Plasma-enhanced chemical vapor deposition equipment

CN309963602SActive Publication Date: 2026-05-05SHANGHAI MICRO SEMI WORLD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Designs(China)
Current Assignee / Owner
SHANGHAI MICRO SEMI WORLD
Filing Date
2025-09-17
Publication Date
2026-05-05

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Abstract

1. Name of the product in this design: Plasma-enhanced chemical vapor deposition equipment. 2. Application of this design: Used for chemical vapor deposition of thin films on the surface of semiconductor substrates. 3. The key design feature of this product is its shape. 4. The image or photograph that best illustrates the design's key points: a 3D model.
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