Mask (sunscreen and makeup protection)

CN309030726SActive Publication Date: 2024-12-24SHANGHAI OUFAN IND CO LTD
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Patent Information

Application Number
CN202430281146.2
Authority / Receiving Office
CN · China
Patent Type
Designs(China)
Current Assignee / Owner
Filing Date
2024-05-13
Publication Date
2024-12-24
Estimated Expiration
2039-05-13

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Abstract

1. The name of the product of this design: mask (sunscreen and makeup smear prevention). 2. Purpose of the product with this appearance design: This product with this appearance design is used for sun protection, makeup removal, and preventing dust from entering the mouth and nose. 3. The design key point of this appearance design product lies in the shape. 4. The picture or photo that best illustrates the design points: Stereoscopic diagram 1. 5. The top view and bottom view are already shown in the three-dimensional view, so they are omitted.
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