A graphite disc surface polishing device

Abstract

The utility model provides a kind of graphite disc surface polishing device, belong to graphite disc polishing technical field, including polishing machine, polishing part, throw head pole and polishing consumables, polishing part is polished to graphite disc arc surface, the side of polishing part implementation polishing operation is arc and mutually matched with the shape of the concave arc surface of the graphite disc to be polished;Throw head pole one end detachably connects polishing machine power output end, the other end connects the side of the arc surface of polishing part away from it;Polishing consumables is detachably attached to the arc surface of polishing part, the shape of layout and the arc surface of polishing part mutually matched;Wherein, polishing machine is used to control its power output end operation, to make power output end drive polishing part operation, to make polishing consumables and graphite disc arc surface mutually contact and implement polishing operation.The utility model has the technical effect that can polish graphite disc arc surface, will not change graphite disc size and shape, even less will lead to graphite disc scrap.

Description

Technical Field

[0001] This utility model belongs to the field of graphite disc polishing technology, and more specifically, it relates to a graphite disc surface polishing device. Background Technology

[0002] A wafer refers to a semiconductor substrate or wafer to be processed during semiconductor manufacturing, which undergoes processes such as high-temperature epitaxy and photolithography. It is the core processing object supported by a graphite disk as a base. In wafer processing, a graphite disk made of high-purity isostatic graphite is used as the base, and this graphite disk has an internal arc-shaped structure. During wafer loading, the initial temperature of the graphite disk is approximately 100°C. The wafer is placed on the flat edge of the graphite disk, and then a robotic arm delivers the graphite disk and wafer together into the reaction chamber. The temperature inside the reaction chamber reaches 600-900°C. Under this high-temperature environment, the wafer deforms and bends downwards, requiring perfect contact with the wafer recesses of the graphite disk to achieve uniform heating and thus ensure wafer processing quality.

[0003] However, during the processing of graphite disks, varying degrees of machining marks inevitably remain on their surface, resulting in unevenness. When the wafer comes into contact with the uneven surface of the graphite disk, uneven contact can cause hazy or polycrystalline marks to form on the back of the wafer. These marks not only interfere with subsequent front-side inspection processes but also adversely affect the photolithography process of the device, reducing the product yield.

[0004] To solve the above problems, there are two main solutions in the existing technology: 1) Chemical Mechanical Polishing (CMP) Solution: After the wafer is removed from the high-temperature epitaxial growth process, the back side of the wafer is chemically mechanically polished to remove imprints. However, this solution has significant drawbacks. On the one hand, the polishing process is costly, and on the other hand, scratches, contamination, and other defects are easily generated during the polishing process, further reducing the wafer yield. 2) Diamond drill bit milling solution: Some processing manufacturers use diamond drill bits to perform secondary milling on the surface of graphite disks in an attempt to eliminate tool marks. However, this solution is difficult to control precisely, and it is very easy to change the size and shape of the graphite disk, resulting in the direct scrapping of the graphite disk, causing material waste and increased costs.

[0005] In summary, existing technologies cannot efficiently and cost-effectively solve the problems of uneven graphite disk surface and imprints on the back of the disk while ensuring the stability of the graphite disk size and shape. There is an urgent need for a new polishing device to make up for the shortcomings of existing technologies. Utility Model Content

[0006] The purpose of this invention is to provide a graphite disk surface polishing device, which aims to solve the technical problem that in the prior art, milling the arc surface of a graphite disk with a diamond drill bit easily changes the size and shape of the graphite disk, leading to the scrapping of the graphite disk.

[0007] To achieve the above objectives, the technical solution adopted by this utility model is: to provide a graphite disk surface polishing device, comprising: The polishing machine has a power output end; The polishing section is suitable for polishing the arc-shaped surface of the graphite disk. The side of the polishing section that performs the polishing operation is arc-shaped and matches the shape of the concave arc-shaped surface of the graphite disk to be polished. The polishing head rod has one end detachably connected to the power output end of the polishing machine and the other end connected to the side of the polishing part away from its arc-shaped surface; Polishing consumables are detachably attached to the arc-shaped surface of the polishing part, and their arrangement shape matches the arc-shaped surface of the polishing part. The polishing machine is used to control the operation of its power output end, so that the power output end drives the polishing part to operate, thereby making the polishing consumables come into contact with the arc-shaped surface of the graphite disk and perform polishing operations.

[0008] In one possible implementation, the polishing part is made of graphite or polytetrafluoroethylene.

[0009] In one possible implementation, the polishing consumable is a composite nonwoven fabric pad or silicon carbide sandpaper.

[0010] In one possible implementation, the throwing rod is made of polytetrafluoroethylene, wood, or high-strength plastic.

[0011] In one possible implementation, the polishing machine has a servo motor and a safety airbag, the servo motor being used to provide polishing power, and the air pressure inside the safety airbag being adjustable and used to regulate the polishing rate.

[0012] In one possible implementation, the polishing machine has a working platform, a graphite disk is placed on the upper end of the working platform, the arc-shaped surface of the graphite disk faces the polishing part, and the polishing consumable abuts against the arc-shaped surface of the graphite disk by means of the polishing head rod to perform polishing operation on the arc-shaped surface of the graphite disk.

[0013] In one possible implementation, the launcher is a telescopic rod with a degree of freedom to extend and retract along its axial direction, and the length of the launcher after extension and retraction can be defined.

[0014] In one possible implementation, the polishing machine has a control panel with a control module for controlling the operation of the power output terminal, and the control panel is communicatively connected to a remote controller with a remote control module for controlling the operation of the power output terminal.

[0015] In one possible implementation, the launcher is an electrically controlled telescopic boom, which is communicatively connected to both the control panel and the remote controller. Both the control panel and the remote controller have adjustment modules for controlling the extension and retraction of the electrically controlled telescopic boom.

[0016] In one possible implementation, the upper part of the work platform has a gripper for holding a graphite disk, and the gripper has a clamping space for holding the graphite disk in the middle.

[0017] The beneficial effects of the graphite disk surface polishing device provided by this utility model are as follows: Compared with the prior art, the graphite disk surface polishing device of this utility model includes a polishing machine, a polishing section, a polishing head rod, and polishing consumables. The polishing section polishes the arc-shaped surface of the graphite disk. The side of the polishing section where the polishing operation is performed is arc-shaped and matches the shape of the concave arc-shaped surface of the graphite disk to be polished. One end of the polishing head rod is detachably connected to the power output end of the polishing machine, and the other end is connected to the side of the polishing section away from its arc-shaped surface. The polishing consumables are detachably attached to the arc-shaped surface of the polishing section. The shape of the arrangement matches the arc surface of the polishing part; the polishing machine is used to control the operation of its power output end, so that the power output end drives the polishing part to run, thereby making the polishing consumables come into contact with the arc surface of the graphite disk and carry out the polishing operation. This solves the technical problem in the prior art that milling the arc surface of the graphite disk with a diamond drill bit easily changes the size and shape of the graphite disk, leading to the scrapping of the graphite disk. It has the technical effect of being able to polish the arc surface of the graphite disk without changing the size and shape of the graphite disk, and without causing the graphite disk to be scrapped. Attached Figure Description

[0018] To more clearly illustrate the technical solutions in the embodiments of this utility model, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this utility model. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0019] Figure 1 A schematic diagram of a graphite disk surface polishing device provided in an embodiment of this utility model; Figure 2 A schematic diagram of the polishing section, polishing head rod, and graphite disk of a graphite disk surface polishing device provided for an embodiment of this utility model; Figure 3 A schematic diagram of the structure of a graphite disk in a graphite disk surface polishing device provided for an embodiment of this utility model; Figure 4 A schematic diagram of the polishing section and polishing head rod of a graphite disk surface polishing device provided in this embodiment of the present invention; Figure 5 for Figure 4 The main view; Figure 6 A schematic diagram of the structure where the film is placed on a graphite disk; Figure 7 A schematic diagram of the polishing head rod structure of a graphite disk surface polishing device provided in another embodiment of this utility model.

[0020] Explanation of reference numerals in the attached figures: 10. Polishing machine; 11. Working platform; 12. Control panel; 13. Remote control; 14. Clamp; 20. Polishing section; 30. Polishing head bar; 40. Polishing consumables; 50. Graphite disc; 51. Curved surface; 60. Sheet. Detailed Implementation

[0021] To make the technical problems, technical solutions, and beneficial effects of this utility model clearer, the present utility model will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the present utility model and are not intended to limit the present utility model.

[0022] The applicant discovered that during wafer mounting, the graphite disk surface has varying degrees of machining marks during the graphite disk processing, resulting in an uneven surface. When the wafer 60 comes into contact with the uneven graphite disk surface, uneven contact can cause hazy or polycrystalline marks to form on the back of the wafer 60. These marks not only interfere with the subsequent front-side inspection process of the wafer 60 but also adversely affect the device photolithography process, reducing the product yield. Therefore, it is necessary to mill the surface of the graphite disk and mechanically polish the surface of the wafer 60. As described in the background art, both solutions have defects or problems. Therefore, based on the defects or problems existing in the prior art, the applicant has designed a device for polishing the surface of the graphite disk to solve the problems or defects existing in the prior art.

[0023] Please refer to the following: Figures 1 to 4The present invention provides a graphite disk surface polishing device. The graphite disk surface polishing device includes a polishing machine 10, a polishing section 20, a polishing head rod 30, and polishing consumables 40. The polishing machine 10 has a power output end; the polishing section 20 is adapted to polish the arc-shaped surface 51 of the graphite disk 50, and one side of the polishing section 20 performing the polishing operation is arc-shaped and matches the shape of the concave arc-shaped surface 51 of the graphite disk 50 to be polished; one end of the polishing head rod 30 is detachably connected to the power output end of the polishing machine 10, and the other end is connected to the side of the polishing section 20 opposite to its arc-shaped surface; the polishing consumables 40 are detachably attached to the arc-shaped surface of the polishing section 20, and their arrangement matches the arc-shaped surface of the polishing section 20; wherein, the polishing machine 10 is used to control the operation of its power output end, so that the power output end drives the polishing section 20 to operate, thereby causing the polishing consumables 40 to come into contact with the arc-shaped surface 51 of the graphite disk 50 and perform the polishing operation.

[0024] This utility model provides a surface polishing device for a graphite disk 50. Compared with the prior art, by connecting the polishing head rod 30 to the polishing machine 10 and the polishing section 20, and setting the polishing consumable 40 on the polishing section 20, the polishing head rod 30 and the polishing section 20 are driven by the power output of the polishing machine 10. This allows the polishing consumable 40 to perform polishing operations on the arc-shaped surface 51 of the graphite disk 50. The surface of the polishing section 20 that contacts the graphite disk 50 is arc-shaped and matches the arc-shaped surface 51 of the graphite disk 50, thus achieving polishing of the arc-shaped surface 51 of the graphite disk 50 without leaving any marks. This polishing method of the graphite disk 50 does not change the size and shape of the graphite disk 50, nor does it lead to the scrapping of the graphite disk 50. It can efficiently and cost-effectively solve the problem of uneven surface of the graphite disk 50 while ensuring the stability of the size and shape of the graphite disk 50.

[0025] The polishing head rod 30 of this invention can be detached from the polishing machine 10. When the polishing machine 10 is not in use, polishing can be performed manually. When connected to the polishing machine 10, automatic polishing can be achieved. When using manual operation, the polishing consumable 40 is rubbed and polished on the arc-shaped surface 51 of the graphite disk 50. Its movement trajectory is similar to the movement trajectory of the power output end of the polishing machine 10, and both can ultimately complete the polishing of the surface of the graphite disk 50.

[0026] In this embodiment, the surface of the graphite disk 50 refers to the concave arc-shaped surface 51 located on the graphite disk 50. A polishing part 20, whose shape matches the concave arc-shaped surface 51, is used. A polishing consumable 40 is attached to the polishing part 20. By contacting the concave arc-shaped surface with the polishing consumable 40, the surface of the graphite disk 50 can be polished, and the processing requirements are met after polishing. The arc-shaped surface of the polishing part 20 referred to in this application is not an arc-shaped surface in two-dimensional vision, but an arc-shaped surface in three-dimensional vision, similar to the structure of a portion of the surface of a sphere. That is, the polishing part 20 has a spherical crown-shaped structure, and the other side of the polishing part 20 is flat, used to connect to one end of the polishing head rod 30. The arc-shaped surface 51 of the graphite disk 50 refers to the pits of the graphite disk 50.

[0027] The polishing machine 10 in this embodiment adopts existing technology. Its power output end is located in the middle of the polishing machine 10, and generally generates torque and has a force that moves vertically. The graphite disk 50 to be polished is located below the power output end. The power output end drives the polishing head rod 30, which drives the polishing part 20. The polishing part 20 drives the polishing consumable 40 to rotate and contact and rub against the arc-shaped surface 51 of the graphite disk 50. When the polishing depth or position cannot meet the polishing requirements, the height of the power output end can be adjusted to lower the height of the polishing part 20, so that the polishing operation can continue. The polishing consumable 40 can be connected to the arc-shaped surface of the polishing part 20 by means of bonding or other connection methods. After polishing for a period of time, it can be disassembled and removed to replace the new polishing consumable 40. The height of the polishing consumable 40 or its position inside the arc-shaped surface 51 of the graphite disk 50 is reasonably adjusted according to the processing degree of the polishing operation to facilitate the polishing operation.

[0028] The polishing part 20 is a core functional component; in some embodiments, please refer to [reference needed]. Figures 1 to 4 The polishing part 20 is made of graphite or polytetrafluoroethylene (PTFE). When graphite (purity ≥ 99.5%) is used for the polishing part 20, it possesses excellent self-lubricating properties, thermal conductivity, and moderate hardness, making it suitable for high-precision polishing of the graphite disk 50. The self-lubricating properties of graphite reduce frictional resistance between the workpiece (graphite disk 50) during polishing, preventing scratches on the workpiece surface. PTFE has strong corrosion resistance, an extremely low coefficient of friction, and high-temperature resistance, making it suitable for polishing the curved surfaces of the graphite disk 50. In this embodiment, graphite or PTFE is chosen because its thermal conductivity effectively controls temperature, and its corrosion resistance and low coefficient of friction ensure polishing precision.

[0029] In some embodiments, please refer to Figures 1 to 4Polishing consumable 40 is either a composite non-woven fabric pad or silicon carbide sandpaper. As the direct actuator for polishing operations, polishing consumable 40, along with silicon carbide sandpaper, is used by skilled surface polishers for high-end, delicate work. Different particle sizes and materials can be selected based on the required roughness and surface finish, effectively removing marks from the graphite disc 50 without altering its size or shape, thus eliminating machining marks. The composite non-woven fabric pad is existing technology, employing a double-layer composite structure of polyester fiber and nylon fiber. The bottom layer is a 1.2-1.5mm thick polyester fiber substrate (density 350-400g / m³). 2 The structure provides structural support; the surface layer is a 0.8-1.0mm thick nylon fiber layer (porosity 60%-70%), which is bonded to the substrate through a needle-punching composite process, and the surface layer is impregnated with nano-alumina abrasive particles (particle size 1-5μm, content 15%-20%). This structure combines flexibility (elongation at break ≥25%) with wear resistance (service life ≥50h / piece), making it suitable for fine polishing of metal parts (such as surface finishing of aluminum alloy shells) and matte treatment of optical components (such as acrylic lenses).

[0030] To improve polishing uniformity, the surface of the composite nonwoven fabric pad is treated with "honeycomb liquid storage holes" with a hole diameter of 0.3-0.5mm and a hole spacing of 1mm. This allows for the storage of neutral polishing liquid, extending the working time of the polishing liquid and reducing the frequency of liquid replenishment. During use, the polishing pressure should be controlled at 0.15-0.3MPa and the rotation speed at 800-1200r / min. When the wear of the surface abrasive particles is ≥50% (judged by observing the particle exposure under a microscope) or the surface roughness of the workpiece cannot reach Ra≤0.2μm, the consumables need to be replaced.

[0031] The arrangement shape of the polishing consumable 40 perfectly matches the shape of the arc surface 51 of the graphite disk 50. By rubbing and polishing the surface of the graphite disk 50, the surface of the polished graphite disk 50 is bright and smooth, and the hazy or polycrystalline marks are greatly reduced after mounting.

[0032] In some embodiments, please refer to Figures 1 to 4 The polishing head rod 30 is made of polytetrafluoroethylene (PTFE), wood, or high-strength plastic. The characteristics of PTFE have been described above and will not be repeated here. The polishing head rod 30 supports the polishing section 20 and provides power transmission; its strength must be high to meet the requirements of polishing. Wood offers advantages such as lightweight, good shock absorption, and easy surface processing, making it suitable for fine polishing and scenarios involving easily damaged workpieces. The shock absorption properties of wood can prevent scratches on the graphite disc 50 surface caused by vibration. High-strength plastic offers high strength, low cost, and good weather resistance, making it suitable for general polishing scenarios. It eliminates the need to replace the polishing head rod 30, improving operational efficiency.

[0033] In some embodiments, please refer to Figure 1The polishing machine 10 includes a servo motor and a safety airbag. The servo motor provides polishing power, and the air pressure inside the safety airbag is adjustable and used to control the polishing rate. In this embodiment, the servo motor is a stepper servo motor or a permanent magnet synchronous servo motor, featuring high-precision pulse control and a wide speed range. The power output is connected to the servo motor or may be part of the servo motor structure. The height of the servo motor is adjustable, thereby adjusting the height of the polishing section 20. The height adjustment method can refer to existing technologies. The safety airbag is part of the polishing machine 10 structure and is also existing technology. It features oil resistance, corrosion resistance, and high elasticity. By adjusting the expansion pressure of the safety airbag, the contact force between the polishing consumable 40 and the graphite disk 50 is changed, thereby controlling the polishing rate. The greater the pressure, the stronger the contact force, the higher the coefficient of friction, and the faster the polishing rate; conversely, the rate decreases, achieving linear control of "pressure-rate." The control method can refer to existing technologies.

[0034] In some embodiments, please refer to Figure 1 The polishing machine 10 has a working platform 11. A graphite disc 50 is placed on the upper end of the working platform 11, with the arc-shaped surface 51 of the graphite disc 50 facing the polishing section 20. The polishing consumable 40 abuts against the arc-shaped surface 51 of the graphite disc 50 via a polishing head rod 30 to perform polishing operations on the arc-shaped surface 51 of the graphite disc 50. The graphite disc 50 is placed on the working platform 11, and the polishing consumable 40 is brought close to the arc-shaped surface 51 of the graphite disc 50. Polishing is performed by rotation. The polishing consumable 40 rotates and moves vertically on the arc-shaped surface 51 of the graphite disc 50. During the polishing process, attention must be paid to the thickness and other dimensions of the graphite disc 50 to avoid changes in its size and shape.

[0035] To enable the polishing section 20 to move vertically and adjust the contact degree between the polishing consumable 40 and the arcuate surface 51 of the graphite disk 50, in some embodiments, please refer to... Figure 7 The polishing head rod 30 is a telescopic rod with a degree of freedom to extend and retract along its axis, and its length after extension and retraction can be limited. By reasonably adjusting the length of the polishing head rod 30, the height of the polishing section 20 can be adjusted, thereby adapting to the polishing process of graphite discs 50 with different thicknesses. The length of the polishing head rod 30 after extension and retraction can be limited.

[0036] To achieve control and remote control of the operation of the polishing machine 10 and the polishing process of the graphite disk 50, in some embodiments, please refer to... Figure 1The polishing machine 10 has a control panel 12, which includes a control module for controlling the operation of the power output end. The control panel 12 is communicatively connected to a remote controller 13, which has a remote control module for controlling the operation of the power output end. In this embodiment, the control panel 12 is existing technology and can control the operation of the power output end through the control module, thereby controlling the processing actions of the polishing machine 10 on the graphite disc 50. Alternatively, operators can also control the operation of the polishing machine 10 by manipulating the remote controller 13, enabling remote control. Both operation methods are usable, and the appropriate method should be selected based on the specific circumstances. Both the remote controller 13 and the control panel 12 have wireless communication modules, such as 4G or GPRS modules. Through wireless communication between the remote controller 13 and the control panel 12, the operation of the polishing machine 10 can be controlled.

[0037] To achieve electric adjustment of the height of the polishing section 20, in some embodiments, please refer to... Figure 7 The polishing head rod 30 is an electrically controlled telescopic rod, which is communicatively connected to the control panel 12 and the remote controller 13. Both the control panel 12 and the remote controller 13 have adjustment modules for controlling the extension and retraction of the electrically controlled telescopic rod. This electrically controlled telescopic rod is existing technology and can realize electric adjustment of the rod body, that is, it can automatically adjust its length, and thus adjust the height of the polishing section 20 to adapt to the polishing requirements of the arc-shaped surface 51 of the graphite disk 50. The operator can adjust and control the length of the electrically controlled telescopic rod on the control panel 12 and the remote controller 13, thereby controlling the height of the polishing section 20 and the height of the polishing consumable 40, thus meeting the polishing requirements of the arc-shaped surface 51 of the graphite disk 50.

[0038] To ensure sufficient stability and secure the graphite disk 50 on the work platform 11, please refer to the following embodiments: Figure 1 The upper end of the working platform 11 has a clamp 14 for holding the graphite disk 50, and a clamping space for holding the graphite disk 50 is formed in the middle of the clamp 14. The clamp 14 in this embodiment is prior art, similar to the structure of a three-jaw chuck, which can fix the graphite disk 50 inside the clamping space. The width of the clamping space can be adjusted by moving the three-jaw chuck, so that graphite disks 50 of different diameters can be placed.

[0039] The above description is only a preferred embodiment of the present utility model and is not intended to limit the present utility model. Any modifications, equivalent substitutions and improvements made within the spirit and principles of the present utility model should be included within the protection scope of the present utility model.

Claims

1. A graphite disk surface polishing device, characterized in that, include: The polishing machine has a power output end; The polishing section is suitable for polishing the arc-shaped surface of the graphite disk. The side of the polishing section that performs the polishing operation is arc-shaped and matches the shape of the concave arc-shaped surface of the graphite disk to be polished. The polishing head rod has one end detachably connected to the power output end of the polishing machine and the other end connected to the side of the polishing part away from its arc-shaped surface; Polishing consumables are detachably attached to the arc-shaped surface of the polishing part, and their arrangement shape matches the arc-shaped surface of the polishing part. The polishing machine is used to control the operation of its power output end, so that the power output end drives the polishing part to operate, thereby making the polishing consumables come into contact with the arc-shaped surface of the graphite disk and perform polishing operations.

2. The graphite disk surface polishing device as described in claim 1, characterized in that, The polishing part is made of graphite or polytetrafluoroethylene.

3. The graphite disk surface polishing device as described in claim 1, characterized in that, The polishing consumables are composite non-woven fabric pads or silicon carbide sandpaper.

4. The graphite disk surface polishing device as described in claim 1, characterized in that, The throwing rod is made of polytetrafluoroethylene, wood, or high-strength plastic.

5. The graphite disk surface polishing device as described in claim 1, characterized in that, The polishing machine has a servo motor and a safety airbag. The servo motor is used to provide polishing power, and the air pressure inside the safety airbag can be adjusted and used to regulate the polishing rate.

6. The graphite disk surface polishing device as described in claim 1, characterized in that, The polishing machine has a working platform, with a graphite disc placed on the upper part of the working platform. The arc-shaped surface of the graphite disc faces the polishing part. The polishing consumables abut against the arc-shaped surface of the graphite disc by means of the polishing head rod to perform polishing operation on the arc-shaped surface of the graphite disc.

7. The graphite disk surface polishing device as described in claim 1, characterized in that, The throwing rod is a telescopic rod with a degree of freedom to extend and retract along its axial direction, and the length of the throwing rod after extension and retraction can be limited.

8. The graphite disk surface polishing device as described in claim 7, characterized in that, The polishing machine has a control panel, which has a control module for controlling the operation of the power output end. The control panel is communicatively connected to a remote controller, which has a remote control module for controlling the operation of the power output end.

9. The graphite disk surface polishing device as described in claim 8, characterized in that, The boom is an electrically controlled telescopic boom, which is communicatively connected to the control panel and the remote control. Both the control panel and the remote control have adjustment modules for controlling the extension and retraction of the electrically controlled telescopic boom.

10. A graphite disk surface polishing device as described in claim 6, characterized in that, The upper part of the work platform has a clamp for holding a graphite disk, and a clamping space for holding the graphite disk is formed in the middle of the clamp.

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