Dress (with irregular hemline with patchwork trim)

CN309655526SActive Publication Date: 2025-12-09ZHEJIANG SCI-TECH UNIV
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Patent Information

Application Number
CN202530395339.5
Authority / Receiving Office
CN · China
Patent Type
Designs(China)
Current Assignee / Owner
Filing Date
2025-07-07
Publication Date
2025-12-09
Estimated Expiration
2040-07-07

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Abstract

1. Name of the designed product: Dress (with irregular skirt with spliced decoration). 2. Use of the designed product: for wearing. 3. Design points of the designed product: combination of shape and pattern. 4. Picture or photo best indicating the design points: assembly state perspective view 1. 5. The left view of the assembly state, the right view of the assembly state, the left view of component 1, and the right view of component 1 have been expressed in other views, so the left view of the assembly state, the right view of the assembly state, the left view of component 1, and the right view of component 1 are omitted; the top view of the assembly state, the bottom view of the assembly state, the top view of component 1, and the bottom view of component 1 are parts that are not easily visible or invisible during use, so the top view of the assembly state, the bottom view of the assembly state, the top view of component 1, and the bottom view of component 1 are omitted; there is no design point in the other views of component 2, so the other views of component 2 are omitted. 6. Other circumstances requiring explanation: Component 1 is a dress, and component 2 is a waistband. The model in the view only serves as an auxiliary display and does not belong to the protection scope of the present design.
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