Central part of sputtering target for physical vapor deposition chamber

Abstract

1. The name of the product of this design: Central part of a sputtering target for a physical vapor deposition chamber. 2. Purpose of the product of this design: The sputtering target for physical vapor deposition chamber is used in the physical vapor deposition chamber. The central part of the sputtering target for physical vapor deposition chamber is a material to be sputtered in the physical vapor deposition processing chamber, which can be installed on a back plate for installation in the processing chamber. 3. The key design point of this design product lies in the shape of the part shown by the solid line. 4. The picture or photo that best illustrates the design points: three-dimensional picture. 5. Other situations that need explanation: The dotted lines in the figure indicate the parts that are not requested for protection.

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