Microwave plasma chemical vapor deposition furnace
CN309739771SActive Publication Date: 2026-01-16TIANJIN MOTAI TECHNOLOGY CO LTD
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Patent Information
- Application Number
- CN202530321076.3
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2025-06-05
- Publication Date
- 2026-01-16
- Estimated Expiration
- 2040-06-05
Smart Images
Figure 000003_ABST
Abstract
1. The name of the design product: microwave plasma chemical vapor deposition furnace. 2. The use of the design product: the design product is used for the deposition furnace of the microwave plasma chemical vapor deposition device. 3. The design points of the design product: in shape. 4. The picture or photo that best indicates the design points: perspective view.
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