Wafer tray
CN309976984SActive Publication Date: 2026-05-12ADVANCED MICRO FAB EQUIP INC CHINA
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Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- ADVANCED MICRO FAB EQUIP INC CHINA
- Filing Date
- 2025-08-28
- Publication Date
- 2026-05-12
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Figure 000005_ABST
Abstract
1. The name of the design product: wafer tray. 2. The use of the design product: used for carrying substrates in vapor deposition equipment. 3. The design points of the design product: in shape. 4. The picture or photo that best shows the design points: design 1 perspective view. 5. Design 1 right view is symmetrical with design 1 left view, omit design 1 right view; design 1 bottom view is symmetrical with design 1 top view, omit design 1 bottom view; design 2 bottom view is symmetrical with design 2 top view, omit design 2 bottom view. 6. Design 1 is designated as the basic design.
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