An auxiliary device for deep trench etching

Abstract

The utility model provides a kind of auxiliary device for deep trench etching, it is related to chip processing field.Processing equipment main body is embedded in the top of shell, and suction equipment is embedded in the outer wall side of shell, and the front end of seal door is movably connected with the front end of seal door, and the front end of seal door is embedded with control end, the inside one side of shell is provided with limiting mechanism;The limiting mechanism includes support platform, the inside of shell is penetrated by the support platform, and the top of support platform is provided with setting groove, and the inside of setting groove is provided with partition groove.The utility model cooperates through support platform, setting groove, partition groove, suction hole, suction pipe and sleeve, can be fixed to chip by the condition of negative pressure formed by suction, avoid from the chip upper limit, influence the comprehensiveness of etching, and a plurality of partition grooves can be set to process a large number of chips simultaneously, improve the output of product, and sleeve is convenient for the disassembly and maintenance of support platform.

Description

Technical Field

[0001] This utility model relates to the field of chip processing, specifically an auxiliary device for deep trench etching. Background Technology

[0002] Deep trench etching* is a key etching process in semiconductor manufacturing. It is mainly used to etch trench structures with a depth much greater than the width (usually with a depth-to-width ratio greater than 3:1, and even more than 10:1) inside or on the surface of a chip to achieve electrical isolation, structural support, or special device functions. Plasma etching technology (such as reactive ion etching (RIE) and inductively coupled plasma etching (ICP)) is used to directionally etch materials (such as silicon, silicon oxide, silicon nitride, etc.) on the wafer surface using high-energy ion beams or active chemical gases.

[0003] A patent with publication number CN217334027U discloses a GPP chip trench etching mechanism. Specifically, the patent discloses a technical solution where "a GPP chip is placed on top of a multi-functional positioning mechanism. The rectangular and circular positioning grooves on the multi-functional positioning mechanism can position and limit GPP chips of different specifications and types. A stainless steel limiting mesh is rotatably connected to the top of the multi-functional positioning mechanism. Locking mechanisms corresponding to the stainless steel limiting mesh are provided on both sides of the front end of the top of the multi-functional positioning mechanism. These locking mechanisms are used for locking and limiting the stainless steel limiting mesh between the multi-functional positioning mechanism and the multi-functional positioning mechanism." This achieves the technical effect that "this utility model, through the design of a simple multi-functional positioning mechanism, can complete the positioning and limiting of GPP chips of different specifications and types, while not affecting the full contact between the etching solution and the GPP chip."

[0004] In existing technologies, chips can be limited by components such as stainless steel limiting mesh. However, in practice, due to the obstruction of the stainless steel limiting mesh, the outer wall of the chip may not be fully etched during the etching process, resulting in incomplete or defective surface treatment and affecting the chip yield. Utility Model Content

[0005] The purpose of this utility model is to provide an auxiliary device for deep trench etching, so as to solve the problems mentioned in the background art and overcome its technical defects.

[0006] To solve the above-mentioned technical problems, the technical solution adopted by this utility model is as follows: it includes an outer shell, the top of which is fitted with the main body of the processing equipment, and an air extraction device is fitted on one side of the outer wall of the outer shell. A sealing door is movably connected to the front end of the outer shell, and a control terminal is fitted on the front end of the sealing door. A limit mechanism is provided on one side of the inner side of the outer shell.

[0007] The limiting mechanism includes a support platform that extends into the interior of the outer shell. The top of the support platform has a placement groove, and the interior of the placement groove has a partition groove. The bottom of the partition groove has an air extraction hole. An air extraction pipe extends out from one side of the outer wall of the support platform, and an insertion pipe is fixedly installed at one end of the air extraction pipe.

[0008] As a further embodiment of this utility model: the outer wall of the insertion tube is fitted with a delivery tube, and the outer wall of the delivery tube is rotatably connected with a sleeve.

[0009] As a further improvement of this utility model: the sleeve is threadedly connected to the delivery pipe, and the sleeve is also threadedly connected to the extraction pipe.

[0010] As a further improvement of this utility model: a fixing plate is fixedly installed on one side of the support platform inside the outer shell, and a locking groove is opened on the inner wall of the fixing plate corresponding to the external placement of the air extraction pipe.

[0011] As a further embodiment of this utility model: an abutting mechanism is provided on the other side of the interior of the outer shell. The abutting mechanism includes a fixed shell, which is fixedly installed on the other side of the interior of the outer shell, and a through groove is provided on the outer wall of the fixed shell.

[0012] As a further improvement of this utility model: a through-hole block extends out of the inside of the through-hole, and a locking block is fixedly installed at one end of the through-hole block.

[0013] As a further improvement of this utility model: the locking block is fixedly installed at one end of the fixed shell with a limiting block, and the outer wall of the limiting block is fitted with a spring.

[0014] As a further improvement of this utility model: the limiting block and the through block are perpendicular to each other, and the limiting block and the fixed shell form a sliding structure.

[0015] Compared with the prior art, the beneficial effects of this utility model include:

[0016] 1. This utility model, through the cooperation of a support platform, a mounting groove, a partition groove, an air extraction hole, an air extraction pipe, and a sleeve, can fix the chip by creating a negative pressure through air extraction, avoiding limiting the chip from above and affecting the overall etching. Furthermore, by setting several partition grooves, a large number of chips can be processed at the same time, increasing product output. The sleeve facilitates the disassembly and maintenance of the support platform.

[0017] 2. This utility model, through the cooperation of a fixed shell, a through block, a locking block, a limiting block and a spring, can elastically push the support platform against the fixed plate, preventing the support platform from becoming loose, and can limit and bear the support platform. It is also located in the middle of the shell, which is convenient for deep groove etching operations. Attached Figure Description

[0018] The disclosure of this utility model is illustrated with reference to the accompanying drawings. It should be understood that the drawings are for illustrative purposes only and are not intended to limit the scope of protection of this utility model. In the drawings, the same reference numerals are used to refer to the same parts. Wherein:

[0019] Figure 1 The schematic diagram shows an overall structural schematic diagram according to one embodiment of the present invention;

[0020] Figure 2 The schematic diagram shows a schematic representation of the internal structure of the outer casing according to one embodiment of the present invention;

[0021] Figure 3 The schematic diagram shows a vent structure according to one embodiment of the present invention.

[0022] Figure 4 The schematic diagram shows a limiting block structure according to one embodiment of the present invention.

[0023] The following are the labeling elements in the diagram: 1. Outer shell; 2. Main body of the processing equipment; 3. Air extraction device; 4. Sealing door; 5. Control terminal; 6. Limiting mechanism; 601. Support platform; 602. Placement slot; 603. Separation slot; 604. Air extraction hole; 605. Air extraction pipe; 606. Insertion pipe; 607. Sleeve; 608. Conveying pipe; 7. Fixing plate; 8. Engaging slot; 9. Abutment mechanism; 901. Fixing shell; 902. Through slot; 903. Through block; 904. Engaging block; 905. Limiting block; 906. Spring. Detailed Implementation

[0024] It is readily understood that, based on the technical solution of this utility model, those skilled in the art can propose various interchangeable structural methods and implementations without altering the essential spirit of this utility model. Therefore, the following detailed embodiments and accompanying drawings are merely illustrative descriptions of the technical solution of this utility model and should not be considered as the entirety of this utility model or as limitations or restrictions on the technical solution of this utility model.

[0025] An embodiment of the present invention is shown in conjunction with the accompanying drawings.

[0026] Please see Figures 1 to 3An auxiliary device for deep trench etching includes a housing 1, a processing equipment body 2 embedded at the top of the housing 1, an air extraction device 3 embedded on one side of the outer wall of the housing 1, a sealing door 4 movably connected to the front end of the housing 1, a control terminal 5 embedded at the front end of the sealing door 4, and a limit mechanism 6 provided on one side of the interior of the housing 1. The limit mechanism 6 includes a support platform 601, which extends into the interior of the housing 1. A placement groove 602 is formed at the top of the support platform 601, and a partition groove 603 is formed inside the placement groove 602. An air extraction hole 604 is provided at the bottom of the part. An air extraction pipe 605 extends out from one side of the outer wall of the support platform 601. An insertion pipe 606 is fixedly installed at one end of the air extraction pipe 605. A delivery pipe 608 is sleeved on the outer wall of the insertion pipe 606. A sleeve 607 is rotatably connected to the outer wall of the delivery pipe 608. The sleeve 607 is threadedly connected to the delivery pipe 608 and the air extraction pipe 605. A fixing plate 7 is fixedly installed on one side of the support platform 601 inside the outer shell 1. A locking groove 8 is provided on the inner wall of the fixing plate 7 corresponding to the outer side of the air extraction pipe 605.

[0027] By adopting the above technical solution, firstly, several partition grooves 603 are opened in the placement groove 602 of the support stage 601 to facilitate the simultaneous placement of multiple chips. Then, the insertion tube 606 is inserted into the delivery tube 608, so that the suction tube 605 and the delivery tube 608 fit tightly together, and are connected by threads with the sleeve 607, so that the support stage 601 can communicate with the suction device 3. The vacuum negative pressure is formed by suction through the suction hole 604, which fixes the chip and avoids the need for upper limit to fix it, which would prevent it from fully contacting the etching gas and affecting the fullness of the etching. With the cooperation of the fixing plate 7 and the locking groove 8, the support stage 601 and the insertion tube 606 are initially supported and limited.

[0028] Specifically, such as Figure 2 and Figure 4 As shown, an abutment mechanism 9 is provided on the other side of the interior of the outer shell 1. The abutment mechanism 9 includes a fixed shell 901, which is fixedly installed on the other side of the interior of the outer shell 1. A through groove 902 is provided on the outer wall of the fixed shell 901. A through block 903 extends out of the through groove 902. A locking block 904 is fixedly installed at one end of the through block 903. A limiting block 905 is fixedly installed at one end of the locking block 904 located on the fixed shell 901. A spring 906 is embedded in the outer wall of the limiting block 905. The limiting block 905 and the through block 903 are perpendicular to each other. A sliding structure is formed between the limiting block 905 and the fixed shell 901.

[0029] By adopting the above technical solution, under the fixation and support of the fixed shell 901, the spring 906 pushes the protruding block 903 through the through groove 902, protruding out of the fixed shell 901 and driving the locking block 904 to abut against one side of the support platform 601, achieving the effect of abutment and support. The limiting block 905 prevents the protruding block 903 from excessively protruding out and detaching from the fixed shell 901. After the sealing door 4 is closed, the support platform 601 can be limited and supported inside the outer shell 1 to carry out deep groove etching operations.

[0030] Working principle: The main body 2 of the processing equipment consists of essential etching components such as a gas treatment and waste gas collection system, a gas supply system, and a control terminal 5. Simultaneously, the extraction device 3 comprises a vacuum pump and other compatible components; this is existing technology and will not be elaborated further. An insertion pipe 606, fixed to the extraction pipe 605 at one end of the wafer carrier stage (also known as the support stage 601), enters the delivery pipe 608. A sleeve 607 is threadedly connected to both the extraction pipe 605 and the delivery pipe 608 for easy assembly and disassembly, and communicates with the extraction device 3. Several partition grooves 603 are formed within the mounting groove 602 of the support stage 601, and extraction holes 604 are provided. The vacuum device 3 can create negative pressure to fix the groove, thus avoiding the grooving surface being blocked and unable to be fully grooved. The fixed plate 7 and the locking groove 8 support and limit the support platform 601 and the vacuum pipe 605. The spring 906 embedded in the fixed shell 901 elastically pushes the limiting block 905, allowing the through block 903 to pass through the through groove 902. The locking block 904 abuts against and locks the support platform 601. At the same time, the sealing door 4 closes and abuts against the support platform 601, so that the support platform 601 is clamped and supported inside the shell 1, thus enabling the deep groove etching operation to be performed effectively.

[0031] The technical scope of this utility model is not limited to the content described above. Those skilled in the art can make various modifications and variations to the above embodiments without departing from the technical concept of this utility model, and all such modifications and variations should fall within the protection scope of this utility model.

Claims

1. An auxiliary device for deep trench etching, characterized in that, Includes a housing (1), the top of which is fitted with a processing device body (2), and a vacuum device (3) is fitted on one side of the outer wall of the housing (1). A sealing door (4) is movably connected to the front end of the housing (1), and a control terminal (5) is fitted on the front end of the sealing door (4). A limit mechanism (6) is provided on one side of the interior of the housing (1). The limiting mechanism (6) includes a support platform (601), which is inserted into the interior of the outer shell (1). The top of the support platform (601) is provided with a placement groove (602), and the interior of the placement groove (602) is provided with a partition groove (603). The bottom of the partition groove (603) is provided with an air extraction hole (604). An air extraction pipe (605) extends out from one side of the outer wall of the support platform (601), and an insertion pipe (606) is fixedly installed at one end of the air extraction pipe (605).

2. The auxiliary device for deep trench etching according to claim 1, characterized in that, The outer wall of the insertion tube (606) is fitted with a delivery tube (608), and the outer wall of the delivery tube (608) is rotatably connected with a sleeve (607).

3. The auxiliary device for deep trench etching according to claim 2, characterized in that, The sleeve (607) is threadedly connected to the delivery pipe (608), and the sleeve (607) is threadedly connected to the extraction pipe (605).

4. The auxiliary device for deep trench etching according to claim 1, characterized in that, A fixing plate (7) is fixedly installed on one side of the support platform (601) inside the outer shell (1), and a locking groove (8) is opened on the inner wall of the fixing plate (7) corresponding to the external opening of the air extraction pipe (605).

5. The auxiliary device for deep trench etching according to claim 1, characterized in that, An abutting mechanism (9) is provided on the other side inside the outer shell (1). The abutting mechanism (9) includes a fixed shell (901). The fixed shell (901) is fixedly installed on the other side inside the outer shell (1), and a through groove (902) is provided on the outer wall of the fixed shell (901).

6. The auxiliary device for deep trench etching according to claim 5, characterized in that, A through-hole block (903) extends through the inside of the through-hole (902), and a locking block (904) is fixedly installed at one end of the through-hole block (903).

7. The auxiliary device for deep trench etching according to claim 6, characterized in that, The locking block (904) is fixedly installed at one end of the fixed shell (901) with a limiting block (905), and a spring (906) is embedded in the outer wall of the limiting block (905).

8. The auxiliary device for deep trench etching according to claim 7, characterized in that, The limiting block (905) and the through block (903) are perpendicular to each other, and the limiting block (905) and the fixed shell (901) form a sliding structure.

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