Double-station alternate etching work cabin

Abstract

The utility model relates to etching work cabin technical field, concretely relates to a double -position alternate etching work cabin, include: workstation, work cabin is installed on the workstation, is used for etching processing to work piece, bearing station mechanism is equipped between the workstation and work cabin, is used for the alternate conveying work piece, and bearing station mechanism includes: rotary platform, is installed on the workstation to and is configured with the first drive arrangement of driving its rotation, rotary column body, through the double -position alternate operation mode of reversion accomodation, has eliminated the production interruption of traditional equipment when feeding and discharging completely, has realized continuous efficient production, and its unique accomodation structure has improved space utilization greatly and avoided the motion interference, in the rotary switching process, the compact cylinder that work position airtight accomodation formed can effectively prevent most corrosive medium from escaping, has improved operation security, equipment protection ability and environmental friendliness significantly.

Description

Technical Field

[0001] This utility model relates to the field of etching chamber technology, specifically a dual-station alternating etching chamber. Background Technology

[0002] Medal processing involves multiple steps, including design, cutting, and polishing. First, the metal blank is shaped, then polished to enhance its surface luster. Next, the intricate details of the patterns and text are rendered—a crucial step often relying on etching. Etching, using chemical or physical methods, can precisely "carve" the metal surface, reproducing complex textures and logos on the medal. It combines delicacy and efficiency, far surpassing traditional hand carving, making it one of the core technologies for high-end medal processing. The efficient operation of the etching process depends on the core equipment: the etching chamber. Equipped with precise temperature control, solution circulation, and positioning systems, the chamber allows for adjustment of etching parameters based on the medal material (such as copper, silver, or alloys), ensuring a stable and controllable etching process. This avoids excessive metal corrosion while accurately replicating design details, providing a solid guarantee for the medal's quality and aesthetics.

[0003] The etching chamber is an important component of medal etching equipment, but it still has certain problems: 1) Traditional single-station equipment must stop etching operations when loading and unloading materials, resulting in a bottleneck in production efficiency; 2) Traditional translational or swing-type station switching methods require a large movement space and are prone to interference with other parts of the equipment; 3) When switching stations, the exposed support platform of the existing equipment is prone to carrying out etching liquid and acidic gases, which corrodes the mechanical equipment and endangers the health of operators; 4) Manual wiping and cleaning of the support platform is inefficient and poses safety hazards, and residual liquid will contaminate subsequent workpieces. Therefore, in view of the above situation, there is an urgent need to develop a dual-station alternating etching chamber to overcome the shortcomings in current practical applications and meet current needs. Utility Model Content

[0004] The purpose of this invention is to provide a dual-station alternating etching chamber to solve the problems mentioned in the background art.

[0005] To achieve the above objectives, this utility model provides the following technical solution: a dual-station alternating etching chamber, comprising:

[0006] Workbench;

[0007] The work chamber, installed on the worktable, is used for etching workpieces;

[0008] The workstation mechanism, located between the worktable and the work chamber, is used for alternating transport of workpieces;

[0009] The supporting workstation mechanism includes:

[0010] A rotary platform is mounted on a workbench and equipped with a first drive device to drive its rotation.

[0011] A rotating column is fixedly mounted on a rotating platform;

[0012] Two load-bearing components are rotatably disposed on opposite sides of the rotating column, each load-bearing component comprising:

[0013] A flip-up component, one end of which is hinged to a rotating cylinder;

[0014] The support platform is used to support the workpiece. A linear sliding mechanism is installed on the lower surface of the platform, which is then mounted on the flipping component.

[0015] The second drive unit is installed inside the tilting component and is used to drive the support platform to reciprocate along the linear sliding mechanism.

[0016] The flipping drive mechanism, located inside the rotating cylinder, is used to drive the two flipping parts to rotate synchronously, so that the flipping parts have an unfolded state and a retracted state.

[0017] Specifically, the rotating platform drives the rotating column and the load-bearing components on both sides to switch positions 180 degrees. The flipping drive mechanism controls the unfolding and retraction of the flipped parts. Combined with the second drive device, the load-bearing platform is moved out or retracted smoothly along the linear sliding mechanism. This realizes continuous alternation between etching processing and loading / unloading operations, which significantly improves production efficiency. At the same time, the retracted state of the flipped parts makes the overall structure compact, effectively reducing the spillage of corrosive gases and liquids, improving the working environment and saving equipment space.

[0018] Preferably, the flipping drive mechanism includes:

[0019] A double-sided rack is slidably mounted in the rotating cylinder along the vertical direction;

[0020] A drive cylinder is used to drive a double-sided rack to move up and down.

[0021] Two gears are fixedly installed at the hinge ends of the two flipping parts and mesh with the corresponding sides of the double-sided rack;

[0022] The side wall of the rotating cylinder has a through groove corresponding to the position of the gear, so that the gear can mesh and drive with the double-sided rack.

[0023] Specifically, by controlling the vertical linear motion of a single double-sided rack through a drive cylinder, the gears on both sides can be synchronously driven to rotate via a through slot, thereby accurately and reliably realizing the unfolding and retraction of the two flipping parts. This method has high transmission efficiency and good motion synchronization, simplifies control, ensures the consistency of the posture of the two workstations, and enhances the stability and reliability of equipment operation.

[0024] Preferably, receiving grooves are provided on opposite sides of the rotating cylinder;

[0025] A first magnetic attraction element is provided in the receiving groove, and a second magnetic attraction element is correspondingly provided on the flipping element.

[0026] Specifically, by setting a first magnetic suction component in the receiving groove of the rotating column and a corresponding second magnetic suction component on the flipping component, the flipping component can be magnetically attracted and tightly fixed to the rotating column when it rotates to the storage state. This effectively prevents the flipping component from accidentally opening when the rotating platform drives the rotating column to rotate at high speed to switch work positions, greatly improving the stability and safety of the equipment operation, while simplifying the mechanical locking structure.

[0027] Preferably, the first magnetic attractor and the second magnetic attractor are permanent magnets or electromagnets.

[0028] Preferably, the inner top of the flipper is equipped with several jet nozzles for spraying gas onto the retracted support surface.

[0029] Specifically, by installing several air jets on the top of the flip-over component, high-pressure gas can be automatically sprayed onto its surface immediately after the etching operation is completed and the platform retracts. This effectively blows away any residual etching liquid, preventing corrosive liquid from being carried to the loading and unloading stations and causing pollution or corrosion to the equipment. This achieves non-contact automatic cleaning of the platform, ensuring the quality of medal processing, while reducing the need for manual maintenance and improving the automation level and operational reliability of the equipment.

[0030] Preferably, the linear sliding mechanism includes a slide rail and a slider that cooperates with the slide rail, the slider is installed inside the flipping component, and the slide rail is installed at the bottom of the support platform;

[0031] The second drive device includes a second motor and a lead screw driven by the second motor, and a threaded pair that mates with the lead screw is fixedly provided at the bottom of the support platform.

[0032] Specifically, the high-precision linear sliding mechanism composed of slide rails and sliders, in conjunction with the second drive device composed of a second motor, lead screw and threaded pair, provides the bearing platform with smooth, accurate and reliable linear reciprocating motion, effectively ensuring the positioning accuracy and repeatability of the medal fixture between the processing position and the loading and unloading position. At the same time, the lead screw drive has a self-locking characteristic, which can reliably stop at any position, enhancing the overall stability and automation of the equipment operation.

[0033] Preferably, the support platform is provided with a fixture for fixing the workpiece.

[0034] Preferably, the first drive device is a first motor installed at the bottom of the rotary platform.

[0035] Preferably, the work compartment corresponds to a workstation. When the supporting component on one side is in the unfolded state and its supporting platform is extended, the workstation is located inside the work compartment and is a processing workstation; when the supporting component on the other side is in the unfolded state and its supporting platform is extended, the workstation is located outside the work compartment and is a loading and unloading workstation.

[0036] Specifically, by setting up the work chamber to correspond to a single workstation, and coordinating the unfolding of the support components and the extension of the support platform, the enclosed processing workstation inside the work chamber and the open loading and unloading workstation outside the work chamber are clearly separated. This completely isolates the etching process from the manual loading and unloading operations in space, ensuring a continuous and uninterrupted alternating production rhythm, greatly improving equipment utilization and production efficiency, and effectively preventing the etching solution and corrosive gases from affecting the external operating environment and personnel, thus achieving a high degree of unity between safety and efficiency.

[0037] Preferably, the rotating cylinder, the rotating platform, and the two flip-over components in the storage state together constitute a complete cylindrical structure.

[0038] Specifically, by making the rotating cylinder, the slewing platform, and the two retractable tilting components together form a complete cylindrical structure, the dynamic characteristics of the equipment during the workstation switching rotation process are greatly optimized. Its smooth cylindrical shape effectively reduces air resistance during rotation and avoids the risk of interference with the internal structure of the work chamber. At the same time, this compact enclosed structure can prevent corrosive gases and liquids from escaping during rotation to the greatest extent, protecting the internal transmission components and improving the overall stability and environmental friendliness of the equipment.

[0039] Compared with the prior art, this utility model provides a dual-station alternating etching chamber, which has the following beneficial effects:

[0040] The dual-station alternating operation mode with flip-out storage completely eliminates production interruptions during loading and unloading, achieving continuous and efficient production. Its unique storage structure greatly improves space utilization and avoids motion interference. During rotational switching, the compact cylinder formed by the sealed storage of the workstations effectively prevents most corrosive media from escaping, significantly improving operational safety, equipment protection, and environmental friendliness. Furthermore, the integrated automatic jet cleaning and high-precision positioning functions work together to efficiently remove residual etching solution, ensuring product processing quality and production continuity, thereby comprehensively improving the reliability, automation level, and final product processing quality of the equipment. Attached Figure Description

[0041] To more clearly illustrate the technical solutions in the embodiments of this utility model, the drawings used in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this utility model. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0042] Figure 1 This is a schematic diagram of the front structure of this utility model;

[0043] Figure 2 This is a side longitudinal sectional view of the entire utility model;

[0044] Figure 3 This is a schematic diagram of the bearing station mechanism of this utility model;

[0045] Figure 4 This is an exploded view of the bearing station mechanism of this utility model;

[0046] Figure 5 This is an exploded view of the rotating cylinder of this utility model;

[0047] Figure 6 This is a schematic diagram of the storage state of the load-bearing component of this utility model.

[0048] In the diagram: 10, workbench; 20, work chamber; 30, bearing station mechanism; 310, rotary platform; 311, first drive device; 3111, first motor; 320, rotating cylinder; 321, through slot; 322, receiving slot; 323, first magnetic suction component; 330, bearing assembly; 331, flipping component; 332, bearing platform; 333, linear sliding mechanism; 3331, slide rail; 3332, slider; 334, second drive device; 3341, second motor; 3342, lead screw; 335, second magnetic suction component; 336, air nozzle; 337, threaded pair; 338, fixture; 340, flipping drive mechanism; 341, double-sided rack; 342, drive cylinder; 343, gear. Detailed Implementation

[0049] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0050] In this utility model, unless otherwise explicitly specified and limited, the terms "installation," "connection," "joining," and "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model according to the specific circumstances.

[0051] Example:

[0052] Please see Figures 1-6 This utility model provides a technical solution: a dual-station alternating etching chamber, comprising:

[0053] Workbench 10;

[0054] The work chamber 20 is installed on the worktable 10 and is used for etching workpieces;

[0055] The workstation mechanism 30 is located between the workbench 10 and the work chamber 20 and is used to alternately transport workpieces.

[0056] The supporting workstation mechanism 30 includes:

[0057] A rotary platform 310 is mounted on a worktable 10 and is equipped with a first drive device 311 that drives its rotation.

[0058] The rotating column 320 is fixedly mounted on the rotary platform 310;

[0059] Two support components 330 are rotatably disposed on opposite sides of the rotating column 320, and each support component 330 includes:

[0060] The flipping component 331 has one end hinged to the rotating cylinder 320;

[0061] The support platform 332 is used to support the workpiece, and a linear sliding mechanism 333 is installed on its lower surface. It is mounted on the flipping part 331 through the linear sliding mechanism 333.

[0062] The second drive device 334 is installed inside the tilting component 331 and is used to drive the support platform 332 to reciprocate along the linear sliding mechanism 333.

[0063] The flipping drive mechanism 340 is located inside the rotating column 320 and is used to drive the two flipping parts 331 to rotate synchronously, so that the flipping parts 331 have an unfolded state and a retracted state.

[0064] Specifically, the rotating platform 310 drives the rotating column 320 and the bearing components 330 on both sides to switch positions 180 degrees. The flipping drive mechanism 340 controls the unfolding and retraction of the flipping part 331. Combined with the second drive device 334, the bearing platform 332 is driven to move out or back smoothly along the linear sliding mechanism 333. This realizes continuous alternation of etching processing and loading / unloading operations, which significantly improves production efficiency. At the same time, the retracted state of the flipping part 331 makes the overall structure compact, effectively reducing the spillage of corrosive gases and liquids, improving the working environment and saving equipment space.

[0065] Preferably, the flipping drive mechanism 340 includes:

[0066] The double-sided rack 341 is slidably disposed within the rotating cylinder 320 in the vertical direction;

[0067] Drive cylinder 342 is used to drive the double-sided rack 341 to move up and down;

[0068] Two gears 343 are fixedly installed at the hinge ends of two flipping parts 331, and mesh with the corresponding sides of the double-sided rack 341.

[0069] The side wall of the rotating cylinder 320 is provided with a through groove 321 corresponding to the position of the gear 343, so that the gear 343 can mesh and drive with the double-sided rack 341.

[0070] Specifically, by controlling the vertical linear motion of a single double-sided rack 341 through the drive cylinder 342, the gears 343 on both sides can be rotated synchronously through the through slot 321, thereby accurately and reliably realizing the unfolding and retraction of the two flipping parts 331. The transmission efficiency is high and the motion synchronization is good, which simplifies the control and ensures the consistency of the posture of the two workstations, and enhances the stability and reliability of the equipment operation.

[0071] Preferably, receiving grooves 322 are provided on opposite sides of the rotating cylinder 320;

[0072] A first magnetic attractor 323 is provided in the receiving groove 322, and a second magnetic attractor 335 is correspondingly provided on the flipping member 331.

[0073] Specifically, by setting a first magnetic suction element 323 in the receiving groove 322 of the rotating column 320 and a corresponding second magnetic suction element 335 on the flipping element 331, the flipping element 331 can be magnetically attracted and tightly fixed to the rotating column 320 when it is rotated to the storage state. This effectively prevents the flipping element from accidentally opening when the rotating platform 310 drives the rotating column to rotate at high speed to switch work positions, greatly improving the stability and safety of the equipment operation, while simplifying the mechanical locking structure.

[0074] Preferably, the first magnetic attractor 323 and the second magnetic attractor 335 are permanent magnets or electromagnets.

[0075] Preferably, the inner top of the flipper 331 is equipped with a plurality of jet nozzles 336 for jetting gas onto the surface of the retracted support platform 332.

[0076] Specifically, by installing several air nozzles 336 on the top of the flipping component 331, high-pressure gas can be automatically sprayed onto the surface of the carrier platform 332 immediately after the etching operation is completed and it retracts. This effectively blows away any residual etching liquid, preventing corrosive liquid from being carried to the loading and unloading stations and causing pollution or corrosion to the equipment. This achieves non-contact automatic cleaning of the carrier platform 332, ensuring the quality of medal processing, while reducing the need for manual maintenance and improving the automation level and operational reliability of the equipment.

[0077] Preferably, the linear sliding mechanism 333 includes a slide rail 3331 and a slider 3332 that cooperates with the slide rail 3331. The slider 3332 is installed inside the flipping member 331, and the slide rail 3331 is installed at the bottom of the support platform 332.

[0078] The second drive device 334 includes a second motor 3341 and a lead screw 3342 driven by the second motor 3341. A threaded pair 337 that mates with the lead screw 3342 is fixedly provided at the bottom of the support platform 332.

[0079] Specifically, the high-precision linear sliding mechanism 333, composed of slide rail 3331 and slider 3332, cooperates with the second drive device 334, composed of second motor 3341, lead screw 3342 and threaded pair 337, to provide the bearing platform 332 with smooth, accurate and reliable linear reciprocating motion. This effectively ensures the positioning accuracy and repeatability of the medal fixture between the processing position and the loading and unloading position. At the same time, the lead screw drive has a self-locking characteristic and can reliably stop at any position, enhancing the overall stability and automation of the equipment operation.

[0080] Preferably, the support platform 332 is provided with a fixture 338 for fixing the workpiece.

[0081] Preferably, the first drive device 311 is a first motor 3111 installed at the bottom of the rotary platform 310.

[0082] Preferably, the working chamber 20 corresponds to a workstation. When the supporting component 330 on one side is in the unfolded state and its supporting platform 332 is extended, the workstation is located inside the working chamber 20 and is a processing workstation. When the supporting component 330 on the other side is in the unfolded state and its supporting platform 332 is extended, the workstation is located outside the working chamber 20 and is a loading and unloading workstation.

[0083] Specifically, by setting the work chamber 20 to correspond to a single workstation, and coordinating the unfolding of the support component 330 and the extension of the support platform 332, the enclosed processing workstation inside the work chamber 20 and the open loading and unloading workstation outside the work chamber 20 are clearly separated. This completely isolates the etching process from the manual loading and unloading operations in space, ensuring a continuous and uninterrupted alternating production rhythm, greatly improving equipment utilization and production efficiency, and effectively preventing the etching solution and corrosive gases from affecting the external operating environment and personnel, thus achieving a high degree of unity between safety and efficiency.

[0084] Preferably, the rotating cylinder 320, the rotating platform 310, and the two flipping parts 331 in the storage state together constitute a complete cylindrical structure.

[0085] Specifically, by making the rotating cylinder 320, the rotary platform 310, and the two retractable flipping parts 331 together form a complete cylindrical structure, the dynamic characteristics of the equipment during the station switching rotation process are greatly optimized. Its smooth cylindrical shape effectively reduces air resistance during rotation and avoids the risk of interference with the internal structure of the working chamber 20. At the same time, this compact closed structure can prevent corrosive gases and liquids from escaping during rotation to the greatest extent, protecting the internal transmission components and improving the overall stability and environmental friendliness of the equipment.

[0086] It should be noted that the instruction manual includes... Figure 4 In this context, A represents the workpiece to be processed, which is the medal.

[0087] Working principle: When the equipment is running, the processing station support platform 332 located in the working chamber 20 is performing etching operations, while the loading and unloading stations outside the chamber can be safely operated. After the operation is completed, each support platform 332 is retracted into the flipping part 331 under the drive of the second drive device 334. During this period, the air nozzle 336 sprays air to clean the table surface. Then, the flipping drive mechanism 340 drives the flipping part 331 to flip and store through the meshing of the double-sided rack 341 and gear 343. It is then attracted and fixed by the first magnetic suction part 323 and the second magnetic suction part 335, so that the whole is formed into a cylindrical structure. Then, the rotating platform 310 drives the rotating column 320 to rotate 180 degrees to realize the exchange of work stations. Finally, the flipping part 331 unfolds again, and the support platform 332 extends, so that etching and loading and unloading operations can continue to be performed in the new work station. This cycle realizes efficient and closed dual-work station alternating production.

[0088] It should be noted that, in this document, relational terms such as "first" and "second" are used only to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or apparatus. Without further limitations, an element defined by the phrase "comprising one..." does not exclude the presence of other identical elements in the process, method, article, or apparatus that includes said element.

Claims

1. A dual-station alternating etching chamber, characterized in that, include: Workbench (10); The work chamber (20) is installed on the worktable (10) and is used to perform etching on the workpiece; The workstation mechanism (30) is located between the workbench (10) and the work chamber (20) and is used to alternately transport workpieces; The bearing station mechanism (30) includes: A rotary platform (310) is installed on the workbench (10) and is equipped with a first drive device (311) to drive its rotation. A rotating column (320) is fixedly mounted on the rotary platform (310); Two support components (330) are rotatably disposed on opposite sides of the rotating column (320), each of the support components (330) comprising: A flipper (331) is hinged at one end to the rotating cylinder (320); The support platform (332) is used to support the workpiece, and a linear sliding mechanism (333) is installed on its lower surface. The workpiece is mounted on the flipping part (331) through the linear sliding mechanism (333). The second driving device (334) is installed inside the flipping component (331) and is used to drive the support platform (332) to reciprocate along the linear sliding mechanism (333); A flipping drive mechanism (340) is disposed inside the rotating column (320) and is used to drive the two flipping parts (331) to rotate synchronously, so that the flipping parts (331) have an unfolded state and a retracted state.

2. The dual-station alternating etching chamber according to claim 1, characterized in that: The flipping drive mechanism (340) includes: A double-sided rack (341) is slidably disposed within the rotating cylinder (320) in the vertical direction; A drive cylinder (342) is used to drive the double-sided rack (341) to move up and down; Two gears (343) are respectively fixedly installed at the hinge ends of the two flipping parts (331) and mesh with the corresponding sides of the double-sided rack (341); The side wall of the rotating cylinder (320) is provided with a through groove (321) corresponding to the position of the gear (343) so that the gear (343) can mesh and drive with the double-sided rack (341).

3. The dual-station alternating etching chamber according to claim 2, characterized in that: The rotating cylinder (320) has receiving grooves (322) on its opposite sides; The receiving groove (322) is provided with a first magnetic suction member (323), and the flipping member (331) is provided with a corresponding second magnetic suction member (335).

4. The dual-station alternating etching chamber according to claim 3, characterized in that: The first magnetic attractor (323) and the second magnetic attractor (335) are permanent magnets or electromagnets.

5. The dual-station alternating etching chamber according to claim 1, characterized in that: The inner top of the flipper (331) is equipped with a plurality of jet nozzles (336) for spraying gas onto the surface of the retracted support platform (332).

6. The dual-station alternating etching chamber according to claim 1, characterized in that: The linear sliding mechanism (333) includes a slide rail (3331) and a slider (3332) that cooperates with the slide rail (3331). The slider (3332) is installed inside the flipping member (331), and the slide rail (3331) is installed at the bottom of the support platform (332). The second drive device (334) includes a second motor (3341) and a lead screw (3342) driven by the second motor (3341). The bottom of the support platform (332) is fixedly provided with a threaded pair (337) that cooperates with the lead screw (3342).

7. The dual-station alternating etching chamber according to claim 1, characterized in that: The support platform (332) is provided with a fixture (338) for fixing the workpiece.

8. The dual-station alternating etching chamber according to claim 1, characterized in that: The first drive device (311) is a first motor (3111) installed at the bottom of the rotary platform (310).

9. A dual-station alternating etching chamber according to claim 1, characterized in that: The work chamber (20) corresponds to a workstation. When the support component (330) on one side is in the unfolded state and its support platform (332) is extended, the workstation is located inside the work chamber (20) and is a processing workstation. When the support component (330) on the other side is in the unfolded state and its support platform (332) is extended, the workstation is located outside the work chamber (20) and is a loading and unloading workstation.

10. A dual-station alternating etching chamber according to any one of claims 1-9, characterized in that: The rotating cylinder (320), the rotating platform (310), and the two retractable components (331) together constitute a complete cylindrical structure.

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