurry is very important for its use. However, the existing polishing slurry supply devices still have the following shortcomings.
[0003] In the polishing process, a stable supply of polishing fluid has a crucial impact on processing quality and efficiency.
[0004] For example, Chinese patent application number 202320691215.7 discloses a polishing slurry supply device, including a device body and a control panel. The bottom of the device body is provided with casters, and the surface of the device body is provided with a connecting groove, which is connected to a connector via a connecting shaft. The connector has opening and closing doors on both sides. An inlet pipe is provided at the upper end of one side of the device body, and an outlet pipe is provided at the lower end of the other side. A dispensing cylinder is provided at the top of the device body, and a connecting pipe is provided at the bottom of the dispensing cylinder. This polishing slurry supply device includes a dispensing cylinder for storing the raw materials of the polishing slurry for convenient later use. Through the coordinated use of the concentration detection device, control panel, and dispensing cylinder, ingredients can be added to the internal components as needed to change the concentration of the polishing slurry. Simultaneously, the internal polishing slurry is stirred by the stirring fan and stirring shaft to ensure uniform mixing of the polishing slurry and raw materials.
[0005] However, this type of polishing slurry supply device still has some shortcomings in actual use. For example, it is impossible to know the amount of polishing slurry stored in a timely and accurate manner. If the polishing slurry is insufficient and is not detected in time, it will lead to poor polishing effect, or even affect the normal operation of the processing equipment, reduce production efficiency and increase production costs. Utility Model Content
[0006] The purpose of this invention is to provide a polishing liquid supply device to solve the problems mentioned in the background art.
[0007] To achieve the above objectives, the present invention provides the following technical solution: a polishing liquid supply device, comprising a liquid supply component, wherein a polishing component is provided at the top of the liquid supply component;
[0008] The liquid supply assembly includes a polishing liquid storage box with a storage chamber inside. A flow tube is fixedly installed on the bottom side of one side of the polishing liquid storage box, and a display box is fixedly installed at one end of the flow tube. A vertical shaft is fixedly installed between the top and bottom surfaces of the display box. A float plate is slidably sleeved on the shaft of the vertical shaft. A pressure head is fixedly installed in the middle of the bottom surface of the float plate. A first magnetic plate is fixedly installed on one side of the bottom surface of the float plate. A switch is fixedly installed in the middle of the bottom surface of the display box. A second magnetic plate is fixedly installed on one side of the bottom surface of the display box. The first magnetic plate is located directly above the second magnetic plate. The pressure head is located directly above the switch. The first and second magnetic plates are arranged opposite poles and attract each other. A buzzer is fixedly installed on the front of the display box.
[0009] Preferably, the polishing assembly includes a base, a control panel is provided on one side of the front of the base, polishing stations are provided on both sides of the top surface of the base, and the base is placed on the top surface of the polishing liquid storage box.
[0010] Preferably, a polishing machine is provided in the middle of the back of the base, and a polishing head is provided at the front end of the bottom of the polishing machine.
[0011] Preferably, an observation window is provided in the middle of one side of the display box, and a scale is provided on the side of the display box and on the side of the observation window.
[0012] Preferably, a drain port and a fill port are respectively provided at the bottom and top of the front end of one side of the liquid storage chamber, and curved pipes are fixedly installed on both sides of the back of the polishing liquid storage box.
[0013] Preferably, one end of each of the two bends is connected to the inside of the liquid storage chamber, one end of each of the two bends is provided with a drive pump, and the other end of each of the two bends is fixedly installed with a nozzle.
[0014] Compared with the prior art, the beneficial effects of this utility model are:
[0015] This polishing slurry supply device, equipped with a float plate, a first magnetic plate, a second magnetic plate, a pressure head, a switch, and a buzzer, can monitor the level of polishing slurry in real time. When the level of polishing slurry is insufficient, the buzzer will sound an alarm to remind the staff to add polishing slurry, thus avoiding the impact of insufficient polishing slurry on the polishing operation and ensuring polishing quality and production efficiency. Attached Figure Description
[0016] Figure 1 This is a schematic diagram of the overall structure of this utility model;
[0017] Figure 2 This is a schematic diagram of the liquid supply component structure of this utility model;
[0018] Figure 3This is a schematic diagram of the internal structure of the display box of this utility model;
[0019] Figure 4 This is a schematic diagram of the polishing component structure of this utility model.
[0020] In the diagram: 1. Liquid supply assembly; 101. Polishing liquid storage box; 102. Liquid storage chamber; 103. Drain port; 104. Fill port; 105. Bend; 106. Drive pump; 107. Nozzle; 108. Display box; 109. Observation window; 110. Scale; 111. Vertical axis; 112. Float plate; 113. Pressure head; 114. Switch; 115. Magnetic plate No. 1; 116. Magnetic plate No. 2; 117. Flow tube; 118. Buzzer; 2. Polishing assembly; 201. Base; 202. Control panel; 203. Polishing station; 204. Polishing machine; 205. Polishing head. Detailed Implementation
[0021] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.
[0022] like Figure 1-4As shown, this utility model provides a technical solution: the liquid supply assembly 1 includes a polishing liquid storage box 101, and a liquid storage chamber 102 is provided inside the polishing liquid storage box 101 for storing polishing liquid. A flow tube 117 is fixedly installed on the bottom side of one side of the polishing liquid storage box 101, and a display box 108 is fixedly installed on one end of the flow tube 117. Polishing liquid can flow into the display box 108 through the flow tube 117. A vertical shaft 111 is fixedly installed between the top and bottom surfaces inside the display box 108. A float plate 112 is slidably sleeved on the shaft of the vertical shaft 111, and the float plate 112 can slide up and down along the vertical shaft 111. A pressure head 113 is fixedly installed at the center of the bottom surface of the float plate 112. A first magnetic plate 115 is fixedly installed on one side of the bottom surface of the float plate 112. A switch 114 is fixedly installed at the center of the bottom surface of the display box 108. A second magnetic plate 116 is fixedly installed on one side of the bottom surface of the display box 108. The first magnetic plate 115 is located directly above the second magnetic plate 116, and the pressure head 113 is located directly above the switch 114. The first magnetic plate 115 and the second magnetic plate 116 are arranged opposite poles and mutually attract each other. When the polishing fluid level drops to a certain level, the float plate 112 descends, and the first magnetic plate 115 and the second magnetic plate 116 are attracted together. At the same time, the pressure head 113 presses the switch 114. A buzzer 118 is fixedly installed on the front of the display box 108. When the switch 114 is pressed, the buzzer 118 sounds an alarm to remind the staff that the polishing fluid level is low.
[0023] The polishing assembly 2 includes a base 201, and a control panel 202 is provided on one side of the front of the base 201 for controlling the operating parameters of the polishing assembly 2. Polishing stations 203 are provided on both sides of the top surface of the base 201, which can polish multiple workpieces simultaneously. The base 201 is placed on the top surface of the polishing liquid storage box 101, so that the polishing assembly 2 is tightly connected to the liquid supply assembly 1.
[0024] A polishing machine 204 is provided in the middle of the back of the base 201. A polishing head 205 is provided at the front end of the bottom of the polishing machine 204. The polishing machine 204 drives the polishing head 205 to polish the workpiece.
[0025] A vertical observation window 109 is provided in the middle of one side of the display box 108. A scale 110 is provided on the side of the display box 108 and on the side of the vertical observation window 109. The staff can intuitively understand the level of polishing liquid in the display box 108 by observing the vertical observation window 109 and the scale 110, and thus know the amount of polishing liquid in the storage chamber 102.
[0026] The liquid storage chamber 102 has a drain port 103 and a fill port 104 at the bottom and top of one side, respectively, to facilitate the discharge and addition of polishing liquid. Two bent pipes 105 are fixedly installed on both sides of the back of the polishing liquid storage box 101. One end of each bent pipe 105 is connected to the inside of the liquid storage chamber 102. A drive pump 106 is installed at one end of each bent pipe 105, and a nozzle 107 is fixedly installed at the other end of each bent pipe 105. The drive pump 106 transports the polishing liquid in the liquid storage chamber 102 to the polishing station 203 through the bent pipes 105 and the nozzles 107.
[0027] Before using this polishing slurry supply device, add an appropriate amount of polishing slurry to the storage chamber 102 through the filling port 104. The polishing slurry flows into the display box 108 through the flow tube 117. As the polishing slurry flows in, the float 112 slides upward on the vertical axis 111. The operator can observe the level of polishing slurry in the display box 108 in real time through the vertical window 109 and the scale 110, thereby knowing the amount of polishing slurry stored in the storage chamber 102.
[0028] The workpiece to be polished is placed on the polishing station 203. The operating parameters of the polishing machine 204, such as polishing speed and pressure, are set via the control panel 202. The drive pump 106 is started, and the polishing liquid in the storage chamber 102 is evenly sprayed onto the workpiece surface on the polishing station 203 through the curved pipe 105 and nozzle 107 under the action of the drive pump 106. Simultaneously, the polishing machine 204 drives the polishing head 205 to perform the polishing operation on the workpiece.
[0029] As the polishing operation progresses, the polishing fluid in the storage chamber 102 gradually decreases. When the polishing fluid level drops to a certain point, the float 112 in the display box 108 descends, and the first magnetic plate 115 and the second magnetic plate 116 are attracted together. At the same time, the pressure head 113 presses the switch 114, and the buzzer 118 sounds an alarm, reminding the staff to add polishing fluid. The staff can replenish the polishing fluid in a timely manner through the filling port 104 to ensure the continuous operation of the polishing operation.
[0030] When it is necessary to clean or replace the polishing fluid in the polishing fluid storage box 101, the polishing fluid in the storage chamber 102 can be discharged through the drain port 103, which facilitates equipment maintenance and upkeep.
[0031] Although embodiments of the present invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the present invention, the scope of which is defined by the appended claims and their equivalents.
Claims
1. A polishing slurry supply device, comprising a slurry supply assembly (1), characterized in that... A polishing component (2) is provided at the top of the liquid supply component (1); The liquid supply assembly (1) includes a polishing liquid storage box (101), which has a liquid storage chamber (102) inside. A flow tube (117) is fixedly installed on the bottom side of one side of the polishing liquid storage box (101), and a display box (108) is fixedly installed on one end of the flow tube (117). A vertical shaft (111) is fixedly installed between the top and bottom surfaces of the display box (108), and a float plate (112) is slidably sleeved on the shaft of the vertical shaft (111). A pressure head (113) is fixedly installed in the middle of the bottom surface of the float plate (112). A first magnetic plate (115) is fixedly installed on one side of the bottom surface of the float plate (112). A switch (114) is fixedly installed in the middle of the bottom surface of the display box (108). A second magnetic plate (116) is fixedly installed on one side of the bottom surface of the display box (108). The first magnetic plate (115) is located directly above the second magnetic plate (116). The pressure head (113) is located directly above the switch (114). The first magnetic plate (115) and the second magnetic plate (116) are arranged opposite poles and attract each other. A buzzer (118) is fixedly installed on the front of the display box (108).
2. The polishing slurry supply device according to claim 1, characterized in that, The polishing assembly (2) includes a base (201), a control panel (202) is provided on one side of the front of the base (201), and polishing stations (203) are provided on both sides of the top surface of the base (201). The base (201) is located on the top surface of the polishing liquid storage box (101).
3. The polishing slurry supply device according to claim 2, characterized in that, A polishing machine (204) is provided in the middle of the back of the base (201), and a polishing head (205) is provided at the front end of the bottom of the polishing machine (204).
4. The polishing slurry supply device according to claim 1, characterized in that, The display box (108) has an observation window (109) in the middle of one side, and a scale (110) is provided on the side of the display box (108) and on one side of the observation window (109).
5. The polishing slurry supply device according to claim 1, characterized in that, The liquid storage chamber (102) has a drain port (103) at the bottom and a filling port (104) at the top of one side of the front end, and the polishing liquid storage box (101) has bent pipes (105) fixedly installed on both sides of the back.
6. The polishing slurry supply device according to claim 5, characterized in that, One end of each of the two bends (105) is connected to the inside of the liquid storage chamber (102). A drive pump (106) is provided at one end of each of the two bends (105), and a nozzle (107) is fixedly installed at the other end of each of the two bends (105).
Citation Information
Patent Citations
Polishing solution supply device
CN219582582U