Fabric (Auspicious Cloud Mask Design)
CN309495503SActive Publication Date: 2025-09-16CRRC QINGDAO SIFANG CO LTD
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Patent Information
- Application Number
- CN202430735522.0
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2024-11-20
- Publication Date
- 2025-09-16
- Estimated Expiration
- 2039-11-20
Smart Images
Figure 000001_ABST
Abstract
1. Name of the product of this design: Fabric (Auspicious Cloud Mask Design). 2. Purpose of this design product: used for processing and manufacturing various types of textiles. 3. The key design point of this product lies in the combination of pattern and color. 4. The picture or photo that best illustrates the key points of the design: main view. 5. The design for which protection is sought includes color. 6. Other notes: This design product is a four-sided continuous flat product with no defined boundaries.
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