Photon mask

CN309166058SActive Publication Date: 2025-03-11SHENZHEN JIANCHAO INTELLIGENT TECH CO LTD
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Patent Information

Application Number
CN202430272680.7
Authority / Receiving Office
CN · China
Patent Type
Designs(China)
Current Assignee / Owner
Filing Date
2024-05-10
Publication Date
2025-03-11
Estimated Expiration
2039-05-10

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Abstract

1. The name of the product of this design: Photon Facial Mask Instrument. 2. Purpose of the product with this appearance design: The product with this appearance design is used for facial beautification, care and maintenance. 3. The design key point of this appearance design product lies in the shape. 4. The picture or photo that best illustrates the design points: Stereoscopic diagram 1.
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