A polysilicon cold hydrogenation residue slurry treatment system

CN224735785UActive Publication Date: 2026-09-11YUNNAN TONGWEI HIGH PURITY CRYSTALLINE SILICON CO LTD
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Patent Information

Application Number
CN202522244567.X
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2025-10-23
Publication Date
2026-09-11
Estimated Expiration
2035-10-23

AI Technical Summary

Technical Problem

[0004]本实用新型为解决现有技术中多晶硅冷氢化渣浆高沸物处理系统中催化剂使用时间短,容易失活,需要频繁更换的问题,提供了一种能够保持催化剂活性和使用寿命,并提高催化裂解效率,维持系统长时间正常工作的多晶硅冷氢化渣浆处理系统

Benefits of technology

[0024]1.本实用新型通过设置预处理单元和精馏分离单元进行多晶硅冷氢化渣浆中氯硅烷和高沸物两种主要成分的分离;并设置裂解转化单元对高沸物进行裂解反应,再产生氯硅烷进行回收;同时在精馏分离单元和裂解转化单元之间通过设置具有搅拌冷却装置,络合反应装置的除杂单元,利用了冷却+絮凝剂+络合剂协同除杂技术去除高沸液中的金属杂质,防止了高含量的金属杂质与裂解转化单元内的催化剂产生反应抑制其催化活性,从而延长了催化剂使用寿命,解决了现有技术中多晶硅冷氢化渣浆高沸物处理系统中催化剂使用时间短,容易失活,需要频繁更换的问题。

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Abstract

The utility model provides a kind of polysilicon cold hydrogenation slag slurry processing system, it is related to polysilicon production technical field.The polysilicon cold hydrogenation slag slurry processing system includes: the pretreatment unit of sequentially intercommunication, rectification separation unit, cooling-complexing impurity removal unit and cleavage conversion unit;Pretreatment unit is used to input polysilicon cold hydrogenation slag slurry, at least with sedimentation device;Rectification separation unit is communicated with sedimentation device, for carrying out the rectification separation of high-boiling substance and chlorosilane in polysilicon cold hydrogenation slag slurry;Cleavage conversion unit at least has cleavage reaction device, and high-boiling substance after processing can be catalytically cracked;Wherein, cooling-complexing impurity removal unit at least has the stirring cooling device and complexing reaction device of sequentially intercommunication, and metal chloride and metal ion in high-boiling substance can be removed.The utility model can keep catalyst activity and improve catalytic cracking efficiency, maintain system long time normal work.
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Description

Technical Field

[0001] This utility model relates to the field of polycrystalline silicon production technology, specifically a polycrystalline silicon cold hydrogenation slag slurry treatment system. Background Technology

[0002] In the core step of the Siemens process (currently the mainstream method) for polysilicon production—chemical vapor deposition (CVD)—high-purity trichlorosilane (SiHCl3) and hydrogen (H2) are fed into a reduction furnace. A reduction reaction occurs on the silicon core at a high temperature (approximately 1100°C), producing high-purity polysilicon. In the modified Siemens process, the silicon tetrachloride, hydrogen chloride, and hydrogen produced during the reduction of polysilicon are recovered and reused by a cold hydrogenation unit. By adding silicon powder to a fluidized bed reactor, trichlorosilane, the raw material required for polysilicon production, is produced under high temperature and pressure, achieving a closed-loop cycle for the polysilicon process. The mixed gas produced at the outlet of the fluidized bed reactor mainly consists of silicon powder, hydrogen, silicon tetrachloride, trichlorosilane, dichlorosilane, and metal chlorides. This mixture is then washed, condensed, and purified. A portion of the liquid is transported to downstream units as trichlorosilane, while the remaining solid-liquid mixture forms a cold hydrogenation slurry, which is discharged from the cold hydrogenation system. Cold hydrogenation slurry is a hazardous waste generated from the bottom of the hydrogenation system during the cold hydrogenation process. It is formed by mixing unreacted silicon powder, catalyst, metallic impurities such as chlorides, and other solid particles with a chlorosilane liquid rich in silicon tetrachloride. It is a byproduct that must be discharged from the system to maintain purity and stable operation in a closed-loop material recycling process.

[0003] In general processes, chlorosilanes are first recovered through evaporation and separation, followed by the treatment of remaining high-boiling-point substances. Because high-boiling-point substances contain Si-Si bonds, these bonds can break under high temperatures or with the aid of a catalyst, resulting in the decomposition of high-value monosilanes. Currently, the main methods for high-boiling-point recovery are high-temperature pyrolysis and catalytic pyrolysis, with catalytic pyrolysis being the most common method. Organic amines are typically used as catalysts, and HCl is used as the pyrolysis gas to convert high-boiling-point substances from polycrystalline silicon production into raw materials trichlorosilane and silicon tetrachloride. Continuous production is now achieved through reactive distillation. However, some problems remain in the treatment of high-boiling-point substances in cold hydrogenation slurry. The catalysts used in the pyrolysis reaction have short service life, are prone to deactivation, and require frequent replacement, affecting material transportation and equipment operation. Utility Model Content

[0004] This invention addresses the problems of short catalyst lifespan, easy deactivation, and frequent replacement required in existing polycrystalline silicon cold hydrogenation slurry high-boiling-point treatment systems. It provides a polycrystalline silicon cold hydrogenation slurry treatment system that maintains catalyst activity and lifespan, improves catalytic cracking efficiency, and ensures long-term normal operation of the system.

[0005] The technical solution adopted in this utility model is:

[0006] A polycrystalline silicon cold hydrogenation slurry treatment system, comprising:

[0007] A pretreatment unit is used to input polycrystalline silicon cold hydrogenation slurry; the pretreatment unit has at least a settling device;

[0008] The distillation separation unit is connected to the side outlet of the settling device; the distillation separation unit is used for the distillation separation of high-boiling substances and chlorosilanes in the polycrystalline silicon cold hydrogenation slurry;

[0009] The cooling-complexing impurity removal unit is connected to the high-boiling-point outlet of the distillation separation unit;

[0010] The pyrolysis conversion unit is connected to the outlet of the cooling and impurity removal unit, and the pyrolysis conversion unit has at least a pyrolysis reaction device; the pyrolysis reaction device is capable of catalytically pyrolyzing the high-boiling-point substances processed by the cooling-complexing and impurity removal unit.

[0011] The cooling and impurity removal unit includes at least a stirring and cooling device and a complexing reaction device connected in sequence; the stirring and cooling device can cool down and add flocculant to remove metal chlorides in high-boiling substances; the complexing reaction device can heat and add complexing agent to remove metal ions in high-boiling substances.

[0012] Furthermore, a filter device is installed on the connecting pipe between the side outlet of the settling device and the distillation separation unit.

[0013] Furthermore, the top of the complexing reaction device is provided with a first condenser, which is used to condense the high-boiling substances processed by the complexing reaction device.

[0014] Furthermore, a second condenser is provided at the top of the pyrolysis reaction device; the second condenser is used to condense and process the chlorosilanes produced by the pyrolysis of the pyrolysis reaction device.

[0015] Furthermore, the bottom outlet of the settling device is connected to a rotating drum device; the liquid outlet of the rotating drum device is connected to the feed inlet of the evaporation separation unit.

[0016] Furthermore, it also includes:

[0017] The drying unit is used to receive the material discharged from the solid outlet of the rotary drum device; the gas outlet of the drying unit is connected to the feed inlet of the distillation separation unit.

[0018] Furthermore, the bottom outlet of the stirring and cooling device is connected to the inlet of the drying unit.

[0019] Furthermore, it also includes:

[0020] The hydrolysis unit is connected to the solid discharge port of the drying unit; the hydrolysis unit is capable of hydrolyzing the residual material.

[0021] Furthermore, the top outlet of the pyrolysis reaction device is connected to a fourth column device; the fourth column device is capable of distilling the chlorosilane product liquid.

[0022] Furthermore, one or more of the bottom outlets of the complexing reaction device, the pyrolysis reaction device, and the fourth tower device are connected to the inlet of the hydrolysis unit.

[0023] The beneficial effects of this utility model are:

[0024] 1. This invention separates the two main components, chlorosilanes and high-boiling-point substances, in polycrystalline silicon cold hydrogenation slurry by setting up a pretreatment unit and a distillation separation unit; and sets up a cracking conversion unit to crack the high-boiling-point substances and then recover the chlorosilanes; simultaneously, a purification unit with a stirring and cooling device and a complexation reaction device is set up between the distillation separation unit and the cracking conversion unit. This unit utilizes a synergistic purification technology of cooling + flocculant + complexing agent to remove metal impurities from the high-boiling-point liquid, preventing high-content metal impurities from reacting with the catalyst in the cracking conversion unit and inhibiting its catalytic activity, thereby extending the catalyst's service life. This solves the problems of short catalyst service life, easy deactivation, and frequent replacement required in the existing polycrystalline silicon cold hydrogenation slurry high-boiling-point substance treatment system. Attached Figure Description

[0025] To more clearly illustrate the technical solutions in the embodiments of this application or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0026] Figure 1 This is a schematic diagram of the processing system according to an embodiment of the present invention;

[0027] Figure 2 This is a schematic diagram of the processing system according to a preferred embodiment of the present invention.

[0028] Reference numerals: 100-Pretreatment unit, 110-Sedimentation device, 120-Filtering device, 130-Drum device;

[0029] 200 - Distillation and separation unit; 210 - First column assembly;

[0030] 300-Cooling-complexing and impurity removal unit; 310-Stirring and cooling device; 320-Complexing reaction device; 330-Second tower body device;

[0031] 400 - Cracking and conversion unit, 410 - Cracking reaction device, 420 - Third tower device, 440 - Fourth tower device;

[0032] 500-Drying Unit;

[0033] 600 - Hydrolysis unit. Detailed Implementation

[0034] In the description of this utility model, it should be understood that the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential", etc., indicating the orientation or positional relationship are based on the orientation or positional relationship shown in the accompanying drawings, and are only for the convenience of describing this utility model and simplifying the description, and are not intended to indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this utility model.

[0035] The following disclosure provides many different embodiments or examples for implementing various structures of this invention. To simplify the disclosure, specific examples of components and arrangements are described below. Of course, these are merely examples and are not intended to limit the scope of this invention.

[0036] The embodiments of the utility model will now be described in detail with reference to the accompanying drawings.

[0037] Example 1

[0038] The main methods for recovering high-boiling-point substances from polycrystalline silicon cold hydrogenation slurry are high-temperature pyrolysis and catalytic pyrolysis. Most existing processes employ catalytic pyrolysis, typically using organic amines as catalysts and HCl as the pyrolysis gas. This converts high-boiling-point substances from polycrystalline silicon production into raw materials trichlorosilane and silicon tetrachloride. Currently, continuous production is achieved through reactive distillation. However, some problems remain in the treatment of high-boiling-point substances in cold hydrogenation slurry, primarily the short service life and susceptibility to deactivation of the catalysts used in the pyrolysis reaction, requiring frequent replacement.

[0039] To address the aforementioned problems in the prior art, this embodiment provides a polycrystalline silicon cold hydrogenation slurry treatment system. This system is used to treat the cold hydrogenation slurry generated during polycrystalline silicon production, separating and recovering chlorosilanes and treating high-boiling-point substances. This polycrystalline silicon cold hydrogenation slurry treatment system can maintain catalyst activity and lifespan, improve catalytic cracking efficiency, and maintain long-term normal system operation. Please refer to... Figure 1 The polycrystalline silicon cold hydrogenation slurry treatment system mainly includes: a pretreatment unit 100, a distillation and separation unit 200, a cooling-complexing and impurity removal unit 300, and a cracking and conversion unit 400.

[0040] The pretreatment unit 100 is used to separate and remove solid impurities from the polycrystalline silicon cold hydrogenation slurry, preventing solid impurities from entering the distillation separation unit 200 and affecting its normal operation. For example... Figure 1 As shown, the pretreatment unit 100 mainly includes a settling device 110, etc. In this embodiment, the settling device 110 is a settling tank. The bottom outlet of the settling device 110 is used to discharge solid precipitate waste. The side outlet of the settling device 110 is used to discharge the liquid portion of the high-boiling residue. The side outlet of the settling device 110 is connected to the distillation separation unit 200.

[0041] The distillation separation unit 200 is used to distill and evaporate the liquid portion of the polycrystalline silicon cold hydrogenation slurry, mainly separating high-boiling-point substances and chlorosilane product liquid. In this embodiment, the distillation separation unit 200 mainly includes a first column assembly 210, etc. The first column assembly 210 is a high-boiling-point removal column. The feed inlet of the distillation separation unit 200 is connected to the side outlet of the settling device 110; the outlet at the top of the distillation separation unit 200 is used to output the chlorosilane product liquid; the outlet at the bottom of the distillation separation unit 200 is connected to the cooling and impurity removal unit 300 for outputting the high-boiling-point residue.

[0042] The applicant discovered in their research that high-boiling-point chlorosilanes contain significant amounts of metallic impurities, such as Al. These impurities largely originate from catalyst residues from the polysilicon production process and from transportation and storage. The Al impurities primarily exist as AlCl3 (boiling point 178℃). The presence of these impurities reduces the activity of organic amine catalysts because the impurities added to the reactants undergo complexation reactions with the organic amine catalysts during the reaction, causing them to become deactivated. Furthermore, AlCl3 is a Lewis acid, while organic amine catalysts are organic bases. The catalytic activity of organic amine catalysts mainly stems from the lone pairs of electrons on their nitrogen atoms, which can break Si-Si bonds. Al atoms, however, have numerous empty orbitals, which preferentially interact with the lone pairs of electrons in organic amine catalysts, inhibiting their catalytic activity and even poisoning or deactivating them, thus reducing catalytic cracking efficiency. Additionally, metallic chlorides cause significant corrosion to equipment. Therefore, impurity removal is necessary before cracking high-boiling-point chlorosilanes to improve catalytic cracking efficiency and extend equipment lifespan. Therefore, the cooling-complexing impurity removal unit 300 in this embodiment utilizes a synergistic impurity removal technology of cooling + flocculant + complexing agent to remove metallic impurities (Fe, Al, etc.) from high-boiling liquids. The cooling-complexing impurity removal unit 300 mainly includes a stirring cooling device 310, a complexing reaction device 320, and a second tower device 330. Specifically, the stirring cooling device 310 in this embodiment uses a cooling tank equipped with a stirrer and a jacketed tube. Freon is introduced into the outer jacketed tube to cool the high-boiling material in the tank and, in conjunction with a flocculant, precipitate high-boiling-point metal chlorides. The inlet of the stirring cooling device 310 is connected to the outlet of the distillation separation unit 200 to input the high-boiling residue. The stirring cooling device 310 is also equipped with a flocculant addition port. The outlet of the stirring cooling device 310 is connected to the complexing reaction device 320 to output the high-boiling material after the first impurity removal. The complexation reaction device 320 in this embodiment adopts a semi-continuous reaction tank complexation vessel with stirring and temperature control equipment. The reaction tank is equipped with a jacket. High-pressure steam is used to heat the material in the tank, and a complexing agent is added to carry out a high-efficiency complexation reaction to remove metal ions from the material. The inlet of the complexation reaction device 320 is connected to the outlet of the stirring and cooling device 310 for inputting the high-boiling-point substance after primary impurity removal. The stirring and cooling device 310 is equipped with a complexing agent addition port. The top outlet of the complexation reaction device 320 is connected to the second tower device 330 for outputting the high-boiling-point substance after the complexation reaction. Furthermore, the second tower device 330 in this embodiment is a packed complexing tower to improve the efficiency of the complexing reaction. The top outlet of the second tower device 330 is equipped with a first condenser, which is used to condense the high-boiling-point substance after the complexing reaction. The second tower device 330 is located on top of the complexing reaction device 320, and the top outlet of the second tower device 330 is connected to the cracking conversion unit 400 to output the condensed high-boiling-point substance.

[0043] The cracking conversion unit 400 is used to perform a cracking reaction on high-boiling-point substances, converting the effective components in the high-boiling-point substances into chlorosilane product liquid for recycling. The cracking conversion unit 400 mainly includes a cracking reaction device 410 and a third tower device 420. In this embodiment, the cracking reaction device 410 is a reaction vessel cracking kettle equipped with a stirring and temperature control device and a jacket. High-pressure steam is used to heat the material in the vessel, and a catalyst can be added to cause the high-boiling-point substances to crack. The feed inlet of the cracking reaction device 410 is connected to the top outlet of the second tower device 330 for inputting the condensed high-boiling-point substances. The bottom outlet of the cracking reaction device 410 is used to output the residue after the high-boiling-point substances have reacted. The top outlet of the cracking reaction device 410 is connected to the third tower device 420. Meanwhile, the third tower device 420 in this embodiment adopts a packed conversion tower to improve the conversion efficiency of the cracking reaction, and a second condenser is provided at the top outlet of the third tower device 420 to condense the chlorosilane gas; the third tower device 420 is located at the top of the cracking reaction device 410, and the outlet at the top of the third tower device 420 is used to output the condensed chlorosilane product liquid.

[0044] One specific working method of this embodiment is as follows:

[0045] First, the polycrystalline silicon cold hydrogenation slurry is fed into the settling device 110 of the pretreatment unit 100. After solid impurities are removed by settling, the liquid portion of the polycrystalline silicon cold hydrogenation slurry is then fed into the first column device 210 of the distillation separation unit 200. Next, the first column device 210 separates the product liquid of chlorosilane and the high-boiling residue by evaporation. Then, the high-boiling residue is fed into the cooling-complexing impurity removal unit 300. Through the stirring cooling device 310, the complexing reaction device 320, and the second column device 330, the metal impurities in the high-boiling liquid are removed by the synergistic impurity removal technology of cooling + flocculant + complexing agent. Then, the high-boiling residue after impurity removal is fed into the cracking conversion unit 400 for cracking reaction to obtain the product liquid of chlorosilane and the residue, thus completing the full recycling of the polycrystalline silicon cold hydrogenation slurry.

[0046] In this embodiment, the polycrystalline silicon cold hydrogenation slurry treatment system separates the two main components, chlorosilanes and high-boiling substances, in the polycrystalline silicon cold hydrogenation slurry by setting up a pretreatment unit 100 and a distillation separation unit 200; and sets up a cracking conversion unit 400 to crack the high-boiling substances and then recover the chlorosilanes; at the same time, a cooling-complexing impurity removal unit 300 with a stirring and cooling device 310, a complexing reaction device 320 and a second tower device 330 is set up between the distillation separation unit 200 and the cracking conversion unit 400. This unit uses a cooling + flocculant + complexing agent synergistic impurity removal technology to remove metal impurities in the high-boiling liquid, preventing high content of metal impurities from reacting with the catalyst in the cracking conversion unit 400 and inhibiting its catalytic activity, thereby extending the catalyst's service life. This solves the problem of short catalyst service life, easy deactivation and frequent replacement required in the existing polycrystalline silicon cold hydrogenation slurry high-boiling substance treatment system.

[0047] Meanwhile, the lack of effective integration between various processes in existing technologies makes it difficult to form a continuous and efficient processing system during production. This hinders the recovery of chlorosilanes and high-boiling-point substances contained in the cold hydrogenation slurry to a large extent, resulting in low recovery rates of high-value chlorosilanes and treatable high-boiling-point substances, leading to resource waste and low recovery efficiency. Furthermore, high operating costs mean that independent systems require more equipment investment, more energy consumption, and more labor costs. Therefore, this embodiment aims to effectively integrate multiple processes to form a continuous and efficient processing system, thereby reducing operating costs.

[0048] Furthermore, in the pretreatment unit 100 of this embodiment, a filter device 120 is also provided on the connecting pipe between the side outlet of the settling device 110 and the distillation separation unit 200. The filter device 120 is used to prevent small amounts of solid impurities from entering the distillation separation unit 200. In addition, the pretreatment unit 100 is also provided with a drum device 130. The feed inlet of the drum device 130 is connected to the bottom outlet of the settling device 110, used to treat solid precipitate waste and further recover liquid from it; the liquid outlet of the drum device 130 is connected to the distillation separation unit 200, and the separated and recovered liquid is returned to the system for further processing.

[0049] Furthermore, in the cracking conversion unit 400 of this embodiment, the cracking reaction device 410 is provided with a first addition port and a second addition port. The first addition port and the second addition port are used to add a cracking agent and HCl gas, respectively. The cracking agent acts as a catalyst to break the Si-Si bonds in the high-boiling product, cracking it into high-value-added monosilanes. The HCl gas is a cracking gas used to maintain and optimize the activity and selectivity of the catalyst. In addition, the third tower device 420 is also provided with a two-stage cooler at the top of the tower. The first-stage cooler is a shell-and-tube type, using chilled water as the refrigerant; the second-stage cooler uses Freon as the refrigerant. Furthermore, the cracking conversion unit 400 also includes a fourth tower device 440. The fourth column unit 440 is a conversion liquid distillation column. By heating, distilling, and then condensing the chlorosilane product liquid, it further removes high-boiling residues from the chlorosilane product liquid and improves the purity of the recovered chlorosilane product liquid. The feed port of the fourth column unit 440 is connected to the top discharge port of the third column unit 420 and is used to input the chlorosilane product liquid. The top discharge port of the fourth column unit 440 is used to output the further purified chlorosilane product liquid.

[0050] In addition, in one or more other embodiments, the complexation reaction device 320 of the cooling-complexing impurity removal unit 300 may not have a second tower device 330. In this case, the top discharge of the complexation reaction device 320, after condensation, is directly connected to the cracking conversion unit 400. Furthermore, the cracking reaction device 410 of the cracking conversion unit 400 may not have a third tower device 420. In this case, the top discharge of the cracking reaction device 410, after condensation, is directly output as chlorosilane product liquid through a pipeline.

[0051] Preferably, such as Figure 2As shown, in one or more other embodiments, a drying unit 500 and a hydrolysis unit 600 may also be provided. The drying unit 500 employs a drum dryer or intermittent dryer equipped with stirring and heating equipment (steam heating). Materials are fed into the dryer in batches and discharged uniformly after drying. A jacket (through which steam is introduced) is used to indirectly contact the materials, transferring heat through thermal conduction. This evaporates the low-boiling-point components in the materials, which are then cooled and recovered. The inlet of the drying unit 500 receives solid residues from the solid outlet of the drum device 130 and the bottom outlet of the stirring and cooling device 310, which can be dried, evaporated, and further recovered as usable materials. The gas outlet at the top of the drying unit 500 is connected to the inlet of the first tower device 210, allowing the recovered gaseous material to be returned to the system. Simultaneously, the hydrolysis unit 600 employs a hydrolysis reaction tank for the harmless hydrolysis reaction of residual materials that cannot be recycled, preventing direct discharge and environmental pollution. The feed inlet of the hydrolysis unit 600 is connected to the solid discharge outlet at the bottom of the drying unit 500, and is also connected to one or more of the bottom discharge outlets of the complexing reaction device 320, the cracking reaction device 410, and the fourth tower device 440.

[0052] The foregoing has shown and described the basic principles, main features, and advantages of this utility model. Those skilled in the art should understand that this utility model is not limited to the above embodiments. The embodiments and descriptions in the specification are merely preferred examples and are not intended to limit the utility model. Various changes and modifications can be made to this utility model without departing from its spirit and scope, and all such changes and modifications fall within the scope of the claimed utility model. The scope of protection of this utility model is defined by the appended claims and their equivalents.

Claims

1. A polycrystalline silicon cold hydrogenation slurry treatment system, characterized in that, Include: A pretreatment unit (100) is used to input polycrystalline silicon cold hydrogenation slurry; the pretreatment unit (100) has at least a settling device (110). The distillation separation unit (200) is connected to the side outlet of the settling device (110); the distillation separation unit (200) is used for the distillation separation of high-boiling substances and chlorosilanes in polycrystalline silicon cold hydrogenation slurry; The cooling-complexing impurity removal unit (300) is connected to the high-boiling-point outlet of the distillation separation unit (200); The pyrolysis conversion unit (400) is connected to the outlet of the cooling-complexing impurity removal unit (300), and the pyrolysis conversion unit (400) has at least a pyrolysis reaction device (410); the pyrolysis reaction device (410) is capable of catalytically pyrolyzing the high-boiling substances processed by the cooling-complexing impurity removal unit (300); The cooling-complexing impurity removal unit (300) has at least a stirring and cooling device (310) and a complexing reaction device (320) connected in sequence; the stirring and cooling device (310) can cool down and add flocculant to remove metal chlorides in high-boiling substances; the complexing reaction device (320) can heat and add complexing agent to remove metal ions in high-boiling substances.

2. The polysilicon cold hydrogenation slurry treatment system of claim 1, wherein, A filter device (120) is installed on the connecting pipe between the side outlet of the settling device (110) and the distillation separation unit (200).

3. The polycrystalline silicon cold hydrogenation slurry treatment system as described in claim 1, characterized in that, The complexation reaction device (320) is provided with a first condenser at the top, which is used to condense the high-boiling substances after the complexation reaction device (320) has been processed.

4. The polysilicon cold hydrogenation slurry treatment system of claim 1, wherein, The top of the pyrolysis reaction device (410) is provided with a second condenser; the second condenser is used to condense and process the chlorosilane produced by the pyrolysis of the pyrolysis reaction device (410).

5. The polysilicon cold hydrogenation slurry treatment system of claim 1, wherein, The bottom outlet of the settling device (110) is connected to a rotating drum device (130); the liquid outlet of the rotating drum device (130) is connected to the feed inlet of the distillation separation unit (200).

6. The polycrystalline silicon cold hydrogenation slurry treatment system as described in claim 5, characterized in that, Also includes: The drying unit (500) is used to receive the material discharged from the solid discharge port of the rotary drum device (130); The gas outlet of the drying unit (500) is connected to the feed inlet of the distillation and separation unit (200).

7. The polysilicon cold hydrogenation slurry treatment system of claim 6, wherein, The bottom outlet of the stirring and cooling device (310) is connected to the inlet of the drying unit (500).

8. The polysilicon cold hydrogenation slurry treatment system of claim 6, wherein, Also includes: The hydrolysis unit (600) is connected to the solid discharge port of the drying unit (500); the hydrolysis unit (600) is capable of hydrolyzing the residual material.

9. The polysilicon cold hydrogenation slurry treatment system of claim 8, wherein, The top outlet of the cracking reaction device (410) is connected to a fourth tower device (440); the fourth tower device (440) is capable of distilling the chlorosilane product liquid.

10. The polysilicon cold hydrogenation slurry treatment system of claim 9, wherein, One or more of the bottom outlet of the complexing reaction device (320), the bottom outlet of the pyrolysis reaction device (410), and the bottom outlet of the fourth tower device (440) are connected to the inlet of the hydrolysis unit (600).