A residual polish removal device

Abstract

The application discloses a residual polishing agent removing device and belongs to the technical field of plasma polishing. Mainly comprising a workbench; further comprising an immersion barrel, which is arranged on the workbench; further comprising cleaning liquid, which is arranged in the immersion barrel; further comprising a grabbing assembly, which is arranged above the immersion barrel; further comprising an air nozzle, which is used for blowing air to the workpiece; wherein: the grabbing assembly is provided with a clamping unit, which is used for clamping the workpiece, and the clamping unit is suitable for moving towards or away from the immersion barrel, the polishing liquid remaining on the surface of the workpiece can be removed through the arrangement of the immersion barrel, and the workpiece can be blown after being cleaned through the arrangement of the air nozzle, so that the residual polishing agent is further reduced.

Description

Technical Field

[0001] This application relates to the field of plasma polishing technology, specifically to a device for removing residual polishing agent. Background Technology

[0002] Plasma gas polishing (plasma polishing) is a process in which atomic nuclei that have lost electrons form positively charged ions in the presence of a polishing agent. When these ions reach a certain number, they can form a plasma state. The plasma state has high energy, and when these plasmas rub against the object to be polished, they can instantly make the object's surface shiny. Currently, due to its high precision, environmental friendliness, and high efficiency, it is mainly used in precision hardware, optical components, semiconductor devices, medical devices, aerospace parts, and consumer electronics.

[0003] Since plasma polishing requires the use of polishing compound, if the polishing compound remains on the workpiece surface for an extended period after removal, it may have adverse effects on the workpiece. A detailed analysis follows:

[0004] Surface activity decay: After plasma polishing, active groups or cross-linked layers may be introduced into the workpiece surface. These structures will gradually diffuse into the material or combine with other molecules over time, leading to a decrease in surface energy. If polishing agent residue is not removed in time, this process may be accelerated, reducing the surface modification effect of the workpiece (such as hydrophilicity, adhesion, etc.).

[0005] Contaminant adsorption: If the storage environment is not ideal (such as high air humidity, containing particulate matter or organic contaminants), the residual polishing agent may adsorb impurities, further reducing the surface energy and affecting subsequent processing or performance.

[0006] Chemical reaction risk: The components in the polishing compound may react slowly with the workpiece material, especially sensitive materials (such as soft metals, polymers or precision optical components), which may cause surface corrosion, discoloration or performance degradation;

[0007] Changes in physical structure: Polishing agents that remain for a long time may undergo physical changes such as drying, crystallization, or moisture absorption, leading to an increase in the surface roughness of the workpiece or the appearance of micro-defects, which affects the smoothness. Therefore, it is necessary to provide a device for removing residual polishing agents to solve the above problems.

[0008] It should be noted that the information disclosed in this background section is only for understanding the background technology of this application concept, and therefore may include information that does not constitute prior art. Utility Model Content

[0009] Based on the aforementioned problems in the prior art, the problem to be solved by this application is to provide a residual polishing agent removal device that can promptly remove the residual polishing agent on the surface of the workpiece after polishing.

[0010] The technical solution adopted by this application to solve its technical problem is: a residual polishing agent removal device, comprising:

[0011] Workbench;

[0012] An impregnation tank, which is set on a workbench;

[0013] Cleaning solution, which is placed inside the immersion tank;

[0014] A gripping component is positioned above the immersion tank;

[0015] An air nozzle, used to blow air onto a workpiece;

[0016] Wherein: the gripping component has a clamping unit for clamping the workpiece, the clamping unit being adapted to move toward or away from the immersion tank.

[0017] Furthermore, a support is provided on the workbench, and a crossbeam is provided on the top of the support. The gripping component is slidably mounted on the crossbeam and is adapted to move along the crossbeam.

[0018] Furthermore, the gripping component includes a mounting plate, on which a telescopic cylinder is provided. The telescopic cylinder has an output shaft, and the clamping unit is disposed on the output shaft.

[0019] Furthermore, the clamping unit includes a clamping cylinder, and a gripper is connected to the clamping cylinder.

[0020] Furthermore, the air nozzle is installed inside the immersion tank, and the air outlet of the air nozzle is higher than the liquid level of the cleaning solution.

[0021] Furthermore, a drying barrel is also provided on the workbench, and the air nozzle is located inside the drying barrel.

[0022] Furthermore, the drying barrel is equipped with an opening and closing component.

[0023] Furthermore, the drying barrel is equipped with absorbent material.

[0024] Furthermore, a heating source is provided inside the drying barrel.

[0025] The beneficial effects of this application are: the residual polishing agent removal device provided by this application can remove the polishing liquid remaining on the surface of the workpiece by setting an immersion tank, and can blow air on the workpiece after cleaning by setting an air nozzle, thereby further reducing the residue of polishing agent.

[0026] In addition to the purposes, features, and advantages described above, this application has other purposes, features, and advantages. A further detailed description of this application will be provided below with reference to the figures. Attached Figure Description

[0027] The accompanying drawings, which form part of this application, are used to provide a further understanding of this application. The illustrative embodiments and descriptions of this application are used to explain this application and do not constitute an undue limitation of this application. In the drawings:

[0028] Figure 1 This is an overall schematic diagram of a residual polishing agent removal device according to this application;

[0029] Figure 2 for Figure 1 A schematic diagram of a partial structure in region A;

[0030] Figure 3 for Figure 1 A schematic diagram of the local structure of region B in the diagram;

[0031] Figure 4 This is a schematic diagram of the structure of Example 2;

[0032] The following are the labeling elements in the figure:

[0033] 1. Workbench; 11. Support frame; 12. Crossbeam; 13. Impregnation tank; 14. Air nozzle; 15. Drying tank;

[0034] 2. Gripping assembly; 21. First slide rail; 22. First slider; 23. Mounting plate; 24. Second slide rail; 25. Second slider; 26. Telescopic cylinder; 27. Output shaft; 28. Movable plate; 29. ​​Clamping cylinder; 210. Gripper. Detailed Implementation

[0035] It should be noted that, unless otherwise specified, the embodiments and features described in this application can be combined with each other. This application will now be described in detail with reference to the accompanying drawings and embodiments.

[0036] To enable those skilled in the art to better understand the present application, the technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present application, and not all embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative effort should fall within the scope of protection of the present application.

[0037] Example 1: As Figures 1-3As shown, this application provides a residual polishing agent removal device, including a workbench 1, a support 11 fixedly mounted on the workbench 1, a crossbeam 12 mounted on the top of the support 11, and a gripping component 2 slidably mounted on the crossbeam 12. The gripping component 2 is used to directly grip the product that needs to have the polishing agent removed or a clamp, container, etc. used to grip the product.

[0038] An immersion tank 13 is provided on the workbench 1. The immersion tank 13 contains a cleaning solution, which can be water or a solution that can neutralize (plasma polishing agents are usually chemical mixtures, including oxidants, reducing agents, acidic substances, etc.) polishing agents.

[0039] The polishing agent removal device designed in this application is generally set on the ground or operating table near the plasma polishing equipment. After the workpiece in the plasma polishing equipment is polished, it can be taken out by the operator (usually the workpiece is held by a clamp, or sometimes it is a separate workpiece) and handed to the gripping component 2 for gripping. Then the gripping component 2 places the clamp or workpiece with the workpiece into the immersion tank 13 for immersion. After immersion for a certain period of time, the gripping component 2 takes it out of the immersion tank 13. During this process, the cleaning liquid in the immersion tank 13 can clean or neutralize the polishing agent on the surface of the workpiece, so as to reduce the impact of polishing agent residue on the surface of the workpiece on the polishing quality of the workpiece.

[0040] The gripping component 2 includes a mounting plate 23, which is connected to the crossbeam 12 via a first slide rail 21 and a first slider 22. The mounting plate 23 can slide (i.e., move laterally) along the direction of the crossbeam 12. The sliding method is not limited here. The mounting plate 23 can be manually pushed by the staff, or additional driving components can be set on the crossbeam 12 to drive the mounting plate 23 to move.

[0041] A telescopic cylinder 26 is fixedly installed on the mounting plate 23. The telescopic cylinder 26 has an output shaft 27, and the extension direction of the output shaft 27 is towards the immersion tank 13. A movable plate 28 is connected to the end of the output shaft 27. The movable plate 28 is connected to the mounting plate 23 through the second slide rail 24 and the second slider 25. The movable plate 28 can move along the direction of the second slide rail 24 (i.e., move vertically) under the drive of the output shaft 27. A clamping unit is fixedly installed on the side of the movable plate 28 facing the immersion tank 13. The clamping unit is used to clamp the workpiece to be cleaned or the fixture with the workpiece.

[0042] In this embodiment, the clamping unit consists of a clamping cylinder 29 and a gripper 210. The gripper 210 can open or close under the drive of the clamping cylinder 29 to perform clamping. In other embodiments, the clamping unit can be in the form of an electromagnet, a spring claw, a buckle, etc.

[0043] The presence of the above components allows for the cleaning of workpieces that have just been taken out of the plasma polishing equipment, thereby removing or reducing the amount of polishing agent remaining on the workpiece surface. However, cleaning fluid may still remain on the workpiece surface, and a small amount of polishing agent may also remain in the cleaning fluid. Therefore, an air nozzle 14 can be installed inside the immersion tank 13. The number of air nozzles 14 is not limited; there can be only one or multiple nozzles around the immersion tank 13. It is necessary to ensure that the air outlet of the air nozzle 14 is higher than the liquid level in the immersion tank 13.

[0044] After the workpiece is cleaned in the immersion tank 13, the air nozzle 14 can be activated to release air. Then, the workpiece is lifted out of the cleaning solution by the telescopic cylinder 26. During this process, the air nozzle 14 is always in the air-releasing state. After the workpiece is exposed above the surface of the cleaning solution, the gas can directly act on the surface of the workpiece, thereby blowing off the residual cleaning solution on the surface of the workpiece, thus further reducing the residue on the surface of the workpiece. At this time, due to the limited shape of the workpiece or fixture, some areas cannot be blown by the wind. After soaking in the cleaning solution, most of the polishing agent can also be removed.

[0045] Example 2: The arrangement of the air nozzle 14 and the immersion tank 13 in Example 1 can effectively remove the polishing agent remaining on the surface of the workpiece. However, since the air nozzle 14 is located at the immersion tank 13, if the air outlet angle of the air nozzle 14 is set incorrectly, or if the gripping component 2 accidentally touches the air nozzle 14 while moving, causing its air outlet direction to be towards the cleaning liquid, the high-speed airflow in the air nozzle 14 will blow the cleaning liquid everywhere, seriously interfering with normal operation.

[0046] In this embodiment, as Figure 4 As shown, the air nozzle 14 can be set separately from the immersion tank 13. The air nozzle 14 is set on the outside of the immersion tank 13. When removing the polishing agent, the gripping component 2 first puts the workpiece or the fixture with the workpiece into the cleaning solution in the immersion tank 13 for soaking, and then removes it and moves it to the air nozzle 14, where the air nozzle 14 blows off the cleaning solution remaining on its surface.

[0047] Even better, a drying barrel 15 can be set on the outside of the air nozzle 14, which covers all the air nozzles 14. After the workpiece is soaked, the gripping component 2 moves the workpiece into the drying barrel 15, and then the air nozzle 14 is turned on, so that the residual cleaning liquid can be blown off without the cleaning liquid flying around in a large area.

[0048] In the above solution, when the air nozzle 14 blows air onto the workpiece, the cleaning liquid on its surface will also be atomized and reduced. Although the amount is not large, long-term operation will cause the cleaning liquid to atomize too much. In addition, since the polishing agent contains certain chemical components, there is a certain risk of workers inhaling the atomized cleaning liquid. Therefore, an opening and closing component (not shown in the figure) can be set for the drying barrel 15. The opening and closing component is hinged to the opening of the drying barrel 15 and has a notch that can accommodate the gripping component 2 and the workpiece. It can be opened when the air nozzle 14 needs to blow air and closed after the gripping component 2 enters the drying barrel 15. In this way, when the air nozzle 14 blows air, the atomized liquid can be controlled inside the drying barrel 15 as much as possible and its evaporation in the air can be reduced.

[0049] Meanwhile, materials that easily absorb water, such as sponges and activated carbon, can be placed on the inner wall of the drying barrel 15. After the cleaning liquid is blown off by the air nozzle 14, the liquid will first be blown by the gas onto the inner wall of the drying barrel 15, i.e., onto these water-absorbing materials. The water-absorbing materials can absorb these mists to reduce their evaporation. A heating source can also be placed between the drying barrel 15 and the water-absorbing materials. When not in use, these heating sources can be turned on to evaporate the moisture in the water-absorbing materials for subsequent use of the entire equipment.

[0050] The above description is merely a preferred embodiment of this application and is not intended to limit this application. Various modifications and variations can be made to this application by those skilled in the art. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of this application should be included within the protection scope of this application.

Claims

1. A residual polishing agent removing device for removing a polishing agent remaining on a workpiece surface, characterized by: The residual polishing agent removal device includes: Workbench (1); An impregnation tank (13) is set on a workbench (1); Cleaning solution, which is placed in the immersion tank (13); A gripping component (2) is positioned above the immersion tank (13); Air nozzle (14), which is used to blow air onto the workpiece; Among them: the workbench (1) is also provided with a drying barrel (15), and the air nozzle (14) is located inside the drying barrel (15); The air-drying barrel (15) is equipped with an opening and closing component; The gripping assembly (2) has a clamping unit for clamping the workpiece, the clamping unit being adapted to move toward or away from the immersion tub (13).

2. A residual polishing agent removal device according to claim 1, characterized in that: The workbench (1) is also provided with a support (11), and a crossbeam (12) is provided on the top of the support (11). The gripping component (2) is slidably disposed on the crossbeam (12) and is adapted to move along the crossbeam (12).

3. The residual polishing agent removal device of claim 1, wherein: The gripping component (2) includes a mounting plate (23), on which a telescopic cylinder (26) is provided. The telescopic cylinder (26) has an output shaft (27), and the clamping unit is disposed on the output shaft (27).

4. The residual polishing agent removal device according to claim 1, characterized by: The clamping unit includes a clamping cylinder (29), and a clamping claw (210) is connected to the clamping cylinder (29).

5. The residual polishing agent removal device of claim 1, wherein: The air nozzle (14) is installed inside the immersion tank (13), and the air outlet of the air nozzle (14) is higher than the liquid level of the cleaning liquid.

6. The residual polishing agent removal device of claim 1, wherein: A heating source is provided inside the air-drying barrel (15).

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