Dual-module two-line laser level
CN309434677SActive Publication Date: 2025-08-12LUAN HANSHENG PHOTOELECTRIC TECH CO LTD
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Patent Information
- Application Number
- CN202430806654.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2024-12-19
- Publication Date
- 2025-08-12
- Estimated Expiration
- 2039-12-19
Smart Images
Figure 000007_ABST
Abstract
1. The name of this design product: dual-module two-line laser level. 2. Application of this design product: used for laser marking, used in construction, decoration, equipment installation and other fields. 3. The key point of the design of this product lies in its shape. 4. The picture or photo that best illustrates the design points: three-dimensional picture.
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