Micromechanical actuator device and method for tilting a micromechanical actuator device

Abstract

Micromechanical actuator device (100; 200; 300; 400) with: a tilting device (110; 310) which has an actuator element (112; 312); a first spring assembly (120); a holding device (122); wherein the tilting device (110; 310) is connected to the holding device (122) via the first spring device (120) so as to be tiltable about a first tilting axis (A); at least one electrical conductor (150; 250; 350) which is routed over the tilting device (110; 310); a permanent magnet device (130-i; 230-i; 430-i) which is arranged on the holding device (122); the permanent magnet device (130-i; 230-i; 430-i) is designed to to generate a first magnetic field (11) such that when an electric current (I) is conducted through the electrical conducting device (150; 250; 350) within the first magnetic field (11) a Lorentz force (31; 32) can be generated by which the tilting device (110; 310) can be tilted relative to the holding device (122) about the first tilting axis (A); a framework facility (144); a second spring device (140-i) via which the holding device (122) is connected to the frame device (144) in a tiltable manner about a second tilting axis (B); an electromagnetic device (125, 129) which is designed to generate a second magnetic field which acts on the permanent magnet device (130-i; 230-i; 430-i) in such a way that the holding device (122) can be tilted relative to the frame device (144) about the second tilting axis (B).

Description

[0001] The present invention relates to a micromechanical actuator device, in particular a micromirror, and a method for tilting a micromechanical actuator device, in particular a micromirror. In particular, the invention relates to a micromirror that can be used in a laser scanner and to operating a micromirror as part of a laser scanner. State of the art

[0002] Micromirrors capable of deflecting a laser beam in two mutually perpendicular directions are required for a variety of applications. For example, such micromirrors are used in laser scanners. Laser scanners are devices that project an image by sequentially scanning pixels with a horizontally and vertically swiveling laser beam. Typically, the horizontal swivel of the laser beam is slower than the vertical swivel, and vice versa. Swiveling the laser beam in the faster direction usually scans one line of the image to be projected, while swiveling the laser beam in the slower direction scans multiple lines of the image.Laser scanners often use two micromirrors connected in series, each of which can only be tilted around a single axis, so that a laser beam hitting the micromirror can only be swivelled in one dimension.

[0003] WO 2012 089387 A1 describes a micromirror and an arrangement of two micromirrors connected in series to form a laser scanner.

[0004] Documents US 2008 / 0 054 732 A1, US 2004 / 0 105 139 A1 and US 2013 / 0 120 819 A1 describe micromechanical actuator devices that partially exhibit the features of the micromechanical actuator device according to claim 1.

[0005] There is a need for an efficient and space-saving actuator device that can be manufactured with minimal technical effort and is tiltable around two different tilting axes. Disclosure of the invention

[0006] The present invention discloses a device having the features of claim 1 and a method having the features of claim 9.

[0007] Accordingly, the invention provides an actuator device, in particular a micromirror, comprising: a tilting device comprising an actuator element; a first spring device; a holding device, wherein the tilting device is connected to the holding device via the first spring device so as to be tiltable about a first tilting axis; at least one electrical conductor, which is guided over the tilting device; a permanent magnet device, which is arranged on the holding device, wherein the permanent magnet device is designed to generate a first magnetic field such that, when an electric current is conducted through the electrical conductor within the first magnetic field, a Lorentz force can be generated by which the tilting device, in particular the actuator element, can be tilted relative to the holding device about the first tilting axis; a frame device;a second spring device by which the holding device is connected to the frame device so as to be tiltable about a second tilting axis; an electromagnetic device which is designed to generate a second magnetic field which acts on the permanent magnet device in such a way that the holding device can be tilted relative to the frame device about the second tilting axis. By tilting the holding device relative to the frame device, the actuator element in particular can be tilted about the second tilting axis.

[0008] An actuator element is understood to be, in particular, an element capable of reflecting a desired radiation, especially laser light, at least partially, and especially predominantly. Such an actuator element can also be referred to as a "mirror element." For example, the mirror element can be configured as several dielectric layers, a metallic layer, a polished layer, etc. Any other component to be actuated can also be used as an actuator element.

[0009] Furthermore, the invention provides a method for tilting a micromechanical actuator device, in particular a micromirror, comprising the steps of: passing an electric current through an electrical conductor, which is guided over a tilting device of the actuator device, within a first magnetic field generated by a permanent magnet device of the actuator device, such that, due to a Lorentz force, the tilting device and / or an actuator element of the tilting device is tilted along a first tilting axis. The permanent magnet device is arranged on a holding device of the actuator device; and generating a second magnetic field by an electromagnetic device of the actuator device in the region of the permanent magnet device, such that, due to magnetic attraction and repulsion, the tilting device and / or the actuator element is tilted along a second tilting axis. Advantages of the invention

[0010] The underlying insight of the present invention is that a permanent magnet device of a micromechanical actuator device can be used both to generate a Lorentz force which realizes a tilting of the actuator element about a first tilting axis, and can also be arranged in a controllably generated magnetic field of an electromagnetic device in order to realize a tilting of the same actuator element about a second tilting axis.

[0011] According to the invention, high torques can be generated at the actuator element, thereby reducing the area required for generating the necessary torques. This makes it advantageous to miniaturize the MEMS chip area and thus increase the number of actuator devices per wafer according to the invention. Miniaturization of the actuator device's chip area is particularly effective perpendicular to the second tilting axis, i.e., the axis of the slow tilting movement, which can also be referred to as the "slow axis." This dimension is a critical size in applications such as miniaturized projectors in mobile phones, as a particularly thin mobile phone is desirable. The invention thus enables the use and integration of laser scanners as projectors while maintaining the thin housing dimensions of mobile phones and other mobile devices such as tablets, etc.

[0012] The actuator device according to the invention has a particularly high drive efficiency, which results in low power consumption for tilting the actuator device.

[0013] According to the invention, only coils and / or a special current-carrying arrangement for the electrical conductors on the tilting mechanism and / or the holding device are required to drive the tilting mechanism and / or the holding device. This requires significantly fewer process steps compared to other implementation options. In particular, highly conductive surfaces already required for electrical connections or position detection can be used for the electrical conductors. This results in no, or only very minimal, additional technical effort or process steps.

[0014] Furthermore, according to the invention, no bulky permanent magnets are required that need to be attached to the outside of the actuator device. This results in a particularly small installation volume and eliminates additional assembly and connection processes. Additionally, the impact resistance of the actuator device is increased.

[0015] The high available torques of the actuator allow the use of relatively stiff torsional springs, which can be implemented using webs. This results in high mechanical overload and drop resistance, as well as good controllability and robustness.

[0016] Advantageous embodiments and further developments are described in the dependent claims and in the description with reference to the figures.

[0017] According to a first preferred embodiment, the first spring assembly comprises a first torsion spring. A first conductor track for connecting the electrical conductor to a first electrical pole can be routed over the first torsion spring. The first spring assembly can further comprise a second torsion spring, wherein a second conductor track for connecting the electrical conductor to a second electrical pole is routed over the first torsion spring and / or over the second torsion spring. This enables particularly efficient contacting of the electrical conductor on the tilting device.

[0018] According to a further preferred embodiment, the second spring assembly comprises at least a third torsion spring, over which at least one conductor track, for example the first or second conductor track described above, is guided for connecting the electrical conducting device to at least one electrical pole, in particular the first or the second electrical pole.

[0019] According to a further preferred embodiment, the permanent magnet assembly comprises at least one first permanent magnet and / or at least one second permanent magnet. The magnetic north-south orientation of the first permanent magnet and / or the magnetic north-south orientation of the second permanent magnet is preferably arranged parallel or antiparallel to the second tilting axis and / or perpendicular to the first tilting axis. This allows for a particularly favorable alignment of the magnetic flux lines in the area of ​​the electrical conduction device. Preferably, the permanent magnet assembly further comprises a third and / or a fourth permanent magnet, the north-south orientations of which are also preferably arranged parallel or antiparallel to the second tilting axis and / or perpendicular to the first tilting axis.The third and / or the fourth permanent magnet can be arranged and designed in a mirror image to the first and / or the second permanent magnet, particularly with respect to the first tilting axis, especially if an electric current flow direction in a section of the electrical conducting device located closest to the first and second permanent magnets is opposite to an electric current flow direction in a section of the electrical conducting device located closest to the third and fourth permanent magnets.

[0020] According to a further preferred embodiment, the permanent magnet assembly comprises at least one first permanent magnet and / or at least one second permanent magnet. The magnetic north-south orientation of the first permanent magnet and / or the magnetic north-south orientation of the second permanent magnet are preferably arranged perpendicular to the second tilting axis. This also allows for a particularly favorable alignment of the magnetic flux lines in the area of ​​the electrical conduction device. Preferably, the permanent magnet assembly further comprises a third and / or a fourth permanent magnet, whose north-south orientations are also preferably arranged perpendicular to the second tilting axis. The third and / or the fourth permanent magnet can be designed and arranged as a mirror image of the first and / or the second permanent magnet, as described above.

[0021] According to a further preferred embodiment, at least two permanent magnets, preferably two permanent magnets at a time, are arranged axially, with respect to the second tilting axis, at different distances from the electrical conducting device, in particular from a section of the electrical conducting device that is closest to each pair of permanent magnets. This can result in a further improvement in the arrangement of the magnetic flux lines in the area of ​​the electrical conducting device. The at least two permanent magnets can, in particular, be the first and second and / or the third and fourth permanent magnets described above.

[0022] According to a further preferred embodiment, the actuator element of the tilting device is designed as a metallic surface, wherein a section of the electrical conductor in which the Lorentz force is generated is realized through the metallic surface. This allows the metallic surface to be used multifunctionally with particular efficiency, thereby reducing resource requirements and manufacturing effort for the actuator device.

[0023] According to a preferred embodiment of the method according to the invention, electric current is passed through the electrical conducting device such that the actuator element of the tilting device is tilted about the first tilting axis in a resonant periodic motion, in particular to achieve rapid tilting about a fast axis. The second magnetic field can be generated such that the tilting device and / or the actuator element is tilted quasi-statically about the second tilting axis to achieve slow tilting about the slow axis. Brief description of the drawings

[0024] The present invention is explained in more detail below with reference to the exemplary embodiments illustrated in the schematic figures of the drawings. The inventive concepts of the micromechanical actuator devices according to the invention are described below using micromirrors as examples of micromechanical actuator devices. However, the described and illustrated embodiments and all variants are equally applicable to any other actuator devices. The figures show: Fig. 1A to Fig. 1D schematic full and detailed views from different directions of a micromirror according to an embodiment of the present invention; Fig. 2A to Fig. 2D schematic full and detailed views from different directions of a micromirror according to a further embodiment of the present invention; Fig. 3A to Fig. 3C Schematic full and detailed views from different directions of a micromirror according to yet another embodiment of the present invention; Fig. 4A to Fig. 4D schematic full and detailed views from different directions of a micromirror according to yet another embodiment of the present invention; and Fig. 5 A schematic flowchart to explain a method for tilting a micromirror according to an embodiment of the present invention.

[0025] In all figures, identical or functionally equivalent elements and devices are designated with the same reference numerals unless otherwise specified. The numbering of process steps is for clarity and is not intended to imply a specific chronological sequence. In particular, several process steps can be performed simultaneously. For the sake of clarity, elements of the drawings are not drawn to scale. Description of the exemplary implementations

[0026] Fig. Figure 1A shows a schematic top view of a micromirror 100 according to an embodiment of the present invention. The micromirror 100 has a tilting device 110, which comprises a mirror element 112 and a bending spring 114. The mirror element 112 of the micromirror 100 is, for example, realized as a metallic surface on a substrate and, for example, in top view, is designed as a flat disk. The mirror element 112 is connected to the bending spring 114 via two first webs 118-1, 118-2, in particular only via these webs, for example, made of the same substrate as the substrate under the metallic surface of the mirror element 112.

[0027] The bending spring 114, for example, is designed as a circular ring in an xy-plane, as shown in Fig. Figure 1A shows the mirror element 112, and in the xy-plane, in which the mirror element 112 is arranged in its rest position, the bending spring 114 completely encloses the mirror element 112. The bending spring 114 is connected to a holding device 122 via two second webs 116-1, 116-2, and in particular only via the second webs 116-1, 116-2. The holding device 122 is also designed as a circular ring and, in the xy-plane, in a rest position of the tilting device 110, encloses both the mirror element 112 and the bending spring 114. At least the second webs 116-1, 116-2, and optionally also the first webs 118-1, 118-2, are designed as torsional springs in the micromirror 100 and, together with the bending spring 114, form a first spring assembly 120.

[0028] The second webs 116-1, 116-2 are arranged along a first tilting axis A of the micromirror 100 on two opposite sides of the bending spring 114. The first webs 118-1, 118-2 are arranged along a second tilting axis B of the micromirror 100 on opposite sides of the mirror element 112. The first tilting axis A serves in particular as the fast axis and is perpendicular to the second tilting axis B, which serves as the slow axis of the micromirror 100. Apart from the first webs 118-1, 118-2, the mirror element 112 is isolated from the rest of the micromirror 100. Apart from the first webs 118-1, 118-2 and the second webs 116-1, 116-2, the bending spring 114 is isolated from the rest of the micromirror 100.

[0029] The holding device 122 is equipped with a first to fourth permanent magnet 130-1, 130-2, 130-3, 130-4, collectively referred to as 130-i, arranged such that each of the permanent magnets 130-i has a north-south orientation either parallel or antiparallel to the second tilting axis B. The entirety of the permanent magnets 130-i can be referred to as the permanent magnet assembly of the micromirror 100. A first permanent magnet 130-1 and a second permanent magnet 130-2 are arranged on one of two opposite sides of the holding device 122. A third permanent magnet 130-3 and a fourth permanent magnet 130-4 are arranged on the other of the two opposite sides. The first permanent magnet 130-1 (or the third permanent magnet 130-3) is located in a z-direction which, in an orthogonal coordinate system, is perpendicular to both the x-direction and the y-direction, above the second permanent magnet 130-2 (or the third permanent magnet 130-3).arranged above the fourth permanent magnet 130-4).

[0030] A first, non-magnetic and non-magnetizable tongue 124-1, rigidly connected to the holding device 122, is arranged between the first and third permanent magnets 130-1, 130-3. A second, non-magnetic and non-magnetizable tongue 124-2, rigidly connected to the holding device 122, is arranged between the second and fourth permanent magnets 130-2, 130-4. The first tongue 124-1 is connected to the frame device 144 via a torsion spring 140-1. The second tongue 124-2 is also connected to the frame device 144 via a torsion spring 140-2. The frame device 144 is, for example, designed as a rectangular frame which, in its rest position, encloses the holding device 122, the bending spring 114, and / or the mirror element 112 in the x and y directions. The holding device 122 is only coupled to the frame device 144 via the tongues 124-1, 124-2 and the torsion springs 140-1, 140-2.The tongues 124-1, 124-2 can in particular be manufactured simultaneously with the holding device 122 and from the same material.

[0031] An electrical conductor 150 for conducting electric current in an almost completely closed circuit around the mirror element 112 is guided on the bending spring 114 of the tilting device 110. A first conductor 156 and a second conductor 158, which connect the electrical conductor 150 to a first and a second electrical pole respectively, are both guided over one and the same web 116-1, with the first and second conductors 156, 158 being guided over the retaining device 122 up to the first web 116-1. The electrical conduction device 150 and / or the first and second conductor tracks 156, 158 can each be realized by a metallic layer and / or by a doped area in a substrate of the bending spring 114, the holding device 122, the tongues 124-1, 124-2, the torsion springs 140-1, 140-2 and / or the frame device 144.

[0032] Fig. Figure 1B shows a schematic detail view in top view of the permanent magnets 130-i together with the forces generated when a current I is passed clockwise through the electrical conducting device 150. The second and fourth permanent magnets 130-2, 130-4 are in Fig. 1 B is shown offset in the y-direction from the first and second permanent magnets 130-1, 130-3 for the sake of recognizability, although this is preferably not the case. A magnetic north pole 130-1N of the first permanent magnet 130-1 faces the conductor 150 and is located closer to the conductor 150 than a magnetic south pole 130-2S of the second permanent magnet 130-2, which also faces the conductor 150. On the other side of the conductor 150, a magnetic south pole 130-3S of the third permanent magnet 130-3 faces the conductor 150 and is located closer to the conductor 150 than a magnetic north pole 130-4N of the fourth permanent magnet 130-4, which also faces the conductor 150.

[0033] A magnetic south pole 130-1S of the first permanent magnet 130-1 and a magnetic north pole 130-2N of the second permanent magnet 130-2 can terminate flush with each other in the axial direction along the second tilting axis B, i.e., in the x-direction. A magnetic north pole 130-3N of the third permanent magnet 130-3 and a magnetic south pole 130-4S of the fourth permanent magnet 130-4 can terminate flush with each other in the axial direction along the second tilting axis B.

[0034] In Fig. Figure 1B further illustrates that a first Lorentz force 31 and a second Lorentz force 32 are generated by the interaction of an electric current I applied to the conducting device 150 and the magnetic flux lines 11 of the first to fourth permanent magnets 130-i. The first Lorentz force 31 is generated in a section of the conducting device 150 closest to the first permanent magnet 130-1, acts on the conducting device 150 together with the bending spring 114 on which it is arranged, and is directed in the negative z-direction. The second Lorentz force 32 is generated in a section of the conducting device 150 closest to the third permanent magnet 130-3, acts on the conducting device 150 and the bending spring 114, and is directed in the positive z-direction.In combination, the first and second Lorentz forces 31, 32 cause the mirror element 112 to tilt, depending on the design, accompanied by a deformation of the first spring assembly 120, i.e., the bending spring 114 and / or the second webs 116-1, 116-2 as torsional springs. The mirror element 112 is thus subjected to an angular momentum in the negative y-direction. If the electric current I is applied with the opposite current flow direction, e.g., if the polarity of the first and second poles is reversed, the mirror element 112 is accordingly subjected to an angular momentum in the positive y-direction.

[0035] Fig. 1C shows a schematic side view of the in Fig. Elements and forces shown in 1B. Fig. Figure 1C shows that the offset arrangement of the permanent magnets 130-i serves to generate particularly large components of the first magnetic field 11 in the positive and negative x-direction in the area of ​​the current I through the conducting device 150.

[0036] In Fig. Figure 1A shows a first electromagnet 125 and a second electromagnet 127 of the micromirror 100. As in Fig. As can be seen in Figure 1D, the first electromagnet 125 has a U-shaped magnetic flux guide plate 129. The flux guide plate 129 consists of a crossbeam 126-3, which is connected at both ends to an arm 126-1, 126-2. The crossbeam 126-3 is wound with a current-carrying coil 131, so that by energizing the coil 131, the arms 126-1, 126-2 function as the magnetic north and south poles, or vice versa. As shown in Fig. As shown in Figure 1D, the first and third permanent magnets 130-1, 130-3 are arranged such that the magnetic south pole 130-1S of the first permanent magnet 130-1 and the magnetic north pole 130-3N of the third permanent magnet 130-3 are arranged in the y-direction between the arms 126-1, 126-2 and in the x- and z-directions at the same level as the arms 126-1, 126-2.

[0037] By energizing coil 131, a second magnetic field can be generated by electromagnet 125. In this second magnetic field, the permanent magnets 130-1, 130-3, which are rotatably arranged relative to the frame assembly 144 by means of the torsion spring 140-1, align themselves favorably in terms of energy. As a result, the holding device 122, which is rigidly connected to the permanent magnets 130-1, 130-3 via the tongues 124-1, 124-2, tilts along the second tilting axis B on the torsion spring 140-1. The second electromagnet 127 is arranged and designed in a mirror-symmetrical manner with respect to the first tilting axis A compared to the first electromagnet 125.When the coil 131 is energized, a coil of the second electromagnet 127 with arms 128-1, 128-2 is simultaneously energized in such a way that the holding device 122 also tilts along the second tilting axis B on the torsion spring 140-2, whereby a tilting with the same direction of rotation, i.e. with an angular momentum either in the positive or negative x-direction, takes place on the torsion springs 140-1, 140-2.

[0038] The electromagnets 125, 127 can be attached to the frame assembly 144. For example, both the electromagnets 125, 127 and the frame assembly 144 can be connected to a circuit board by means of which the electric current I can be fed into the line assembly 150 and / or by means of which the electric coils of the electromagnets 125, 127 can be energized.

[0039] Fig. 2A to Fig. Figure 2D shows a micromirror 200 according to a further embodiment of the present invention. The micromirror 200 is a variant of the micromirror 100 and differs from it in the guiding of an electrical conduction device 250 via the tilting device 110 and the holding device 122 of the micromirror 200 instead of the conduction device 150 of the micromirror 100, as well as in a correspondingly different configuration of the first to fourth permanent magnets 230-i of the micromirror 200 instead of the permanent magnets 130-i of the micromirror 100.

[0040] Fig. Figure 2A shows the micromirror 200 schematically in top view. Fig. Figure 2B shows a schematic detail view in top view of the permanent magnets 230-i and the mirror element 112 together with the forces arising when a current I is passed in the positive y-direction through the electrical conducting device 250. Fig. 2C shows a schematic side view of the in Fig. Elements and forces shown in 2B. Fig. Figure 2D schematically shows an arrangement of the first and second permanent magnets 130-1, 130-2 between the first electromagnet 125.

[0041] The conductor assembly 250 is guided on the bending spring 114 in a mirror-symmetrical manner with respect to the first tilting axis A, whereby the electric current I can be guided in a mirror-symmetrical manner with respect to the first tilting axis A. The conductor assembly 250 is connected to the first electrical pole via a first of the two second webs 116-1, which is designed as a torsion spring, and to the second electrical pole via a second of the two second webs 116-2, which is also designed as a torsion spring.

[0042] The first and third permanent magnets 230-1, 230-3, which, like the first and third permanent magnets 130-1, 130-3, are arranged in the positive z-direction above the holding device 122, are each arranged with their north pole 230-1N, 230-3N pointing towards the mirror element 112. The second and fourth permanent magnets 230-2, 230-4, which are arranged in the negative z-direction below the holding device 122, are each arranged with their south pole 230-2S, 230-4S pointing towards the mirror element 112. The south pole 230-2S of the second permanent magnet 230-2 is arranged closer to the conducting device 250 in the x-direction than the north pole 230-1N of the first permanent magnet 230-1. The south pole 230-4S of the fourth permanent magnet 230-4 is located closer to the conductor assembly 250 in the x-direction than the north pole 230-3N of the third permanent magnet 230-3.

[0043] The magnetic poles 230-1S, 230-2N facing away from the mirror element 112 can be arranged flush in the x-direction. The magnetic poles 230-3S, 230-4N facing away from the mirror element 112 can also be arranged flush in the x-direction. In particular, the arrangement and design of the first and second permanent magnets 230-1, 230-2 are mirror-symmetrical with respect to the first tilting axis A to the arrangement and design of the third and fourth permanent magnets 230-3, 230-4. According to Fig. In 2D, the first and second permanent magnets 230-1, 230-2 are arranged with respect to the arms 126-1, 126-2 of the first electromagnet 125 in the same way as the first and second permanent magnets 130-1, 130-2.

[0044] Fig. 3A to Fig. Figure 3D shows a micromirror 300 according to a further embodiment of the present invention. The micromirror 300 is a variant of the micromirror 200 and differs from it in a tilting device 310 of the micromirror 300 instead of the tilting device 110 of the micromirror 100 and in the guidance of an electrical conduction device 350 instead of the conduction device 250 of the micromirror 200.

[0045] Fig. Figure 3A shows the micromirror 300 schematically in top view. Fig. Figure 3B shows a schematic detail view in top view of the permanent magnets 230-i and the mirror element 312 together with the forces arising when a current I is passed in the positive y-direction through the electrical conducting device 350. Fig. 3C shows a schematic side view of the in Fig. The elements and forces shown in Figure 3B. The arrangement of the first and second permanent magnets 230-1, 230-2 between the first electromagnet 125 is as shown in Figure 3B. Fig. 2D representation.

[0046] In the micromirror 300, the tilting device 310 consists of the mirror element 312, which is connected to the holding device 122 via the second webs 116-1, 116-2, which function as torsion springs. Instead of symmetrical guidance via the bending spring 114, as in the micromirror 200, in the micromirror 300 a metallic surface, which functions as the mirror element 312 of the micromirror 300, is directly contacted and serves as part of the electrical conduction device 350. The applied electric current I thus flows from the direction of web 116-1 towards web 116-2, or vice versa, across the entire metallic surface, or a spaced portion of the metallic surface, of the mirror element 312.Since the electric current I is also guided in a mirror-symmetrical manner to the first tilting axis A in the micromirror 300, according to the conducting device 350, the permanent magnets 230-i of the micromirror 300 are designed and arranged in the same way as the permanent magnets 230-i of the micromirror 200.

[0047] Fig. 4A to Fig. Figure 4D shows a micromirror 400 according to yet another embodiment of the present invention. The micromirror 400 is a variant of the micromirror 100 and differs from it in the design and arrangement of the permanent magnets 430-i of the micromirror 400.

[0048] Fig. Figure 4A shows the micromirror 400 schematically in top view. Fig. Figure 4B shows a schematic detail view in top view of the permanent magnets 430-i and the mirror element 112 together with the forces arising when a current is passed clockwise through the electrical conducting device 150. Fig. 4C shows a schematic side view of the in Fig. Elements and forces shown in 4B. Fig. Figure 4D schematically shows an arrangement of the first and second permanent magnets 430-1, 430-2 between the first electromagnet 125.

[0049] In the micromirror 400, the magnetic north-south axes of the permanent magnets 430-i, in a rest position without an applied electric current I and without any current being applied to the coils, are arranged perpendicular to both the first tilting axis A and the second tilting axis B. The first permanent magnet 430-1 is arranged closer to the mirror element 112 in the x-direction than the second permanent magnet 430-2, and the third permanent magnet 430-3 is arranged closer to the mirror element 112 in the x-direction than the fourth permanent magnet 430-4, with the ends of the permanent magnets 430-i facing away from the mirror element 112 being arranged in pairs flush in the x-direction.

[0050] The north pole 430-1N of the first permanent magnet 430-1 faces away from the second permanent magnet 430-2, while the south pole 430-1S of the first permanent magnet 430-1 faces towards the second permanent magnet 430-2. The north pole 430-2N of the second permanent magnet 430-2 faces towards the first permanent magnet 430-1, while the south pole 430-2S of the second permanent magnet 430-2 faces away from the first permanent magnet 430-1. The first and second permanent magnets 430-1, 430-2 are arranged on opposite outer sides of the tongue 124-1, as are the first and second permanent magnets 130-1, 130-2, 230-1, 230-2.

[0051] The north pole 430-3N of the third permanent magnet 430-3 faces the fourth permanent magnet 430-4, while the south pole 430-3S of the third permanent magnet 430-3 faces away from the fourth permanent magnet 430-4. The north pole 430-4N of the fourth permanent magnet 430-4 faces away from the third permanent magnet 430-3, while the south pole 430-4S of the fourth permanent magnet 430-4 faces the third permanent magnet 430-3. The third and fourth permanent magnets 430-3, 430-4 are arranged on opposite outer sides of the tongue 124-2, as are the third and fourth permanent magnets 130-3, 130-4, 230-3, 230-4.

[0052] Accordingly, as in Fig. Figure 4D shows that both the north and south poles 430-1N, 430-1S, 430-2N, 430-2S of the first and second permanent magnets 430-1, 430-2 are arranged between the arms 126-1, 126-2 of the flux guide plate 129 of the first electromagnet 125, specifically at one end of the permanent magnets 430-i facing away from the mirror element 112. The same applies to the second electromagnet 127 and the third and fourth permanent magnets 430-3, 430-4.

[0053] Fig. Figure 5 shows a schematic flowchart to explain a method according to an embodiment of the present invention. The method according to Fig. 5 is feasible with the micromirror according to the invention, in particular with one of the micromirrors 100; 200, 300; 400, and is adaptable with respect to all described further developments and modifications of the micromirrors according to the invention and vice versa.

[0054] In step S01, an electric current I, in particular alternating current, is guided through an electrical conducting device 150; 250; 350, which is guided over a tilting device 112; 312 of the micromirror, within a first magnetic field 11 generated by a permanent magnet device 130-i; 230-i; 430-i of the micromirror 100; 200; 300; 400, so that, due to a Lorentz force 31, 32, a mirror element 112; 312 of the tilting device 110; 310 is tilted along a first tilting axis A.

[0055] In step S02, a second magnetic field is generated by an electromagnetic device 125, 127 of the micromirror 100; 200; 300; 400 in the area of ​​the permanent magnet device 130-i; 230-i; 430-i, so that due to magnetic attraction and repulsion the tilting device 110; 310 is tilted along a second tilting axis B, which is arranged in particular perpendicular to the first tilting axis A.

[0056] Preferably, the electric current is guided through the electrical conducting device 150; 250; 350 such that the mirror element 112; 312 of the tilting device 110; 310 is tilted along the first tilting axis A in a resonant periodic motion. Preferably, the second magnetic field is generated such that the tilting device 110; 310 is tilted quasi-statically along the second tilting axis B.

[0057] Although the present invention has been described above with reference to preferred embodiments, it is not limited thereto, but can be modified in a variety of ways. In particular, the invention can be altered or modified in many ways without deviating from the core of the invention. For example, the north-south orientation of all permanent magnets of a micromirror 100; 200; 300; 400 can also be exactly opposite to that shown for the micromirrors 100; 200; 300; 400 in each case.

[0058] For example, the bending spring 114 can also be designed as a uniformly shaped but rigid element, so that the first spring assembly 120 consists only of the second webs 116-1, 116-2. Instead of exactly two first webs 118-1, 118-2, for example, only one web, or three or more webs can be provided. Instead of circular (ring) shapes for the bending spring 114, for the holding device 122 and / or for the mirror element 112; 312, other shapes, for example rectangular shapes, can also be used.

[0059] For clarity, the conductor structures 150; 250; 350 are shown in the figures as single-layer conductor structures. However, the conductor structures 150; 250; 350 can also be designed as two-layer or multi-layer structures, for example helically, whereby, in particular, in the sections of the conductor structures 150; 250; 350 closest to the permanent magnets 130-i; 230-i; 430-i, two or more conductor tracks can be arranged one above the other in the z-direction, so that the generated Lorentz forces 31, 32 are correspondingly stronger.

Claims

[1] Micromechanical actuator device (100; 200; 300; 400) with: a tilting device (110; 310) which has an actuator element (112; 312); a first spring assembly (120); a holding device (122); wherein the tilting device (110; 310) is connected to the holding device (122) via the first spring device (120) so as to be tiltable about a first tilting axis (A); at least one electrical conductor (150; 250; 350) which is routed over the tilting device (110; 310); a permanent magnet device (130-i; 230-i; 430-i) which is arranged on the holding device (122); the permanent magnet device (130-i; 230-i; 430-i) is designed to to generate a first magnetic field (11) such that when an electric current (I) is conducted through the electrical conducting device (150; 250; 350) within the first magnetic field (11) a Lorentz force (31; 32) can be generated by which the tilting device (110; 310) can be tilted relative to the holding device (122) about the first tilting axis (A); a framework facility (144); a second spring device (140-i) via which the holding device (122) is connected to the frame device (144) in a tiltable manner about a second tilting axis (B); an electromagnetic device (125, 129) which is designed to generate a second magnetic field which acts on the permanent magnet device (130-i; 230-i; 430-i) in such a way that the holding device (122) can be tilted relative to the frame device (144) about the second tilting axis (B). [2] Device (100; 200; 300; 400) according to claim 1, wherein the first spring assembly (120) comprises a first torsion spring (116-1); and wherein a first electrical conductor (156) for connecting the electrical conductor device (150) to a first electrical pole is guided over the first torsion spring (116-1). [3] Device (100; 200; 300; 400) according to claim 1 or 2, wherein the first spring assembly (120) further comprises a second torsion spring (116-2), wherein a second electrical conductor (158) for connecting the electrical conductor assembly (150) to a second electrical pole is guided over the first torsion spring (116-1) and / or over the second torsion spring (116-2). [4] Device (100; 200; 300; 400) according to one of claims 1 to 3, wherein the second spring assembly (140-i) comprises at least one third torsion spring (140-1, 140-2) over which at least one electrical conductor (156, 158) is guided for connecting the electrical conductor assembly (150) to at least one electrical pole. [5] Device (100; 200; 300) according to any one of claims 1 to 4, wherein the permanent magnet device (130-i; 230-i; 430-i) comprises at least one first permanent magnet (130-1, 130-3; 230-1, 230-3; 430-1, 430-3) and / or at least one second permanent magnet (130-2, 130-4; 230-2, 230-4; 430-2, 430-4); wherein a magnetic north-south orientation of the at least one first permanent magnet (130-1, 130-3; 230-1, 230-3; 430-1, 430-3) is arranged parallel to the second tilting axis (B); and / or wherein a magnetic north-south orientation of the at least one second permanent magnet (130-2, 130-4; 230-2, 230-4; 430-2, 430-4) is arranged antiparallel to the second tilting axis (B). [6] Device (400) according to any one of claims 1 to 4, wherein the permanent magnet device (430-i) comprises at least one first permanent magnet (430-1, 430-3) and / or at least one second permanent magnet (430-2, 430-4); wherein a magnetic north-south orientation of the at least one first permanent magnet (430-1, 430-3) and / or a magnetic north-south orientation of the at least one second permanent magnet (430-2, 430-4) are arranged perpendicular to the second tilting axis (B). [7] Device (100; 200; 300; 400) according to one of claims 5 or 6, wherein at least two permanent magnets (130-i; 230-i; 430-i) are arranged in the axial direction, with respect to the second tilting axis (B), at different distances from the electrical conducting device (150; 250; 350). [8] Device (300) according to one of claims 1 to 7, wherein the actuator element (312) of the tilting device (310) is designed as a metallic surface, and wherein a section of the electrical conductor track (350) in which the Lorentz force (31, 32) is generated is realized through the metallic surface. [9] Method for tilting a micromechanical actuator device (100; 200; 300; 400), comprising the steps: Conducting (S01) electric current (I) through an electrical conducting device (150; 250; 350), which is guided over a tilting device (110; 310) of the actuator device (100; 200; 300; 400), within a first magnetic field (11) generated by a permanent magnet device (130-i; 230-i; 430-i) of the actuator device (100; 200; 300; 400), such that, due to a Lorentz force (31, 32), the tilting device (110; 310) and / or an actuator element (112; 312) of the tilting device (110; 310) is tilted along a first tilting axis (A), wherein the permanent magnet device (130-i; 230-i; 430-i) is attached to a holding device (122) of the Actuator device (100; 200; 300; 400) is arranged; and generating (S02) a second magnetic field by an electromagnetic device (125, 129) of the actuator device (100; 200; 300; 400) in the area of ​​the permanent magnet device (130-i; 230-i; 430-i), so that due to magnetic attraction and repulsion the tilting device (110;310) and / or the actuator element (112; 312) is tilted along a second tilting axis (B).; [10] Method according to claim 9, wherein the electric current (I) is passed through the electrical conducting device (150; 250, 350) such that the actuator element (112; 312) of the tilting device (110; 310) is tilted along the first tilting axis (A) in a resonant periodic motion; and wherein the second magnetic field is generated in such a way that the tilting device (110; 310) and / or the actuator element (112; 312) is tilted quasi-statically along the second tilting axis (B).

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