Etching stage electrostatic chuck
CN309414581SActive Publication Date: 2025-08-01EN SEMICON (SHANGHAI) INC
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Patent Information
- Application Number
- CN202430770912.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2024-12-04
- Publication Date
- 2025-08-01
- Estimated Expiration
- 2039-12-04
Smart Images
Figure 000008_ABST
Abstract
1. Name of the Design Product: Electrostatic Chuck for Etching Station. 2. Use of the Design Product: Electrostatic chuck for etching station. 3. Design Key Points of the Design Product: Lies in the shape. 4. Picture or Photograph that Best Illustrates the Design Key Points: Perspective View 1.
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