Wafer appearance defect inspection equipment
CN309146573SActive Publication Date: 2025-03-04奈米科学仪器装备(杭州)有限公司
View PDF 0 Cites 0 Cited by
Patent Information
- Application Number
- CN202430446640.X
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2024-07-17
- Publication Date
- 2025-03-04
- Estimated Expiration
- 2039-07-17
Smart Images
Figure 000001_ABST
Abstract
1. The name of this design product: Wafer appearance defect detection equipment. 2. Purpose of this design product: This design product is used for equipment for fully automatic detection of semiconductor wafer defects. 3. The design key point of this appearance design product lies in the shape. 4. The picture or photo that best illustrates the design points: three-dimensional picture.
Need to check novelty before this filing date? Find Prior Art